JP5198473B2 - フルオレン系樹脂重合体およびこれの製造方法 - Google Patents
フルオレン系樹脂重合体およびこれの製造方法 Download PDFInfo
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- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 title claims description 92
- 239000011347 resin Substances 0.000 title claims description 46
- 229920005989 resin Polymers 0.000 title claims description 46
- 229920000642 polymer Polymers 0.000 title claims description 45
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000002253 acid Substances 0.000 claims description 30
- 150000001875 compounds Chemical class 0.000 claims description 29
- 125000004432 carbon atom Chemical group C* 0.000 claims description 15
- 125000002947 alkylene group Chemical group 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 8
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 claims description 7
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 claims description 7
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims description 6
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 6
- 238000006482 condensation reaction Methods 0.000 claims description 6
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 claims description 6
- FNZBSNUICNVAAM-UHFFFAOYSA-N trimethyl-[methyl-[methyl-(methyl-phenyl-trimethylsilyloxysilyl)oxy-phenylsilyl]oxy-phenylsilyl]oxysilane Chemical compound C=1C=CC=CC=1[Si](C)(O[Si](C)(C)C)O[Si](C)(C=1C=CC=CC=1)O[Si](C)(O[Si](C)(C)C)C1=CC=CC=C1 FNZBSNUICNVAAM-UHFFFAOYSA-N 0.000 claims description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims 4
- ABDKAPXRBAPSQN-UHFFFAOYSA-N veratrole Chemical compound COC1=CC=CC=C1OC ABDKAPXRBAPSQN-UHFFFAOYSA-N 0.000 claims 4
- PPZYHOQWRAUWAY-UHFFFAOYSA-N 2-[2-(carboxymethoxy)phenoxy]acetic acid Chemical compound OC(=O)COC1=CC=CC=C1OCC(O)=O PPZYHOQWRAUWAY-UHFFFAOYSA-N 0.000 claims 2
- MMEDJBFVJUFIDD-UHFFFAOYSA-N 2-[2-(carboxymethyl)phenyl]acetic acid Chemical compound OC(=O)CC1=CC=CC=C1CC(O)=O MMEDJBFVJUFIDD-UHFFFAOYSA-N 0.000 claims 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical group C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 15
- 238000006243 chemical reaction Methods 0.000 description 14
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical group C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 11
- 239000011342 resin composition Substances 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- -1 diol compound Chemical class 0.000 description 5
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 4
- 239000007810 chemical reaction solvent Substances 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- ILUAAIDVFMVTAU-UHFFFAOYSA-N cyclohex-4-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CC=CCC1C(O)=O ILUAAIDVFMVTAU-UHFFFAOYSA-N 0.000 description 2
- 230000000994 depressogenic effect Effects 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 238000012643 polycondensation polymerization Methods 0.000 description 2
- PXGZQGDTEZPERC-UHFFFAOYSA-N 1,4-cyclohexanedicarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)CC1 PXGZQGDTEZPERC-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- 150000008064 anhydrides Chemical group 0.000 description 1
