JP5765235B2 - 感光性組成物、それから形成された硬化膜および硬化膜を有する素子 - Google Patents

感光性組成物、それから形成された硬化膜および硬化膜を有する素子 Download PDF

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JP5765235B2
JP5765235B2 JP2011551347A JP2011551347A JP5765235B2 JP 5765235 B2 JP5765235 B2 JP 5765235B2 JP 2011551347 A JP2011551347 A JP 2011551347A JP 2011551347 A JP2011551347 A JP 2011551347A JP 5765235 B2 JP5765235 B2 JP 5765235B2
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photosensitive composition
positive photosensitive
weight
compound
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JPWO2012029734A1 (ja
Inventor
藤原　健典
健典 藤原
諏訪　充史
充史 諏訪
圭一 内田
圭一 内田
将 福原
将 福原
妹尾　将秀
将秀 妹尾
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Toray Industries Inc
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Toray Industries Inc
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/05—Alcohols; Metal alcoholates
    • C08K5/057—Metal alcoholates
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
JP2011551347A 2010-09-02 2011-08-30 感光性組成物、それから形成された硬化膜および硬化膜を有する素子 Active JP5765235B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011551347A JP5765235B2 (ja) 2010-09-02 2011-08-30 感光性組成物、それから形成された硬化膜および硬化膜を有する素子

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2010196348 2010-09-02
JP2010196348 2010-09-02
PCT/JP2011/069515 WO2012029734A1 (ja) 2010-09-02 2011-08-30 感光性組成物、それから形成された硬化膜および硬化膜を有する素子
JP2011551347A JP5765235B2 (ja) 2010-09-02 2011-08-30 感光性組成物、それから形成された硬化膜および硬化膜を有する素子

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JPWO2012029734A1 JPWO2012029734A1 (ja) 2013-10-28
JP5765235B2 true JP5765235B2 (ja) 2015-08-19

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JP (1) JP5765235B2 (ko)
KR (1) KR101842891B1 (ko)
CN (1) CN103180784B (ko)
SG (1) SG188386A1 (ko)
TW (1) TWI490649B (ko)
WO (1) WO2012029734A1 (ko)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI484293B (zh) * 2012-11-07 2015-05-11 Chi Mei Corp 感光性樹脂組成物及其應用
KR20140058847A (ko) * 2012-11-07 2014-05-15 롬엔드하스전자재료코리아유한회사 유무기 복합 실록산계 고분자 및 이를 포함하는 포지티브형 감광성 수지 조성물
KR20150118582A (ko) * 2013-02-12 2015-10-22 도레이 카부시키가이샤 감광성 수지 조성물, 그것을 열경화시켜서 이루어지는 보호막 또는 절연막, 그것을 사용한 터치 패널 및 그 제조 방법
JP6295950B2 (ja) * 2013-03-28 2018-03-20 東レ株式会社 感光性樹脂組成物、保護膜又は絶縁膜、タッチパネル及びその製造方法
JP6384678B2 (ja) * 2013-10-21 2018-09-05 日産化学株式会社 ポジ型感光性樹脂組成物
JP6468853B2 (ja) * 2015-01-19 2019-02-13 東京応化工業株式会社 ポジ型感光性樹脂組成物及び硬化膜
CN107207868B (zh) * 2015-02-19 2020-11-06 日本瑞翁株式会社 树脂组合物、树脂膜及电子部件
KR101881943B1 (ko) * 2015-02-26 2018-07-26 삼성에스디아이 주식회사 포지티브형 감광성 수지 조성물, 감광성 수지막 및 이를 이용한 표시 소자
CN104789041B (zh) * 2015-04-23 2017-02-01 湖北金三峡印务有限公司 锆螯合物改性的复合碱可溶乳液及其制备的高复溶性水性油墨及方法
KR20170053561A (ko) * 2015-11-06 2017-05-16 롬엔드하스전자재료코리아유한회사 감광성 수지 조성물 및 이로부터 제조된 경화막
CN105301901A (zh) * 2015-11-16 2016-02-03 北京中科紫鑫科技有限责任公司 一种正性光刻胶组合物的制备方法
CN105301904B (zh) * 2015-11-16 2017-05-31 北京中科紫鑫科技有限责任公司 一种光刻胶组合物及其制备方法
CN105301903A (zh) * 2015-11-16 2016-02-03 北京中科紫鑫科技有限责任公司 一种形成光刻胶组合物
CN105301916A (zh) * 2015-11-16 2016-02-03 北京中科紫鑫科技有限责任公司 一种光刻胶图案的形成方法
CN109791352B (zh) * 2016-09-30 2022-07-29 东丽株式会社 感光性树脂组合物、导电性图案的制造方法、基板、触摸面板及显示器
JP6807226B2 (ja) * 2016-12-09 2021-01-06 東京応化工業株式会社 基材上に平坦化膜又はマイクロレンズを形成するために用いられるエネルギー感受性組成物、硬化体の製造方法、硬化体、マイクロレンズの製造方法、及びｃｍｏｓイメージセンサ
EP3769156B1 (en) * 2018-03-23 2024-03-20 Merck Patent GmbH Negative-working ultra thick film photoresist
KR20190136248A (ko) * 2018-05-30 2019-12-10 롬엔드하스전자재료코리아유한회사 포지티브형 감광성 수지 조성물 및 이를 이용한 경화막
JP7264771B2 (ja) * 2019-08-30 2023-04-25 信越化学工業株式会社 レジスト材料及びパターン形成方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004295116A (ja) * 2003-03-10 2004-10-21 Fuji Photo Film Co Ltd 染料含有硬化性組成物、カラーフィルタ及びその製造方法
WO2005081065A1 (ja) * 2004-02-20 2005-09-01 Nippon Soda Co., Ltd. 光感応性基体及びパターニング方法
JP2006091490A (ja) * 2004-09-24 2006-04-06 Jsr Corp 層間絶縁膜形成用感放射線性樹脂組成物および層間絶縁膜
WO2009101885A1 (ja) * 2008-02-14 2009-08-20 Kyowa Hakko Chemical Co., Ltd. ポリイミド
JP2010170082A (ja) * 2008-12-25 2010-08-05 Toray Ind Inc 感光性組成物、それから形成された硬化膜、および硬化膜を有する素子

