JP5127875B2 - リソグラフィ装置及び物品の製造方法 - Google Patents

リソグラフィ装置及び物品の製造方法 Download PDF

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Publication number
JP5127875B2
JP5127875B2 JP2010104232A JP2010104232A JP5127875B2 JP 5127875 B2 JP5127875 B2 JP 5127875B2 JP 2010104232 A JP2010104232 A JP 2010104232A JP 2010104232 A JP2010104232 A JP 2010104232A JP 5127875 B2 JP5127875 B2 JP 5127875B2
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Japan
Prior art keywords
shielding plate
light
light shielding
arc
lithographic apparatus
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JP2010104232A
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English (en)
Japanese (ja)
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JP2011233781A5 (enExample
JP2011233781A (ja
Inventor
堅一郎 森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2010104232A priority Critical patent/JP5127875B2/ja
Priority to TW100111009A priority patent/TWI442188B/zh
Priority to KR1020110036762A priority patent/KR101359080B1/ko
Priority to US13/093,309 priority patent/US8760627B2/en
Priority to CN201110103590.7A priority patent/CN102236265B/zh
Publication of JP2011233781A publication Critical patent/JP2011233781A/ja
Publication of JP2011233781A5 publication Critical patent/JP2011233781A5/ja
Application granted granted Critical
Publication of JP5127875B2 publication Critical patent/JP5127875B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
JP2010104232A 2010-04-28 2010-04-28 リソグラフィ装置及び物品の製造方法 Active JP5127875B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2010104232A JP5127875B2 (ja) 2010-04-28 2010-04-28 リソグラフィ装置及び物品の製造方法
TW100111009A TWI442188B (zh) 2010-04-28 2011-03-30 平版裝置及物品製造方法
KR1020110036762A KR101359080B1 (ko) 2010-04-28 2011-04-20 리소그래피 장치 및 물품의 제조 방법
US13/093,309 US8760627B2 (en) 2010-04-28 2011-04-25 Lithographic apparatus and method of manufacturing article
CN201110103590.7A CN102236265B (zh) 2010-04-28 2011-04-25 光刻设备和制造物品的方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010104232A JP5127875B2 (ja) 2010-04-28 2010-04-28 リソグラフィ装置及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2011233781A JP2011233781A (ja) 2011-11-17
JP2011233781A5 JP2011233781A5 (enExample) 2012-08-02
JP5127875B2 true JP5127875B2 (ja) 2013-01-23

Family

ID=44858017

Family Applications (1)

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JP2010104232A Active JP5127875B2 (ja) 2010-04-28 2010-04-28 リソグラフィ装置及び物品の製造方法

Country Status (5)

