JP6170145B2 - 相互混合層を有するガス分離膜 - Google Patents
相互混合層を有するガス分離膜 Download PDFInfo
- Publication number
- JP6170145B2 JP6170145B2 JP2015519339A JP2015519339A JP6170145B2 JP 6170145 B2 JP6170145 B2 JP 6170145B2 JP 2015519339 A JP2015519339 A JP 2015519339A JP 2015519339 A JP2015519339 A JP 2015519339A JP 6170145 B2 JP6170145 B2 JP 6170145B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- porous support
- gas
- gutter
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000012528 membrane Substances 0.000 title claims description 71
- 238000000926 separation method Methods 0.000 title claims description 15
- 239000002131 composite material Substances 0.000 claims description 55
- 239000004642 Polyimide Substances 0.000 claims description 11
- 229920001721 polyimide Polymers 0.000 claims description 11
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 10
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 7
- 229920002301 cellulose acetate Polymers 0.000 claims description 5
- 239000004697 Polyetherimide Substances 0.000 claims description 4
- 229920001601 polyetherimide Polymers 0.000 claims description 4
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 172
- 239000000203 mixture Substances 0.000 description 96
- 239000007789 gas Substances 0.000 description 81
- 230000005855 radiation Effects 0.000 description 54
- 229920000642 polymer Polymers 0.000 description 35
- 238000000034 method Methods 0.000 description 30
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 20
- -1 polyethylene Polymers 0.000 description 20
- 238000001723 curing Methods 0.000 description 17
- 239000012442 inert solvent Substances 0.000 description 17
- 239000011148 porous material Substances 0.000 description 16
- 230000008569 process Effects 0.000 description 16
- 239000011241 protective layer Substances 0.000 description 15
- 230000004907 flux Effects 0.000 description 12
- 238000000576 coating method Methods 0.000 description 11
- 238000005011 time of flight secondary ion mass spectroscopy Methods 0.000 description 11
- 238000002042 time-of-flight secondary ion mass spectrometry Methods 0.000 description 11
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 10
- 239000000126 substance Substances 0.000 description 10
- 229920001187 thermosetting polymer Polymers 0.000 description 8
- 238000000108 ultra-filtration Methods 0.000 description 8
- 101100351213 Chromobacterium violaceum (strain ATCC 12472 / DSM 30191 / JCM 1249 / NBRC 12614 / NCIMB 9131 / NCTC 9757) pcp gene Proteins 0.000 description 7
- 101100126615 Mus musculus Itpr1 gene Proteins 0.000 description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 7
- 101150075058 pcp1 gene Proteins 0.000 description 7
- 230000035699 permeability Effects 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 6
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 150000001412 amines Chemical class 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000012952 cationic photoinitiator Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 5
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 5
- 238000007756 gravure coating Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 229910052753 mercury Inorganic materials 0.000 description 5
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 5
- 229920002239 polyacrylonitrile Polymers 0.000 description 5
- 150000003254 radicals Chemical class 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- 150000001450 anions Chemical class 0.000 description 4
- 229910002091 carbon monoxide Inorganic materials 0.000 description 4
- 150000004696 coordination complex Chemical class 0.000 description 4
- 150000002009 diols Chemical class 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- 239000002737 fuel gas Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000003999 initiator Substances 0.000 description 4
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 150000001335 aliphatic alkanes Chemical class 0.000 description 3
- 150000004996 alkyl benzenes Chemical class 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 239000013522 chelant Substances 0.000 description 3
- 238000003851 corona treatment Methods 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000004205 dimethyl polysiloxane Substances 0.000 description 3
- 238000003618 dip coating Methods 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000005499 meniscus Effects 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 230000035515 penetration Effects 0.000 description 3
- 239000012466 permeate Substances 0.000 description 3
- 238000007764 slot die coating Methods 0.000 description 3
- 150000003573 thiols Chemical class 0.000 description 3
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- WCZNKVPCIFMXEQ-UHFFFAOYSA-N 2,3,5,6-tetramethylbenzene-1,4-diamine Chemical compound CC1=C(C)C(N)=C(C)C(C)=C1N WCZNKVPCIFMXEQ-UHFFFAOYSA-N 0.000 description 2
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 2
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical group NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- 101001098880 Homo sapiens Purkinje cell protein 2 homolog Proteins 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- 239000002033 PVDF binder Substances 0.000 description 2
- 102100028516 Receptor-type tyrosine-protein phosphatase U Human genes 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- QMKYBPDZANOJGF-UHFFFAOYSA-N benzene-1,3,5-tricarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=CC(C(O)=O)=C1 QMKYBPDZANOJGF-UHFFFAOYSA-N 0.000 description 2
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 2
- VHRGRCVQAFMJIZ-UHFFFAOYSA-N cadaverine Chemical compound NCCCCCN VHRGRCVQAFMJIZ-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 125000002843 carboxylic acid group Chemical group 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 238000002296 dynamic light scattering Methods 0.000 description 2
- 239000003344 environmental pollutant Substances 0.000 description 2
- 150000002118 epoxides Chemical group 0.000 description 2
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 230000004927 fusion Effects 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002736 metal compounds Chemical class 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- ZTILUDNICMILKJ-UHFFFAOYSA-N niobium(v) ethoxide Chemical compound CCO[Nb](OCC)(OCC)(OCC)OCC ZTILUDNICMILKJ-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
- 230000000269 nucleophilic effect Effects 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 239000013500 performance material Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 231100000719 pollutant Toxicity 0.000 description 2
- 229920002492 poly(sulfone) Polymers 0.000 description 2
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- XPGAWFIWCWKDDL-UHFFFAOYSA-N propan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCC[O-].CCC[O-].CCC[O-].CCC[O-] XPGAWFIWCWKDDL-UHFFFAOYSA-N 0.000 description 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 2
- 238000003847 radiation curing Methods 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- TYFQFVWCELRYAO-UHFFFAOYSA-N suberic acid Chemical compound OC(=O)CCCCCCC(O)=O TYFQFVWCELRYAO-UHFFFAOYSA-N 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- NHGXDBSUJJNIRV-UHFFFAOYSA-M tetrabutylammonium chloride Chemical compound [Cl-].CCCC[N+](CCCC)(CCCC)CCCC NHGXDBSUJJNIRV-UHFFFAOYSA-M 0.000 description 2
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium ethoxide Chemical compound [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 2
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- ONDPHDOFVYQSGI-UHFFFAOYSA-N zinc nitrate Chemical compound [Zn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ONDPHDOFVYQSGI-UHFFFAOYSA-N 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 1
- LWNGJAHMBMVCJR-UHFFFAOYSA-N (2,3,4,5,6-pentafluorophenoxy)boronic acid Chemical compound OB(O)OC1=C(F)C(F)=C(F)C(F)=C1F LWNGJAHMBMVCJR-UHFFFAOYSA-N 0.000 description 1
