JP2007224293A5 - - Google Patents
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- Publication number
- JP2007224293A5 JP2007224293A5 JP2007014523A JP2007014523A JP2007224293A5 JP 2007224293 A5 JP2007224293 A5 JP 2007224293A5 JP 2007014523 A JP2007014523 A JP 2007014523A JP 2007014523 A JP2007014523 A JP 2007014523A JP 2007224293 A5 JP2007224293 A5 JP 2007224293A5
- Authority
- JP
- Japan
- Prior art keywords
- meth
- acrylate
- weight
- resin composition
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 16
- -1 isobornyl compound Chemical class 0.000 claims 15
- 239000011342 resin composition Substances 0.000 claims 11
- 150000001875 compounds Chemical class 0.000 claims 6
- 239000004593 Epoxy Substances 0.000 claims 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims 4
- 150000001735 carboxylic acids Chemical class 0.000 claims 4
- 239000003505 polymerization initiator Substances 0.000 claims 4
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 claims 3
- 229920001577 copolymer Polymers 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 3
- 239000000203 mixture Substances 0.000 claims 3
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 claims 2
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical compound [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 claims 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 claims 2
- 230000000379 polymerizing effect Effects 0.000 claims 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims 2
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 claims 1
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 claims 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical class C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 claims 1
- AVTLBBWTUPQRAY-UHFFFAOYSA-N 2-(2-cyanobutan-2-yldiazenyl)-2-methylbutanenitrile Chemical compound CCC(C)(C#N)N=NC(C)(CC)C#N AVTLBBWTUPQRAY-UHFFFAOYSA-N 0.000 claims 1
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 claims 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 claims 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims 1
- PTZRYAAOQPNAKU-UHFFFAOYSA-N 2-[(1-carboxy-3-cyanobutyl)diazenyl]-4-cyanopentanoic acid Chemical compound N#CC(C)CC(C(O)=O)N=NC(C(O)=O)CC(C)C#N PTZRYAAOQPNAKU-UHFFFAOYSA-N 0.000 claims 1
- PFHOSZAOXCYAGJ-UHFFFAOYSA-N 2-[(2-cyano-4-methoxy-4-methylpentan-2-yl)diazenyl]-4-methoxy-2,4-dimethylpentanenitrile Chemical compound COC(C)(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)(C)OC PFHOSZAOXCYAGJ-UHFFFAOYSA-N 0.000 claims 1
- WYGWHHGCAGTUCH-UHFFFAOYSA-N 2-[(2-cyano-4-methylpentan-2-yl)diazenyl]-2,4-dimethylpentanenitrile Chemical compound CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C WYGWHHGCAGTUCH-UHFFFAOYSA-N 0.000 claims 1
- JFWFAUHHNYTWOO-UHFFFAOYSA-N 2-[(2-ethenylphenyl)methoxymethyl]oxirane Chemical compound C=CC1=CC=CC=C1COCC1OC1 JFWFAUHHNYTWOO-UHFFFAOYSA-N 0.000 claims 1
- OCKQMFDZQUFKRD-UHFFFAOYSA-N 2-[(3-ethenylphenyl)methoxymethyl]oxirane Chemical compound C=CC1=CC=CC(COCC2OC2)=C1 OCKQMFDZQUFKRD-UHFFFAOYSA-N 0.000 claims 1
