JP5352190B2 - 光電変換装置 - Google Patents
光電変換装置 Download PDFInfo
- Publication number
- JP5352190B2 JP5352190B2 JP2008280835A JP2008280835A JP5352190B2 JP 5352190 B2 JP5352190 B2 JP 5352190B2 JP 2008280835 A JP2008280835 A JP 2008280835A JP 2008280835 A JP2008280835 A JP 2008280835A JP 5352190 B2 JP5352190 B2 JP 5352190B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor layer
- electrode
- layer
- single crystal
- unit cell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/17—Photovoltaic cells having only PIN junction potential barriers
- H10F10/172—Photovoltaic cells having only PIN junction potential barriers comprising multiple PIN junctions, e.g. tandem cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
Landscapes
- Photovoltaic Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008280835A JP5352190B2 (ja) | 2007-11-09 | 2008-10-31 | 光電変換装置 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007292650 | 2007-11-09 | ||
| JP2007292650 | 2007-11-09 | ||
| JP2008280835A JP5352190B2 (ja) | 2007-11-09 | 2008-10-31 | 光電変換装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009135473A JP2009135473A (ja) | 2009-06-18 |
| JP2009135473A5 JP2009135473A5 (enExample) | 2011-12-08 |
| JP5352190B2 true JP5352190B2 (ja) | 2013-11-27 |
Family
ID=40622575
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008280835A Expired - Fee Related JP5352190B2 (ja) | 2007-11-09 | 2008-10-31 | 光電変換装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8394655B2 (enExample) |
| JP (1) | JP5352190B2 (enExample) |
| KR (1) | KR101608953B1 (enExample) |
| WO (1) | WO2009060808A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20190045510A (ko) * | 2017-10-24 | 2019-05-03 | 경희대학교 산학협력단 | 나노와이어 어레이를 포함하는 태양 전지 및 이의 제조 방법 |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008039461A2 (en) * | 2006-09-27 | 2008-04-03 | Thinsilicon Corp. | Back contact device for photovoltaic cells and method of manufacturing a back contact |
| US20090139558A1 (en) * | 2007-11-29 | 2009-06-04 | Shunpei Yamazaki | Photoelectric conversion device and manufacturing method thereof |
| JP5248994B2 (ja) * | 2007-11-30 | 2013-07-31 | 株式会社半導体エネルギー研究所 | 光電変換装置の製造方法 |
| EP2075850A3 (en) * | 2007-12-28 | 2011-08-24 | Semiconductor Energy Laboratory Co, Ltd. | Photoelectric conversion device and manufacturing method thereof |
| US8017429B2 (en) * | 2008-02-19 | 2011-09-13 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing photoelectric conversion device |
| US8748799B2 (en) | 2010-12-14 | 2014-06-10 | Zena Technologies, Inc. | Full color single pixel including doublet or quadruplet si nanowires for image sensors |
| US9082673B2 (en) | 2009-10-05 | 2015-07-14 | Zena Technologies, Inc. | Passivated upstanding nanostructures and methods of making the same |
| US9000353B2 (en) | 2010-06-22 | 2015-04-07 | President And Fellows Of Harvard College | Light absorption and filtering properties of vertically oriented semiconductor nano wires |
| US8866065B2 (en) | 2010-12-13 | 2014-10-21 | Zena Technologies, Inc. | Nanowire arrays comprising fluorescent nanowires |
| US9515218B2 (en) | 2008-09-04 | 2016-12-06 | Zena Technologies, Inc. | Vertical pillar structured photovoltaic devices with mirrors and optical claddings |