- SXGMVGOVILIERA-UHFFFAOYSA-N (2R,3S)-2,3-diaminobutanoic acid Natural products CC(N)C(N)C(O)=O SXGMVGOVILIERA-UHFFFAOYSA-N 0.000 description 1
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 1
- RYSXWUYLAWPLES-MTOQALJVSA-N (Z)-4-hydroxypent-3-en-2-one titanium Chemical compound [Ti].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O RYSXWUYLAWPLES-MTOQALJVSA-N 0.000 description 1
- YOBOXHGSEJBUPB-MTOQALJVSA-N (z)-4-hydroxypent-3-en-2-one;zirconium Chemical compound [Zr].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O YOBOXHGSEJBUPB-MTOQALJVSA-N 0.000 description 1
- OVSGBKZKXUMMHS-VGKOASNMSA-L (z)-4-oxopent-2-en-2-olate;propan-2-olate;titanium(4+) Chemical compound [Ti+4].CC(C)[O-].CC(C)[O-].C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O OVSGBKZKXUMMHS-VGKOASNMSA-L 0.000 description 1
- KRZCAGBYTRBWHJ-UHFFFAOYSA-N 1,1,1-trifluoropentane-2,4-dione zirconium(4+) Chemical compound [Zr+4].CC(=O)CC(=O)C(F)(F)F KRZCAGBYTRBWHJ-UHFFFAOYSA-N 0.000 description 1
- KYVBNYUBXIEUFW-UHFFFAOYSA-N 1,1,3,3-tetramethylguanidine Chemical compound CN(C)C(=N)N(C)C KYVBNYUBXIEUFW-UHFFFAOYSA-N 0.000 description 1
- ZWVMLYRJXORSEP-UHFFFAOYSA-N 1,2,6-Hexanetriol Chemical compound OCCCCC(O)CO ZWVMLYRJXORSEP-UHFFFAOYSA-N 0.000 description 1
- JRNVQLOKVMWBFR-UHFFFAOYSA-N 1,2-benzenedithiol Chemical compound SC1=CC=CC=C1S JRNVQLOKVMWBFR-UHFFFAOYSA-N 0.000 description 1
- VYMPLPIFKRHAAC-UHFFFAOYSA-N 1,2-ethanedithiol Chemical compound SCCS VYMPLPIFKRHAAC-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- JLBFLZFFGYGZGN-UHFFFAOYSA-N 1,4-diazabicyclo[2.2.2]octane;hydrochloride Chemical compound Cl.C1CN2CCN1CC2 JLBFLZFFGYGZGN-UHFFFAOYSA-N 0.000 description 1
- 229940043375 1,5-pentanediol Drugs 0.000 description 1
- PWGJDPKCLMLPJW-UHFFFAOYSA-N 1,8-diaminooctane Chemical compound NCCCCCCCCN PWGJDPKCLMLPJW-UHFFFAOYSA-N 0.000 description 1
- ZFPGARUNNKGOBB-UHFFFAOYSA-N 1-Ethyl-2-pyrrolidinone Chemical compound CCN1CCCC1=O ZFPGARUNNKGOBB-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- WFSMVVDJSNMRAR-UHFFFAOYSA-N 2-[2-(2-ethoxyethoxy)ethoxy]ethanol Chemical compound CCOCCOCCOCCO WFSMVVDJSNMRAR-UHFFFAOYSA-N 0.000 description 1
- MMEDJBFVJUFIDD-UHFFFAOYSA-N 2-[2-(carboxymethyl)phenyl]acetic acid Chemical compound OC(=O)CC1=CC=CC=C1CC(O)=O MMEDJBFVJUFIDD-UHFFFAOYSA-N 0.000 description 1
- XHHXXUFDXRYMQI-UHFFFAOYSA-N 2-[bis(2-hydroxyethyl)amino]ethanol;titanium Chemical compound [Ti].OCCN(CCO)CCO XHHXXUFDXRYMQI-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- LTHNHFOGQMKPOV-UHFFFAOYSA-N 2-ethylhexan-1-amine Chemical compound CCCCC(CC)CN LTHNHFOGQMKPOV-UHFFFAOYSA-N 0.000 description 1
- IXNCIJOVUPPCOF-UHFFFAOYSA-N 2-ethylhexan-1-ol;titanium Chemical compound [Ti].CCCCC(CC)CO.CCCCC(CC)CO.CCCCC(CC)CO.CCCCC(CC)CO IXNCIJOVUPPCOF-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- RXFCIXRFAJRBSG-UHFFFAOYSA-N 3,2,3-tetramine Chemical compound NCCCNCCNCCCN RXFCIXRFAJRBSG-UHFFFAOYSA-N 0.000 description 1
- XBIUWALDKXACEA-UHFFFAOYSA-N 3-[bis(2,4-dioxopentan-3-yl)alumanyl]pentane-2,4-dione Chemical compound CC(=O)C(C(C)=O)[Al](C(C(C)=O)C(C)=O)C(C(C)=O)C(C)=O XBIUWALDKXACEA-UHFFFAOYSA-N 0.000 description 1
- HDFKMLFDDYWABF-UHFFFAOYSA-N 3-phenyloxolane-2,5-dione Chemical compound O=C1OC(=O)CC1C1=CC=CC=C1 HDFKMLFDDYWABF-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- HIJQFTSZBHDYKW-UHFFFAOYSA-N 4,4-dimethyloxane-2,6-dione Chemical compound CC1(C)CC(=O)OC(=O)C1 HIJQFTSZBHDYKW-UHFFFAOYSA-N 0.000 description 1
- BFWYZZPDZZGSLJ-UHFFFAOYSA-N 4-(aminomethyl)aniline Chemical compound NCC1=CC=C(N)C=C1 BFWYZZPDZZGSLJ-UHFFFAOYSA-N 0.000 description 1
- POLIXZIAIMAECK-UHFFFAOYSA-N 4-[2-(2,6-dioxomorpholin-4-yl)ethyl]morpholine-2,6-dione Chemical compound C1C(=O)OC(=O)CN1CCN1CC(=O)OC(=O)C1 POLIXZIAIMAECK-UHFFFAOYSA-N 0.000 description 1
- NIAAGQAEVGMHPM-UHFFFAOYSA-N 4-methylbenzene-1,2-dithiol Chemical compound CC1=CC=C(S)C(S)=C1 NIAAGQAEVGMHPM-UHFFFAOYSA-N 0.000 description 1
- 102100033806 Alpha-protein kinase 3 Human genes 0.000 description 1
- 101710082399 Alpha-protein kinase 3 Proteins 0.000 description 1
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 1
- SAIKULLUBZKPDA-UHFFFAOYSA-N Bis(2-ethylhexyl) amine Chemical compound CCCCC(CC)CNCC(CC)CCCC SAIKULLUBZKPDA-UHFFFAOYSA-N 0.000 description 1
- HWIVDKZVOGWRSQ-UHFFFAOYSA-K C(C=CCC)(=O)[O-].[Ce+3].C(C=CCC)(=O)[O-].C(C=CCC)(=O)[O-] Chemical compound C(C=CCC)(=O)[O-].[Ce+3].C(C=CCC)(=O)[O-].C(C=CCC)(=O)[O-] HWIVDKZVOGWRSQ-UHFFFAOYSA-K 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 239000004971 Cross linker Substances 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 101001128138 Homo sapiens NACHT, LRR and PYD domains-containing protein 2 Proteins 0.000 description 1
- 101001128135 Homo sapiens NACHT, LRR and PYD domains-containing protein 4 Proteins 0.000 description 1
- 101000982939 Homo sapiens PAN2-PAN3 deadenylation complex catalytic subunit PAN2 Proteins 0.000 description 1
- 101000742934 Homo sapiens Retinol dehydrogenase 14 Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 102100031897 NACHT, LRR and PYD domains-containing protein 2 Human genes 0.000 description 1
- 102100031898 NACHT, LRR and PYD domains-containing protein 4 Human genes 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- ALQSHHUCVQOPAS-UHFFFAOYSA-N Pentane-1,5-diol Chemical compound OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000005700 Putrescine Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical group C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- GKXVJHDEWHKBFH-UHFFFAOYSA-N [2-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC=C1CN GKXVJHDEWHKBFH-UHFFFAOYSA-N 0.000 description 1
- NNJWFWSBENPGEY-UHFFFAOYSA-N [2-(sulfanylmethyl)phenyl]methanethiol Chemical compound SCC1=CC=CC=C1CS NNJWFWSBENPGEY-UHFFFAOYSA-N 0.000 description 1
- JSNABGZJVWSNOB-UHFFFAOYSA-N [3-(sulfanylmethyl)phenyl]methanethiol Chemical compound SCC1=CC=CC(CS)=C1 JSNABGZJVWSNOB-UHFFFAOYSA-N 0.000 description 1
- IYPNRTQAOXLCQW-UHFFFAOYSA-N [4-(sulfanylmethyl)phenyl]methanethiol Chemical compound SCC1=CC=C(CS)C=C1 IYPNRTQAOXLCQW-UHFFFAOYSA-N 0.000 description 1
- NJSVDVPGINTNGX-UHFFFAOYSA-N [dimethoxy(propyl)silyl]oxymethanamine Chemical compound CCC[Si](OC)(OC)OCN NJSVDVPGINTNGX-UHFFFAOYSA-N 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000001099 ammonium carbonate Substances 0.000 description 1
- 235000012501 ammonium carbonate Nutrition 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000008064 anhydrides Chemical group 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- ZWOASCVFHSYHOB-UHFFFAOYSA-N benzene-1,3-dithiol Chemical compound SC1=CC=CC(S)=C1 ZWOASCVFHSYHOB-UHFFFAOYSA-N 0.000 description 1
- WYLQRHZSKIDFEP-UHFFFAOYSA-N benzene-1,4-dithiol Chemical compound SC1=CC=C(S)C=C1 WYLQRHZSKIDFEP-UHFFFAOYSA-N 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- UUZYBYIOAZTMGC-UHFFFAOYSA-M benzyl(trimethyl)azanium;bromide Chemical compound [Br-].C[N+](C)(C)CC1=CC=CC=C1 UUZYBYIOAZTMGC-UHFFFAOYSA-M 0.000 description 1
- NDKBVBUGCNGSJJ-UHFFFAOYSA-M benzyltrimethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)CC1=CC=CC=C1 NDKBVBUGCNGSJJ-UHFFFAOYSA-M 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- CNLVKRYETIVYNZ-UHFFFAOYSA-J butyl phosphate;titanium(4+) Chemical compound [Ti+4].CCCCOP([O-])([O-])=O.CCCCOP([O-])([O-])=O CNLVKRYETIVYNZ-UHFFFAOYSA-J 0.000 description 1
- NDWWLJQHOLSEHX-UHFFFAOYSA-L calcium;octanoate Chemical compound [Ca+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O NDWWLJQHOLSEHX-UHFFFAOYSA-L 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical group 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- WBKDDMYJLXVBNI-UHFFFAOYSA-K chromium(3+);2-ethylhexanoate Chemical compound [Cr+3].CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O WBKDDMYJLXVBNI-UHFFFAOYSA-K 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- ZKXWKVVCCTZOLD-FDGPNNRMSA-N copper;(z)-4-hydroxypent-3-en-2-one Chemical compound [Cu].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O ZKXWKVVCCTZOLD-FDGPNNRMSA-N 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 150000003950 cyclic amides Chemical class 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- 150000003997 cyclic ketones Chemical class 0.000 description 1
