JP5778376B2 - コーティングプロセスにおいて材料を噴霧化する方法 - Google Patents

コーティングプロセスにおいて材料を噴霧化する方法 Download PDF

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Publication number
JP5778376B2
JP5778376B2 JP2008548728A JP2008548728A JP5778376B2 JP 5778376 B2 JP5778376 B2 JP 5778376B2 JP 2008548728 A JP2008548728 A JP 2008548728A JP 2008548728 A JP2008548728 A JP 2008548728A JP 5778376 B2 JP5778376 B2 JP 5778376B2
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Japan
Prior art keywords
supply conduit
liquid
gas
substrate
atomizer
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Expired - Fee Related
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JP2008548728A
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English (en)
Japanese (ja)
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JP2009526127A5 (https=
JP2009526127A (ja
Inventor
ジェイ. アンダーソン,エドワード
ジェイ. アンダーソン,エドワード
アール. ラモス,ジーザス
アール. ラモス,ジーザス
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3M Innovative Properties Co
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3M Innovative Properties Co
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54Apparatus specially adapted for continuous coating
    • C23C16/545Apparatus specially adapted for continuous coating for coating elongated substrates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B13/00Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
    • B05B13/02Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
    • B05B13/04Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation
    • B05B13/0463Installation or apparatus for applying liquid or other fluent material to moving work of indefinite length
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B17/00Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups
    • B05B17/04Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods
    • B05B17/06Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations
    • B05B17/0607Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02Spray pistols; Apparatus for discharge
    • B05B7/04Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge
    • B05B7/0416Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid
    • B05B7/0441Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid with one inner conduit of liquid surrounded by an external conduit of gas upstream the mixing chamber
    • B05B7/045Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid with one inner conduit of liquid surrounded by an external conduit of gas upstream the mixing chamber the gas and liquid flows being parallel just upstream the mixing chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/02Processes for applying liquids or other fluent materials performed by spraying
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/02Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber

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  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Dispersion Chemistry (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Electroluminescent Light Sources (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Nozzles (AREA)
  • Special Spraying Apparatus (AREA)
JP2008548728A 2005-12-29 2006-12-28 コーティングプロセスにおいて材料を噴霧化する方法 Expired - Fee Related JP5778376B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US75491405P 2005-12-29 2005-12-29
US60/754,914 2005-12-29
PCT/US2006/049432 WO2008030262A1 (en) 2005-12-29 2006-12-28 Method for atomizing material for coating processes

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2014042504A Division JP2014133948A (ja) 2005-12-29 2014-03-05 コーティングプロセスにおいて材料を噴霧化する方法

Publications (3)

Publication Number Publication Date
JP2009526127A JP2009526127A (ja) 2009-07-16
JP2009526127A5 JP2009526127A5 (https=) 2015-07-02
JP5778376B2 true JP5778376B2 (ja) 2015-09-16

Family

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Family Applications (2)

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JP2008548728A Expired - Fee Related JP5778376B2 (ja) 2005-12-29 2006-12-28 コーティングプロセスにおいて材料を噴霧化する方法
JP2014042504A Pending JP2014133948A (ja) 2005-12-29 2014-03-05 コーティングプロセスにおいて材料を噴霧化する方法

Family Applications After (1)

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JP2014042504A Pending JP2014133948A (ja) 2005-12-29 2014-03-05 コーティングプロセスにおいて材料を噴霧化する方法

Country Status (7)

Country Link
US (1) US8658248B2 (https=)
EP (1) EP1969618B1 (https=)
JP (2) JP5778376B2 (https=)
KR (3) KR20140121888A (https=)
CN (1) CN101351868B (https=)
BR (1) BRPI0620597A2 (https=)
WO (1) WO2008030262A1 (https=)

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US20040202708A1 (en) 2003-04-14 2004-10-14 3M Innovative Properties Company Transdermal drug delivery device with translucent inorganic barrier layer
US7052772B2 (en) 2003-08-14 2006-05-30 3M Innovative Properties Company Material for packaging electronic components
FR2859650B1 (fr) * 2003-09-12 2006-02-24 Gloster Sante Europ Appareil de brumisation d'une composition liquide
JP4590881B2 (ja) 2004-02-13 2010-12-01 株式会社ユーテック Cvd用気化器、溶液気化式cvd装置

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EP1969618B1 (en) 2018-01-24
US8658248B2 (en) 2014-02-25
US20080292810A1 (en) 2008-11-27
CN101351868B (zh) 2013-03-13
BRPI0620597A2 (pt) 2011-11-16
EP1969618A4 (en) 2012-02-22
KR20130130062A (ko) 2013-11-29
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CN101351868A (zh) 2009-01-21
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