JP5457627B2 - 反応ノズル、気相加水分解処理装置および気相加水分解処理方法 - Google Patents

反応ノズル、気相加水分解処理装置および気相加水分解処理方法 Download PDF

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Publication number
JP5457627B2
JP5457627B2 JP2007243652A JP2007243652A JP5457627B2 JP 5457627 B2 JP5457627 B2 JP 5457627B2 JP 2007243652 A JP2007243652 A JP 2007243652A JP 2007243652 A JP2007243652 A JP 2007243652A JP 5457627 B2 JP5457627 B2 JP 5457627B2
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JP
Japan
Prior art keywords
nozzle
fluid
gas
reaction
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007243652A
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English (en)
Japanese (ja)
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JP2009072688A (ja
Inventor
邦男 渡邉
忍 箱崎
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Kureha Ecology Management Co Ltd
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Kureha Ecology Management Co Ltd
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Publication date
Application filed by Kureha Ecology Management Co Ltd filed Critical Kureha Ecology Management Co Ltd
Priority to JP2007243652A priority Critical patent/JP5457627B2/ja
Priority to PCT/JP2008/063912 priority patent/WO2009037923A1/fr
Priority to CN200880107964.9A priority patent/CN101801524B/zh
Publication of JP2009072688A publication Critical patent/JP2009072688A/ja
Application granted granted Critical
Publication of JP5457627B2 publication Critical patent/JP5457627B2/ja
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23G—CREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
    • F23G7/00—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals
    • F23G7/04—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste liquors, e.g. sulfite liquors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/26—Nozzle-type reactors, i.e. the distribution of the initial reactants within the reactor is effected by their introduction or injection through nozzles
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23D—BURNERS
    • F23D11/00—Burners using a direct spraying action of liquid droplets or vaporised liquid into the combustion space
    • F23D11/10—Burners using a direct spraying action of liquid droplets or vaporised liquid into the combustion space the spraying being induced by a gaseous medium, e.g. water vapour
    • F23D11/108—Burners using a direct spraying action of liquid droplets or vaporised liquid into the combustion space the spraying being induced by a gaseous medium, e.g. water vapour medium and fuel intersecting downstream of the burner outlet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
    • B01J2219/00119—Heat exchange inside a feeding nozzle or nozzle reactor

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Treating Waste Gases (AREA)
  • Nozzles (AREA)
  • Silicon Compounds (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP2007243652A 2007-09-20 2007-09-20 反応ノズル、気相加水分解処理装置および気相加水分解処理方法 Expired - Fee Related JP5457627B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2007243652A JP5457627B2 (ja) 2007-09-20 2007-09-20 反応ノズル、気相加水分解処理装置および気相加水分解処理方法
PCT/JP2008/063912 WO2009037923A1 (fr) 2007-09-20 2008-08-01 Buse pour réaction, appareil d'hydrolyse en phase vapeur et procédé d'hydrolyse en phase vapeur
CN200880107964.9A CN101801524B (zh) 2007-09-20 2008-08-01 反应喷嘴、气相水解处理装置和气相水解处理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007243652A JP5457627B2 (ja) 2007-09-20 2007-09-20 反応ノズル、気相加水分解処理装置および気相加水分解処理方法

Publications (2)

Publication Number Publication Date
JP2009072688A JP2009072688A (ja) 2009-04-09
JP5457627B2 true JP5457627B2 (ja) 2014-04-02

Family

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Family Applications (1)

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JP2007243652A Expired - Fee Related JP5457627B2 (ja) 2007-09-20 2007-09-20 反応ノズル、気相加水分解処理装置および気相加水分解処理方法

Country Status (3)