- SSJXIUAHEKJCMH-UHFFFAOYSA-N cyclohexane-1,2-diamine Chemical compound NC1CCCCC1N SSJXIUAHEKJCMH-UHFFFAOYSA-N 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- XCIXKGXIYUWCLL-UHFFFAOYSA-N cyclopentanol Chemical compound OC1CCCC1 XCIXKGXIYUWCLL-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- 208000028659 discharge Diseases 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000000295 emission spectrum Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- UARGAUQGVANXCB-UHFFFAOYSA-N ethanol;zirconium Chemical compound [Zr].CCO.CCO.CCO.CCO UARGAUQGVANXCB-UHFFFAOYSA-N 0.000 description 1
- WIEGKKSLPGLWRN-UHFFFAOYSA-N ethyl 3-oxobutanoate;titanium Chemical compound [Ti].CCOC(=O)CC(C)=O WIEGKKSLPGLWRN-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- VANNPISTIUFMLH-UHFFFAOYSA-N glutaric anhydride Chemical compound O=C1CCCC(=O)O1 VANNPISTIUFMLH-UHFFFAOYSA-N 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 239000005431 greenhouse gas Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- CCJBRSNBMJFUGV-UHFFFAOYSA-N heptane-2,3-dione;zirconium Chemical compound [Zr].CCCCC(=O)C(C)=O CCJBRSNBMJFUGV-UHFFFAOYSA-N 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 229940051250 hexylene glycol Drugs 0.000 description 1
- 239000012510 hollow fiber Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- AQBLLJNPHDIAPN-LNTINUHCSA-K iron(3+);(z)-4-oxopent-2-en-2-olate Chemical compound [Fe+3].C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O AQBLLJNPHDIAPN-LNTINUHCSA-K 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- SGGOJYZMTYGPCH-UHFFFAOYSA-L manganese(2+);naphthalene-2-carboxylate Chemical compound [Mn+2].C1=CC=CC2=CC(C(=O)[O-])=CC=C21.C1=CC=CC2=CC(C(=O)[O-])=CC=C21 SGGOJYZMTYGPCH-UHFFFAOYSA-L 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000012229 microporous material Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- YWFWDNVOPHGWMX-UHFFFAOYSA-N n,n-dimethyldodecan-1-amine Chemical compound CCCCCCCCCCCCN(C)C YWFWDNVOPHGWMX-UHFFFAOYSA-N 0.000 description 1
- 239000003345 natural gas Substances 0.000 description 1
- BMGNSKKZFQMGDH-FDGPNNRMSA-L nickel(2+);(z)-4-oxopent-2-en-2-olate Chemical compound [Ni+2].C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O BMGNSKKZFQMGDH-FDGPNNRMSA-L 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- WCVRQHFDJLLWFE-UHFFFAOYSA-N pentane-1,2-diol Chemical compound CCCC(O)CO WCVRQHFDJLLWFE-UHFFFAOYSA-N 0.000 description 1
- VAUKWMSXUKODHR-UHFFFAOYSA-M pentyl(triphenyl)phosphanium;bromide Chemical compound [Br-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CCCCC)C1=CC=CC=C1 VAUKWMSXUKODHR-UHFFFAOYSA-M 0.000 description 1
- 238000005373 pervaporation Methods 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920005597 polymer membrane Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920002717 polyvinylpyridine Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 238000001542 size-exclusion chromatography Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical class S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 description 1
- 229910052815 sulfur oxide Inorganic materials 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- RKHXQBLJXBGEKF-UHFFFAOYSA-M tetrabutylphosphanium;bromide Chemical compound [Br-].CCCC[P+](CCCC)(CCCC)CCCC RKHXQBLJXBGEKF-UHFFFAOYSA-M 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 238000012722 thermally initiated polymerization Methods 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- KSBAEPSJVUENNK-UHFFFAOYSA-L tin(ii) 2-ethylhexanoate Chemical compound [Sn+2].CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O KSBAEPSJVUENNK-UHFFFAOYSA-L 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- 150000004072 triols Chemical class 0.000 description 1
- AVCVDUDESCZFHJ-UHFFFAOYSA-N triphenylphosphane;hydrochloride Chemical compound [Cl-].C1=CC=CC=C1[PH+](C=1C=CC=CC=1)C1=CC=CC=C1 AVCVDUDESCZFHJ-UHFFFAOYSA-N 0.000 description 1
- VXYADVIJALMOEQ-UHFFFAOYSA-K tris(lactato)aluminium Chemical compound CC(O)C(=O)O[Al](OC(=O)C(C)O)OC(=O)C(C)O VXYADVIJALMOEQ-UHFFFAOYSA-K 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
- CHJMFFKHPHCQIJ-UHFFFAOYSA-L zinc;octanoate Chemical compound [Zn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O CHJMFFKHPHCQIJ-UHFFFAOYSA-L 0.000 description 1
- NHXVNEDMKGDNPR-UHFFFAOYSA-N zinc;pentane-2,4-dione Chemical compound [Zn+2].CC(=O)[CH-]C(C)=O.CC(=O)[CH-]C(C)=O NHXVNEDMKGDNPR-UHFFFAOYSA-N 0.000 description 1
- GBNDTYKAOXLLID-UHFFFAOYSA-N zirconium(4+) ion Chemical compound [Zr+4] GBNDTYKAOXLLID-UHFFFAOYSA-N 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/22—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
- B01D53/228—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion characterised by specific membranes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0002—Organic membrane manufacture
- B01D67/0006—Organic membrane manufacture by chemical reactions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0039—Inorganic membrane manufacture
- B01D67/0053—Inorganic membrane manufacture by inducing porosity into non porous precursor membranes
- B01D67/006—Inorganic membrane manufacture by inducing porosity into non porous precursor membranes by elimination of segments of the precursor, e.g. nucleation-track membranes, lithography or laser methods
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0081—After-treatment of organic or inorganic membranes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0081—After-treatment of organic or inorganic membranes
- B01D67/0095—Drying
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/08—Hollow fibre membranes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
- B01D69/125—In situ manufacturing by polymerisation, polycondensation, cross-linking or chemical reaction
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/08—Polysaccharides
- B01D71/12—Cellulose derivatives
- B01D71/14—Esters of organic acids
- B01D71/16—Cellulose acetate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/30—Polyalkenyl halides
- B01D71/32—Polyalkenyl halides containing fluorine atoms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/58—Other polymers having nitrogen in the main chain, with or without oxygen or carbon only
- B01D71/62—Polycondensates having nitrogen-containing heterocyclic rings in the main chain
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/58—Other polymers having nitrogen in the main chain, with or without oxygen or carbon only
- B01D71/62—Polycondensates having nitrogen-containing heterocyclic rings in the main chain
- B01D71/64—Polyimides; Polyamide-imides; Polyester-imides; Polyamide acids or similar polyimide precursors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/58—Other polymers having nitrogen in the main chain, with or without oxygen or carbon only
- B01D71/62—Polycondensates having nitrogen-containing heterocyclic rings in the main chain
- B01D71/64—Polyimides; Polyamide-imides; Polyester-imides; Polyamide acids or similar polyimide precursors
- B01D71/641—Polyamide-imides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/58—Other polymers having nitrogen in the main chain, with or without oxygen or carbon only
- B01D71/62—Polycondensates having nitrogen-containing heterocyclic rings in the main chain
- B01D71/64—Polyimides; Polyamide-imides; Polyester-imides; Polyamide acids or similar polyimide precursors
- B01D71/643—Polyether-imides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/70—Polymers having silicon in the main chain, with or without sulfur, nitrogen, oxygen or carbon only
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/70—Polymers having silicon in the main chain, with or without sulfur, nitrogen, oxygen or carbon only
- B01D71/701—Polydimethylsiloxane