| US20140007928A1 (en) * | 2012-07-06 | 2014-01-09 | Zena Technologies, Inc. | Multi-junction photovoltaic devices |
| US9478685B2 (en) | 2014-06-23 | 2016-10-25 | Zena Technologies, Inc. | Vertical pillar structured infrared detector and fabrication method for the same |
| US8229255B2 (en) | 2008-09-04 | 2012-07-24 | Zena Technologies, Inc. | Optical waveguides in image sensors |
| US8735797B2 (en) | 2009-12-08 | 2014-05-27 | Zena Technologies, Inc. | Nanowire photo-detector grown on a back-side illuminated image sensor |
| US9343490B2 (en) | 2013-08-09 | 2016-05-17 | Zena Technologies, Inc. | Nanowire structured color filter arrays and fabrication method of the same |
| US8546742B2 (en) | 2009-06-04 | 2013-10-01 | Zena Technologies, Inc. | Array of nanowires in a single cavity with anti-reflective coating on substrate |
| US9299866B2 (en) | 2010-12-30 | 2016-03-29 | Zena Technologies, Inc. | Nanowire array based solar energy harvesting device |
| US9406709B2 (en) | 2010-06-22 | 2016-08-02 | President And Fellows Of Harvard College | Methods for fabricating and using nanowires |
| US8299472B2 (en) | 2009-12-08 | 2012-10-30 | Young-June Yu | Active pixel sensor with nanowire structured photodetectors |
| US8274039B2 (en) | 2008-11-13 | 2012-09-25 | Zena Technologies, Inc. | Vertical waveguides with various functionality on integrated circuits |
| US8835831B2 (en) | 2010-06-22 | 2014-09-16 | Zena Technologies, Inc. | Polarized light detecting device and fabrication methods of the same |
| KR101308324B1 (ko) * | 2008-09-29 | 2013-09-17 | 씬실리콘 코포레이션 | 단일체로 통합된 태양광 모듈 |
| US20100282314A1 (en) * | 2009-05-06 | 2010-11-11 | Thinsilicion Corporation | Photovoltaic cells and methods to enhance light trapping in semiconductor layer stacks |
| WO2010144421A2 (en) | 2009-06-10 | 2010-12-16 | Thinsilicon Corporation | Photovoltaic modules and methods of manufacturing photovoltaic modules having multiple semiconductor layer stacks |
| US20110114156A1 (en) * | 2009-06-10 | 2011-05-19 | Thinsilicon Corporation | Photovoltaic modules having a built-in bypass diode and methods for manufacturing photovoltaic modules having a built-in bypass diode |
| KR101785997B1 (ko) | 2009-10-30 | 2017-10-17 | 주식회사 골드피크이노베이션즈 | 무선통신 시스템에서 요소 반송파 집합 정보 전송방법 및 그 기지국, 단말의 수신방법 |
| US8704083B2 (en) | 2010-02-11 | 2014-04-22 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and fabrication method thereof |
| JP2013058562A (ja) | 2011-09-07 | 2013-03-28 | Semiconductor Energy Lab Co Ltd | 光電変換装置 |
| KR101832230B1 (ko) | 2012-03-05 | 2018-04-13 | 엘지전자 주식회사 | 태양 전지 및 이의 제조 방법 |
| KR20140082012A (ko) * | 2012-12-21 | 2014-07-02 | 엘지전자 주식회사 | 태양 전지 및 이의 제조 방법 |
| FR3073081B1 (fr) * | 2017-10-27 | 2019-11-22 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Substrat semi-conducteur protege pour son transport et sa manipulation |
Family Cites Families (56)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4180618A (en) | 1977-07-27 | 1979-12-25 | Corning Glass Works | Thin silicon film electronic device |
| JPS58180069A (ja) * | 1982-04-15 | 1983-10-21 | Agency Of Ind Science & Technol | 半導体装置 |
| US4496788A (en) | 1982-12-29 | 1985-01-29 | Osaka Transformer Co., Ltd. | Photovoltaic device |
