JP5933694B2 - ホウ素炭素膜をドライストリッピングする方法 - Google Patents
ホウ素炭素膜をドライストリッピングする方法 Download PDFInfo
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- PPWPWBNSKBDSPK-UHFFFAOYSA-N [B].[C] Chemical compound [B].[C] PPWPWBNSKBDSPK-UHFFFAOYSA-N 0.000 title claims description 100
- 238000000034 method Methods 0.000 title claims description 57
- 229910052760 oxygen Inorganic materials 0.000 claims description 88
- 239000001301 oxygen Substances 0.000 claims description 85
- 239000000758 substrate Substances 0.000 claims description 82
- 229910052739 hydrogen Inorganic materials 0.000 claims description 75
- 239000001257 hydrogen Substances 0.000 claims description 73
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 66
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 64
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 45
- 229910052799 carbon Inorganic materials 0.000 claims description 45
- 239000007789 gas Substances 0.000 claims description 43
- 150000001875 compounds Chemical class 0.000 claims description 40
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 30
- 229910052796 boron Inorganic materials 0.000 claims description 30
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 29
- 229920000642 polymer Polymers 0.000 claims description 26
- -1 oxygen ions Chemical class 0.000 claims description 23
- 230000008569 process Effects 0.000 claims description 20
- 239000011737 fluorine Substances 0.000 claims description 18
- 229910052731 fluorine Inorganic materials 0.000 claims description 18
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 8
- 229910001882 dioxygen Inorganic materials 0.000 claims description 8
- 150000001722 carbon compounds Chemical class 0.000 claims description 6
- 150000002431 hydrogen Chemical class 0.000 claims description 4
- 239000012528 membrane Substances 0.000 claims description 2
- 210000002381 plasma Anatomy 0.000 description 76
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 38
- 239000001272 nitrous oxide Substances 0.000 description 19
- 238000005530 etching Methods 0.000 description 18
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 16
- 238000010586 diagram Methods 0.000 description 12
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 239000012159 carrier gas Substances 0.000 description 9
- 239000000460 chlorine Substances 0.000 description 9
- 229910052801 chlorine Inorganic materials 0.000 description 9
- 239000003989 dielectric material Substances 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 239000001307 helium Substances 0.000 description 8
- 229910052734 helium Inorganic materials 0.000 description 8
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 8
- 239000007800 oxidant agent Substances 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 230000001590 oxidative effect Effects 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 239000003039 volatile agent Substances 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000001965 increasing effect Effects 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229910003481 amorphous carbon Inorganic materials 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical class B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000012035 limiting reagent Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31105—Etching inorganic layers
- H01L21/31111—Etching inorganic layers by chemical means