- NIDNOXCRFUCAKQ-UHFFFAOYSA-N bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid Chemical compound C1C2C=CC1C(C(=O)O)C2C(O)=O NIDNOXCRFUCAKQ-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000004581 coalescence Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000006159 dianhydride group Chemical group 0.000 description 1
- 150000002009 diols Chemical group 0.000 description 1
- CNEKKZXYBHKSDC-UHFFFAOYSA-N ethyl acetate;propane-1,2-diol Chemical compound CC(O)CO.CCOC(C)=O CNEKKZXYBHKSDC-UHFFFAOYSA-N 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
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- C—CHEMISTRY; METALLURGY
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/182—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing using pre-adducts of epoxy compounds with curing agents
- C08G59/186—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing using pre-adducts of epoxy compounds with curing agents with acids
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
- C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
- C08G63/40—Polyesters derived from ester-forming derivatives of polycarboxylic acids or of polyhydroxy compounds, other than from esters thereof
- C08G63/42—Cyclic ethers; Cyclic carbonates; Cyclic sulfites; Cyclic orthoesters
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/66—Polyesters containing oxygen in the form of ether groups
- C08G63/668—Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds
- C08G63/672—Dicarboxylic acids and dihydroxy compounds
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/06—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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Description
Xは、炭素数1〜3のアルキレン、エチレンオキシド、およびプロピレンオキシドからなる群から選択された1つであり、Yは、シクロヘキサン(cyclohexane)、シクロヘキセン(cyclohexene)、ベンゼン、および炭素数3〜10のアルキレンからなる群から選択された1つである。
フルオレン基を含むジエポキシ化合物;および
ベンゼン、シクロヘキサン、シクロヘキセン、ノルボルネン、および炭素数3〜10のアルカンのうちから選択された1つを間に置いて両端に酸が置換された構造を有する二酸化合物;を混合した後、縮合反応によって前記化学式1の反復単位を有するフルオレン系樹脂重合体を製造するフルオレン系樹脂重合体の製造方法を提供する。
9,9−ビスフェノールフルオレンジグリシジルエーテル122gと4−シクロヘキセン−1,2−ジカルボン酸45gを150gのプロピレングリコールメチルエーテルアセテートと共に攪拌した。反応器内部に窒素を流して反応器を110℃で加熱した。10時間後に反応を終了し、200gの反応溶媒を追加してフルオレン系樹脂重合体を得て、図1にNMRグラフで示した(固形分29.19重量%、酸価25、分子量13000)。
9,9−ビスフェノールフルオレンジグリシジルエーテル124gとフタル酸44gを150gのプロピレングリコールメチルエーテルアセテートと共に攪拌した。反応器内部に窒素を流して反応器を110℃で加熱した。10時間後に反応を終了し、200gの反応溶媒を追加してフルオレン系樹脂重合体を得て、図2にNMRグラフで示した(固形分28.80重量%、酸価32、分子量10300)。
9,9−ビスフェノールフルオレンジグリシジルエーテル107gと5−ノルボルネン−2,3−ジカルボン酸42gを150gのプロピレングリコールメチルエーテルアセテートと共に攪拌した。反応器内部に窒素を流して反応器を110℃で加熱した。10時間後に反応を終了し、200gの反応溶媒を追加してフルオレン系樹脂重合体を得て、図3にNMRグラフで示した(固形分31.65重量%、酸価25、分子量4000)。
Claims (6)
- 前記二酸化合物は、cis−5−ノルボルネン−エンド−2,3−ジカルボン酸、1,2−フェニレン二酢酸および、1,2−フェニレンジオキシ二酢酸からなる群から選択された1種以上の化合物を含むことを特徴とする請求項2に記載のフルオレン系樹脂重合体。
- フルオレン基を含むジエポキシ化合物;および
ノルボルネン、1,2−ジメチルベンゼン、1,2−ジメトキシベンゼンおよび炭素数3〜10のアルカンのうちから選択された1つを間に置いて両端に酸が置換された構造を有する二酸化合物を混合した後、縮合反応によって下記化学式1の反復単位を有し、重量平均分子量が1,000〜50,000であり、かつ、酸価が25〜32mgKOH/gであるフルオレン系樹脂重合体を製造することを特徴とするフルオレン系樹脂重合体の製造方法:
Xは、炭素数1〜3のアルキレン、エチレンオキシド、−CH2−(OCH2CH2)−およびプロピレンオキシドからなる群から選択された1つであり、
Yは、以下の式:
