JP4783484B2 - 無電解金メッキ溶液および方法 - Google Patents

無電解金メッキ溶液および方法 Download PDF

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Publication number
JP4783484B2
JP4783484B2 JP2000019278A JP2000019278A JP4783484B2 JP 4783484 B2 JP4783484 B2 JP 4783484B2 JP 2000019278 A JP2000019278 A JP 2000019278A JP 2000019278 A JP2000019278 A JP 2000019278A JP 4783484 B2 JP4783484 B2 JP 4783484B2
Authority
JP
Japan
Prior art keywords
gold
nickel
electrolyte composition
immersion
circuit board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2000019278A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000219973A (ja
JP2000219973A5 (enExample
Inventor
マイケル・ピー・トーベン
ジェームズ・エル・マーティン
康夫 太田
靖史 滝沢
治樹 榎本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Electronic Materials International LLC
Original Assignee
Rohm and Haas Electronic Materials LLC
DuPont Electronic Materials International LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm and Haas Electronic Materials LLC, DuPont Electronic Materials International LLC filed Critical Rohm and Haas Electronic Materials LLC
Publication of JP2000219973A publication Critical patent/JP2000219973A/ja
Publication of JP2000219973A5 publication Critical patent/JP2000219973A5/ja
Application granted granted Critical
Publication of JP4783484B2 publication Critical patent/JP4783484B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing the conductive pattern
    • H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/42—Coating with noble metals
    • C23C18/44—Coating with noble metals using reducing agents
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing the conductive pattern

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
JP2000019278A 1999-01-27 2000-01-27 無電解金メッキ溶液および方法 Expired - Lifetime JP4783484B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11771599P 1999-01-27 1999-01-27
US60/117715 1999-01-27

Publications (3)

Publication Number Publication Date
JP2000219973A JP2000219973A (ja) 2000-08-08
JP2000219973A5 JP2000219973A5 (enExample) 2007-03-08
JP4783484B2 true JP4783484B2 (ja) 2011-09-28

Family

ID=22374429

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000019278A Expired - Lifetime JP4783484B2 (ja) 1999-01-27 2000-01-27 無電解金メッキ溶液および方法

Country Status (5)

Country Link
US (1) US6383269B1 (enExample)
EP (1) EP1026285A3 (enExample)
JP (1) JP4783484B2 (enExample)
KR (1) KR100712261B1 (enExample)
TW (1) TWI223011B (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2915888B1 (ja) * 1998-01-28 1999-07-05 日本特殊陶業株式会社 配線基板及びその製造方法
SG94721A1 (en) * 1999-12-01 2003-03-18 Gul Technologies Singapore Ltd Electroless gold plated electronic components and method of producing the same
KR20030033034A (ko) * 2000-08-21 2003-04-26 니혼 리로날 가부시키가이샤 치환 무전해 금 도금액, 및 상기 도금액 제조용 첨가제
JP3482402B2 (ja) * 2001-06-29 2003-12-22 日本エレクトロプレイテイング・エンジニヤース株式会社 置換金メッキ液
DE10139555B4 (de) * 2001-08-10 2008-10-16 Robert Bosch Gmbh Verfahren zum Aufbringen einer Haftvermittlerschicht auf einer Metallschicht eines Chips
JP3892730B2 (ja) * 2002-01-30 2007-03-14 関東化学株式会社 無電解金めっき液
WO2004003551A1 (ja) * 2002-06-28 2004-01-08 Canon Kabushiki Kaisha プローブ担体､プローブ担体の作成方法及びプローブ担体の評価方法及びそれを用いた標的核酸の検出方法
JP4638818B2 (ja) * 2003-06-10 2011-02-23 Ｊｘ日鉱日石金属株式会社 無電解金めっき液
CN1981347A (zh) * 2004-07-15 2007-06-13 积水化学工业株式会社 导电性微粒、导电性微粒的制造方法、和各向异性导电材料
JP5116956B2 (ja) * 2005-07-14 2013-01-09 関東化学株式会社 無電解硬質金めっき液
JP4932542B2 (ja) * 2007-03-05 2012-05-16 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 無電解金めっき液
GB0711302D0 (en) * 2007-06-12 2007-07-25 Buss Chemtech Ag Process & apparatus
KR100981445B1 (ko) * 2008-05-07 2010-09-13 (주)인터플렉스 연성인쇄회로기판의 고연성 Ａｕ 표면처리방법
US20110147038A1 (en) * 2009-12-17 2011-06-23 Honeywell International Inc. Oxidation-resistant high temperature wires and methods for the making thereof
WO2015010198A1 (en) 2013-07-24 2015-01-29 National Research Council Of Canada Process for depositing metal on a substrate
KR101444687B1 (ko) 2014-08-06 2014-09-26 (주)엠케이켐앤텍 무전해 금도금액
CN113054077A (zh) * 2021-03-16 2021-06-29 京东方科技集团股份有限公司 显示面板及其制备方法、显示装置及拼接显示装置