| US4633034A (en) | 1985-02-08 | 1986-12-30 | Energy Conversion Devices, Inc. | Photovoltaic device and method |
| US4665277A (en) | 1986-03-11 | 1987-05-12 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Floating emitter solar cell |
| CA1303194C (en) | 1987-07-21 | 1992-06-09 | Katsumi Nakagawa | Photovoltaic element with a semiconductor layer comprising non-single crystal material containing at least zn, se and h in an amount of 1 to40 atomic % |
| ES2073407T3 (es) | 1987-11-20 | 1995-08-16 | Canon Kk | Elemento fotovoltaico con union pin, celulas tandem y triples. |
| JPH01227307A (ja) | 1988-03-08 | 1989-09-11 | Asahi Glass Co Ltd | 透明導電体 |
| US5002618A (en) | 1989-01-21 | 1991-03-26 | Canon Kabushiki Kaisha | Pin heterojunction photovoltaic elements with polycrystal BAs(H,F) semiconductor film |
| US5002617A (en) | 1989-01-21 | 1991-03-26 | Canon Kabushiki Kaisha | Pin heterojunction photovoltaic elements with polycrystal AlAs(H,F) semiconductor film |
| JP2829653B2 (ja) | 1989-01-21 | 1998-11-25 | キヤノン株式会社 | 光起電力素子 |
| JPH02192771A (ja) | 1989-01-21 | 1990-07-30 | Canon Inc | 光起電力素子 |
| EP0481094B1 (en) | 1990-05-07 | 2000-08-09 | Canon Kabushiki Kaisha | Solar cell |
| JPH04276665A (ja) | 1991-03-04 | 1992-10-01 | Canon Inc | 集積型太陽電池 |
| JP3073327B2 (ja) | 1992-06-30 | 2000-08-07 | キヤノン株式会社 | 堆積膜形成方法 |
| JP2761156B2 (ja) | 1992-06-30 | 1998-06-04 | キヤノン株式会社 | 光起電力素子及びその製造方法、並びにそれを用いた発電装置 |
| JPH0644638A (ja) | 1992-07-24 | 1994-02-18 | Sony Corp | 録音装置 |
| JP3360919B2 (ja) | 1993-06-11 | 2003-01-07 | 三菱電機株式会社 | 薄膜太陽電池の製造方法,及び薄膜太陽電池 |
| JPH07106617A (ja) * | 1993-09-30 | 1995-04-21 | Canon Inc | 透明電極及びその形成方法並びに該透明電極を用いた太陽電池 |
| JP3571785B2 (ja) | 1993-12-28 | 2004-09-29 | キヤノン株式会社 | 堆積膜形成方法及び堆積膜形成装置 |
| JP2984537B2 (ja) | 1994-03-25 | 1999-11-29 | キヤノン株式会社 | 光起電力素子 |
| US5635408A (en) | 1994-04-28 | 1997-06-03 | Canon Kabushiki Kaisha | Method of producing a semiconductor device |
| JP3381443B2 (ja) | 1995-02-02 | 2003-02-24 | ソニー株式会社 | 基体から半導体層を分離する方法、半導体素子の製造方法およびsoi基板の製造方法 |
| US5736431A (en) | 1995-02-28 | 1998-04-07 | Semiconductor Energy Laboratory Co., Ltd. | Method for producing thin film solar battery |
| JPH08255762A (ja) * | 1995-03-17 | 1996-10-01 | Nec Corp | 半導体デバイスの製造方法 |
| JPH1093122A (ja) * | 1996-09-10 | 1998-04-10 | Nippon Telegr & Teleph Corp <Ntt> | 薄膜太陽電池の製造方法 |
| US6756289B1 (en) | 1996-12-27 | 2004-06-29 | Canon Kabushiki Kaisha | Method of producing semiconductor member and method of producing solar cell |
| EP0851513B1 (en) | 1996-12-27 | 2007-11-21 | Canon Kabushiki Kaisha | Method of producing semiconductor member and method of producing solar cell |
| US6033974A (en) | 1997-05-12 | 2000-03-07 | Silicon Genesis Corporation | Method for controlled cleaving process |
| JPH10335683A (ja) * | 1997-05-28 | 1998-12-18 | Ion Kogaku Kenkyusho:Kk | タンデム型太陽電池およびその製造方法 |
| JPH1140832A (ja) | 1997-07-17 | 1999-02-12 | Ion Kogaku Kenkyusho:Kk | 薄膜太陽電池およびその製造方法 |
| JPH11274539A (ja) * | 1998-01-21 | 1999-10-08 | Canon Inc | 透明導電層付き基板及び光起電力素子 |
| US6951689B1 (en) | 1998-01-21 | 2005-10-04 | Canon Kabushiki Kaisha | Substrate with transparent conductive layer, and photovoltaic element |
