JP5010610B2 - 基板温度決定装置およびその決定方法 - Google Patents
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K11/00—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K11/00—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00
- G01K11/20—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00 using thermoluminescent materials
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K11/00—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00
- G01K11/32—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00 using changes in transmittance, scattering or luminescence in optical fibres
- G01K11/3206—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00 using changes in transmittance, scattering or luminescence in optical fibres at discrete locations in the fibre, e.g. using Bragg scattering
- G01K11/3213—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00 using changes in transmittance, scattering or luminescence in optical fibres at discrete locations in the fibre, e.g. using Bragg scattering using changes in luminescence, e.g. at the distal end of the fibres
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Drying Of Semiconductors (AREA)
- Plasma Technology (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Radiation Pyrometers (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Measurement Of Radiation (AREA)
Description
ここで、Iは蛍光輝度(−)、I0は最初の蛍光輝度(−)、tは励起中断(s)からの時間、tは即発蛍光減衰時間(s)である。蛍光輝度の統合は任意である。輝度を、元の値のe−1(36.8%)まで減少させるために必用な時間は、即発蛍光減衰時間で定義可能である。(Advances In High Temperature Phosphor Thermometry For Aerospace Applications,by S.W.Allison et al.,American Institute of Aeronautics and Astronautics,p.2を参照)
Claims (21)
- プラズマ処理システムにおいて、基板に熱的接触する蛍光体材料であって、前記蛍光体材料は第二の波長帯において電磁放射線に曝されると、第一の波長帯において蛍光応答を生じさせ、前記蛍光応答は前記蛍光体材料の温度に関連する減衰率で減衰し、さらに前記蛍光体材料は、プラズマに曝されると、第一の組の不揮発性副産物を生じさせる、蛍光体材料と、
前記蛍光体材料とプラズマとの間に配される遮蔽窓であって、前記遮蔽窓によって、前記第一の波長と前記第二の波長が少なくとも部分的に伝播され、前記遮蔽窓は、プラズマに曝されると、前記第一の組の不揮発性副産物よりも少量の第二の組の不揮発性副産物を生じさせる遮蔽窓とを備え、
前記蛍光体材料および前記遮蔽窓は前記基板内のノッチに配され、
前記電磁放射線が前記遮蔽窓を介して前記蛍光体材料に伝播されると、前記温度は前記蛍光応答の減衰率から決定される、基板温度測定装置。 - 前記蛍光体材料はセラミックである請求項1に記載の装置。
- 前記遮蔽窓は、石英、サファイア、ガラス、ホウケイ酸塩、およびMgF2のいずれかからなる請求項1又は2に記載の装置。
- センサ/トランスミッタは前記第二の波長帯において第二の波長を伝播し、前記センサ/トランスミッタは前記第一の波長帯において第一の波長を測定する請求項1〜3のいずれか1項に記載の装置。
- 前記基板はチャック上に配される請求項1〜4のいずれか1項に記載の装置。
- 前記センサ/トランスミッタは前記チャック内に配される請求項5に記載の装置。
- 前記遮蔽窓は、粘着剤、摩擦係合、押圧係合、およびガスケットのいずれかによって、前記基板に固定される請求項1〜6のいずれか1項に記載の装置。
- プラズマ処理システムにおいて、蛍光体材料を基板に熱的結合する手段であって、前記蛍光体材料は、第二の波長帯において電磁放射線に曝されると、第一の波長帯において蛍光応答を生じさせ、前記蛍光応答は、前記蛍光体材料の温度に関連する減衰率で減衰し、さらに前記蛍光体材料は、プラズマに曝されると第一の組の不揮発性副産物を生じさせる手段と、