Country Link
US (1) US8760627B2 (enExample)
JP (1) JP5127875B2 (enExample)
KR (1) KR101359080B1 (enExample)
CN (1) CN102236265B (enExample)
TW (1) TWI442188B (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5836652B2 (ja) 2011-06-10 2015-12-24 キヤノン株式会社 インプリント方法、インプリント装置及び物品の製造方法
JP5789135B2 (ja) * 2011-06-17 2015-10-07 キヤノン株式会社 露光装置及びデバイスの製造方法
JP5868094B2 (ja) * 2011-09-26 2016-02-24 キヤノン株式会社 露光装置及びデバイス製造方法
JP6012200B2 (ja) * 2012-02-28 2016-10-25 キヤノン株式会社 露光装置、それを用いたデバイスの製造方法
JP6029289B2 (ja) 2012-02-28 2016-11-24 キヤノン株式会社 露光装置、それを用いたデバイスの製造方法
NL2011172A (en) * 2012-07-23 2014-01-27 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP6200135B2 (ja) * 2012-07-24 2017-09-20 キヤノン株式会社 インプリント装置、インプリント方法、および、物品製造方法
DE102012218074A1 (de) * 2012-10-04 2013-08-14 Carl Zeiss Smt Gmbh Blenden-Vorrichtung
US20150277239A1 (en) * 2012-10-05 2015-10-01 Rudolph Technologies, Inc. Multiple-Blade Device for Substrate Edge Protection during Photolithography
JP6288985B2 (ja) * 2013-08-13 2018-03-07 キヤノン株式会社 リソグラフィ装置、および物品の製造方法
NL2016271B1 (en) * 2016-02-16 2017-08-22 Liteq B V Lithographic apparatus and method for preventing peripheral exposure of a substrate.
JP6177409B2 (ja) * 2016-10-19 2017-08-09 キヤノン株式会社 露光装置、それを用いたデバイスの製造方法
JP6936672B2 (ja) * 2017-09-19 2021-09-22 キヤノン株式会社 インプリント装置、インプリント方法および物品製造方法
JP7162430B2 (ja) * 2018-02-27 2022-10-28 株式会社オーク製作所 投影露光装置
KR102439935B1 (ko) 2018-02-27 2022-09-02 가부시키가이샤 오크세이사쿠쇼 투영 노광 장치
JP7145620B2 (ja) * 2018-02-27 2022-10-03 株式会社オーク製作所 投影露光装置
JP7179420B2 (ja) 2019-01-29 2022-11-29 株式会社オーク製作所 投影露光装置及び投影露光装置に使用する遮光板
JP7446069B2 (ja) * 2019-09-03 2024-03-08 キヤノン株式会社 露光装置及び物品の製造方法
JP7446799B2 (ja) * 2019-12-05 2024-03-11 キヤノン株式会社 インプリント方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3056206B1 (ja) * 1999-03-18 2000-06-26 広島日本電気株式会社 ダミーパターン形成方法及び半導体製造方法
US6830852B2 (en) 2001-07-19 2004-12-14 Nikon Corporation Stencil reticles for use in charged-particle-beam microlithography, and pattern-determination methods for such reticles
US6680774B1 (en) * 2001-10-09 2004-01-20 Ultratech Stepper, Inc. Method and apparatus for mechanically masking a workpiece
JP2003158067A (ja) * 2001-11-22 2003-05-30 Hitachi Ltd 半導体装置の製造方法および露光装置
TWI251116B (en) 2002-12-19 2006-03-11 Asml Netherlands Bv Device manufacturing method, computer-readable medium and lithographic apparatus
JP2005045160A (ja) * 2003-07-25 2005-02-17 Matsushita Electric Ind Co Ltd 露光方法
JP4458329B2 (ja) 2003-12-26 2010-04-28 キヤノン株式会社 露光装置及びデバイス製造方法
JP4481698B2 (ja) 2004-03-29 2010-06-16 キヤノン株式会社 加工装置
JP2006040915A (ja) * 2004-07-22 2006-02-09 Seiko Epson Corp 半導体装置の製造方法、及びその製造装置、並びに電気光学装置の製造方法
US7936447B2 (en) * 2006-05-08 2011-05-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7525640B2 (en) 2006-11-07 2009-04-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4838698B2 (ja) 2006-12-19 2011-12-14 キヤノン株式会社 露光装置およびデバイス製造方法
US7777863B2 (en) * 2007-05-30 2010-08-17 Asml Netherlands B.V. Lithographic apparatus with mask to prevent exposure of peripheral exposure region of substrate
JP2009239018A (ja) * 2008-03-27 2009-10-15 Orc Mfg Co Ltd 投影露光装置
NL2003962A (en) * 2008-12-24 2010-06-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP5789135B2 (ja) * 2011-06-17 2015-10-07 キヤノン株式会社 露光装置及びデバイスの製造方法
JP5868094B2 (ja) * 2011-09-26 2016-02-24 キヤノン株式会社 露光装置及びデバイス製造方法

Also Published As

Publication number Publication date
KR20110120220A (ko) 2011-11-03
CN102236265A (zh) 2011-11-09
US20110267595A1 (en) 2011-11-03
JP2011233781A (ja) 2011-11-17
TW201200970A (en) 2012-01-01
CN102236265B (zh) 2014-01-29
KR101359080B1 (ko) 2014-02-05
US8760627B2 (en) 2014-06-24
TWI442188B (zh) 2014-06-21

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