JP5947292B2 - 誘導結合誘電体バリア放電ランプ - Google Patents
誘導結合誘電体バリア放電ランプ Download PDFInfo
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- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
- C02F1/325—Irradiation devices or lamp constructions
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/28—Treatment of water, waste water, or sewage by sorption
- C02F1/283—Treatment of water, waste water, or sewage by sorption using coal, charred products, or inorganic mixtures containing them
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F38/00—Adaptations of transformers or inductances for specific applications or functions
- H01F38/14—Inductive couplings
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J5/00—Details relating to vessels or to leading-in conductors common to two or more basic types of discharge tubes or lamps
- H01J5/50—Means forming part of the tube or lamps for the purpose of providing electrical connection to it
- H01J5/54—Means forming part of the tube or lamps for the purpose of providing electrical connection to it supported by a separate part, e.g. base
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J5/00—Details relating to vessels or to leading-in conductors common to two or more basic types of discharge tubes or lamps
- H01J5/50—Means forming part of the tube or lamps for the purpose of providing electrical connection to it
- H01J5/54—Means forming part of the tube or lamps for the purpose of providing electrical connection to it supported by a separate part, e.g. base
- H01J5/62—Connection of wires protruding from the vessel to connectors carried by the separate part
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
- H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
- H01J65/046—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/322—Lamp arrangement
- C02F2201/3222—Units using UV-light emitting diodes [LED]
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- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
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- C02F2201/3223—Single elongated lamp located on the central axis of a turbular reactor
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- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/326—Lamp control systems
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- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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- C02F2209/005—Processes using a programmable logic controller [PLC]
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- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/005—Processes using a programmable logic controller [PLC]
- C02F2209/006—Processes using a programmable logic controller [PLC] comprising a software program or a logic diagram
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- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/005—Processes using a programmable logic controller [PLC]
- C02F2209/008—Processes using a programmable logic controller [PLC] comprising telecommunication features, e.g. modems or antennas
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- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/02—Temperature
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- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/06—Controlling or monitoring parameters in water treatment pH
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/11—Turbidity
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- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/40—Liquid flow rate
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/04—Disinfection
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
- H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
- H01J65/048—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using an excitation coil
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Description
Claims (20)
- 時変電流を生成するのに適している主誘導回路を含むベース・ステーションであって、該ベース・ステーションは流体フロー経路を規定する、ベース・ステーションと、