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/76—Macromolecular material not specifically provided for in a single one of groups B01D71/08 - B01D71/74
- B01D71/82—Macromolecular material not specifically provided for in a single one of groups B01D71/08 - B01D71/74 characterised by the presence of specified groups, e.g. introduced by chemical after-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/22—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
- B01D2053/221—Devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/22—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
- B01D2053/221—Devices
- B01D2053/223—Devices with hollow tubes
- B01D2053/224—Devices with hollow tubes with hollow fibres
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/30—Cross-linking
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/34—Use of radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/34—Use of radiation
- B01D2323/345—UV-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/40—Details relating to membrane preparation in-situ membrane formation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2325/00—Details relating to properties of membranes
- B01D2325/02—Details relating to pores or porosity of the membranes
- B01D2325/022—Asymmetric membranes
- B01D2325/023—Dense layer within the membrane
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2325/00—Details relating to properties of membranes
- B01D2325/04—Characteristic thickness
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2325/00—Details relating to properties of membranes
- B01D2325/20—Specific permeability or cut-off range
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/40—Capture or disposal of greenhouse gases of CO2
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Laminated Bodies (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Description
a)多孔質支持体;
b)一部分が支持体内に存在し、一部分が支持体の外側にある、ガター層;および
c)ガター層上の識別層;
これに関し:
(i)支持体の外側のガター層部分は、10nm〜900nmの平均厚さ(GLe)を有し;そして
(ii)支持体内に存在するガター層部分は、GLeの10%〜350%の平均厚さ(GLi)を有する。
多孔質支持体は、任意の適した材料から構築することができる。そのような材料の例としては、ポリスルホン、ポリエーテルスルホン、ポリイミド、ポリエーテルイミド、ポリアミド、ポリアミドイミド、ポリアクリロニトリル、ポリカーボネート、ポリエステル、ポリアクリレート、酢酸セルロース、ポリエチレン、ポリプロピレン、ポリフッ化ビニリデン、ポリテトラフルオロエチレン、ポリ(4−メチル1−ペンテン)および特にポリアクリロニトリルが挙げられる。
例えば湿潤性および/または付着力を改善する目的で、コロナ放電処理、グロー放電処理、火炎処理、紫外線照射処理などに付してある多孔質支持体を用いることもできる。
多孔率%=100%×(細孔により欠落している表面の面積)
(全表面積)
として表すこともできる。
したがって、好ましい態様において、多孔質支持体は、>1%、より好ましくは>3%、特に>10%、さらに特に>20%の多孔率%を有する。
上記多孔率%および透過率は、複合膜を作製するために用いられる多孔質支持体(すなわち、ガター層および他の層を施用する前)に関連する。
多孔質支持体として、限外濾過膜、例えば、ポリスルホン限外濾過膜、セルロース系限外濾過膜、ポリテトラフルオロエチレン限外濾過膜、ポリフッ化ビニリデン限外濾過膜、および特にポリアクリロニトリル限外濾過膜を用いることができる。
支持体内に存在するガター層部分は、好ましくはGLeの10%〜200%、より好ましくはGLeの20%〜90%の平均厚さを有する。
ガター層が終了したと考えられる位置は、ToF−SIMSデプスプロファイリングにより、ガター層を特徴付ける元素の強度が、ガター層中のその元素に関する最大値の20%まで低下したことが示される位置である。例えば、ガター層がケイ素に富み、多孔質層が実質的にケイ素を含まない場合、ガター層が終了したと考えられる位置は、ToF−SIMSデプスプロファイリングにより、ケイ素含有率が、ガター層中に見いだされる最大ケイ素含有率の20%まで低下したことが示される位置である。ToF−SIMSデプスプロファイリングでは、スパッタリング段階中には複合膜の表面から材料を除去するためにDCモードでイオン銃を操作し、捕捉段階ではパルスモードで同じイオン銃または第2のイオン銃を操作する。ToF−SIMSによるデプスプロファイリングによって、対象となるすべての種を、高い質量分解能で同時にモニタリングすることが可能になり、多孔質支持体中のガター層が終わる境界線が、その位置における化学組成の変化により明らかに示される。同様に、ToF−SIMSデプスプロファイリングでは、識別層とガター層の接合部が、それらの化学組成が非常に異なるため(例えば、識別層はフッ素化合物に富むことができ、ガター層は実質的にフッ素化合物を含まないことができる)、明らかに示される。ケイ素含有化合物に富むガター層の場合、ガター層がその前駆体成分の異なる浸透率に起因して不均一な化学組成を有していても、ケイ素含有率の変化が、ガター層の始まりと終わりに関する非常に良好な指標である。
GLiの値を小さくするために、放射線硬化性組成物を多孔質支持体に施用する前に、多孔質支持体の細孔を不活性液体で部分的に満たしてもよい。この不活性液体は放射線硬化性ではなく、ガター層を形成する放射性硬化性液体が多孔質支持体の奥深くに浸透するのを妨げ、これにより望ましい割合のガター層が多孔質支持体内にあることを確実にする。不活性液体は、ガター層を形成するために用いられる放射線硬化性組成物と混和しないことが好ましい。この技術は、より薄い膜を形成することができ、より多くの施用技術をより低粘度の放射線硬化性組成物に使用することができるという点で、上記第1の技術に勝る利点を有する。
(i)熱硬化性および放射線硬化性の両方であり、1以上のジアルコキシシラン基を含む成分;
(ii)加熱されると成分(i)と共重合することができる架橋剤;および
(iii)不活性溶媒;および所望により
(iv)触媒;
を含む組成物を熱硬化することにより得ることが好ましい。
成分(i)は、1分子あたり少なくとも3つの放射線硬化性基を含むことが好ましい。
成分(i)は、フェニルシロキサン基(例えば、式−(Si(Ph)2−O)−基[式中、Phはフェニルまたはフェニレン基である]のもの)を含まないことが好ましい。
成分(i)はまた、1以上の熱硬化性基を含む。成分(i)が熱硬化してPCPポリマーをもたらすことができるように、これは必須である。
不活性溶媒(iii)の機能は、PCPポリマーを作製するために用いられる組成物に、熱架橋反応の効率的な進行および/または該組成物の粘度の制御に適した濃度をもたらすことである。典型的には、成分(iii)として用いられる不活性溶媒は、1以上の有機溶媒、特に水不混和性有機溶媒(1以上)を含む。不活性溶媒は、硬化性ではないので“不活性”とする。
(1)0.5〜50重量%のPCPポリマー;
(2)0〜5重量%の光開始剤;および
(3)50〜99.5重量%の不活性溶媒。
好ましいカチオン光開始剤としては、非求核性アニオン、例えば、ヘキサフルオロアルシネートアニオン、六フッ化アンチモン(V)アニオン、六フッ化リンアニオンおよびテトラフルオロボレートの有機塩が挙げられる。市販のカチオン光開始剤としては、UV−9380c、UV−9390c(Momentive performance materialsにより製造されている)、UVI−6974、UVI−6970、UVI−6990(Union Carbide Corp.により製造されている)、CD−1010、CD−1011、CD−1012(Sartomer Corp.により製造されている)、AdekaoptomerTM SP−150、SP−151、SP−170、SP−171(Asahi Denka Kogyo Co.,Ltd.により製造されている)、IrgacureTM 250、IrgacureTM 261(Ciba Specialty Chemicals Corp.)、CI−2481、CI−2624、CI−2639、CI−2064(Nippon Soda Co.,Ltd.)、DTS−102、DTS−103、NAT−103、NDS−103、TPS−103、MDS−103、MPI−103およびBBI−103(Midori Chemical Co.,Ltd.)が挙げられる。上記カチオン光開始剤は、個別または2種以上の組合わせのいずれかで用いることができる。
ラジカルタイプIの光開始剤の例は、国際公開WO2007/018425号、14頁23行〜15頁26行に記載されているとおりであり、これを本明細書中で参考として援用する。
場合によっては、ガター層を形成するために用いられる硬化性組成物中の個々の成分が、異なる速度で多孔質支持体中に浸透してもよい。したがって、ガター層の化学組成が不均一である、例えば、これら浸透速度の差に起因して、支持体内に存在するガター層部分が、支持体の外側にあるガター層部分と異なる化学組成を有することが可能である。したがって、本発明は、その範囲内に、先に定義したような複合膜であって、ガター層が均一または不均一であるものを包含することが、理解されるであろう。
適したコーティング技術を用い、少なくとも5m/分、例えば、少なくとも10m/分またはさらに高速、例えば、15m/分、20m/分、またはさらに最高100m/分のコーティング速度を達成することができる。好ましい態様では、放射線硬化性組成物を、上記コーティング速度の1つで支持体に施用する。
通常、ガター層は、識別層のための平滑な連続表面を提供する機能を有する。ガター層には細孔がないことが好ましいが、識別層はガター層中の微小欠陥をしばしば満たすことができるので、通常、多少の細孔の存在により最終膜の透過性が低減することはない。
ガター層は実質的に非孔質である、すなわち、層中に存在するあらゆる細孔が<1nmの平均径を有することが好ましい。これは、著しく大きい可能性がある欠陥の存在を排除するものではない。上記のように、欠陥は識別層により補正される可能性がある。
例えば、組成物を硬化するために電子ビーム、紫外線、可視線および/または赤外線を用いることができ、組成物に適合するように適した放射線を選択する。紫外線硬化の場合、水銀アーク灯がとりわけ有効であるが、発光ダイオードを用いることもできる。
放射線硬化性組成物は、紫外線または電子ビームで照射することが好ましい。
乾燥厚さは、複合膜を切断し、ガター層上の識別層の厚さを走査型電子顕微鏡を用いて測定することにより、決定することができる。
識別層のガター層上への付着性を改善するために、後者をコロナ放電またはプラズマ処理により処理してから、該層上に識別層を形成することができる。コロナまたはプラズマ処理では、一般に、0.5〜100kJ/m2のエネルギー線量が好ましい。
所望による保護層は、任意の適した技術、例えば、ガター層の調製に関して上記したコーティング法のいずれかを含むプロセスにより、識別層上に形成することができる。
保護層は、所望により、例えば膜表面をより親水性にすることにより、複合膜の機能に影響を及ぼす表面特性を有する。
複合膜の全体的乾燥厚さは、典型的には20〜500μm、好ましくは30〜300μmになる。
例えば、極性ガスおよび非極性ガスを含む供給ガスを、極性ガスに富むガス流と極性ガスが減少したガス流に分離することができる。多くの場合、膜は、非極性ガス、例えば、アルカン、H2およびN2と比較して、極性ガス、例えば、CO2、H2S、NH3、SOxおよび窒素酸化物、特にNOxに対し、高い透過性を示す。
該モジュールは任意の好都合な形をとることができ、例えば、スパイラル型、中空型、プリーツ型、チューブラー型、プレートアンドフレーム型などのモジュールが好ましい。
PAN1は、ドイツのGMT Membrantechnik GmbHからのポリアクリロニトリルL10限外濾過膜である(多孔質支持体)。
PAN2は、DuPontからのポリアクリロニトリルタイプA−7多孔質支持体である。
X−22−162Cは、Shin−Etsu Chemical Co.,Ltd.からの架橋剤(カルボン酸反応性基、220mm2/sの粘度および2300g/molの反応性基当量を有する両末端反応性シリコーン)である(MWT 4600)。
UV9300は、Momentive Performance Materials HoldingsからのSilForceTM UV9300である。これは、反応性エポキシ基および線状ポリジメチルシロキサン鎖を含む熱硬化性コポリマーである。さらに、このコポリマーは、光開始剤の存在下で紫外線を照射すると迅速に硬化する。
I0591は、Tokyo Chemical Industries N.V.(ベルギー)からの4−イソプロピル−4’−メチルジフェニルヨードニウムテトラキス(ペンタフルオロフェニル)ボレート(C40H18BF20I):
n−ヘプタンは、Brenntag Nederland BVからのn−ヘプタンである。
MEKは、Brenntag Nederland BVからの2−ブタノンである。
MIBKは、Brenntag Nederland BVからのメチルイソブチルケトンである。
APTMSは、Sigma Aldrichからの3−トリメトキシシリルプロパン−1−アミンである。
THFは、Brenntag Nederland BVからのテトラヒドロフランである。
PI1は、6FDA−TeMPD x/DABA y、x/y=20/80である;Fujifilm Corporationから得られ、以下の構造を有する:
CAは、Eastman Chemicalsからの酢酸セルロースCA−398−3である。
ガス流束および選択率の評価
以下の実施例において、複合膜のガス流束および選択率を以下のように決定した:
(A) ガス流束
得られた複合膜を通過するCH4およびCO2の流束を、40℃および6000kPaのガス供給圧力で、測定直径3.0cmのガス透過セルならびに13v/v%のCO2および87v/v%のCH4の供給ガス組成物を用いて測定した。
Qi=各ガスの流束(m3(STP)/m2・kPa.s)
θperm=透過物の流れ(m3(STP)/s)
Χperm,i=透過物中の各ガスの体積分率
Α=膜の面積(m2)
ΡFeed=供給ガスの圧力(kPa)
ΧFeed,i=供給物中の各ガスの体積分率
ΡPerm=透過ガスの圧力(kPa)
STPは標準温圧であり、ここでは25.0℃および1気圧(101.325kPa)と定義する。
(B) 選択率
膜の選択率(CO2/CH4)を、上記で算出したQ CO2およびQ CH4から、以下の式に基づき算出した:
αCO2/CH4 = Q CO2/Q CH4
ToF−SIMSデプスプロファイリングによる層厚の測定
ガター層の厚さGleおよびGliを、Ulvac−PHI TRIFT V nano TOF表面分析機を用いてToF−SIMSデプスプロファイリングにより測定した。以下の条件を用いた:
−Ulvac−PHI TRIFT V nano TOF、
−Bi3 ++一次イオン(30kV、ADC 4nA)、
−デプスプロファイル分析のためのAr−GCIB、AAr2500 +、15kV、1nA。
放射線硬化性ポリマーPCP1およびPCP2の調製
成分UV9300、X−22−162CおよびDBUを表1に示す量でn−ヘプタンに溶解し、95℃の温度で168時間維持して、部分的に硬化されたポリマーPCP1を得た。PCP1は12.2のSi含量(meq/ポリマー1g)を有し、得られたPCP1のn−ヘプタン溶液は25.0℃において22.8mPasの粘度を有していた。PCP2は、100% UV9300であった。