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3032436A (en) 1960-11-18 1962-05-01 Metal Proc Co Inc Method and composition for plating by chemical reduction
US3753874A (en) 1971-12-21 1973-08-21 Amp Inc Method and electrolyte for electrodepositing a gold-arsenic alloy
DE3029785A1 (de) * 1980-08-04 1982-03-25 Schering Ag, 1000 Berlin Und 4619 Bergkamen Saures goldbad zur stromlosen abscheidung von gold
US4374876A (en) * 1981-06-02 1983-02-22 Occidental Chemical Corporation Process for the immersion deposition of gold
JPS596365A (ja) * 1982-06-30 1984-01-13 Toshiba Corp 無電解金メツキ方法
DE3237394A1 (de) * 1982-10-08 1984-04-12 Siemens AG, 1000 Berlin und 8000 München Chemisches vergoldungsbad
JPS60125379A (ja) 1983-12-07 1985-07-04 Shinko Electric Ind Co Ltd 無電解金めっき液
US5202151A (en) 1985-10-14 1993-04-13 Hitachi, Ltd. Electroless gold plating solution, method of plating with gold by using the same, and electronic device plated with gold by using the same
CN1003524B (zh) 1985-10-14 1989-03-08 株式会社日立制作所 无电浸镀金溶液
US5178918A (en) * 1986-07-14 1993-01-12 Robert Duva Electroless plating process
DE3640028C1 (de) * 1986-11-24 1987-10-01 Heraeus Gmbh W C Saures Bad fuer das stromlose Abscheiden von Goldschichten
DD265915A1 (de) * 1987-11-10 1989-03-15 Akad Wissenschaften Ddr Verfahren zur stromlosen abscheidung von gold
JPH0826471B2 (ja) 1988-11-14 1996-03-13 新光電気工業株式会社 金めっき液
JP3058178B2 (ja) 1990-01-18 2000-07-04 エヌ・イーケムキヤツト株式会社 無電解金めつき液
US5232492A (en) 1992-01-23 1993-08-03 Applied Electroless Concepts Inc. Electroless gold plating composition
WO1994012686A1 (fr) 1992-11-25 1994-06-09 Kanto Kagaku Kabushiki Kaisha Bain autocatalytique de placage d'or
US5803957A (en) * 1993-03-26 1998-09-08 C. Uyemura & Co.,Ltd. Electroless gold plating bath
EP0618307B1 (en) * 1993-03-26 1997-11-12 C. Uyemura & Co, Ltd Electroless gold plating bath
JP2927142B2 (ja) * 1993-03-26 1999-07-28 上村工業株式会社 無電解金めっき浴及び無電解金めっき方法
US5318621A (en) 1993-08-11 1994-06-07 Applied Electroless Concepts, Inc. Plating rate improvement for electroless silver and gold plating
KR960005765A (ko) * 1994-07-14 1996-02-23 모리시다 요이치 반도체 장치의 배선형성에 이용하는 무전해 도금욕 및 반도체 장치의 배선성형방법
JP3426817B2 (ja) * 1995-11-17 2003-07-14 日立化成工業株式会社 無電解金めっき液
JPH09157859A (ja) 1995-12-01 1997-06-17 Hitachi Chem Co Ltd 無電解金めっき液
JPH09171714A (ja) * 1995-12-21 1997-06-30 Nippon Chem Ind Co Ltd 導電性粉体
JPH09287077A (ja) 1996-04-19 1997-11-04 Hitachi Chem Co Ltd 無電解金めっき液
JPH08253872A (ja) 1996-04-22 1996-10-01 Hitachi Ltd 電子部品の金めっき方法
JP3259906B2 (ja) * 1997-04-15 2002-02-25 イビデン株式会社 無電解めっき用接着剤およびプリント配線板
JPH1112753A (ja) 1997-06-20 1999-01-19 Hitachi Chem Co Ltd 無電解金めっき方法
DE19745601C2 (de) 1997-10-08 2001-07-12 Fraunhofer Ges Forschung Lösung und Verfahren zum stromlosen Abscheiden von Goldschichten sowie Verwendung der Lösung
US5935306A (en) * 1998-02-10 1999-08-10 Technic Inc. Electroless gold plating bath
JP3816241B2 (ja) * 1998-07-14 2006-08-30 株式会社大和化成研究所 金属を還元析出させるための水溶液
JP3677617B2 (ja) 1999-06-08 2005-08-03 小島化学薬品株式会社 無電解金めっき液

Also Published As

Publication number Publication date
JP2000219973A (ja) 2000-08-08
EP1026285A3 (en) 2001-12-12
KR20000053621A (ko) 2000-08-25
EP1026285A2 (en) 2000-08-09
KR100712261B1 (ko) 2007-04-26
US6383269B1 (en) 2002-05-07
TWI223011B (en) 2004-11-01

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