- ZADXFVHUPXKZBJ-UHFFFAOYSA-N 2-[(4-ethenylphenyl)methoxymethyl]oxirane Chemical compound C1=CC(C=C)=CC=C1COCC1OC1 ZADXFVHUPXKZBJ-UHFFFAOYSA-N 0.000 claims 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 claims 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 claims 1
- IISBACLAFKSPIT-UHFFFAOYSA-N Bisphenol A Natural products C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 claims 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims 1
- LXEKPEMOWBOYRF-UHFFFAOYSA-N [2-[(1-azaniumyl-1-imino-2-methylpropan-2-yl)diazenyl]-2-methylpropanimidoyl]azanium;dichloride Chemical compound Cl.Cl.NC(=N)C(C)(C)N=NC(C)(C)C(N)=N LXEKPEMOWBOYRF-UHFFFAOYSA-N 0.000 claims 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 claims 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims 1
- 229930016911 cinnamic acid Natural products 0.000 claims 1
- 235000013985 cinnamic acid Nutrition 0.000 claims 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 claims 1
- 229940018557 citraconic acid Drugs 0.000 claims 1
- 229920006026 co-polymeric resin Polymers 0.000 claims 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 claims 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 239000001530 fumaric acid Substances 0.000 claims 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000009413 insulation Methods 0.000 claims 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 claims 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 claims 1
- 239000011976 maleic acid Substances 0.000 claims 1
- HNEGQIOMVPPMNR-NSCUHMNNSA-N mesaconic acid Chemical compound OC(=O)C(/C)=C/C(O)=O HNEGQIOMVPPMNR-NSCUHMNNSA-N 0.000 claims 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 claims 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 claims 1
- HNEGQIOMVPPMNR-UHFFFAOYSA-N methylfumaric acid Natural products OC(=O)C(C)=CC(O)=O HNEGQIOMVPPMNR-UHFFFAOYSA-N 0.000 claims 1
- OURNLUUIQWKTRH-UHFFFAOYSA-N oxirane;phenol Chemical compound C1CO1.OC1=CC=CC=C1.OC1=CC=CC=C1 OURNLUUIQWKTRH-UHFFFAOYSA-N 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 claims 1
- 239000007787 solid Substances 0.000 claims 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020060010503A KR101348757B1 (ko) | 2006-02-03 | 2006-02-03 | 유기 절연막용 수지 조성물 및 그 제조 방법, 상기 수지조성물을 포함하는 표시판 |
| KR10-2006-0010503 | 2006-02-03 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007224293A JP2007224293A (ja) | 2007-09-06 |
| JP2007224293A5 true JP2007224293A5 (enExample) | 2010-03-11 |
| JP5269323B2 JP5269323B2 (ja) | 2013-08-21 |
Family
ID=38334436
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007014523A Active JP5269323B2 (ja) | 2006-02-03 | 2007-01-25 | 有機絶縁膜用樹脂組成物及びその製造方法、前記樹脂組成物を含む表示板 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7879961B2 (enExample) |
| JP (1) | JP5269323B2 (enExample) |
| KR (1) | KR101348757B1 (enExample) |
| CN (1) | CN101058618B (enExample) |
| TW (1) | TWI414555B (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5030562B2 (ja) * | 2006-11-30 | 2012-09-19 | 富士フイルム株式会社 | インクジェット用インク組成物、及び、インクジェット記録方法 |
| KR101388519B1 (ko) | 2007-07-23 | 2014-04-24 | 주식회사 동진쎄미켐 | 박막 트랜지스터 기판의 제조 방법 및 이에 사용되는감광성 수지 조성물 |
| JP5187492B2 (ja) * | 2007-11-22 | 2013-04-24 | Ｊｓｒ株式会社 | 硬化性樹脂組成物、保護膜および保護膜の形成方法 |