- H01L21/31116—Etching inorganic layers by chemical means by dry-etching
- H01L21/31122—Etching inorganic layers by chemical means by dry-etching of layers not containing Si, e.g. PZT, Al2O3
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
- H01L21/0206—Cleaning during device manufacture during, before or after processing of insulating layers
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31144—Etching the insulating layers by chemical or physical means using masks
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Description
Claims (15)
- 基板から膜をストリッピングする方法であって、
ホウ素および炭素を約1:1から約3:1の間のホウ素対炭素の原子比で含む膜をその上に有する基板をチャンバ内に位置決めすることと、
前記膜を酸素イオンまたは酸素ラジカルおよび水素イオンまたは水素ラジカルに露出させて、前記ホウ素および炭素から1つまたは複数の揮発性化合物を生成することと、
前記1つまたは複数の揮発性化合物を前記チャンバから排気することと
を含む方法。 - 前記膜を前記酸素イオンまたは酸素ラジカルおよび前記水素イオンまたは水素ラジカルに露出させる前に、前記膜をフッ素イオンまたはフッ素ラジカルおよび酸素イオンまたは酸素ラジカルに露出させて、前記膜の表面から炭素ベースのポリマーを除去することをさらに含む、請求項1に記載の方法。
- 前記酸素イオンまたは酸素ラジカルが、O2、N2O、CO2、NO、またはNO2を含む酸素含有ガスからプラズマを生成することによって形成され、前記水素イオンまたは水素ラジカルが、H2またはNH3を含む水素含有ガスからプラズマを生成することによって形成される、請求項1に記載の方法。
- 前記酸素含有ガスが2原子酸素であり、前記水素含有ガスが2原子水素であり、前記チャンバが約20トル未満の圧力で維持される、請求項3に記載の方法。
- 前記水素含有ガスが約500SCCMから約10,000SCCMの間の流量を有し、前記酸素含有ガスが約250SCCMから約5000SCCMの間の流量を有する、請求項4に記載の方法。
- 前記チャンバ内の前記圧力が約5トルから約100トルの範囲内であり、前記基板が約200℃から約400℃の範囲内の温度で維持される、請求項1に記載の方法。
- チャンバ内に位置決めされた基板からホウ素炭素膜をストリッピングする方法であって、
ホウ素および炭素を含む基板を、酸素ラジカルまたは酸素イオンおよび水素ラジカルまたは水素イオンを含有するプラズマに露出させることと、
前記水素ラジカルまたは水素イオンと前記ホウ素を反応させて揮発性ホウ素種を形成することと、
前記酸素ラジカルまたは酸素イオンと前記炭素を反応させて揮発性炭素種を形成することと、
前記揮発性ホウ素種および前記揮発性炭素種を前記チャンバから除去することと
を含む方法。 - 前記基板を前記露出させることは、
HxOyを含むプロセスガスを前記チャンバに導入することであって、xおよびyが1より大きい整数または非整数である、導入することと、
前記プロセスガスからプラズマを生成することと
を含む、請求項7に記載の方法。 - 前記基板を前記露出させることが、水蒸気または過酸化水素から形成されるプラズマに前記基板を露出させることをさらに含む、請求項8に記載の方法。
- 前記基板を前記露出させることが、
水蒸気ジェネレータを使用して水蒸気を生成することと、
前記水蒸気を前記チャンバ内へ流すことと、
RF電力を使用して前記水蒸気からプラズマを形成することと
を含む、請求項7に記載の方法。 - 前記チャンバ内の前記圧力が約5トルより大きく、前記基板が、前記チャンバ内に位置する面板の表面から約600ミル未満のところに位置決めされる、請求項7に記載の方法。
- 前記基板を前記露出させることは、式HxOyを有する化合物、および酸素含有化合物または水素含有化合物のうちの少なくとも1つからプラズマを生成することを含み、ここでxおよびyが1より大きい整数または非整数である、請求項7に記載の方法。
- 前記酸素含有化合物がO2、N2O、CO2、NO、またはNO2を含み、前記水素含有化合物がH2またはNH3を含む、請求項12に記載の方法。
- チャンバ内に位置決めされた基板からホウ素および炭素を含む膜をストリッピングする方法であって、
HxOyを含む化合物から形成される、酸素ラジカルまたは酸素イオンおよび水素ラジカルまたは水素イオンを含むプラズマに基板を露出させることであって、xおよびyが1より大きい整数または非整数である、露出させることと、
前記膜を接触させることによって、前記水素ラジカルまたは水素イオンと前記ホウ素を反応させて揮発性ホウ素種を形成し、前記酸素ラジカルまたは酸素イオンと前記炭素を反応させて揮発性炭素種を形成することと、
前記揮発性ホウ素種および前記揮発性炭素種を前記チャンバから除去することと
を含む方法。 - 前記プラズマが水蒸気または過酸化水素を含む、請求項14に記載の方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
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US201161485534P | 2011-05-12 | 2011-05-12 | |
US61/485,534 | 2011-05-12 | ||
US13/456,404 | 2012-04-26 | ||
US13/456,404 US9299581B2 (en) | 2011-05-12 | 2012-04-26 | Methods of dry stripping boron-carbon films |
PCT/US2012/035659 WO2012154429A2 (en) | 2011-05-12 | 2012-04-27 | Methods of dry stripping boron-carbon films |
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JP2014516205A JP2014516205A (ja) | 2014-07-07 |
JP5933694B2 true JP5933694B2 (ja) | 2016-06-15 |
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Country Status (6)
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US (1) | US9299581B2 (ja) |
JP (1) | JP5933694B2 (ja) |
KR (1) | KR101682081B1 (ja) |
CN (1) | CN103443909A (ja) |
TW (1) | TWI541062B (ja) |
WO (1) | WO2012154429A2 (ja) |
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