JP5791083B2 - 元素材料の一次的な製造 - Google Patents

元素材料の一次的な製造 Download PDF

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Publication number
JP5791083B2
JP5791083B2 JP2012508481A JP2012508481A JP5791083B2 JP 5791083 B2 JP5791083 B2 JP 5791083B2 JP 2012508481 A JP2012508481 A JP 2012508481A JP 2012508481 A JP2012508481 A JP 2012508481A JP 5791083 B2 JP5791083 B2 JP 5791083B2
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cathode
electrolyte
anode
electrons
liquid electrolyte
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JP2012508481A
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Japanese (ja)
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JP2012525502A5 (OSRAM
JP2012525502A (ja
Inventor
パウウェル，アダム，シー，ザ・フォース
デレジンスキー，スティーブ，ジェイ，ザ・サード
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インフィニウム インコーポレイテッド
インフィニウム インコーポレイテッド
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/33—Silicon
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C3/00—Electrolytic production, recovery or refining of metals by electrolysis of melts
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C3/00—Electrolytic production, recovery or refining of metals by electrolysis of melts
    • C25C3/26—Electrolytic production, recovery or refining of metals by electrolysis of melts of titanium, zirconium, hafnium, tantalum or vanadium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C3/00—Electrolytic production, recovery or refining of metals by electrolysis of melts
    • C25C3/34—Electrolytic production, recovery or refining of metals by electrolysis of melts of metals not provided for in groups C25C3/02 - C25C3/32
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D9/00—Electrolytic coating other than with metals
    • C25D9/04—Electrolytic coating other than with metals with inorganic materials
    • C25D9/08—Electrolytic coating other than with metals with inorganic materials by cathodic processes

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
JP2012508481A 2009-04-30 2010-04-29 元素材料の一次的な製造 Expired - Fee Related JP5791083B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US17439509P 2009-04-30 2009-04-30
US61/174,395 2009-04-30
US12/764,637 US8460535B2 (en) 2009-04-30 2010-04-21 Primary production of elements
US12/764,637 2010-04-21
PCT/US2010/001263 WO2010126597A1 (en) 2009-04-30 2010-04-29 Primary production of elements

Publications (3)

Publication Number Publication Date
JP2012525502A JP2012525502A (ja) 2012-10-22
JP2012525502A5 JP2012525502A5 (OSRAM) 2015-07-02
JP5791083B2 true JP5791083B2 (ja) 2015-10-07

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JP2012508481A Expired - Fee Related JP5791083B2 (ja) 2009-04-30 2010-04-29 元素材料の一次的な製造

Country Status (8)

