JP5121836B2 - Plcプラットフォーム上に集積されたdwdm送信器アレイを監視するための回折格子タップのための方法およびシステム - Google Patents
Plcプラットフォーム上に集積されたdwdm送信器アレイを監視するための回折格子タップのための方法およびシステム Download PDFInfo
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- 238000000034 method Methods 0.000 title claims description 63
- 238000012544 monitoring process Methods 0.000 title claims description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 203
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 94
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 45
- 239000010703 silicon Substances 0.000 claims abstract description 45
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 33
- 239000000758 substrate Substances 0.000 claims abstract description 13
- 239000010410 layer Substances 0.000 claims description 79
- 238000005253 cladding Methods 0.000 claims description 65
- 230000003287 optical effect Effects 0.000 claims description 47
- 239000012792 core layer Substances 0.000 claims description 14
- 239000004065 semiconductor Substances 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims description 4
- 230000008569 process Effects 0.000 description 18
- 238000010586 diagram Methods 0.000 description 12
- 238000012986 modification Methods 0.000 description 12
- 230000004048 modification Effects 0.000 description 12
- 238000013459 approach Methods 0.000 description 5
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- 239000013307 optical fiber Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 230000000737 periodic effect Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 241000167857 Bourreria Species 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04B—TRANSMISSION
- H04B10/00—Transmission systems employing electromagnetic waves other than radio-waves, e.g. infrared, visible or ultraviolet light, or employing corpuscular radiation, e.g. quantum communication
- H04B10/07—Arrangements for monitoring or testing transmission systems; Arrangements for fault measurement of transmission systems
- H04B10/075—Arrangements for monitoring or testing transmission systems; Arrangements for fault measurement of transmission systems using an in-service signal
- H04B10/079—Arrangements for monitoring or testing transmission systems; Arrangements for fault measurement of transmission systems using an in-service signal using measurements of the data signal
- H04B10/0799—Monitoring line transmitter or line receiver equipment
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04B—TRANSMISSION
- H04B10/00—Transmission systems employing electromagnetic waves other than radio-waves, e.g. infrared, visible or ultraviolet light, or employing corpuscular radiation, e.g. quantum communication
- H04B10/50—Transmitters
- H04B10/501—Structural aspects
- H04B10/506—Multiwavelength transmitters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/12—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto
- H01L31/14—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto the light source or sources being controlled by the semiconductor device sensitive to radiation, e.g. image converters, image amplifiers or image storage devices
- H01L31/147—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto the light source or sources being controlled by the semiconductor device sensitive to radiation, e.g. image converters, image amplifiers or image storage devices the light sources and the devices sensitive to radiation all being semiconductor devices characterised by potential barriers
- H01L31/153—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto the light source or sources being controlled by the semiconductor device sensitive to radiation, e.g. image converters, image amplifiers or image storage devices the light sources and the devices sensitive to radiation all being semiconductor devices characterised by potential barriers formed in, or on, a common substrate
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- Engineering & Computer Science (AREA)