硬化性組成物G1を作製するために、上記の前段階で生じたPCP1溶液を20℃に冷却し、以下の表2に示すPCP1濃度が得られるようにn−ヘプタンを用いて希釈した。その後、該溶液を、2.7μmの孔径を有する濾紙に通して濾過した。その後、光開始剤I0591および金属錯体(Ti(OiPr)4)を表2に示す量で濾液に加えて、硬化性組成物G1を得た。G1中に存在するTi(OiPr)4の量は、1グラムのPCP1あたり105.6μmolのTi(OiPr)4に相当していた。同様に、G1中の金属:ケイ素のモル比は0.0087であった。
段階a) ガター層の形成
硬化性組成物G1〜G3を、それぞれ独立して、以下の表4に示す多孔質支持体にさまざまな厚さまでスピンコーティングにより施用し、D−電球を取り付けたFusion UV SystemsからのLight Hammer LH10を24kW/mの強度で用いて硬化し、乾燥した。GLtの値(すなわち、ガター層の全体的厚さ=GLi+GLe)を、多孔質支持体に施用する硬化性組成物の単位面積あたりの量を制御することにより実現した。言い換えれば、ガター層の厚さは、単位面積あたりでより多くの関連硬化性組成物を多孔質支持体に施用するほど増大した。GLiとGLeの値の相対的値を、硬化前に多孔質支持体中に硬化性組成物が浸透するのを可能にする時間の量を変動させることにより制御した。例えば、硬化性組成物の多孔質支持体への施用と硬化の時間差が増大するほどGLiの値は増大した(そして、GLeの値は低減した)。これは、余分な時間により、より多くの硬化性組成物が多孔質支持体中に浸透することが可能になったためである。
段階b) 識別層の形成
用いる組成物D1およびD2を、表3に示す構成成分を混合することにより調製した:
段階c) 保護層の形成
以下の表4の最終列に示した放射線硬化性組成物をスピンコーティングにより識別層に施用した後、D−電球を取り付けたFusion UV SystemsからのLight Hammer LH10を24kW/mの強度で用いて該層上で硬化し、乾燥した。このようにして、さまざまな保護層厚さを有する本発明に従った一連の膜を調製した。
上記表4に記載した複合膜の選択率(CO2/CH4)および流束を、上記技術(A)および(B)により測定した。結果を以下の表5に示す。
VG(非常に良い) :30を超える
G(良い) :25〜30
A(平均) :22〜24
P(劣る) :20未満
表5では、以下の略語を用いて流束の性能を記載している:
VG(非常に良い) :50GPU(ガス透過単位)を超える
G(良い) :40〜50
A(平均) :30〜40
P(劣る) :30未満
本発明は以下の態様を含む。
[1] 以下を含む複合膜:
a)多孔質支持体;
b)一部分が支持体内に存在し、一部分が支持体の外側にある、ガター層;および
c)ガター層上の識別層;
これに関し:
(i)支持体の外側のガター層部分は、10nm〜900nmの平均厚さ(GLe)を有し;そして
(ii)支持体内に存在するガター層部分は、GLeの10%〜350%の平均厚さ(GLi)を有する。
[2] GLeが400〜900nmの値を有する、[1]に記載の複合膜。
[3] GLiがGLeの20%〜90%の値を有する、[1]〜[2]のいずれか一項に記載の複合膜。
[4] ガター層がジアルコキシシラン基を含む、[1]〜[3]のいずれか一項に記載の複合膜。
[5] 識別層が、ポリイミド、酢酸セルロース、ポリエチレンオキシドまたはポリエーテルイミドを含む、[1]〜[4]のいずれか一項に記載の複合膜。
[6] 識別層が、トリフルオロメチル基を含むポリイミドを含む、[1]〜[5]のいずれか一項に記載の複合膜。
[7] 識別層が、式(1)の基を含むポリイミドを含む、[1]〜[6]のいずれか一項に記載の複合膜:
[9] [1]〜[8]のいずれか一項に記載の膜の、CO2ガスおよびCH4ガスの分離のための使用。
[10] [1]〜[9]のいずれか一項に記載の膜の、バイオガスからメタンを精製するための使用。
[11] [1]〜[7]のいずれか一項に記載の複合膜を含むガス分離モジュール。
2 ガター層
2a 支持体の外側にあるガター層部分
2b 支持体内のガター層部分
3 識別層
Claims (7)
- a)多孔質支持体;
b)一部分が支持体内に存在し、一部分が支持体の外側にある、ジアルコキシシラン基を含むガター層;および
c)ガター層上の識別層;
を含む複合膜であって、
(i)支持体の外側のガター層部分は、400nm〜900nmの平均厚さ(GLe)を有し;
(ii)支持体内に存在するガター層部分は、GLeの20%〜90%の平均厚さ(GLi)を有し、
(iii)識別層が、ポリイミド、酢酸セルロース、ポリエチレンオキシドまたはポリエーテルイミドを含む、複合膜。 - 識別層が、トリフルオロメチル基を含むポリイミドを含む、請求項1に記載の複合膜。
- 請求項1〜3のいずれか一項に記載の膜の、ガスの分離のための使用。
- 請求項1〜3のいずれか一項に記載の膜の、CO2ガスおよびCH4ガスの分離のための使用。
- 請求項1〜3のいずれか一項に記載の膜の、バイオガスからメタンを精製するための使用。
- 請求項1〜3のいずれか一項に記載の複合膜を含むガス分離モジュール。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1211309.8 | 2012-06-26 | ||
GBGB1211309.8A GB201211309D0 (en) | 2012-06-26 | 2012-06-26 | Process for preparing membranes |
PCT/GB2013/051687 WO2014001798A1 (en) | 2012-06-26 | 2013-06-26 | Gas separation membrane with intermixed layers |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015522411A JP2015522411A (ja) | 2015-08-06 |
JP6170145B2 true JP6170145B2 (ja) | 2017-07-26 |
Family
ID=46704224
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015519338A Expired - Fee Related JP6170144B2 (ja) | 2012-06-26 | 2013-06-26 | 相互混合層を有するガス分離膜 |
JP2015519339A Expired - Fee Related JP6170145B2 (ja) | 2012-06-26 | 2013-06-26 | 相互混合層を有するガス分離膜 |
JP2015519337A Expired - Fee Related JP6235006B2 (ja) | 2012-06-26 | 2013-06-26 | 架橋ジアルキルシロキサンを中間層に有するガス分離膜およびその調製法 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015519338A Expired - Fee Related JP6170144B2 (ja) | 2012-06-26 | 2013-06-26 | 相互混合層を有するガス分離膜 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015519337A Expired - Fee Related JP6235006B2 (ja) | 2012-06-26 | 2013-06-26 | 架橋ジアルキルシロキサンを中間層に有するガス分離膜およびその調製法 |
Country Status (6)
Country | Link |
---|---|
US (6) | US9694325B2 (ja) |
JP (3) | JP6170144B2 (ja) |
CN (3) | CN104428052B (ja) |
GB (1) | GB201211309D0 (ja) |
MY (2) | MY171318A (ja) |
WO (5) | WO2014001796A1 (ja) |
Families Citing this family (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
PE20110063A1 (es) | 2008-06-20 | 2011-02-16 | Genentech Inc | DERIVADOS DE [1, 2, 4]TRIAZOLO[1, 5-a]PIRIDINA COMO INHIBIDORES DE JAK |
GB201211309D0 (en) * | 2012-06-26 | 2012-08-08 | Fujifilm Mfg Europe Bv | Process for preparing membranes |
WO2014130844A1 (en) | 2013-02-21 | 2014-08-28 | The Regents Of The University Of California | Universal scalable and cost-effective surface modifications |
JP6232061B2 (ja) * | 2013-06-12 | 2017-11-15 | 東洋ゴム工業株式会社 | 酸性ガス含有ガス処理用分離膜、及び酸性ガス含有ガス処理用分離膜の製造方法 |
GB201317525D0 (en) * | 2013-10-03 | 2013-11-20 | Fujifilm Mfg Europe Bv | Membranes |
GB201317521D0 (en) | 2013-10-03 | 2013-11-20 | Fujifilm Mfg Europe Bv | Membranes |
GB201317516D0 (en) | 2013-10-03 | 2013-11-20 | Fujifilm Mfg Europe Bv | Gas separation moduals |
WO2015070288A1 (en) * | 2013-11-14 | 2015-05-21 | Co2Crc Limited | Composite gas separation membrane |
JP6180965B2 (ja) * | 2014-02-28 | 2017-08-16 | 富士フイルム株式会社 | ガス分離膜およびガス分離膜モジュール |
US9458022B2 (en) * | 2014-03-28 | 2016-10-04 | L'Air Liquide Société Anonyme Pour L'Étude Et L'Exploitation Des Procedes Georges Claude | Process and apparatus for separating NO2 from a CO2 and NO2—containing fluid |
CN105233713B (zh) * | 2014-07-03 | 2019-07-12 | 中国科学院过程工程研究所 | 一种渗透汽化透醇复合膜的制备方法 |
CN104086750B (zh) * | 2014-07-28 | 2017-05-03 | 武汉工程大学 | 一种固化剂1,2‑双(2,6‑二氧‑4‑吗啉基)乙烷在环氧树脂体系的应用 |
JP6670764B2 (ja) * | 2015-01-30 | 2020-03-25 | 日本碍子株式会社 | 分離膜構造体 |
US9480954B2 (en) * | 2015-03-18 | 2016-11-01 | Uop Llc | High selectivity epoxysilicone-cross-linked polyimide membranes for gas separations |
RU2722449C2 (ru) | 2015-08-11 | 2020-06-01 | Кохерент Байофарма | Полилигандные лекарственные конъюгаты и их применения |
WO2017038285A1 (ja) | 2015-08-31 | 2017-03-09 | 富士フイルム株式会社 | ガス分離複合膜の製造方法、液組成物、ガス分離複合膜、ガス分離モジュール、ガス分離装置及びガス分離方法 |
WO2017098802A1 (ja) * | 2015-12-10 | 2017-06-15 | 富士フイルム株式会社 | 保護層付きガス分離膜、保護層付きガス分離膜の製造方法、ガス分離膜モジュール及びガス分離装置 |
GB201604949D0 (en) * | 2016-03-23 | 2016-05-04 | Fujifilm Mfg Europ B V And Fujifilm Corp | Composite membranes |
CN108883378B (zh) * | 2016-04-04 | 2021-08-24 | 住友化学株式会社 | 酸性气体分离膜及使用了它的酸性气体分离方法、及酸性气体分离模块及酸性气体分离装置 |
JP2019093309A (ja) * | 2016-04-05 | 2019-06-20 | 富士フイルム株式会社 | ガス分離膜、ガス分離モジュール、ガス分離装置及びガス分離方法 |
WO2018091865A1 (en) * | 2016-11-15 | 2018-05-24 | Fujifilm Manufacturing Europe Bv | Composite membranes |
CN110248924A (zh) | 2016-12-01 | 2019-09-17 | 加州大学评议会 | 能量提供装置及其应用 |
US10364397B2 (en) | 2017-04-18 | 2019-07-30 | King Fahd University Of Petroleum And Minerals | Mercury removal from liquid hydrocarbons by 1,4-benzenediamine alkyldiamine cross-linked polymers |
US10328386B2 (en) * | 2017-05-18 | 2019-06-25 | Uop Llc | Co-cast thin film composite flat sheet membranes for gas separations and olefin/paraffin separations |
GB201710912D0 (en) * | 2017-07-06 | 2017-08-23 | Imp Innovations Ltd | Separation membranes |
KR102200028B1 (ko) * | 2017-11-07 | 2021-01-08 | 주식회사 엘지화학 | 기체 분리막의 제조방법 및 이에 의하여 제조된 기체 분리막 |
TW201924773A (zh) * | 2017-11-09 | 2019-07-01 | 美國加利福尼亞大學董事會 | 不對稱複合膜及其用途 |
EP3717531A4 (en) | 2017-12-01 | 2021-08-25 | The Regents of the University of California | BIOLOGICAL SOIL RESISTANT COATINGS AND THEIR MANUFACTURING AND USE PROCESSES |
CN110605033B (zh) * | 2018-06-14 | 2022-03-15 | 中国石油化工股份有限公司 | 一种耐温中空纤维超滤膜的制备方法、该耐温中空纤维超滤膜及其组件 |
EP3581675A1 (en) * | 2018-06-15 | 2019-12-18 | Corporation de L'Ecole Polytechnique de Montreal | Optical article having directional micro- or nanostructured thin film coating, and its process |
KR102457839B1 (ko) * | 2018-08-09 | 2022-10-21 | 주식회사 엘지화학 | 분리막의 제조방법 및 이에 의하여 제조된 분리막 |
CN109502896A (zh) * | 2018-11-30 | 2019-03-22 | 湖南国盛石墨科技有限公司 | 一种石墨烯净水器 |
KR102168152B1 (ko) * | 2019-01-03 | 2020-10-20 | 경상대학교산학협력단 | 복합막, 이의 제조방법 및 이를 포함하는 이산화탄소 분리막 |
EP3980088A4 (en) | 2019-06-05 | 2023-06-14 | The Regents of the University of California | BIOFOILING RESISTANT COATINGS AND METHODS OF MAKING AND USING THEREOF |
CN110548426B (zh) * | 2019-08-28 | 2022-04-01 | 陈泉学 | 一种超滤膜的涂层工艺 |
CN110548425A (zh) * | 2019-08-28 | 2019-12-10 | 陈泉学 | 一种高效油水分离超滤膜的制备方法 |
Family Cites Families (156)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3822202A (en) | 1972-07-20 | 1974-07-02 | Du Pont | Heat treatment of membranes of selected polyimides,polyesters and polyamides |
US3892665A (en) * | 1973-10-15 | 1975-07-01 | Standard Oil Co | Membrane method and product |
US4230463A (en) | 1977-09-13 | 1980-10-28 | Monsanto Company | Multicomponent membranes for gas separations |