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5764863B2 (ja) * 2005-10-28 2015-08-19 東レ株式会社 固体撮像素子
JP4932414B2 (ja) * 2005-11-01 2012-05-16 富士フイルム株式会社 ネガ型染料含有感放射線性硬化性組成物、カラーフィルタおよびその製造方法
CN102393607B (zh) * 2005-11-30 2013-11-13 住友电木株式会社 正型感光性树脂组合物及使用该组合物的半导体器件和显示器
JP4899844B2 (ja) * 2006-12-07 2012-03-21 住友ベークライト株式会社 ポジ型感光性樹脂組成物、硬化膜、保護膜、絶縁膜およびそれを用いた半導体装置、表示体装置。
KR101428718B1 (ko) * 2007-02-02 2014-09-24 삼성디스플레이 주식회사 감광성 유기물, 이의 도포 방법, 이를 이용한 유기막 패턴형성 방법, 이로써 제조되는 표시 장치
JP5003375B2 (ja) * 2007-09-20 2012-08-15 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法
JP2010085758A (ja) * 2008-09-30 2010-04-15 Fujifilm Corp ジピロメテン系化合物及びその互変異性体、着色硬化性組成物、カラーフィルタ及びその製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004295116A (ja) * 2003-03-10 2004-10-21 Fuji Photo Film Co Ltd 染料含有硬化性組成物、カラーフィルタ及びその製造方法
WO2005081065A1 (ja) * 2004-02-20 2005-09-01 Nippon Soda Co., Ltd. 光感応性基体及びパターニング方法
JP2006091490A (ja) * 2004-09-24 2006-04-06 Jsr Corp 層間絶縁膜形成用感放射線性樹脂組成物および層間絶縁膜
WO2009101885A1 (ja) * 2008-02-14 2009-08-20 Kyowa Hakko Chemical Co., Ltd. ポリイミド
JP2010170082A (ja) * 2008-12-25 2010-08-05 Toray Ind Inc 感光性組成物、それから形成された硬化膜、および硬化膜を有する素子

Also Published As

Publication number Publication date
JPWO2012029734A1 (ja) 2013-10-28
KR20130108289A (ko) 2013-10-02
SG188386A1 (en) 2013-04-30
CN103180784A (zh) 2013-06-26
WO2012029734A1 (ja) 2012-03-08
TW201211697A (en) 2012-03-16
CN103180784B (zh) 2016-01-20
TWI490649B (zh) 2015-07-01
KR101842891B1 (ko) 2018-05-14

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