JP6377975B2 - 基板固定装置 - Google Patents

基板固定装置 Download PDF

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Publication number
JP6377975B2
JP6377975B2 JP2014128275A JP2014128275A JP6377975B2 JP 6377975 B2 JP6377975 B2 JP 6377975B2 JP 2014128275 A JP2014128275 A JP 2014128275A JP 2014128275 A JP2014128275 A JP 2014128275A JP 6377975 B2 JP6377975 B2 JP 6377975B2
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JP
Japan
Prior art keywords
electrostatic
electrode
base
substrate
tray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2014128275A
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English (en)
Japanese (ja)
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JP2016009715A (ja
JP2016009715A5 (enExample
Inventor
晃樹 玉川
晃樹 玉川
則雄 白岩
則雄 白岩
忠義 吉川
忠義 吉川
直人 渡部
直人 渡部
美喜 齋藤
美喜 齋藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinko Electric Industries Co Ltd
Original Assignee
Shinko Electric Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinko Electric Industries Co Ltd filed Critical Shinko Electric Industries Co Ltd
Priority to JP2014128275A priority Critical patent/JP6377975B2/ja
Priority to US14/732,868 priority patent/US9837297B2/en
Priority to TW104118706A priority patent/TWI640054B/zh
Priority to KR1020150084935A priority patent/KR102266688B1/ko
Publication of JP2016009715A publication Critical patent/JP2016009715A/ja
Publication of JP2016009715A5 publication Critical patent/JP2016009715A5/ja
Application granted granted Critical
Publication of JP6377975B2 publication Critical patent/JP6377975B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H01L21/6833—Details of electrostatic chucks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/6875—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68771—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by supporting more than one semiconductor substrate

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Jigs For Machine Tools (AREA)
JP2014128275A 2014-06-23 2014-06-23 基板固定装置 Active JP6377975B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2014128275A JP6377975B2 (ja) 2014-06-23 2014-06-23 基板固定装置
US14/732,868 US9837297B2 (en) 2014-06-23 2015-06-08 Tray and wafer holding apparatus
TW104118706A TWI640054B (zh) 2014-06-23 2015-06-10 托盤及晶圓固持裝置
KR1020150084935A KR102266688B1 (ko) 2014-06-23 2015-06-16 트레이 및 웨이퍼 고정 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014128275A JP6377975B2 (ja) 2014-06-23 2014-06-23 基板固定装置

Publications (3)

Publication Number Publication Date
JP2016009715A JP2016009715A (ja) 2016-01-18
JP2016009715A5 JP2016009715A5 (enExample) 2017-02-23
JP6377975B2 true JP6377975B2 (ja) 2018-08-22

Family

ID=54870313

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014128275A Active JP6377975B2 (ja) 2014-06-23 2014-06-23 基板固定装置

Country Status (4)