SU956003A1 (ru) * | 1977-01-20 | 1982-09-07 | Институт нефтехимического синтеза им.А.В.Топчиева | Мембранный катализатор дл гидрировани органических соединений |
JPS6244961B2 (ja) * | 1979-08-21 | 1987-09-24 | Nikorai Sutepanobitsuchi Ridorenko | |
US4393113A (en) | 1980-06-05 | 1983-07-12 | Teitin Limited | Novel silicon-containing copolymer, ultrathin solid membrane composed of said copolymer, use of said solid membrane for concentrating a specified gas in a gaseous mixture, and process for producing said solid membrane |
JPS58223411A (ja) * | 1982-06-21 | 1983-12-26 | Matsushita Electric Ind Co Ltd | 選択性気体透過複合膜 |
JPS5966308A (ja) * | 1982-10-04 | 1984-04-14 | Matsushita Electric Ind Co Ltd | 気体透過複合膜 |
US4484935A (en) | 1983-06-30 | 1984-11-27 | Monsanto Company | Permeation modified membrane |
GB2144344B (en) * | 1983-08-02 | 1986-11-26 | Shell Int Research | Composite dense membrane |
GB8320797D0 (en) | 1983-08-02 | 1983-09-01 | Shell Int Research | Very thin dense membrane |
JPS60161703A (ja) * | 1984-01-30 | 1985-08-23 | Teijin Ltd | 気体選択透過膜複合体 |
EP0155173B1 (en) * | 1984-03-12 | 1989-10-18 | Tokuyama Soda Kabushiki Kaisha | Process for preparation of fluorine-containing polymer films |
US4527999A (en) * | 1984-03-23 | 1985-07-09 | Abcor, Inc. | Separation membrane and method of preparing and using same |
US4969998A (en) * | 1984-04-23 | 1990-11-13 | W. L. Gore & Associates, Inc. | Composite semipermeable membrane |
JPS60257808A (ja) * | 1984-06-04 | 1985-12-19 | Nippon Denso Co Ltd | 中空糸複合膜の製造方法 |
US4806189A (en) * | 1984-08-13 | 1989-02-21 | Monsanto Company | Composite fluid separation membranes |
JPS61114714A (ja) * | 1984-11-09 | 1986-06-02 | ザ リサーチ フアウンデーシヨン オブ ステイト ユニバーシイテイ オブ ニユーヨーク | ガス分離用複合膜の製造方法 |
US4602922A (en) * | 1984-11-09 | 1986-07-29 | Research Foundation Of State University Of New York | Method of making membranes for gas separation and the composite membranes |
JPH0647058B2 (ja) * | 1985-03-13 | 1994-06-22 | 旭化成工業株式会社 | 気体選択透過膜 |
DE3634016A1 (de) * | 1986-04-17 | 1987-10-29 | Lohmann Gmbh & Co Kg | Flaechenfoermiges therapeutisches system, verfahren zu seiner herstellung und seine verwendung |
US4781733A (en) | 1986-07-23 | 1988-11-01 | Bend Research, Inc. | Semipermeable thin-film membranes comprising siloxane, alkoxysilyl and aryloxysilyl oligomers and copolymers |
US4717394A (en) | 1986-10-27 | 1988-01-05 | E. I. Du Pont De Nemours And Company | Polyimide gas separation membranes |
US4701187A (en) * | 1986-11-03 | 1987-10-20 | Air Products And Chemicals, Inc. | Process for separating components of a gas stream |
JPS63214319A (ja) * | 1987-02-27 | 1988-09-07 | Sanyo Chem Ind Ltd | 分離用複合膜 |
US4828700A (en) * | 1987-07-20 | 1989-05-09 | The Dow Chemical Company | Rejection enhancing coatings for reverse osmosis membranes |
JPS6430620A (en) * | 1987-07-28 | 1989-02-01 | Asahi Glass Co Ltd | Production of gas separating composite membrane |
US5102552A (en) * | 1987-12-16 | 1992-04-07 | Hoechst Celanese Corporation | Membranes from UV-curable resins |
EP0322866B1 (en) * | 1987-12-28 | 1993-04-28 | Idemitsu Kosan Company Limited | Selective gas permeation membranes and method of manufacturing them |
US5498278A (en) * | 1990-08-10 | 1996-03-12 | Bend Research, Inc. | Composite hydrogen separation element and module |
US5085676A (en) | 1990-12-04 | 1992-02-04 | E. I. Du Pont De Nemours And Company | Novel multicomponent fluid separation membranes |
US5167825A (en) * | 1991-09-30 | 1992-12-01 | Her Majesty The Queen As Represented By Minister Of The Environment C/O Environment Canada | Supported pervaporation membrane and module containing arrays of membranes |
US5294342A (en) * | 1992-10-01 | 1994-03-15 | Hoechst Celanese Corporation | Composite porous membranes |
US5266391A (en) * | 1992-12-18 | 1993-11-30 | Hoechst Celanese Corporation | Composite porous membranes |
US5286280A (en) * | 1992-12-31 | 1994-02-15 | Hoechst Celanese Corporation | Composite gas separation membrane having a gutter layer comprising a crosslinked polar phenyl-containing - organopolysiloxane, and method for making the same - |
NL9401260A (nl) * | 1993-11-12 | 1995-06-01 | Cornelis Johannes Maria Van Ri | Membraan voor microfiltratie, ultrafiltratie, gasscheiding en katalyse, werkwijze ter vervaardiging van een dergelijk membraan, mal ter vervaardiging van een dergelijk membraan, alsmede diverse scheidingssystemen omvattende een dergelijk membraan. |
US5443728A (en) * | 1994-04-28 | 1995-08-22 | Praxair Technology, Inc. | Method of preparing membranes from blends of polyetherimide and polyimide polymers |
JP3003500B2 (ja) * | 1994-04-28 | 2000-01-31 | ダイキン工業株式会社 | ポリテトラフルオロエチレン複合多孔膜 |
US5658669A (en) * | 1994-05-09 | 1997-08-19 | Hoechst Aktiengesellschaft | Composite membranes and processes for their production |
US5647894A (en) | 1994-06-08 | 1997-07-15 | Nitto Denko Corporation | Gas separating composite membrane and process for producing the same |
JPH0852332A (ja) * | 1994-06-08 | 1996-02-27 | Nitto Denko Corp | 気体用複合分離膜及びその製造方法 |
DE4421871C2 (de) * | 1994-06-23 | 1997-06-19 | Seitz Filter Werke | Mehrschichtige Mikrofiltrationsmembran mit integrierter Vorfilterschicht und Verfahren zu ihrer Herstellung |
US5666642A (en) * | 1995-04-21 | 1997-09-09 | Coremetals Research, Inc. | Extraction of cesium and strontium ions from nuclear waste |
US5650453A (en) * | 1995-04-28 | 1997-07-22 | General Electric Company | UV curable epoxysilicone blend compositions |
CN1140769A (zh) * | 1995-06-30 | 1997-01-22 | 普拉塞尔技术有限公司 | 纺制空心纤维膜的方法和装置 |
US5661092A (en) * | 1995-09-01 | 1997-08-26 | The University Of Connecticut | Ultra thin silicon oxide and metal oxide films and a method for the preparation thereof |
US6018060A (en) * | 1997-07-10 | 2000-01-25 | Membrane Technology And Research, Inc. | Membrane process and apparatus for argon purging from oxidation reactors |
US6756019B1 (en) * | 1998-02-24 | 2004-06-29 | Caliper Technologies Corp. | Microfluidic devices and systems incorporating cover layers |
JP4313874B2 (ja) * | 1999-02-02 | 2009-08-12 | キヤノン株式会社 | 基板の製造方法 |
GB9905561D0 (en) * | 1999-03-11 | 1999-05-05 | Exxon Chemical Patents Inc | Molecular sieve layers and process for their manufacture |
US6623639B2 (en) * | 1999-03-19 | 2003-09-23 | Bend Research, Inc. | Solvent-resistant microporous polybenzimidazole membranes |
US6921763B2 (en) * | 1999-09-17 | 2005-07-26 | Abbott Laboratories | Pyrazolopyrimidines as therapeutic agents |
CA2385747A1 (en) * | 1999-09-17 | 2001-03-22 | Gavin C. Hirst | Pyrazolopyrimidines as therapeutic agents |
JP4815668B2 (ja) * | 2000-05-15 | 2011-11-16 | トヨタ自動車株式会社 | 水素生成装置 |
US6994789B2 (en) * | 2000-08-07 | 2006-02-07 | Cuno Incorporated | Pre-metered, unsupported multilayer microporous membrane |
US6736971B2 (en) * | 2000-08-07 | 2004-05-18 | Cuno Incorporated | Pre-metered, unsupported multilayer microporous membrane |
US6432376B1 (en) * | 2000-09-05 | 2002-08-13 | Council Of Scientific & Industrial Research | Membrane process for the production of hydrogen peroxide by non-hazardous direct oxidation of hydrogen by oxygen using a novel hydrophobic composite Pd-membrane catalyst |
US20040035846A1 (en) * | 2000-09-13 | 2004-02-26 | Yasuji Hiramatsu | Ceramic heater for semiconductor manufacturing and inspecting equipment |
US20020056371A1 (en) * | 2000-09-27 | 2002-05-16 | Hawkeye Enterprises, Llc | Membrane system and method for separation of gases |
US6500233B1 (en) * | 2000-10-26 | 2002-12-31 | Chevron U.S.A. Inc. | Purification of p-xylene using composite mixed matrix membranes |
NL1016779C2 (nl) * | 2000-12-02 | 2002-06-04 | Cornelis Johannes Maria V Rijn | Matrijs, werkwijze voor het vervaardigen van precisieproducten met behulp van een matrijs, alsmede precisieproducten, in het bijzonder microzeven en membraanfilters, vervaardigd met een dergelijke matrijs. |
CA2406207A1 (en) * | 2001-02-16 | 2002-10-15 | Sumitomo Electric Industries, Ltd. | Hydrogen-permeable structure and method for manufacture thereof or repair thereof |
