JP5269323B2 - 有機絶縁膜用樹脂組成物及びその製造方法、前記樹脂組成物を含む表示板 - Google Patents
有機絶縁膜用樹脂組成物及びその製造方法、前記樹脂組成物を含む表示板 Download PDFInfo
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- JP5269323B2 JP5269323B2 JP2007014523A JP2007014523A JP5269323B2 JP 5269323 B2 JP5269323 B2 JP 5269323B2 JP 2007014523 A JP2007014523 A JP 2007014523A JP 2007014523 A JP2007014523 A JP 2007014523A JP 5269323 B2 JP5269323 B2 JP 5269323B2
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B41/00—Circuit arrangements or apparatus for igniting or operating discharge lamps
- H05B41/14—Circuit arrangements
- H05B41/26—Circuit arrangements in which the lamp is fed by power derived from DC by means of a converter, e.g. by high-voltage DC
- H05B41/28—Circuit arrangements in which the lamp is fed by power derived from DC by means of a converter, e.g. by high-voltage DC using static converters
- H05B41/288—Circuit arrangements in which the lamp is fed by power derived from DC by means of a converter, e.g. by high-voltage DC using static converters with semiconductor devices and specially adapted for lamps without preheating electrodes, e.g. for high-intensity discharge lamps, high-pressure mercury or sodium lamps or low-pressure sodium lamps
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
- C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1811—C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V23/00—Arrangement of electric circuit elements in or on lighting devices
- F21V23/02—Arrangement of electric circuit elements in or on lighting devices the elements being transformers, impedances or power supply units, e.g. a transformer with a rectifier
- F21V23/026—Fastening of transformers or ballasts
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/08—Styrene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
- C08F220/282—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing two or more oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
- C08F220/325—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/40—Esters of unsaturated alcohols, e.g. allyl (meth)acrylate
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
- Y02B20/00—Energy efficient lighting technologies, e.g. halogen lamps or gas discharge lamps
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31855—Of addition polymer from unsaturated monomers
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Thin Film Transistor (AREA)
- Formation Of Insulating Films (AREA)
- Liquid Crystal (AREA)
- Organic Insulating Materials (AREA)
- Materials For Photolithography (AREA)
- Epoxy Resins (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020060010503A KR101348757B1 (ko) | 2006-02-03 | 2006-02-03 | 유기 절연막용 수지 조성물 및 그 제조 방법, 상기 수지조성물을 포함하는 표시판 |
| KR10-2006-0010503 | 2006-02-03 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007224293A JP2007224293A (ja) | 2007-09-06 |
| JP2007224293A5 JP2007224293A5 (enExample) | 2010-03-11 |
| JP5269323B2 true JP5269323B2 (ja) | 2013-08-21 |
Family
ID=38334436
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007014523A Active JP5269323B2 (ja) | 2006-02-03 | 2007-01-25 | 有機絶縁膜用樹脂組成物及びその製造方法、前記樹脂組成物を含む表示板 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7879961B2 (enExample) |
| JP (1) | JP5269323B2 (enExample) |
| KR (1) | KR101348757B1 (enExample) |
| CN (1) | CN101058618B (enExample) |
| TW (1) | TWI414555B (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5030562B2 (ja) * | 2006-11-30 | 2012-09-19 | 富士フイルム株式会社 | インクジェット用インク組成物、及び、インクジェット記録方法 |
| KR101388519B1 (ko) | 2007-07-23 | 2014-04-24 | 주식회사 동진쎄미켐 | 박막 트랜지스터 기판의 제조 방법 및 이에 사용되는감광성 수지 조성물 |
