TWI414555B - 用於有機絕緣層之樹脂組合物、製造樹脂組合物的方法及包含樹脂組合物之顯示面板 - Google Patents

用於有機絕緣層之樹脂組合物、製造樹脂組合物的方法及包含樹脂組合物之顯示面板 Download PDF

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Publication number
TWI414555B
TWI414555B TW96103905A TW96103905A TWI414555B TW I414555 B TWI414555 B TW I414555B TW 96103905 A TW96103905 A TW 96103905A TW 96103905 A TW96103905 A TW 96103905A TW I414555 B TWI414555 B TW I414555B
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TW
Taiwan
Prior art keywords
compound
unsaturated carboxylic
resin composition
insulating layer
acid
Prior art date
Application number
TW96103905A
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English (en)
Chinese (zh)
Other versions
TW200734394A (en
Inventor
李東基
金柄郁
尹赫敏
Original Assignee
三星顯示器有限公司
東進世美肯股份有限公司
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Application filed by 三星顯示器有限公司, 東進世美肯股份有限公司 filed Critical 三星顯示器有限公司
Publication of TW200734394A publication Critical patent/TW200734394A/zh
Application granted granted Critical
Publication of TWI414555B publication Critical patent/TWI414555B/zh

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B41/00—Circuit arrangements or apparatus for igniting or operating discharge lamps
    • H05B41/14—Circuit arrangements
    • H05B41/26—Circuit arrangements in which the lamp is fed by power derived from DC by means of a converter, e.g. by high-voltage DC
    • H05B41/28—Circuit arrangements in which the lamp is fed by power derived from DC by means of a converter, e.g. by high-voltage DC using static converters
    • H05B41/288—Circuit arrangements in which the lamp is fed by power derived from DC by means of a converter, e.g. by high-voltage DC using static converters with semiconductor devices and specially adapted for lamps without preheating electrodes, e.g. for high-intensity discharge lamps, high-pressure mercury or sodium lamps or low-pressure sodium lamps
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1811—C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V23/00—Arrangement of electric circuit elements in or on lighting devices
    • F21V23/02—Arrangement of electric circuit elements in or on lighting devices the elements being transformers, impedances or power supply units, e.g. a transformer with a rectifier
    • F21V23/026—Fastening of transformers or ballasts
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C08F220/282—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing two or more oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • C08F220/325—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/40—Esters of unsaturated alcohols, e.g. allyl (meth)acrylate
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B20/00—Energy efficient lighting technologies, e.g. halogen lamps or gas discharge lamps
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Thin Film Transistor (AREA)
  • Formation Of Insulating Films (AREA)
  • Organic Insulating Materials (AREA)
  • Liquid Crystal (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
TW96103905A 2006-02-03 2007-02-02 用於有機絕緣層之樹脂組合物、製造樹脂組合物的方法及包含樹脂組合物之顯示面板 TWI414555B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020060010503A KR101348757B1 (ko) 2006-02-03 2006-02-03 유기 절연막용 수지 조성물 및 그 제조 방법, 상기 수지조성물을 포함하는 표시판

Publications (2)

Publication Number Publication Date
TW200734394A TW200734394A (en) 2007-09-16
TWI414555B true TWI414555B (zh) 2013-11-11

Family

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Family Applications (1)

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TW96103905A TWI414555B (zh) 2006-02-03 2007-02-02 用於有機絕緣層之樹脂組合物、製造樹脂組合物的方法及包含樹脂組合物之顯示面板

Country Status (5)