US6719147B2 (en) * | 2001-04-27 | 2004-04-13 | The University Of Delaware | Supported mesoporous carbon ultrafiltration membrane and process for making the same |
US6688477B2 (en) | 2001-05-03 | 2004-02-10 | Air Products And Chemicals, Inc. | Composite membranes |
JP4823442B2 (ja) * | 2001-07-02 | 2011-11-24 | 株式会社ノリタケカンパニーリミテド | ガス分離材及びその製造方法並びにリアクター |
EP1437172B1 (en) * | 2001-09-17 | 2009-02-11 | Ngk Insulators, Ltd. | Method for preparing ddr type zeolite film, ddr type zeolite film, and composite ddr type zeolite film, and method for preparation thereof |
EP1459601B1 (en) * | 2001-12-21 | 2009-04-08 | iFire IP Corporation | Low firing temperature thick film dielectric layer for electroluminescent display |
WO2003084651A1 (en) | 2002-04-03 | 2003-10-16 | Uop Llc | Epoxysilicone coated membranes |
US20070227907A1 (en) * | 2006-04-04 | 2007-10-04 | Rajiv Shah | Methods and materials for controlling the electrochemistry of analyte sensors |
US7813780B2 (en) * | 2005-12-13 | 2010-10-12 | Medtronic Minimed, Inc. | Biosensors and methods for making and using them |
US6896717B2 (en) | 2002-07-05 | 2005-05-24 | Membrane Technology And Research, Inc. | Gas separation using coated membranes |
US7008564B2 (en) * | 2002-07-11 | 2006-03-07 | Battelle Energy Alliance, Llc | Cured composite materials for reactive metal battery electrolytes |
US20100210745A1 (en) * | 2002-09-09 | 2010-08-19 | Reactive Surfaces, Ltd. | Molecular Healing of Polymeric Materials, Coatings, Plastics, Elastomers, Composites, Laminates, Adhesives, and Sealants by Active Enzymes |
WO2004082918A2 (en) * | 2003-03-13 | 2004-09-30 | 3M Innovative Properties Company | Composite webs and closure systems |
US7381361B2 (en) * | 2003-06-26 | 2008-06-03 | Intel Corporation | Fabricating structures in micro-fluidic channels based on hydrodynamic focusing |
JP2007526109A (ja) * | 2003-07-10 | 2007-09-13 | プラクスエア・テクノロジー・インコーポレイテッド | イオン輸送膜構造体を形成する方法 |
KR101051219B1 (ko) * | 2003-10-06 | 2011-07-21 | 니혼도꾸슈도교 가부시키가이샤 | 박막 전자부품 및 그 제조방법 |
US8414489B2 (en) * | 2003-11-13 | 2013-04-09 | Medtronic Minimed, Inc. | Fabrication of multi-sensor arrays |
KR20050093018A (ko) * | 2004-03-18 | 2005-09-23 | 한국과학기술연구원 | 고효율 3차원 나노 구조 분리막 |
WO2005097304A1 (en) * | 2004-04-08 | 2005-10-20 | Mcmaster University | Membrane stacks |
CA2576372A1 (en) * | 2004-09-30 | 2006-04-06 | Mcmaster University | Composite material comprising layered hydrophilic coatings |
AU2005304962B2 (en) * | 2004-11-09 | 2009-11-19 | Smithkline Beecham Corporation | Glycogen phosphorylase inhibitor compounds and pharmaceutical compositions thereof |
US7923105B2 (en) * | 2004-12-01 | 2011-04-12 | Ngk Insulators, Ltd. | Hydrogen separator and process for production thereof |
US8153189B2 (en) * | 2005-03-31 | 2012-04-10 | Canon Kabushiki Kaisha | Structure and process for production thereof |
JP4575220B2 (ja) * | 2005-04-14 | 2010-11-04 | 信越化学工業株式会社 | レジスト下層膜材料およびパターン形成方法 |
EP1919597A4 (en) * | 2005-07-14 | 2008-08-20 | Univ Ben Gurion | COMPOSITE MEMBRANES AND METHODS OF PREPARATION THEREOF |
WO2007018426A1 (en) * | 2005-08-05 | 2007-02-15 | Fujifilm Manufacturing Europe B.V. | Porous membrane and recording medium comprising same |
WO2007018425A1 (en) * | 2005-08-05 | 2007-02-15 | Fujifilm Manufacturing Europe B.V. | Porous membrane and recording medium comprising same |
ATE427156T1 (de) * | 2005-08-05 | 2009-04-15 | Fujifilm Mfg Europe Bv | Poríse membran und aufzeichnungsmedium sowie herstellungsverfahren dafur |
WO2007018422A1 (en) * | 2005-08-05 | 2007-02-15 | Fujifilm Manufacturing Europe B.V. | Porous membrane and recording medium comprising same |
JP2009502582A (ja) * | 2005-08-05 | 2009-01-29 | フジフィルム マニュファクチャリング ユーロプ ビー.ブイ. | 多孔質膜及びこれを含有する記録媒体 |
JP2009503224A (ja) * | 2005-08-05 | 2009-01-29 | フジフィルム マニュファクチャリング ユーロプ ビー.ブイ. | 多孔質膜とこれを含む記録媒体 |
US7396382B2 (en) * | 2005-09-28 | 2008-07-08 | General Electric Company | Functionalized inorganic membranes for gas separation |
JP4553835B2 (ja) * | 2005-12-14 | 2010-09-29 | 信越化学工業株式会社 | 反射防止膜材料、及びこれを用いたパターン形成方法、基板 |
US20070151447A1 (en) | 2005-12-30 | 2007-07-05 | Membrane Technology And Research, Inc. | Gas separation membranes and processes for controlled environmental management |
WO2007135689A2 (en) * | 2006-05-24 | 2007-11-29 | Ben Gurion University Of The Negev R&D Authority | Membranes, coatings and films and methods for their preparation |
JP2009545662A (ja) * | 2006-08-04 | 2009-12-24 | フジフィルム マニュファクチャリング ユーロプ ビー.ブイ. | 多孔性膜およびこれを含む記録媒体 |
US7771520B1 (en) * | 2006-09-06 | 2010-08-10 | Bossard Peter R | System and method for forming a membrane that is super-permeable to hydrogen |
HUP0600735A2 (en) * | 2006-09-21 | 2009-04-28 | Zoltan Dr Noszticzius | Permeation method and apparatus for preparing fluids containing high-purity chlorine dioxide |
JP2010508140A (ja) * | 2006-10-27 | 2010-03-18 | ザ リージェンツ オブ ザ ユニバーシティ オブ カリフォルニア | 逆浸透薄膜のためのミクロおよびナノ複合支持体構造 |
US7758751B1 (en) * | 2006-11-29 | 2010-07-20 | Uop Llc | UV-cross-linked membranes from polymers of intrinsic microporosity for liquid separations |
WO2008118228A2 (en) * | 2006-12-05 | 2008-10-02 | Stonybrook Water Purification | Articles comprising a fibrous support |
ES2476801T3 (es) * | 2007-02-20 | 2014-07-15 | Shell Internationale Research Maatschappij B.V. | Un método para reacondicionar una membrana de separación de gases |
EP2155371A1 (en) * | 2007-05-24 | 2010-02-24 | FUJIFILM Manufacturing Europe B.V. | Membrane comprising oxyethylene groups |
EP2148735A1 (en) * | 2007-05-24 | 2010-02-03 | FUJIFILM Manufacturing Europe B.V. | Membranes and processes for their manufacture and use |
CN101754797A (zh) | 2007-05-24 | 2010-06-23 | 富士胶片制造欧洲有限公司 | 包含氧乙烯基的膜 |
JP4940351B2 (ja) * | 2007-11-30 | 2012-05-30 | 東レバッテリーセパレータフィルム合同会社 | 微細孔フィルムとその製造方法、及びその用途 |
KR101590651B1 (ko) * | 2007-12-21 | 2016-02-01 | 가부시끼가이샤 도꾸야마 | 고체 고분자형 연료 전지용 격막, 및 격막-촉매 전극 접합체 |
US20100248002A1 (en) * | 2007-12-31 | 2010-09-30 | Kotaro Takita | Microporous Multilayer Membrane, System And Process For Producing Such Membrane, And The Use Of Such Membrane |
EP2239048B1 (en) * | 2008-01-24 | 2014-12-24 | Renaissance Energy Research Corporation | Co2-facilitated transport membrane and manufacturing method for same |
US8419838B2 (en) * | 2008-04-08 | 2013-04-16 | Fujifilm Manufacturing Europe B.V. | Process for preparing membranes |
JP2011516258A (ja) * | 2008-04-08 | 2011-05-26 | フジフィルム・マニュファクチュアリング・ヨーロッパ・ベスローテン・フエンノートシャップ | 複合膜 |
US20090280262A1 (en) * | 2008-05-08 | 2009-11-12 | Chung Yuan Christian University | Method for forming composite membrane with porous coating layer and apparatus thereof |
US20090321355A1 (en) * | 2008-06-30 | 2009-12-31 | NANOASIS TECHNOLOGIES, INC., a corporation of the state of Delaware | Membranes with embedded nanotubes for selective permeability |
WO2010020655A1 (en) * | 2008-08-21 | 2010-02-25 | Shell Internationale Research Maatschappij B.V. | Improved process for production of elemental iron |
US20100075101A1 (en) * | 2008-09-25 | 2010-03-25 | Man-Wing Tang | Cast-on-Tricot Asymmetric and Composite Separation Membranes |
CN101444703B (zh) * | 2008-12-05 | 2011-11-23 | 浙江工业大学 | 一种用于膜生物反应器的复合膜及其制备方法 |
DE102009004848B3 (de) * | 2009-01-16 | 2010-04-15 | Sartorius Stedim Biotech Gmbh | Elektronenstrahlinduzierte Modifizierung von Membranen durch Polymere |
GB0901699D0 (en) * | 2009-02-02 | 2009-03-11 | Ntnu Technology Transfer As | gas seperation membrane |
JP2010201549A (ja) * | 2009-03-03 | 2010-09-16 | Fuji Xerox Co Ltd | マイクロ流路デバイス、分離方法、及び、分離装置 |
US8132677B2 (en) * | 2009-03-27 | 2012-03-13 | Uop Llc | Polymer membranes prepared from aromatic polyimide membranes by thermal treating and UV crosslinking |
US8802329B2 (en) * | 2009-05-14 | 2014-08-12 | GM Global Technology Operations LLC | Electrode containing nanostructured thin catalytic layers and method of making |
US20100319535A1 (en) * | 2009-06-23 | 2010-12-23 | Joshi Ashok V | High-temperature, steam-selective membrane |
