JP6368075B2 - モールド - Google Patents

モールド Download PDF

Info

Publication number
JP6368075B2
JP6368075B2 JP2013134209A JP2013134209A JP6368075B2 JP 6368075 B2 JP6368075 B2 JP 6368075B2 JP 2013134209 A JP2013134209 A JP 2013134209A JP 2013134209 A JP2013134209 A JP 2013134209A JP 6368075 B2 JP6368075 B2 JP 6368075B2
Authority
JP
Japan
Prior art keywords
mold
pattern
substrate
light shielding
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2013134209A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015012034A (ja
JP2015012034A5 (enExample
Inventor
宮島　義一
義一 宮島
章義 鈴木
章義 鈴木
岩永　武彦
武彦 岩永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2013134209A priority Critical patent/JP6368075B2/ja
Priority to TW103120021A priority patent/TWI534858B/zh
Priority to KR1020140074106A priority patent/KR101717328B1/ko
Priority to US14/311,759 priority patent/US20150004275A1/en
Priority to CN201410282999.3A priority patent/CN104249420A/zh
Publication of JP2015012034A publication Critical patent/JP2015012034A/ja
Publication of JP2015012034A5 publication Critical patent/JP2015012034A5/ja
Application granted granted Critical
Publication of JP6368075B2 publication Critical patent/JP6368075B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2013134209A 2013-06-26 2013-06-26 モールド Active JP6368075B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2013134209A JP6368075B2 (ja) 2013-06-26 2013-06-26 モールド
TW103120021A TWI534858B (zh) 2013-06-26 2014-06-10 模具
KR1020140074106A KR101717328B1 (ko) 2013-06-26 2014-06-18 몰드
US14/311,759 US20150004275A1 (en) 2013-06-26 2014-06-23 Mold
CN201410282999.3A CN104249420A (zh) 2013-06-26 2014-06-23 模具

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013134209A JP6368075B2 (ja) 2013-06-26 2013-06-26 モールド

Publications (3)

Publication Number Publication Date
JP2015012034A JP2015012034A (ja) 2015-01-19
JP2015012034A5 JP2015012034A5 (enExample) 2016-08-12
JP6368075B2 true JP6368075B2 (ja) 2018-08-01

Family

ID=52115827

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013134209A Active JP6368075B2 (ja) 2013-06-26 2013-06-26 モールド

Country Status (5)

Country Link
US (1) US20150004275A1 (enExample)
JP (1) JP6368075B2 (enExample)
KR (1) KR101717328B1 (enExample)
CN (1) CN104249420A (enExample)
TW (1) TWI534858B (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20160023404A1 (en) * 2014-07-25 2016-01-28 Stephen Raymond Anderson Three-dimensional manufacturing, fabricating, forming, and/or repairing apparatus and method
US10409156B2 (en) * 2015-02-13 2019-09-10 Canon Kabushiki Kaisha Mold, imprint apparatus, and method of manufacturing article
JP6583747B2 (ja) * 2015-09-29 2019-10-02 大日本印刷株式会社 インプリント用のモールドおよびその製造方法
US20170210036A1 (en) * 2016-01-22 2017-07-27 Canon Kabushiki Kaisha Mold replicating method, imprint apparatus, and article manufacturing method
TWI565577B (zh) * 2016-01-29 2017-01-11 森田印刷廠股份有限公司 模內轉印模具及模內轉印方法
JP6748496B2 (ja) * 2016-06-30 2020-09-02 キヤノン株式会社 モールド、インプリント方法、インプリント装置および物品製造方法
CN108068254A (zh) * 2016-11-14 2018-05-25 昇印光电（昆山）股份有限公司 微纳结构压印模具
JP6821408B2 (ja) * 2016-11-28 2021-01-27 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
US10712660B2 (en) * 2016-12-21 2020-07-14 Canon Kabushiki Kaisha Template for imprint lithography including a recession and an apparatus and method of using the template
CN109397677A (zh) * 2017-08-18 2019-03-01 昇印光电（昆山）股份有限公司 微纳压印模具
TWI754374B (zh) * 2018-04-09 2022-02-01 日商大日本印刷股份有限公司 奈米壓印用模片及其製造方法、及、2段台面基底及其製造方法
US11281095B2 (en) 2018-12-05 2022-03-22 Canon Kabushiki Kaisha Frame curing template and system and method of using the frame curing template
JP7278135B2 (ja) 2019-04-02 2023-05-19 キヤノン株式会社 インプリント装置および物品製造方法
JP7414508B2 (ja) * 2019-12-16 2024-01-16 キヤノン株式会社 インプリント装置、および物品製造方法
US11747731B2 (en) 2020-11-20 2023-09-05 Canon Kabishiki Kaisha Curing a shaped film using multiple images of a spatial light modulator
JP2023091495A (ja) * 2021-12-20 2023-06-30 キヤノン株式会社 インプリント方法、インプリント装置および物品製造方法。