| JP4208281B2 (ja) * | 1998-02-26 | 2009-01-14 | キヤノン株式会社 | 積層型光起電力素子 |
| US6331208B1 (en) | 1998-05-15 | 2001-12-18 | Canon Kabushiki Kaisha | Process for producing solar cell, process for producing thin-film semiconductor, process for separating thin-film semiconductor, and process for forming semiconductor |
| JP2000150940A (ja) * | 1998-11-18 | 2000-05-30 | Denso Corp | 半導体微粒子集合体及びその製造方法 |
| JP4379943B2 (ja) * | 1999-04-07 | 2009-12-09 | 株式会社デンソー | 半導体基板の製造方法および半導体基板製造装置 |
| JP2001068709A (ja) * | 1999-08-30 | 2001-03-16 | Kyocera Corp | 薄膜太陽電池 |
| JP4452789B2 (ja) * | 1999-09-01 | 2010-04-21 | 独立行政法人 日本原子力研究開発機構 | シリコン系結晶薄板の製造方法および光電変換素子用基板の製造方法 |
| JP2001160540A (ja) | 1999-09-22 | 2001-06-12 | Canon Inc | 半導体装置の製造方法、液相成長法及び液相成長装置、太陽電池 |
| JP4450126B2 (ja) | 2000-01-21 | 2010-04-14 | 日新電機株式会社 | シリコン系結晶薄膜の形成方法 |
| JP3513592B2 (ja) | 2000-09-25 | 2004-03-31 | 独立行政法人産業技術総合研究所 | 太陽電池の製造方法 |
| JP2002348198A (ja) | 2001-05-28 | 2002-12-04 | Nissin Electric Co Ltd | 半導体素子エピタキシャル成長用基板及びその製造方法 |
| JP2003017723A (ja) | 2001-06-29 | 2003-01-17 | Shin Etsu Handotai Co Ltd | 半導体薄膜の製造方法及び太陽電池の製造方法 |
| JP4103447B2 (ja) | 2002-04-30 | 2008-06-18 | 株式会社Ihi | 大面積単結晶シリコン基板の製造方法 |
| JP2004014958A (ja) | 2002-06-11 | 2004-01-15 | Fuji Electric Holdings Co Ltd | 薄膜多結晶太陽電池とその製造方法 |
| JP2004087667A (ja) | 2002-08-26 | 2004-03-18 | Hitachi Cable Ltd | 結晶シリコン系薄膜半導体装置の製造方法 |
| US6818529B2 (en) | 2002-09-12 | 2004-11-16 | Applied Materials, Inc. | Apparatus and method for forming a silicon film across the surface of a glass substrate |
| JP2004296650A (ja) * | 2003-03-26 | 2004-10-21 | Canon Inc | 積層型光起電力素子 |
| WO2004102677A1 (ja) | 2003-05-13 | 2004-11-25 | Asahi Glass Company, Limited | 太陽電池用透明導電性基板およびその製造方法 |
| JP2005050905A (ja) | 2003-07-30 | 2005-02-24 | Sharp Corp | シリコン薄膜太陽電池の製造方法 |
| JP2005268682A (ja) | 2004-03-22 | 2005-09-29 | Canon Inc | 半導体基材及び太陽電池の製造方法 |
| US20070193622A1 (en) | 2004-03-31 | 2007-08-23 | Hironobu Sai | Laminate Type Thin-Film Solar Cell And Method For Manufacturing The Same |
| CN101512721A (zh) | 2006-04-05 | 2009-08-19 | 硅源公司 | 利用层转移工艺制造太阳能电池的方法和结构 |
| EP2135295A4 (en) | 2007-04-06 | 2014-05-21 | Semiconductor Energy Lab | Photovoltaic module and method for its production |
| KR101362688B1 (ko) | 2007-04-13 | 2014-02-17 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 광전 변환 장치 및 그 제조 방법 |
-
2008
- 2008-10-28 KR KR1020107012348A patent/KR101608953B1/ko not_active Expired - Fee Related
- 2008-10-28 WO PCT/JP2008/069992 patent/WO2009060808A1/en not_active Ceased
- 2008-10-31 JP JP2008280835A patent/JP5352190B2/ja not_active Expired - Fee Related
- 2008-11-04 US US12/264,541 patent/US8394655B2/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20190045510A (ko) * | 2017-10-24 | 2019-05-03 | 경희대학교 산학협력단 | 나노와이어 어레이를 포함하는 태양 전지 및 이의 제조 방법 |
| KR102006074B1 (ko) * | 2017-10-24 | 2019-07-31 | 경희대학교 산학협력단 | 나노와이어 어레이를 포함하는 태양 전지 및 이의 제조 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009135473A (ja) | 2009-06-18 |
| US8394655B2 (en) | 2013-03-12 |
| US20090120498A1 (en) | 2009-05-14 |
| KR101608953B1 (ko) | 2016-04-04 |
| KR20100088151A (ko) | 2010-08-06 |
| WO2009060808A1 (en) | 2009-05-14 |
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