Country Link
US (1) US9837297B2 (enExample)
JP (1) JP6377975B2 (enExample)
KR (1) KR102266688B1 (enExample)
TW (1) TWI640054B (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6010720B1 (ja) * 2015-01-20 2016-10-19 日本碍子株式会社 ウエハ支持構造体
US10770270B2 (en) * 2016-06-07 2020-09-08 Applied Materials, Inc. High power electrostatic chuck with aperture-reducing plug in a gas hole
US11532497B2 (en) * 2016-06-07 2022-12-20 Applied Materials, Inc. High power electrostatic chuck design with radio frequency coupling
US20180096867A1 (en) * 2016-09-30 2018-04-05 Momentive Performance Materials Inc. Heating apparatus with controlled thermal contact
KR20180064505A (ko) * 2016-11-07 2018-06-14 어플라이드 머티어리얼스, 인코포레이티드 기판을 홀딩하기 위한 캐리어, 프로세싱 시스템에서의 캐리어의 사용, 캐리어를 이용하는 프로세싱 시스템, 및 기판의 온도를 제어하기 위한 방법
JP6986937B2 (ja) * 2017-01-05 2021-12-22 東京エレクトロン株式会社 プラズマ処理装置
JP6858035B2 (ja) 2017-02-27 2021-04-14 新光電気工業株式会社 基板固定具及び基板固定装置
JP6969182B2 (ja) * 2017-07-06 2021-11-24 東京エレクトロン株式会社 プラズマ処理装置
US20190105748A1 (en) * 2017-10-11 2019-04-11 Samsung Electronics Co., Ltd. Seal-less airlock wafer stage
JP7049108B2 (ja) * 2017-12-25 2022-04-06 日本特殊陶業株式会社 静電チャック
DE102018127658A1 (de) * 2018-11-06 2020-05-07 Asm Assembly Systems Gmbh & Co. Kg Elektrostatisches Aufspannen von Elektronikplatten
US12300473B2 (en) 2019-03-08 2025-05-13 Applied Materials, Inc. Electrostatic chuck for high bias radio frequency (RF) power application in a plasma processing chamber
CN113574652B (zh) 2019-03-18 2023-09-01 日本碍子株式会社 静电卡盘
CN113892061B (zh) * 2019-05-29 2025-02-11 Asml控股股份有限公司 分裂式双面晶片和掩模板夹具
JP7349845B2 (ja) * 2019-08-13 2023-09-25 東京エレクトロン株式会社 基板処理システムにおける搬送方法
JP7386086B2 (ja) * 2020-01-07 2023-11-24 日本特殊陶業株式会社 保持装置
JP7683605B2 (ja) * 2020-06-29 2025-05-27 住友大阪セメント株式会社 静電チャック装置
JP2024071016A (ja) * 2022-11-14 2024-05-24 新光電気工業株式会社 トレイ及び基板固定装置
US20240186121A1 (en) * 2022-12-06 2024-06-06 Applied Materials, Inc. Thermal choke plate

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2767282B2 (ja) * 1989-05-30 1998-06-18 日本真空技術株式会社 基板保持装置
JPH05259048A (ja) * 1992-03-09 1993-10-08 Nippon Telegr & Teleph Corp <Ntt> 試料加工用装置、試料搬送用装置及び試料搬送・加工用装置
JP3596127B2 (ja) * 1995-12-04 2004-12-02 ソニー株式会社 静電チャック、薄板保持装置、半導体製造装置、搬送方法及び半導体の製造方法
JP4256503B2 (ja) * 1997-10-30 2009-04-22 東京エレクトロン株式会社 真空処理装置
JP4346877B2 (ja) 2002-08-29 2009-10-21 東京エレクトロン株式会社 静電吸着装置および処理装置
JP4302428B2 (ja) * 2003-05-09 2009-07-29 信越化学工業株式会社 静電吸着機能を有するウエーハ加熱装置
JP2006056731A (ja) * 2004-08-18 2006-03-02 Taiheiyo Cement Corp 窒化アルミニウム焼結体およびそれを用いた静電チャック
DE102005056364B3 (de) * 2005-11-25 2007-08-16 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Bipolarer Trägerwafer und mobile, bipolare, elektrostatische Waferanordnung
JP4864757B2 (ja) * 2007-02-14 2012-02-01 東京エレクトロン株式会社 基板載置台及びその表面処理方法
JP2010098012A (ja) * 2008-10-14 2010-04-30 Ulvac Japan Ltd エッチング装置及びエッチング方法
JP2012074650A (ja) * 2010-09-30 2012-04-12 Samco Inc プラズマ処理用トレイ及びプラズマ処理装置
JP5638405B2 (ja) * 2010-10-08 2014-12-10 パナソニック株式会社 基板のプラズマ処理方法
JP6285620B2 (ja) * 2011-08-26 2018-02-28 新光電気工業株式会社 静電チャック及び半導体・液晶製造装置
US9494875B2 (en) 2011-10-06 2016-11-15 Asml Netherlands B.V. Chuck, a chuck control system, a lithography apparatus and a method of using a chuck
JP6007039B2 (ja) * 2012-09-18 2016-10-12 株式会社アルバック 搬送トレー及び基板保持方法
JP5595549B2 (ja) * 2013-03-28 2014-09-24 パナソニック株式会社 プラズマ処理装置用トレイ、プラズマ処理装置、及びプラズマ処理方法

Also Published As

Publication number Publication date
KR20150146408A (ko) 2015-12-31
US20150371885A1 (en) 2015-12-24
JP2016009715A (ja) 2016-01-18
US9837297B2 (en) 2017-12-05
TW201613019A (en) 2016-04-01
TWI640054B (zh) 2018-11-01
KR102266688B1 (ko) 2021-06-21

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