- 前記二酸化合物は、cis−5−ノルボルネン−エンド−2,3−ジカルボン酸、1,2−フェニレン二酢酸および、1,2−フェニレンジオキシ二酢酸からなる群から選択された1種以上であることを特徴とする請求項4または5に記載のフルオレン系樹脂重合体の製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070017080A KR100970837B1 (ko) | 2007-02-20 | 2007-02-20 | 플로렌계 수지 중합체 및 이를 포함하는 네가티브형 감광성수지 조성물 |
KR10-2007-0017080 | 2007-02-20 | ||
PCT/KR2008/000365 WO2008102953A1 (en) | 2007-02-20 | 2008-01-21 | Fluorene-based resin polymer and method for preparing thereof |
Publications (2)
Publication Number | Publication Date |
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JP2010519378A JP2010519378A (ja) | 2010-06-03 |
JP5198473B2 true JP5198473B2 (ja) | 2013-05-15 |
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Application Number | Title | Priority Date | Filing Date |
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JP2009550788A Active JP5198473B2 (ja) | 2007-02-20 | 2008-01-21 | フルオレン系樹脂重合体およびこれの製造方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8338559B2 (ja) |
JP (1) | JP5198473B2 (ja) |
KR (1) | KR100970837B1 (ja) |
CN (1) | CN101616951B (ja) |
TW (1) | TWI393729B (ja) |
WO (1) | WO2008102953A1 (ja) |
Families Citing this family (10)
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KR101226406B1 (ko) * | 2010-12-28 | 2013-01-24 | 주식회사 포스코 | 안료밀착성이 우수한 표면처리용 흑색수지 조성물 및 이를 이용한 흑색수지 강판 |
MX357366B (es) * | 2012-10-30 | 2018-07-06 | Jain Irrigation Systems Ltd | Sistema de control de movimiento y procedimiento con recogida de energia. |
KR101661673B1 (ko) * | 2014-02-12 | 2016-09-30 | 제일모직 주식회사 | 감광성 수지 조성물, 이를 이용한 차광층 및 컬러필터 |
JP6435226B2 (ja) * | 2015-04-01 | 2018-12-05 | 大阪ガスケミカル株式会社 | フルオレン骨格を有するエポキシ樹脂及びその製造方法 |
KR102054045B1 (ko) * | 2017-03-03 | 2019-12-09 | 주식회사 엘지화학 | 고분자 수지 화합물 및 이를 포함하는 블랙 뱅크용 감광성 수지 조성물 |
KR102420415B1 (ko) * | 2017-10-17 | 2022-07-15 | 덕산네오룩스 주식회사 | 부착력 또는 접착성이 향상된 감광성 수지 조성물 및 그것들을 사용한 광 차단 층 |
KR102227606B1 (ko) | 2018-04-06 | 2021-03-12 | 주식회사 엘지화학 | 카도계 바인더 수지, 이를 포함하는 감광성 수지 조성물, 블랙 매트릭스, 컬러필터 및 디스플레이 장치 |
CN109100917A (zh) * | 2018-07-19 | 2018-12-28 | 江苏博砚电子科技有限公司 | 一种彩色感光性树脂组合物及其制备方法 |
KR20210081032A (ko) * | 2019-12-23 | 2021-07-01 | 주식회사 엘지화학 | 고분자 수지 화합물, 이의 제조 방법 및 이를 포함하는 감광성 수지 조성물 |
CN111471286B (zh) * | 2020-04-07 | 2022-03-08 | 宁波坚锋新材料有限公司 | 一种耐摩耐污芴基聚酯母粒及高透明抗刮伤抗菌的高性能聚碳酸酯复合材料 |
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JP4408599B2 (ja) | 2001-11-16 | 2010-02-03 | 東洋紡績株式会社 | スルホン酸基含有芳香族ポリアリーレンエーテル化合物および高分子電解質膜 |
JP2003147076A (ja) * | 2001-11-16 | 2003-05-21 | Toyobo Co Ltd | スルホン化フッ素含有重合体、それを含有する樹脂組成物および高分子電解質膜 |
JP4035420B2 (ja) * | 2002-03-25 | 2008-01-23 | 大阪瓦斯株式会社 | ビニルエステル系樹脂 |
JP2004002635A (ja) * | 2002-03-25 | 2004-01-08 | Osaka Gas Co Ltd | ライニング用樹脂組成物 |
CN1564951A (zh) * | 2002-06-27 | 2005-01-12 | 帝人株式会社 | 聚碳酸酯类取向膜以及相位差膜 |
JP4575680B2 (ja) * | 2004-02-23 | 2010-11-04 | 大阪瓦斯株式会社 | 新規フルオレン化合物 |
KR20060022366A (ko) * | 2004-09-07 | 2006-03-10 | 주식회사 엘지화학 | 신규한 술폰산염을 포함하는9,9-비스(4-히드록시페닐)플루오렌 화합물 |
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KR100970837B1 (ko) | 2010-07-16 |
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CN101616951B (zh) | 2011-12-28 |
US20100029892A1 (en) | 2010-02-04 |
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