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4727806A (en) * 1985-08-26 1988-03-01 Wilson Engraving Company, Inc. Pin register system for flexographic printing plates
US8011916B2 (en) * 2005-09-06 2011-09-06 Canon Kabushiki Kaisha Mold, imprint apparatus, and process for producing structure
JP5182470B2 (ja) * 2007-07-17 2013-04-17 大日本印刷株式会社 インプリントモールド
JP4799575B2 (ja) * 2008-03-06 2011-10-26 株式会社東芝 インプリント方法
JP5534311B2 (ja) * 2010-01-22 2014-06-25 Ｈｏｙａ株式会社 マスクブランク用基板とその製造方法、インプリントモールド用マスクブランクとその製造方法、及びインプリントモールドとその製造方法
JP5744590B2 (ja) * 2011-03-28 2015-07-08 キヤノン株式会社 インプリント方法、型、それらを用いた物品の製造方法
JP5831012B2 (ja) * 2011-07-27 2015-12-09 大日本印刷株式会社 インプリント用位置合わせマーク、該マークを備えたテンプレートおよびその製造方法
JP6061524B2 (ja) * 2011-08-11 2017-01-18 キヤノン株式会社 インプリント装置および物品の製造方法
JP2013051360A (ja) * 2011-08-31 2013-03-14 Fujikura Ltd 絶縁性基板の製造方法及び多層積層板の製造方法

Also Published As

Publication number Publication date
JP2015012034A (ja) 2015-01-19
CN104249420A (zh) 2014-12-31
US20150004275A1 (en) 2015-01-01
KR101717328B1 (ko) 2017-03-16
TWI534858B (zh) 2016-05-21
TW201503232A (zh) 2015-01-16
KR20150001630A (ko) 2015-01-06

Similar Documents

Publication Publication Date Title
JP6368075B2 (ja) モールド
JP6304934B2 (ja) インプリント装置および物品の製造方法
KR102074088B1 (ko) 임프린트 장치, 임프린트 방법 및 물품 제조 방법
TWI601619B (zh) 壓印設備及物件製造方法
US20200223126A1 (en) Imprint apparatus and method for manufacturing article
JP6294679B2 (ja) インプリント装置及び物品の製造方法
KR20130040723A (ko) 임프린트 방법, 임프린트 장치, 및 디바이스 제조 방법
KR102239538B1 (ko) 임프린트 방법, 임프린트 장치, 형, 및 물품 제조 방법
JP2017108140A (ja) インプリント装置、および部分領域をインプリントする方法
KR20210020795A (ko) 평탄화 공정, 장치 및 물품 제조 방법
JP2015050437A (ja) インプリント装置および物品の製造方法
JP2019204907A (ja) インプリント装置、インプリント方法および物品の製造方法
JP2016225433A (ja) モールド、インプリント方法、インプリント装置および物品の製造方法
JP2013110162A (ja) インプリント装置及び物品の製造方法
JP7134055B2 (ja) 成形装置、および物品の製造方法
JP7204457B2 (ja) インプリント装置、インプリント方法及び物品の製造方法
JP2013038137A (ja) モールド、インプリント装置、インプリント方法及び物品の製造方法
WO2018088049A1 (ja) インプリント装置、インプリント方法、及び物品製造方法
JP7358192B2 (ja) インプリント装置、インプリント方法及び物品の製造方法
JP6166516B2 (ja) インプリント装置、インプリント方法および物品の製造方法
JP2017216374A (ja) 計測装置、搬送システム、リソグラフィ装置、および物品の製造方法
JP7337682B2 (ja) インプリント装置、インプリント方法、及び物品の製造方法
US20240419087A1 (en) Substrate chuck, lithography apparatus, and article manufacturing method
JP2017208450A (ja) リソグラフィ装置、および物品の製造方法
JP6470153B2 (ja) インプリント方法およびインプリント装置

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160627

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20160627

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20170316

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20170407

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20171201

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20180112

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20180608

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20180706

R151 Written notification of patent or utility model registration

Ref document number: 6368075

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151