Country Link
US (2) US8460535B2 (OSRAM)
EP (1) EP2425042A1 (OSRAM)
JP (1) JP5791083B2 (OSRAM)
KR (1) KR20120024671A (OSRAM)
CN (1) CN102575364B (OSRAM)
CA (1) CA2759805C (OSRAM)
TW (1) TWI479051B (OSRAM)
WO (1) WO2010126597A1 (OSRAM)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8460535B2 (en) 2009-04-30 2013-06-11 Infinium, Inc. Primary production of elements
WO2012083480A1 (en) * 2010-12-20 2012-06-28 Epro Development Limited Method and apparatus for producing pure silicon
US9388498B2 (en) 2011-07-22 2016-07-12 The Regents Of The University Of Michigan Electrochemical liquid-liquid-solid deposition processes for production of group IV semiconductor materials
WO2013028798A1 (en) * 2011-08-22 2013-02-28 Metal Oxygen Separtation Technologies, Inc. Liquid anodes and fuels for production of metals from their oxides by molten salt electrolysis with a solid electrolyte
KR20140108211A (ko) 2011-09-01 2014-09-05 인피니움, 인크. 산소 및 액체 금속 환경에서 고온에서 고전류 컨덕터
US20130152734A1 (en) 2011-10-07 2013-06-20 Metal Oxygen Separation Technologies, Inc. Methods and apparatuses for efficient metals production, separation, and recycling by salt- and argon-mediated distillation with oxide electrolysis, and sensor device related thereto
US10147836B2 (en) 2012-05-31 2018-12-04 Board Of Regents Of The University Of Texas System Production of thin film solar grade silicon on metals by electrodeposition from silicon dioxide in a molten salt
CN102691077A (zh) * 2012-06-15 2012-09-26 徐州金石彭源稀土材料厂 一种从稀土中提取镨的工艺
WO2014004610A1 (en) * 2012-06-27 2014-01-03 Arizona Board Of Regents, A Body Corporate Of The State Of Arizona, Acting For And On Behalf Of Arizona State University System and method for electrorefining of silicon
WO2014085467A1 (en) * 2012-11-28 2014-06-05 Trustees Of Boston University Method and apparatus for producing solar grade silicon using a som electrolysis process
KR101438126B1 (ko) * 2013-03-12 2014-09-04 한국원자력연구원 리튬 재순환형 금속산화물 전해환원 장치
WO2014165937A1 (en) * 2013-04-12 2014-10-16 Ventseatech Pty Ltd Apparatus and method for recovery of metals from a body of fluid by electrodeposition
US10087539B2 (en) * 2013-06-12 2018-10-02 Infinium, Inc. Liquid metal electrodes for gas separation
WO2014201207A2 (en) 2013-06-14 2014-12-18 Arizona Board Of Regents, A Body Corporate Of The State Of Arizona, Acting For And On Behalf Of Arizona State University System and method for purification of electrolytic salt
WO2015006331A1 (en) * 2013-07-08 2015-01-15 POWELL, Adam, Clayton, IV Clean, efficient metal electrolysis via som anodes
DE102014111781B4 (de) * 2013-08-19 2022-08-11 Korea Atomic Energy Research Institute Verfahren zur elektrochemischen Herstellung einer Silizium-Schicht
US20160362805A1 (en) * 2013-11-01 2016-12-15 Adam Clayton Powell, IV Methods and apparatuses for increasing energy efficiency and improving membrane robustness in primary metal production
GB201411430D0 (en) * 2014-06-26 2014-08-13 Metalysis Ltd Method of producing metallic tanralum
US10550489B2 (en) 2016-07-11 2020-02-04 Uchicago Argonne, Llc Actinide and rare earth drawdown system for molten salt recycle
CN106222703A (zh) * 2016-08-25 2016-12-14 北京工业大学 多步选择性电解回收废硬质合金中金属的方法
KR101734119B1 (ko) * 2016-09-22 2017-05-11 한국지질자원연구원 금속의 전해환원 조건 설정방법 및 이를 이용한 희토류 금속의 전해환원 방법
US10538860B2 (en) 2017-01-09 2020-01-21 The Regents Of The University Of Michigan Devices and methods for electrochemical liquid phase epitaxy
KR102055597B1 (ko) * 2017-12-14 2020-01-22 한국세라믹기술원 고체 산화물 멤브레인용 복합체, 이의 제조방법 및 이를 포함하는 고체 산화물 멤브레인
KR102376951B1 (ko) * 2020-02-19 2022-03-22 순천향대학교 산학협력단 사용후 핵연료에 포함된 희토류 금속 회수 방법 및 그 장치
AR128753A1 (es) * 2022-03-10 2024-06-12 Reynolds Consumer Products LLC Sistemas y métodos para la purificación del aluminio

