JP6129982B2 - 電子顕微鏡 - Google Patents
電子顕微鏡 Download PDFInfo
- Publication number
- JP6129982B2 JP6129982B2 JP2015541606A JP2015541606A JP6129982B2 JP 6129982 B2 JP6129982 B2 JP 6129982B2 JP 2015541606 A JP2015541606 A JP 2015541606A JP 2015541606 A JP2015541606 A JP 2015541606A JP 6129982 B2 JP6129982 B2 JP 6129982B2
- Authority
- JP
- Japan
- Prior art keywords
- electron
- electron source
- flushing
- electron microscope
- source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000008859 change Effects 0.000 claims description 14
- 230000002123 temporal effect Effects 0.000 claims description 11
- 238000004140 cleaning Methods 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 8
- 238000011010 flushing procedure Methods 0.000 description 69
- 239000000523 sample Substances 0.000 description 46
- 238000000605 extraction Methods 0.000 description 27
- 238000010894 electron beam technology Methods 0.000 description 20
- 239000007789 gas Substances 0.000 description 17
- 230000003287 optical effect Effects 0.000 description 14
- 230000007423 decrease Effects 0.000 description 12
- 230000001133 acceleration Effects 0.000 description 6
- 230000003749 cleanliness Effects 0.000 description 6
- 125000004429 atom Chemical group 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 230000005684 electric field Effects 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 238000001514 detection method Methods 0.000 description 2
- 239000003574 free electron Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 108010083687 Ion Pumps Proteins 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000008080 stochastic effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
- H01J2237/24514—Beam diagnostics including control of the parameter or property diagnosed
- H01J2237/24535—Beam current
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013212424 | 2013-10-10 | ||
| JP2013212424 | 2013-10-10 | ||
| PCT/JP2014/076883 WO2015053300A1 (fr) | 2013-10-10 | 2014-10-08 | Microscope électronique |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2015053300A1 JPWO2015053300A1 (ja) | 2017-03-09 |
| JP6129982B2 true JP6129982B2 (ja) | 2017-05-17 |
Family
ID=52813116
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015541606A Expired - Fee Related JP6129982B2 (ja) | 2013-10-10 | 2014-10-08 | 電子顕微鏡 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP6129982B2 (fr) |
| WO (1) | WO2015053300A1 (fr) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019155540A1 (fr) * | 2018-02-07 | 2019-08-15 | 株式会社日立ハイテクノロジーズ | Dispositif de nettoyage |
| JP7018418B2 (ja) * | 2019-10-07 | 2022-02-10 | 日本電子株式会社 | 電子銃、電子顕微鏡、３次元積層造形装置、及び電子銃の電流調整方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0487244A (ja) * | 1990-07-27 | 1992-03-19 | Hitachi Ltd | 走査型電子顕微鏡 |
| JPH0525654U (ja) * | 1991-09-17 | 1993-04-02 | 株式会社日立製作所 | 走査電子顕微鏡 |
| JPH0845455A (ja) * | 1994-07-27 | 1996-02-16 | Jeol Ltd | 電界放射型電子銃の動作状態判断方法 |
| JPH08129981A (ja) * | 1994-10-28 | 1996-05-21 | Hitachi Ltd | 電界放射型電子銃及び電子線装置 |
| JP2005235469A (ja) * | 2004-02-18 | 2005-09-02 | Jeol Ltd | 荷電粒子ビーム装置及び荷電粒子ビーム装置の制御方法 |
| JP5455700B2 (ja) * | 2010-02-18 | 2014-03-26 | 株式会社日立ハイテクノロジーズ | 電界放出電子銃及びその制御方法 |
-
2014
- 2014-10-08 JP JP2015541606A patent/JP6129982B2/ja not_active Expired - Fee Related
- 2014-10-08 WO PCT/JP2014/076883 patent/WO2015053300A1/fr active Application Filing
Also Published As
| Publication number | Publication date |
|---|---|
| WO2015053300A1 (fr) | 2015-04-16 |
| JPWO2015053300A1 (ja) | 2017-03-09 |
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