- Computer Networks & Wireless Communication (AREA)
- Signal Processing (AREA)
- Optical Integrated Circuits (AREA)
- Optical Transform (AREA)
Description
1.集積された導波路内の、屈折率の周期的変化が、光の一部を導波路から外に出るように向け直すために使用される。
2.導波路コアの外部の、クラッド領域内に、回折格子構造を配置するための方法が提供される。
3.向け直される角度は、導波路表面に対して、90度に近いが等しくはない角度に、または、後方反射のない任意のその他の所望の角度に、設定されてもよい。
4.そのような周期的構造を形成するための方法が提供される。
L−L*sin(θ)=m*λ/n
上式で、θは90度からずれた角度であり、mは整数であり、λは送信器の波長であり、nは導波路内の屈折率であり、Lは周期的回折格子のピッチである。
L=m(λ/n)/2
1.(プロセス510)シリコン層を提供する。
2.(プロセス520)シリコン層の上のシリカ層内に光合波器を形成する。
3.(プロセス530)シリカ層内に回折格子を形成する。
4.(プロセス540)窪みを形成するため、および、表面を露出させるために、シリカ層の第1の部分を取り除く。
5.(プロセス550)表面にレーザチップを装着する。
6.(プロセス560)フォトダイオードを、回折構成の上にあるように取り付ける。
Claims (11)
- シリカ層とシリコン層とを含み、窪んだ領域を有するシリカ−オン−シリコン基板と、
前記シリカ層内の複数の入力導波路であって、該シリカ層内の複数の入力導波路のそれぞれはクラッド領域により囲まれたコア領域を備え、該コア領域の屈折率は前記クラッド領域の屈折率よりも高い、前記複数の入力導波路と、
前記シリカ層内にあり、それぞれが前記入力導波路のうちの対応する1つに結合された複数の回折格子であって、該複数の回折格子のそれぞれは、前記コア領域の上方の前記クラッド領域の部分に形成され、且つ、前記クラッド領域の部分に囲まれており、前記コア領域及び前記クラッド領域に沿って光が伝播する際に光が前記複数の回折格子により回折される、前記複数の回折格子と、
前記シリカ層内にあり、前記複数の入力導波路に結合されたアレイ導波路回折格子と、
前記シリカ層内にあり、前記アレイ導波路回折格子に結合された少なくとも1つの出力導波路と、
前記シリカ−オン−シリコン基板の前記窪んだ領域内に配置された、それぞれが前記複数の入力導波路のうちの対応する1つに光学的に結合された複数のレーザと、
それぞれが前記複数の回折格子のうちの対応する1つの上方にあり、それぞれが対応する入力導波路の光パワーを監視する複数のフォトダイオードと、
を備える集積されたDWDM送信器装置。 - 前記複数の回折格子のそれぞれは、前記クラッド領域内に複数の回折領域を含み、前記複数の回折領域は、前記クラッド領域の屈折率とは異なる屈折率によって特徴付けられる、請求項1に記載の装置。
- 前記クラッド領域は非ドープシリカを含み、前記回折領域はドープされたシリカを含む、請求項2に記載の装置。
- 前記複数の回折格子のそれぞれは、前記クラッド領域の一部の中に複数の回折格子要素を含み、前記複数の回折格子要素のピッチは、前記コア領域の軸に対して90度において最大の回折パワーを提供し且つ後方反射を回避するように選択される、請求項1に記載の装置。
- シリコン層を提供することと、
前記シリコン層の上のシリカ層内に、複数の入力導波路と少なくとも1つの出力導波路とを含む光合波器を形成することであって、
前記シリコン層の上に第1のシリカクラッド層を形成することと、
前記第1のシリカクラッド層の上にシリカコア層を形成することと、
前記シリカコア層の少なくとも一部をエッチングすることと、
前記エッチングされたシリカコア層と前記第1のシリカクラッド層との上に第2のシリカクラッド層を蒸着することと、
を含む、前記光合波器を形成することと、
前記第2のシリカクラッド層内に、それぞれが前記入力導波路のうちの対応する1つに結合し、且つ、前記第2のシリカクラッド層に囲まれる複数の回折格子であって、前記シリカコア層及び前記第2のシリカクラッド層に沿って光が伝播する際に光が前記複数の回折格子により回折される、前記複数の回折格子を形成することと、
表面を露出させるために前記シリカ層の少なくとも第1の部分を取り除くことと、
前記表面に、それぞれが前記複数の入力導波路のうちの対応する1つに光学的に結合される複数の半導体レーザを装着することと、
前記シリカ層に、それぞれが対応する入力導波路の光パワーを監視する複数のフォトダイオードを、前記複数の回折格子のうちの対応する1つの上方に取り付けることと、
を含み、
前記シリカコア層の屈折率は、前記第2のシリカクラッド層の屈折率よりも高い、
集積されたDWDM送信器装置を形成するための方法。 - 前記第1のシリカクラッド層は、非ドープシリカ層を含み、及び/又は、前記第2のシリカクラッド層は、非ドープシリカ層を含む、請求項5に記載の方法。
- 前記シリカコア層は、ドープされたシリカ層を含む、請求項5に記載の方法。
- 前記複数の回折格子のそれぞれは、前記第2のシリカクラッド層の中に複数の回折領域を含み、前記複数の回折領域は、前記第2のシリカクラッド層の屈折率とは異なる屈折率によって特徴付けられる、請求項5に記載の方法。
- 前記第2のシリカクラッド層は非ドープシリカを含み、前記回折領域はドープされたシリカを含む、請求項8に記載の方法。
- 前記複数の回折格子は、マスクを使用したUV露光を使用して形成される、請求項9に記載の方法。
- 前記複数の回折格子のそれぞれは、前記第2のシリカクラッド層の一部の中に複数の回折格子要素を含み、前記複数の回折格子要素のピッチは、前記シリカコア層の軸に対して90度において最大の回折パワーを提供し且つ後方反射を回避するように選択される、請求項5に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US82901306P | 2006-10-11 | 2006-10-11 | |
US11/858,868 US8050525B2 (en) | 2006-10-11 | 2007-09-20 | Method and system for grating taps for monitoring a DWDM transmitter array integrated on a PLC platform |
PCT/CN2007/070806 WO2008046340A1 (en) | 2006-10-11 | 2007-09-27 | Method and system for grating taps for monitoring a dwdm transmitter array integrated on a plc platform |
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JP2010512543A JP2010512543A (ja) | 2010-04-22 |
JP5121836B2 true JP5121836B2 (ja) | 2013-01-16 |
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US (1) | US8050525B2 (ja) |
EP (1) | EP2062076B1 (ja) |
JP (1) | JP5121836B2 (ja) |
CN (1) | CN101501541B (ja) |
AT (1) | ATE540328T1 (ja) |
ES (1) | ES2378096T3 (ja) |
WO (1) | WO2008046340A1 (ja) |
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2007
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CN101501541B (zh) | 2011-09-14 |
US8050525B2 (en) | 2011-11-01 |
US20080089697A1 (en) | 2008-04-17 |
EP2062076A1 (en) | 2009-05-27 |
EP2062076B1 (en) | 2012-01-04 |
EP2062076A4 (en) | 2009-09-09 |
ES2378096T3 (es) | 2012-04-04 |
ATE540328T1 (de) | 2012-01-15 |
JP2010512543A (ja) | 2010-04-22 |
CN101501541A (zh) | 2009-08-05 |
WO2008046340A1 (en) | 2008-04-24 |
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