| JP5187492B2 (ja) * | 2007-11-22 | 2013-04-24 | Jsr株式会社 | 硬化性樹脂組成物、保護膜および保護膜の形成方法 |
| JP2009227838A (ja) * | 2008-03-24 | 2009-10-08 | Fujifilm Corp | 膜形成用組成物、絶縁膜、及び、電子デバイス |
| CN105062214A (zh) * | 2008-04-04 | 2015-11-18 | 柯尼卡美能达株式会社 | 非水性喷墨油墨、非水性喷墨油墨的制造方法及喷墨记录方法 |
| KR101317601B1 (ko) * | 2008-08-29 | 2013-10-11 | 주식회사 엘지화학 | 아크릴계 수지 및 이를 포함하는 감광성 수지 조성물 |
| CN102300909B (zh) | 2009-01-28 | 2014-06-18 | 日立化成工业株式会社 | 预浸料坯、带有树脂的膜、带有树脂的金属箔、覆金属箔层叠板及印制电路板 |
| KR102008769B1 (ko) * | 2009-11-27 | 2019-08-09 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 반도체 장치의 제작방법 |
| WO2011077946A1 (en) | 2009-12-25 | 2011-06-30 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| US20130123391A1 (en) * | 2010-08-25 | 2013-05-16 | Dow Global Technologies Llc | Copolymers |
| CN104981490A (zh) * | 2013-02-12 | 2015-10-14 | Dic株式会社 | 绝缘材料用树脂组合物、绝缘墨液、绝缘膜及使用该绝缘膜的有机场效应晶体管 |
| CN105985486B (zh) * | 2015-02-05 | 2020-11-10 | 中国石油化工股份有限公司 | 一种双环戊二烯-环戊烯共聚物及其制备方法 |
| DE102015119939A1 (de) * | 2015-11-18 | 2017-05-18 | ALTANA Aktiengesellschaft | Vernetzbare polymere Materialien für dielektrische Schichten in elektronischen Bauteilen |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2606775B1 (fr) * | 1986-11-14 | 1989-07-07 | Charbonnages Ste Chimique | Copolymeres (meth)acryliques autoreticulables a basses temperatures |
| JPH03273006A (ja) | 1990-03-22 | 1991-12-04 | Toyo Eng Corp | 重合体の精製方法 |
| US5399604A (en) * | 1992-07-24 | 1995-03-21 | Japan Synthetic Rubber Co., Ltd. | Epoxy group-containing resin compositions |
| GB9408725D0 (en) * | 1994-05-03 | 1994-06-22 | Zeneca Resins Bv | Production of aqueous polymer compositions |
| JP3994429B2 (ja) * | 1998-12-01 | 2007-10-17 | Jsr株式会社 | 層間絶縁膜用感放射線性樹脂組成物 |
| JP4019404B2 (ja) * | 1999-08-05 | 2007-12-12 | Jsr株式会社 | 保護膜および液晶表示素子 |
| US6727314B2 (en) * | 2001-12-13 | 2004-04-27 | Basf Ag | Crosslinking systems for acrylic latex films |
| JP3933966B2 (ja) * | 2002-03-15 | 2007-06-20 | 日本ゼオン株式会社 | ジエン系ゴム、その製造方法、ならびにゴム組成物、その製造方法および架橋物 |
| KR20030097392A (ko) | 2002-06-20 | 2003-12-31 | 건설화학공업(주) | 난연성 비닐에스테르 수지의 조성물 및 그 제조방법 |
| KR100923056B1 (ko) | 2002-09-16 | 2009-10-22 | 삼성전자주식회사 | 표시 장치 및 이의 제조방법 |
| KR100684365B1 (ko) * | 2003-04-30 | 2007-02-20 | 주식회사 삼양이엠에스 | 음성 레지스트 조성물을 이용한 고개구율 박막 트랜지스터(tft) 액정표시소자의 유기절연막 형성방법 |
| CN100358156C (zh) * | 2003-05-06 | 2007-12-26 | Pt普拉斯有限公司 | 用于lcd板和oeld板的存储电容器结构 |
| TWI386714B (zh) | 2004-05-06 | 2013-02-21 | Dongjin Semichem Co Ltd | Tft-lcd用層間有機絕緣膜、tft-lcd用層間有機絕緣膜用丙烯酸系共聚合體樹脂及其製造方法 |
| KR20050113351A (ko) * | 2004-05-27 | 2005-12-02 | 주식회사 동진쎄미켐 | 감광성 수지 조성물 |
| KR20060084489A (ko) * | 2005-01-19 | 2006-07-24 | 삼성전자주식회사 | 박막 트랜지스터 표시판 |
| US7799509B2 (en) * | 2005-06-04 | 2010-09-21 | Samsung Electronics Co., Ltd. | Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same |
-
2006
- 2006-02-03 KR KR1020060010503A patent/KR101348757B1/ko active Active
-
2007
- 2007-01-25 JP JP2007014523A patent/JP5269323B2/ja active Active
- 2007-02-02 TW TW96103905A patent/TWI414555B/zh active
- 2007-02-02 US US11/670,700 patent/US7879961B2/en active Active
- 2007-02-05 CN CN2007101053595A patent/CN101058618B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN101058618A (zh) | 2007-10-24 |
| JP2007224293A (ja) | 2007-09-06 |
| US7879961B2 (en) | 2011-02-01 |
| US20070184293A1 (en) | 2007-08-09 |
| KR101348757B1 (ko) | 2014-01-07 |
| TW200734394A (en) | 2007-09-16 |
| CN101058618B (zh) | 2011-10-26 |
| KR20070079682A (ko) | 2007-08-08 |
| TWI414555B (zh) | 2013-11-11 |
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