Country Link
JP (1) JP5457627B2 (fr)
CN (1) CN101801524B (fr)
WO (1) WO2009037923A1 (fr)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5440766B2 (ja) 2009-07-29 2014-03-12 日立工機株式会社 インパクト工具
CN101941707B (zh) * 2010-03-11 2012-12-05 赤峰盛森硅业科技发展有限公司 小分子烷烃燃烧制备气相二氧化硅的方法与装置
CA2823341A1 (fr) * 2010-12-29 2012-07-05 Ivanhoe Energy Inc. Buses d'alimentation de reacteur ameliorees
CN102042603B (zh) * 2010-12-31 2012-06-06 中国航天科技集团公司第六研究院第十一研究所 可调节高效废酸组合燃烧器
US8593634B1 (en) * 2012-06-15 2013-11-26 Larry Y Igarashi Custom cosmetic blending machine
US9861973B2 (en) * 2012-05-10 2018-01-09 University Of Connecticut Methods and apparatus for making catalyst films
WO2015002281A1 (fr) * 2013-07-04 2015-01-08 コニカミノルタ株式会社 Panneau de scintillateur et son procédé de production
CN106345622B (zh) * 2016-11-22 2018-07-06 镇江市和云工业废水处置有限公司 一种废液焚烧系统喷液喷头
CA3048054A1 (fr) * 2017-02-23 2018-08-30 Wacker Chemie Ag Procede et dispositif d'hydrolyse d'un compose
CN108126644B (zh) * 2018-01-19 2023-08-29 德山化工（浙江）有限公司 氯硅烷液体中和处理装置及处理方法
KR101906495B1 (ko) * 2018-03-21 2018-10-10 (주)청도이엔피 미세먼지 조대화 장치 및 이를 이용하여 미세먼지를 제거하는 방법
CN108190898B (zh) * 2018-03-27 2019-07-23 乐山师范学院 一种制备二氧化硅的反应器
CN108644600A (zh) * 2018-05-18 2018-10-12 东莞安默琳机械制造技术有限公司 微量润滑喷嘴
JP7024646B2 (ja) * 2018-07-24 2022-02-24 日本製鉄株式会社 超音波処理装置及びファインバブルの供給方法
JP6533859B1 (ja) * 2018-10-29 2019-06-19 株式会社アサカ理研 炭酸リチウムの製造装置
JP7190338B2 (ja) * 2018-11-21 2022-12-15 太平洋セメント株式会社 無機酸化物粒子の製造方法
DE102019209898A1 (de) * 2019-07-04 2021-01-07 Schmid Silicon Technology Gmbh Vorrichtung und Verfahren zur Bildung von flüssigem Silizium
KR102352239B1 (ko) * 2020-05-07 2022-01-18 주식회사 나노브릭 시인성을 높이는 인쇄 장치 및 인쇄 방법과 이를 이용하여 인쇄된 인쇄물
CN113181852B (zh) * 2021-05-25 2023-03-24 湖北理工学院 利用微反应器制备微粉化药物的方法及设备
CN113457869B (zh) * 2021-09-01 2021-11-16 苏州好博医疗器械股份有限公司 一种蒸汽喷射设备的喷头保护装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5217703A (en) * 1991-08-28 1993-06-08 United Technologies Corporation Method of manufacture of iron oxide particles
JPH06226085A (ja) * 1993-02-03 1994-08-16 Asahi Glass Co Ltd 酸化物微粒子の製造装置および製造方法
JP3395284B2 (ja) * 1993-10-05 2003-04-07 宇部興産株式会社 高純度マグネシア微粉末の製造方法
JP3480083B2 (ja) * 1994-10-11 2003-12-15 信越化学工業株式会社 微細シリカの製造方法
DE19725955C1 (de) * 1997-06-19 1999-01-21 Heraeus Quarzglas Verfahren zur Herstellung eines Quarzglasrohlings und dafür geeignete Vorrichtung
JP4420690B2 (ja) * 2004-02-04 2010-02-24 ホソカワミクロン株式会社 微粒子製造方法及び微粒子製造装置

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Publication number Publication date
CN101801524B (zh) 2014-04-16
CN101801524A (zh) 2010-08-11
WO2009037923A1 (fr) 2009-03-26
JP2009072688A (ja) 2009-04-09

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