DE102009034575A1 (de) * | 2009-07-24 | 2011-01-27 | Universität Bielefeld | Perforierte Membranen |
US8691588B2 (en) * | 2009-08-21 | 2014-04-08 | Cornell University | Nanofilter devices using elastomeric micro to nanochannel interfaces and methods based thereon |
US20110064936A1 (en) * | 2009-09-17 | 2011-03-17 | Massachusetts Institute Of Technology | Method of Asymmetrically Functionalizing Porous Materials |
JP2011100635A (ja) * | 2009-11-06 | 2011-05-19 | Sumitomo Chemical Co Ltd | 積層フィルムおよび非水電解質二次電池 |
US8631946B2 (en) * | 2009-12-24 | 2014-01-21 | Toray Industries, Inc. | Composite semipermeable membrane and method for producing same |
WO2011099587A1 (ja) * | 2010-02-10 | 2011-08-18 | 富士フイルム株式会社 | ガス分離膜、その製造方法、並びにそれを用いたガス分離方法、モジュール及び分離装置 |
FR2957593B1 (fr) * | 2010-03-19 | 2012-04-13 | Univ Paris Curie | Procede de preparation de bicouches ceramiques poreuses nanostructurees, bicouches ceramiques obtenues par ce procede et applications |
US20110268959A1 (en) * | 2010-04-29 | 2011-11-03 | General Electric Company | Porous membrane |
US20130136678A1 (en) * | 2010-07-12 | 2013-05-30 | Konstantin Chuntonov | Plate getter composites |
US9216390B2 (en) * | 2010-07-15 | 2015-12-22 | Ohio State Innovation Foundation | Systems, compositions, and methods for fluid purification |
KR101394624B1 (ko) * | 2010-08-13 | 2014-05-14 | 에스케이이노베이션 주식회사 | 폴리올레핀계 미세다공막 기재의 공극이 보호된 다층 복합 다공막 및 그 제조방법 |
WO2012027587A2 (en) * | 2010-08-25 | 2012-03-01 | Rensselaer Polytechnic Institute | Tunable nanoporous films on polymer substrates, and methods for their manufacture |
EP2614881A1 (en) * | 2010-09-07 | 2013-07-17 | Toray Industries, Inc. | Separation membrane, separation membrane element, and method for producing separation membrane |
WO2012100318A1 (en) * | 2011-01-24 | 2012-08-02 | Membrane Distillation Desalination Ltd. Co. | Composite membranes for membrane distillation and related methods of manufacture |
US20120211424A1 (en) * | 2011-01-25 | 2012-08-23 | The Regents Of The University Of Colorado, A Body Corporate | Novel Polymerizable Surfactant Platforms and Uses Thereof |
US9713792B2 (en) * | 2011-07-25 | 2017-07-25 | Fujifilm Manufacturing Europe Bv | Composite membranes |
SG11201400825XA (en) * | 2011-09-21 | 2014-04-28 | Univ Nanyang Tech | Aquaporin based thin film composite membranes |
SG188687A1 (en) * | 2011-09-22 | 2013-04-30 | Univ Singapore | Thin film composite osmosis membranes |
EP2745919A4 (en) * | 2011-09-29 | 2015-06-24 | Toray Industries | COMPOSITE SEMI-PERMEABLE MEMBRANE |
JP2013075264A (ja) * | 2011-09-30 | 2013-04-25 | Fujifilm Corp | ガス分離膜、その製造方法、それを用いたガス分離膜モジュール |
US20130108531A1 (en) * | 2011-10-28 | 2013-05-02 | Guild Associates, Inc. | Process For Natural Gas Purification |
CN102430347B (zh) * | 2011-10-31 | 2013-01-23 | 南京天膜科技有限公司 | 一种pdms/pei分离膜及其制备方法和应用 |
NL2007705C2 (en) * | 2011-11-02 | 2013-05-21 | Stichting Energie | Low cost polymer supported hybrid silica membrane and production thereof. |
JP2013111507A (ja) | 2011-11-25 | 2013-06-10 | Fujifilm Corp | ガス分離膜、その製造方法、それを用いたガス分離膜モジュール |
US8814982B2 (en) * | 2011-12-08 | 2014-08-26 | Uop Llc | Tetrazole functionalized polymer membranes |
US20130211542A1 (en) * | 2012-02-08 | 2013-08-15 | The Regents Of The University Of California | Synthesis of nanotopographic biomimetic membranes for tissue culture, engineering and prosthetics applications |
CN104136101B (zh) * | 2012-02-24 | 2016-10-19 | 东丽株式会社 | 分离膜及分离膜元件 |
EP2825825B1 (en) * | 2012-03-13 | 2017-09-13 | W. L. Gore & Associates, Inc. | Venting array and manufacturing method |
US20150136690A1 (en) * | 2012-06-01 | 2015-05-21 | National Unibersity of Singapore | Method of making a membrane and a membrane for water filtration |
GB201211309D0 (en) | 2012-06-26 | 2012-08-08 | Fujifilm Mfg Europe Bv | Process for preparing membranes |
US20150005468A1 (en) * | 2013-06-28 | 2015-01-01 | Uop Llc | High permeability copolyimide gas separation membranes |
GB201317525D0 (en) * | 2013-10-03 | 2013-11-20 | Fujifilm Mfg Europe Bv | Membranes |
GB201317521D0 (en) * | 2013-10-03 | 2013-11-20 | Fujifilm Mfg Europe Bv | Membranes |
-
2012
- 2012-06-26 GB GBGB1211309.8A patent/GB201211309D0/en not_active Ceased
-
2013
- 2013-06-26 JP JP2015519338A patent/JP6170144B2/ja not_active Expired - Fee Related
- 2013-06-26 CN CN201380034432.8A patent/CN104428052B/zh not_active Expired - Fee Related
- 2013-06-26 WO PCT/GB2013/051685 patent/WO2014001796A1/en active Application Filing
- 2013-06-26 CN CN201380034428.1A patent/CN104428050B/zh not_active Expired - Fee Related
- 2013-06-26 JP JP2015519339A patent/JP6170145B2/ja not_active Expired - Fee Related
- 2013-06-26 WO PCT/GB2013/051684 patent/WO2014001795A1/en active Application Filing
- 2013-06-26 MY MYPI2014703925A patent/MY171318A/en unknown
- 2013-06-26 WO PCT/GB2013/051687 patent/WO2014001798A1/en active Application Filing
- 2013-06-26 US US14/408,754 patent/US9694325B2/en active Active
- 2013-06-26 US US14/408,481 patent/US9579609B2/en active Active
- 2013-06-26 MY MYPI2014703934A patent/MY178421A/en unknown
- 2013-06-26 CN CN201380034518.0A patent/CN104411389B/zh not_active Expired - Fee Related
- 2013-06-26 US US14/409,559 patent/US9731248B2/en active Active
- 2013-06-26 WO PCT/GB2013/051683 patent/WO2014001794A1/en active Application Filing
- 2013-06-26 US US14/409,550 patent/US9700848B2/en active Active
- 2013-06-26 JP JP2015519337A patent/JP6235006B2/ja not_active Expired - Fee Related
- 2013-06-26 WO PCT/GB2013/051679 patent/WO2014001790A1/en active Application Filing
- 2013-06-26 US US14/408,808 patent/US9586182B2/en active Active
-
2017
- 2017-07-06 US US15/642,663 patent/US10005043B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN104428052A (zh) | 2015-03-18 |
US20150343389A1 (en) | 2015-12-03 |
US20150298071A1 (en) | 2015-10-22 |
WO2014001798A1 (en) | 2014-01-03 |
CN104411389B (zh) | 2017-04-12 |
US10005043B2 (en) | 2018-06-26 |
JP2015522410A (ja) | 2015-08-06 |
WO2014001796A1 (en) | 2014-01-03 |
US9579609B2 (en) | 2017-02-28 |
JP6170144B2 (ja) | 2017-07-26 |
MY178421A (en) | 2020-10-13 |
WO2014001790A1 (en) | 2014-01-03 |
US9731248B2 (en) | 2017-08-15 |
US20170296981A1 (en) | 2017-10-19 |
US9586182B2 (en) | 2017-03-07 |
US9700848B2 (en) | 2017-07-11 |
CN104428050A (zh) | 2015-03-18 |
CN104428050B (zh) | 2017-02-08 |
US20150209733A1 (en) | 2015-07-30 |
US20150143995A1 (en) | 2015-05-28 |
JP6235006B2 (ja) | 2017-11-22 |
CN104411389A (zh) | 2015-03-11 |
GB201211309D0 (en) | 2012-08-08 |
US20150165369A1 (en) | 2015-06-18 |
CN104428052B (zh) | 2017-03-15 |
WO2014001794A1 (en) | 2014-01-03 |
US9694325B2 (en) | 2017-07-04 |
WO2014001795A1 (en) | 2014-01-03 |
JP2015528739A (ja) | 2015-10-01 |
JP2015522411A (ja) | 2015-08-06 |
MY171318A (en) | 2019-10-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6170145B2 (ja) | 相互混合層を有するガス分離膜 | |
US9586183B2 (en) | Membranes | |
US9808771B2 (en) | Membranes | |
US20180178169A1 (en) | Multilayer Composite Gas Separation Membranes with two Selective Layers | |
US20190105612A1 (en) | Composite Membranes | |
WO2015049504A1 (en) | Membranes | |
WO2014001792A1 (en) | Gas separation membrane with cross-linked dialkylsiloxane in intermediate layer|and the preparation thereof | |
WO2019110962A1 (en) | Composite membranes | |
WO2024056366A1 (en) | Gas-separation membranes | |
WO2024056365A1 (en) | Gas-separation membranes | |
US20200001246A1 (en) | Membranes | |
WO2021197912A1 (en) | Gas-separation membranes | |
WO2018091865A1 (en) | Composite membranes |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20160330 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20161209 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20161216 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170313 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20170531 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170629 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6170145 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
LAPS | Cancellation because of no payment of annual fees |