ベース・ステーションにより取り外し可能に支えられるのに適しており、紫外光を放射するのに適しているランプ・アセンブリと、を備える流体処理システムであって、前記ランプ・アセンブリは、前記主誘導回路からパワーを受け取るのに適している二次誘導回路と、
磁気コアであって、前記二次誘導回路が該磁気コアのまわりに広がっている、磁気コアと、
二次誘導回路に電気的に結合された第1および第2の電極と、
前記第1および第2の電極に電気的に結合されたランプと、を含み、
前記二次誘導回路は、前記主誘導回路からパワーを受け取るのに適しており、また、前記ランプにエネルギー供給するために前記第1および第2の電極にパワーを供給するのに適しており、前記主誘導回路、前記二次誘導回路および前記磁気コアが互いに同心状に配置されるように、前記二次誘導回路および前記磁気コアは、前記主誘導回路の開口部の内部に受け入れられる、流体処理システム。 - 前記ランプは、コンパクト蛍光ランプ、チューブ蛍光ランプまたはLEDランプである、請求項1に記載の流体処理システム。
- 前記二次誘導回路は、前記主誘導回路によって規定される内半径より小さい外半径を規定し、
前記二次誘導回路と前記主誘導回路とは実質的に同軸である、請求項1に記載の流体処理システム。 - 前記ベース・ステーションは、前記ベース・ステーションの流体フロー経路を通って動いている流体の混濁度、pHまたは温度を測定するセンサを含む、請求項1に記載の流体処理システム。
- 放電チャンバーが、出力を規定し、
前記ベース・ステーションは、前記流体の前記測定した特性に基づいて、前記放電チャンバーの出力を変えるマイクロコントローラを含む、請求項4に記載の流体処理システム。 - 前記ベース・ステーションは、前記ランプ・アセンブリの発光の出力を測定するセンサを含む、請求項1に記載の流体処理システム。
- 前記主誘導回路は、パワー伝送モードで動作可能であり、通信モードで動作可能である、請求項1に記載の流体処理システム。
- 前記ランプ・アセンブリは、前記主誘導回路との通信のためのRFアンテナと関連メモリ・タグを含む、請求項7に記載の流体処理システム。
- 前記二次誘導回路によって受け取られた第1の電圧を、前記第1の電極および前記第2の電極にわたり印加された第2の電圧に変換するために、前記二次誘導回路と前記第1の電極および前記第2の電極の間で、電気的に接続されるパルス駆動回路を更に備える請求項1に記載の流体処理システム。
- 主誘導回路を含むベース・ステーションおよび流体フロー経路を提供するステップと、
二次誘導回路、磁気コア、第1および第2の電極、および、前記第1および第2の電極に電気的に結合された紫外線ランプを含むランプ・アセンブリを提供するステップと、
前記ランプ・アセンブリを、前記ベース・アセンブリの内部に配置するステップであって、前記主誘導回路、前記二次誘導回路および前記磁気コアを、同心状に配置するように、前記二次誘導回路および前記磁気コアは、前記主誘導回路の内部に受け入れられる、ステップと、
前記ランプにエネルギー供給し、紫外光で前記流体フロー経路を放射線照射するために、前記主誘導回路において時変電流を生成するステップと、
を含むランプ・アセンブリを作動する方法。 - 前記ランプの発光の出力を測定するステップと、
前記時変電流を、発光の出力の関数として制御するステップと
を更に含む請求項10に記載の方法。 - 前記流体フロー経路における流体のフロー・レートを測定するステップと、
前記時変電流を、前記測定されたフロー・レートの関数として制御するステップと
を更に含む請求項10に記載の方法。 - 前記流体フロー経路における流体の混濁度を測定するステップと、
前記時変電流を、前記測定された混濁度の関数として制御するステップとを更に含む請求項10に記載の方法。 - 前記流体フロー経路における流体の温度を測定するステップと、
前記時変電流を、前記測定された温度の関数として制御するステップと
を更に含む請求項10に記載の方法。 - 前記流体フロー経路における流体のpHを測定するステップと、
前記時変電流を、前記測定されたpHの関数として制御するステップと
を更に含む請求項10に記載の方法。 - 前記ランプ・アセンブリと通信的に結びついたメモリに問い合わせるために、前記主誘導回路を通信モードにおいて駆動するステップを更に含む請求項10に記載の方法。
- 前記ランプ・アセンブリの前記問い合わせに基づいて、前記ランプ・アセンブリの照明の数を、メモリに格納するステップを更に含む請求項16に記載の方法。
- 前記ランプ・アセンブリの照明の数に基づいて、前記主誘導回路における前記時変電流を調整するステップを更に含む請求項17に記載の方法。
- 前記ランプ・アセンブリの前記問い合わせに基づいて、ランプ・アセンブリの動作の累積的な期間を、メモリに格納するステップを更に含む請求項16に記載の方法。
- 前記ランプ・アセンブリの動作の累積的な期間に基づいて、前記主誘導回路における前記時変電流を調整するステップを更に含む請求項19に記載の方法。
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US35160410P | 2010-06-04 | 2010-06-04 | |
US61/351,604 | 2010-06-04 | ||
PCT/US2011/038983 WO2011153388A2 (en) | 2010-06-04 | 2011-06-03 | Inductively coupled dielectric barrier discharge lamp |
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JP2015243860A Division JP6234424B2 (ja) | 2010-06-04 | 2015-12-15 | 誘導結合誘電体バリア放電ランプ |
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JP2013528910A JP2013528910A (ja) | 2013-07-11 |
JP2013528910A5 JP2013528910A5 (ja) | 2014-05-15 |
JP5947292B2 true JP5947292B2 (ja) | 2016-07-06 |
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JP2015243860A Expired - Fee Related JP6234424B2 (ja) | 2010-06-04 | 2015-12-15 | 誘導結合誘電体バリア放電ランプ |
JP2017203416A Expired - Fee Related JP6625594B2 (ja) | 2010-06-04 | 2017-10-20 | 誘導結合誘電体バリア放電ランプ |
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TW201214504A (en) | 2012-04-01 |
US20110297844A1 (en) | 2011-12-08 |
TWI623963B (zh) | 2018-05-11 |
JP6625594B2 (ja) | 2019-12-25 |
CN103026457B (zh) | 2016-10-26 |
US20180319678A1 (en) | 2018-11-08 |
JP2018047461A (ja) | 2018-03-29 |
KR101795827B1 (ko) | 2017-11-08 |
WO2011153388A4 (en) | 2012-07-12 |
US20170015566A1 (en) | 2017-01-19 |
TW201707045A (zh) | 2017-02-16 |
TWI666680B (zh) | 2019-07-21 |
TWI569301B (zh) | 2017-02-01 |
TWI483287B (zh) | 2015-05-01 |
US9493366B2 (en) | 2016-11-15 |
CN107068535A (zh) | 2017-08-18 |
US10160667B2 (en) | 2018-12-25 |
TW201826320A (zh) | 2018-07-16 |
KR101949075B1 (ko) | 2019-02-15 |
JP2013528910A (ja) | 2013-07-11 |
WO2011153388A2 (en) | 2011-12-08 |
KR20130118752A (ko) | 2013-10-30 |
KR20170125407A (ko) | 2017-11-14 |
JP2016101584A (ja) | 2016-06-02 |
CN103026457A (zh) | 2013-04-03 |
JP6234424B2 (ja) | 2017-11-22 |
CN107068535B (zh) | 2019-01-18 |
WO2011153388A3 (en) | 2012-05-10 |
US10035715B2 (en) | 2018-07-31 |
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