前記蛍光体材料とプラズマとの間に遮蔽窓を配する手段であって、前記遮蔽窓により、前記第一の波長および前記第二の波長を少なくとも部分的に伝播することが可能で、前記遮蔽窓は、プラズマに曝されると、前記第一の組の不揮発性副産物よりも少量の第二の組の不揮発性副産物を生じさせる手段と、
前記電磁放射線が前記遮蔽窓を介して前記蛍光体材料に伝播されると、前記蛍光応答の前記減衰率から前記温度を決定する手段と、を備え、
前記蛍光体材料および前記遮蔽窓は前記基板内のノッチに配される、基板温度測定装置。 - 前記蛍光体材料はセラミックである請求項8記載の装置。
- 前記遮蔽窓は、石英、サファイア、ガラス、ホウケイ酸塩、およびMgF2のいずれかからなる請求項8又は9記載の装置。
- センサ/トランスミッタは、前記第二の波長帯において第二の波長を伝播し、前記センサ/トランスミッタは、前記第一の波長帯において第一の波長を測定する請求項8〜10のいずれか一項に記載の装置。
- 前記基板はチャック上に配される請求項8〜11のいずれか一項に記載の装置。
- 前記センサ/トランスミッタは前記チャック内に配される請求項12記載の装置。
- 前記遮蔽窓は、粘着剤、摩擦係合、押圧係合、およびガスケットのいずれかで、前記基板に固定される請求項8〜13のいずれか一項に記載の装置。
- プラズマ処理システムにおいて、
蛍光体材料を基板に熱的結合させる工程であって、前記蛍光体材料は第二の波長帯において電磁放射線に曝されると、第一の波長帯において蛍光応答を生じさせ、前記蛍光応答は前記蛍光体材料の温度に関連する減衰率で減衰し、さらに前記蛍光体材料は、プラズマに曝されると、第一の組の不揮発性副産物を生じさせる工程と、
前記蛍光体材料とプラズマとの間に遮蔽窓を配する工程であって、前記蛍光体材料および前記遮蔽窓は、前記基板内のノッチに配され、前記遮蔽窓によって、前記第一の波長と前記第二の波長が少なくとも部分的に伝播可能であり、前記遮蔽窓は、プラズマに曝されると、前記第一の組の不揮発性副産物より少量の第二の組の不揮発性副産物を生じさせる工程と、
前記電磁放射線が前記遮蔽窓を介して前記蛍光材料に伝播されると、前記蛍光応答の減衰率から前記温度を決定する工程とを備える、基板測定方法。 - 前記蛍光体材料はセラミックである請求項15記載の方法。
- 前記遮蔽窓は、石英、サファイア、ガラス、ホウケイ酸塩、およびMgF2のいずれかからなる請求項15又は16記載の方法。
- センサ/トランスミッタは前記第二の波長帯において第二の波長を伝播し、前記センサ/トランスミッタは前記第一の波長帯において第一の波長を測定する請求項15〜17のいずれか一項に記載の基板温度測定方法。
- 前記基板はチャック上に配される請求項15〜18のいずれか一項に記載の方法。
- 前記センサ/トランスミッタは前記チャック内に配される請求項19記載の方法。
- 前記遮蔽窓は、粘着剤、摩擦係合、押圧係合、およびガスケットのいずれかで、前記基板に固定される請求項15〜20のいずれか一項に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US11/233,561 | 2005-09-22 | ||
US11/233,561 US7578616B2 (en) | 2005-09-22 | 2005-09-22 | Apparatus for determining a temperature of a substrate and methods therefor |
PCT/US2006/035620 WO2007037983A2 (en) | 2005-09-22 | 2006-09-12 | Apparatus for determining a temperature of a substrate and methods therefor |
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JP2009509356A JP2009509356A (ja) | 2009-03-05 |
JP5010610B2 true JP5010610B2 (ja) | 2012-08-29 |
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US (2) | US7578616B2 (ja) |
JP (1) | JP5010610B2 (ja) |
KR (1) | KR101277905B1 (ja) |
CN (1) | CN101268346B (ja) |
TW (1) | TWI408348B (ja) |
WO (1) | WO2007037983A2 (ja) |
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TWI408348B (zh) | 2013-09-11 |
WO2007037983A2 (en) | 2007-04-05 |
US20070064767A1 (en) | 2007-03-22 |
WO2007037983A3 (en) | 2008-01-24 |
JP2009509356A (ja) | 2009-03-05 |
CN101268346A (zh) | 2008-09-17 |
KR20080053479A (ko) | 2008-06-13 |
US7578616B2 (en) | 2009-08-25 |
KR101277905B1 (ko) | 2013-06-25 |
US20080019418A1 (en) | 2008-01-24 |
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