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL290208A (OSRAM) * 1962-03-14
US3983012A (en) * 1975-10-08 1976-09-28 The Board Of Trustees Of Leland Stanford Junior University Epitaxial growth of silicon or germanium by electrodeposition from molten salts
US4142947A (en) * 1977-05-12 1979-03-06 Uri Cohen Electrodeposition of polycrystalline silicon from a molten fluoride bath and product
US4292145A (en) * 1980-05-14 1981-09-29 The Board Of Trustees Of Leland Stanford Junior University Electrodeposition of molten silicon
FR2560896B1 (fr) * 1984-03-12 1989-10-20 Pechiney Procede d'obtention d'un metal par electrolyse d'halogenures en bain de sels fondus comportant un double depot simultane et continu et dispositifs d'application
JPH0726220B2 (ja) * 1986-01-08 1995-03-22 昭和電工株式会社 電解鉄の製法
JPH0726221B2 (ja) * 1986-01-09 1995-03-22 昭和電工株式会社 電解鉄の製造方法
US4923579A (en) * 1988-09-12 1990-05-08 Westinghouse Electric Corp. Electrochemical process for zirconium alloy recycling
JPH0696787B2 (ja) * 1988-09-26 1994-11-30 昭和電工株式会社 高純度金属又は合金の製造方法
JP2783027B2 (ja) * 1991-12-03 1998-08-06 住友金属鉱山株式会社 金属の電解精製における品質管理方法
JPH06192875A (ja) * 1992-12-24 1994-07-12 Sumitomo Metal Mining Co Ltd ガリウム電解液の精製方法
JPH07300692A (ja) * 1994-04-27 1995-11-14 Konica Corp 電解金属回収装置
FR2731717B1 (fr) * 1995-03-15 1997-04-25 Commissariat Energie Atomique Procede d'oxydation electrochimique de am (vii) en am (vi), utilisable pour separer l'americium des solutions de retraitement de combustibles nucleaires uses
US5976345A (en) * 1997-01-06 1999-11-02 Boston University Method and apparatus for metal extraction and sensor device related thereto
JP2980869B2 (ja) * 1997-08-12 1999-11-22 科学技術振興事業団 単結晶質銀薄膜又は単結晶銀の作製方法
JP2997265B1 (ja) * 1999-01-29 2000-01-11 金属鉱業事業団 電解還元装置
JP2001040493A (ja) * 1999-07-30 2001-02-13 Toho Titanium Co Ltd チタンの製造方法及びその製造装置
US6896788B2 (en) * 2000-05-22 2005-05-24 Nikko Materials Company, Limited Method of producing a higher-purity metal
JP3878402B2 (ja) * 2000-05-22 2007-02-07 日鉱金属株式会社 金属の高純度化方法
JP2002098793A (ja) * 2000-09-22 2002-04-05 Ngk Insulators Ltd β−アルミナを用いたＮａ・Ｎａ化合物の電解方法
NO20010963D0 (no) 2001-02-26 2001-02-26 Norwegian Silicon Refinery As FremgangsmÕte for fremstilling av silisium og/eller aluminium og silumin (aluminium-silisium-legering)
JP3825983B2 (ja) * 2001-03-26 2006-09-27 日鉱金属株式会社 金属の高純度化方法
CN1715454A (zh) 2001-08-01 2006-01-04 株式会社日矿材料 高纯镍、由其构成的溅射靶及通过该靶形成的高纯镍薄膜
JP2004083992A (ja) * 2002-08-27 2004-03-18 Nikko Materials Co Ltd 高純度アンチモンの製造方法及び高純度アンチモン
AU2003902048A0 (en) * 2003-04-29 2003-05-15 M.I.M. Holdings Limited Method & apparatus for cathode plate production
US7846309B2 (en) * 2003-08-14 2010-12-07 Rio Tinto Alcan International Limited Metal electrowinning cell with electrolyte purifier
JP4555984B2 (ja) * 2004-04-28 2010-10-06 Ｄｏｗａエコシステム株式会社 金属回収装置及び金属回収方法
GB0422129D0 (en) 2004-10-06 2004-11-03 Qinetiq Ltd Electro-reduction process
JP4600924B2 (ja) * 2005-02-10 2010-12-22 滋賀県 水素回収型電解式水質改善装置
JP2007016293A (ja) * 2005-07-08 2007-01-25 Kyoto Univ 懸濁電解による金属の製造方法
US8658007B2 (en) * 2005-07-15 2014-02-25 The Trustees Of Boston University Oxygen-producing inert anodes for SOM process
AU2007226754B2 (en) * 2006-03-10 2011-01-20 Elkem As Method for electrolytic production and refining of metals
US7901561B2 (en) * 2006-03-10 2011-03-08 Elkem As Method for electrolytic production and refining of metals
JP2008266766A (ja) * 2006-12-26 2008-11-06 Nikko Kinzoku Kk ハロゲン系溶液からの板状電気銅の製造方法
CN101070598B (zh) * 2007-03-26 2010-07-14 中南大学 一种熔盐电解法制备太阳级硅材料的方法
US7744734B2 (en) * 2007-08-24 2010-06-29 Battelle Energy Alliance, Llc High current density cathode for electrorefining in molten electrolyte
US8460535B2 (en) 2009-04-30 2013-06-11 Infinium, Inc. Primary production of elements

Also Published As

Publication number Publication date
CN102575364A (zh) 2012-07-11
US8460535B2 (en) 2013-06-11
KR20120024671A (ko) 2012-03-14
US20100276297A1 (en) 2010-11-04
CN102575364B (zh) 2014-11-12
TW201042089A (en) 2010-12-01
TWI479051B (zh) 2015-04-01
US20130264212A1 (en) 2013-10-10
EP2425042A1 (en) 2012-03-07
US8795506B2 (en) 2014-08-05
JP2012525502A (ja) 2012-10-22
HK1173197A1 (en) 2013-05-10
CA2759805C (en) 2014-01-21
WO2010126597A1 (en) 2010-11-04
CA2759805A1 (en) 2010-11-04

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