| JP2009227838A (ja) * | 2008-03-24 | 2009-10-08 | Fujifilm Corp | 膜形成用組成物、絶縁膜、及び、電子デバイス |
| CN105062214A (zh) * | 2008-04-04 | 2015-11-18 | 柯尼卡美能达株式会社 | 非水性喷墨油墨、非水性喷墨油墨的制造方法及喷墨记录方法 |
| KR101317601B1 (ko) * | 2008-08-29 | 2013-10-11 | 주식회사 엘지화학 | 아크릴계 수지 및 이를 포함하는 감광성 수지 조성물 |
| CN102300909B (zh) | 2009-01-28 | 2014-06-18 | 日立化成工业株式会社 | 预浸料坯、带有树脂的膜、带有树脂的金属箔、覆金属箔层叠板及印制电路板 |
| KR102008769B1 (ko) * | 2009-11-27 | 2019-08-09 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 반도체 장치의 제작방법 |
| WO2011077946A1 (en) | 2009-12-25 | 2011-06-30 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| US20130123391A1 (en) * | 2010-08-25 | 2013-05-16 | Dow Global Technologies Llc | Copolymers |
| CN104981490A (zh) * | 2013-02-12 | 2015-10-14 | Dic株式会社 | 绝缘材料用树脂组合物、绝缘墨液、绝缘膜及使用该绝缘膜的有机场效应晶体管 |
| CN105985486B (zh) * | 2015-02-05 | 2020-11-10 | 中国石油化工股份有限公司 | 一种双环戊二烯-环戊烯共聚物及其制备方法 |
| DE102015119939A1 (de) * | 2015-11-18 | 2017-05-18 | ALTANA Aktiengesellschaft | Vernetzbare polymere Materialien für dielektrische Schichten in elektronischen Bauteilen |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2606775B1 (fr) * | 1986-11-14 | 1989-07-07 | Charbonnages Ste Chimique | Copolymeres (meth)acryliques autoreticulables a basses temperatures |
| JPH03273006A (ja) | 1990-03-22 | 1991-12-04 | Toyo Eng Corp | 重合体の精製方法 |
| US5399604A (en) * | 1992-07-24 | 1995-03-21 | Japan Synthetic Rubber Co., Ltd. | Epoxy group-containing resin compositions |
| GB9408725D0 (en) * | 1994-05-03 | 1994-06-22 | Zeneca Resins Bv | Production of aqueous polymer compositions |
| JP3994429B2 (ja) * | 1998-12-01 | 2007-10-17 | Ｊｓｒ株式会社 | 層間絶縁膜用感放射線性樹脂組成物 |
| JP4019404B2 (ja) * | 1999-08-05 | 2007-12-12 | Ｊｓｒ株式会社 | 保護膜および液晶表示素子 |
| US6727314B2 (en) * | 2001-12-13 | 2004-04-27 | Basf Ag | Crosslinking systems for acrylic latex films |
| JP3933966B2 (ja) * | 2002-03-15 | 2007-06-20 | 日本ゼオン株式会社 | ジエン系ゴム、その製造方法、ならびにゴム組成物、その製造方法および架橋物 |
| KR20030097392A (ko) | 2002-06-20 | 2003-12-31 | 건설화학공업(주) | 난연성 비닐에스테르 수지의 조성물 및 그 제조방법 |
| KR100923056B1 (ko) | 2002-09-16 | 2009-10-22 | 삼성전자주식회사 | 표시 장치 및 이의 제조방법 |
| KR100684365B1 (ko) * | 2003-04-30 | 2007-02-20 | 주식회사 삼양이엠에스 | 음성 레지스트 조성물을 이용한 고개구율 박막 트랜지스터(tft) 액정표시소자의 유기절연막 형성방법 |
| CN100358156C (zh) * | 2003-05-06 | 2007-12-26 | Pt普拉斯有限公司 | 用于lcd板和oeld板的存储电容器结构 |
| TWI386714B (zh) | 2004-05-06 | 2013-02-21 | Dongjin Semichem Co Ltd | Ｔｆｔ-ｌｃｄ用層間有機絕緣膜、ｔｆｔ-ｌｃｄ用層間有機絕緣膜用丙烯酸系共聚合體樹脂及其製造方法 |
| KR20050113351A (ko) * | 2004-05-27 | 2005-12-02 | 주식회사 동진쎄미켐 | 감광성 수지 조성물 |
| KR20060084489A (ko) * | 2005-01-19 | 2006-07-24 | 삼성전자주식회사 | 박막 트랜지스터 표시판 |
| US7799509B2 (en) * | 2005-06-04 | 2010-09-21 | Samsung Electronics Co., Ltd. | Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same |
-
2006
- 2006-02-03 KR KR1020060010503A patent/KR101348757B1/ko active Active
-
2007
- 2007-01-25 JP JP2007014523A patent/JP5269323B2/ja active Active
- 2007-02-02 TW TW96103905A patent/TWI414555B/zh active
- 2007-02-02 US US11/670,700 patent/US7879961B2/en active Active
- 2007-02-05 CN CN2007101053595A patent/CN101058618B/zh active Active
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