Country Link
US (1) US7879961B2 (enExample)
JP (1) JP5269323B2 (enExample)
KR (1) KR101348757B1 (enExample)
CN (1) CN101058618B (enExample)
TW (1) TWI414555B (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5030562B2 (ja) * 2006-11-30 2012-09-19 富士フイルム株式会社 インクジェット用インク組成物、及び、インクジェット記録方法
KR101388519B1 (ko) 2007-07-23 2014-04-24 주식회사 동진쎄미켐 박막 트랜지스터 기판의 제조 방법 및 이에 사용되는감광성 수지 조성물
JP5187492B2 (ja) * 2007-11-22 2013-04-24 Ｊｓｒ株式会社 硬化性樹脂組成物、保護膜および保護膜の形成方法
JP2009227838A (ja) * 2008-03-24 2009-10-08 Fujifilm Corp 膜形成用組成物、絶縁膜、及び、電子デバイス
EP2261290B1 (en) * 2008-04-04 2016-02-24 Konica Minolta IJ Technologies, Inc. Nonaqueous ink jet ink, process for producing nonaqueous ink jet ink, and ink jet recording method
KR101317601B1 (ko) * 2008-08-29 2013-10-11 주식회사 엘지화학 아크릴계 수지 및 이를 포함하는 감광성 수지 조성물
JP5921800B2 (ja) * 2009-01-28 2016-05-24 日立化成株式会社 プリプレグ、樹脂付きフィルム、樹脂付き金属箔、金属箔張積層板及びプリント配線板
CN102640292B (zh) 2009-11-27 2015-11-25 株式会社半导体能源研究所 半导体装置和及其制造方法
KR101866734B1 (ko) 2009-12-25 2018-06-15 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
SG187915A1 (en) * 2010-08-25 2013-03-28 Dow Global Technologies Llc Copolymers
US20150353665A1 (en) * 2013-02-12 2015-12-10 Dic Corporation Resin composition for insulating materials, insulating ink, insulating film and organic field effect transistor using insulating film
CN105985486B (zh) * 2015-02-05 2020-11-10 中国石油化工股份有限公司 一种双环戊二烯-环戊烯共聚物及其制备方法
DE102015119939A1 (de) * 2015-11-18 2017-05-18 ALTANA Aktiengesellschaft Vernetzbare polymere Materialien für dielektrische Schichten in elektronischen Bauteilen

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004097522A1 (en) * 2003-04-30 2004-11-11 Adms Technology Co. Ltd. Negative resist composition for organic insulator of high aperture lcd

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2606775B1 (fr) 1986-11-14 1989-07-07 Charbonnages Ste Chimique Copolymeres (meth)acryliques autoreticulables a basses temperatures
JPH03273006A (ja) 1990-03-22 1991-12-04 Toyo Eng Corp 重合体の精製方法
US5399604A (en) 1992-07-24 1995-03-21 Japan Synthetic Rubber Co., Ltd. Epoxy group-containing resin compositions
GB9408725D0 (en) 1994-05-03 1994-06-22 Zeneca Resins Bv Production of aqueous polymer compositions
JP3994429B2 (ja) * 1998-12-01 2007-10-17 Ｊｓｒ株式会社 層間絶縁膜用感放射線性樹脂組成物
JP4019404B2 (ja) * 1999-08-05 2007-12-12 Ｊｓｒ株式会社 保護膜および液晶表示素子
US6727314B2 (en) 2001-12-13 2004-04-27 Basf Ag Crosslinking systems for acrylic latex films
JP3933966B2 (ja) 2002-03-15 2007-06-20 日本ゼオン株式会社 ジエン系ゴム、その製造方法、ならびにゴム組成物、その製造方法および架橋物
KR20030097392A (ko) 2002-06-20 2003-12-31 건설화학공업(주) 난연성 비닐에스테르 수지의 조성물 및 그 제조방법
KR100923056B1 (ko) 2002-09-16 2009-10-22 삼성전자주식회사 표시 장치 및 이의 제조방법
CN100358156C (zh) * 2003-05-06 2007-12-26 Pt普拉斯有限公司 用于lcd板和oeld板的存储电容器结构
TWI386714B (zh) * 2004-05-06 2013-02-21 東進世美肯有限公司 Ｔｆｔ-ｌｃｄ用層間有機絕緣膜、ｔｆｔ-ｌｃｄ用層間有機絕緣膜用丙烯酸系共聚合體樹脂及其製造方法
KR20050113351A (ko) * 2004-05-27 2005-12-02 주식회사 동진쎄미켐 감광성 수지 조성물
KR20060084489A (ko) * 2005-01-19 2006-07-24 삼성전자주식회사 박막 트랜지스터 표시판
US7799509B2 (en) * 2005-06-04 2010-09-21 Samsung Electronics Co., Ltd. Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004097522A1 (en) * 2003-04-30 2004-11-11 Adms Technology Co. Ltd. Negative resist composition for organic insulator of high aperture lcd

Also Published As

Publication number Publication date
KR101348757B1 (ko) 2014-01-07
CN101058618A (zh) 2007-10-24
TW200734394A (en) 2007-09-16
US20070184293A1 (en) 2007-08-09
US7879961B2 (en) 2011-02-01
CN101058618B (zh) 2011-10-26
JP2007224293A (ja) 2007-09-06
JP5269323B2 (ja) 2013-08-21
KR20070079682A (ko) 2007-08-08

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