JP4756221B2 - 半導体記憶装置 - Google Patents

半導体記憶装置 Download PDF

Info

Publication number
JP4756221B2
JP4756221B2 JP2010147238A JP2010147238A JP4756221B2 JP 4756221 B2 JP4756221 B2 JP 4756221B2 JP 2010147238 A JP2010147238 A JP 2010147238A JP 2010147238 A JP2010147238 A JP 2010147238A JP 4756221 B2 JP4756221 B2 JP 4756221B2
Authority
JP
Japan
Prior art keywords
diffusion layer
transistor
layer
nmos
transistors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2010147238A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010272874A (ja
JP2010272874A5 (enrdf_load_stackoverflow
Inventor
富士雄 舛岡
紳太郎 新井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Unisantis Electronics Japan Ltd
Original Assignee
Unisantis Electronics Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unisantis Electronics Japan Ltd filed Critical Unisantis Electronics Japan Ltd
Priority to JP2010147238A priority Critical patent/JP4756221B2/ja
Publication of JP2010272874A publication Critical patent/JP2010272874A/ja
Publication of JP2010272874A5 publication Critical patent/JP2010272874A5/ja
Application granted granted Critical
Publication of JP4756221B2 publication Critical patent/JP4756221B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Semiconductor Memories (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
JP2010147238A 2010-06-29 2010-06-29 半導体記憶装置 Active JP4756221B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010147238A JP4756221B2 (ja) 2010-06-29 2010-06-29 半導体記憶装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010147238A JP4756221B2 (ja) 2010-06-29 2010-06-29 半導体記憶装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2009123882 Division 2009-05-22 2009-05-22

Publications (3)

Publication Number Publication Date
JP2010272874A JP2010272874A (ja) 2010-12-02
JP2010272874A5 JP2010272874A5 (enrdf_load_stackoverflow) 2011-01-20
JP4756221B2 true JP4756221B2 (ja) 2011-08-24

Family

ID=43420605

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010147238A Active JP4756221B2 (ja) 2010-06-29 2010-06-29 半導体記憶装置

Country Status (1)

Country Link
JP (1) JP4756221B2 (enrdf_load_stackoverflow)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9117528B2 (en) 2014-01-20 2015-08-25 Unisantis Electronics Singapore Pte. Ltd. Semiconductor device
US9449988B2 (en) 2013-08-08 2016-09-20 Unisantis Electronics Singapore Pte. Ltd. Semiconductor device with six transistors forming a nor circuit
US9484424B2 (en) 2013-07-30 2016-11-01 Unisantis Electronics Singapore Pte. Ltd. Semiconductor device with a NAND circuit having four transistors
US9590631B2 (en) 2014-04-22 2017-03-07 Unisantis Electronics Singapore Pte. Ltd. Semiconductor device
US9601510B2 (en) 2013-08-08 2017-03-21 Unisantis Electronics Singapore Pte. Ltd. Semiconductor device with six transistors forming a NAND circuit
US9627496B2 (en) 2013-07-30 2017-04-18 Unisantis Electronics Singapore Pte. Ltd. Semiconductor with a two-input NOR circuit
US9627407B2 (en) 2014-04-22 2017-04-18 Unisantis Electronics Singapore Pte. Ltd. Semiconductor device comprising a NOR decoder with an inverter
US9641179B2 (en) 2014-04-10 2017-05-02 Unisantis Electronics Singapore Pte. Ltd. Semiconductor device
US9646991B2 (en) 2013-09-03 2017-05-09 Unisantis Electronics Singapore Pte. Ltd. Semiconductor device with surrounding gate transistors in a NOR circuit
US9716092B2 (en) 2013-09-03 2017-07-25 Unisantis Electronics Singapore Pte. Ltd. Semiconductor device with surrounding gate transistors in a NAND circuit
US9876504B2 (en) 2014-04-10 2018-01-23 Unisantis Electronics Singapore Pte. Ltd. Semiconductor device

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8759178B2 (en) 2011-11-09 2014-06-24 Unisantis Electronics Singapore Pte. Ltd. Method for manufacturing semiconductor device and semiconductor device
US10438836B2 (en) 2011-11-09 2019-10-08 Unisantis Electronics Singapore Pte. Ltd. Method for manufacturing a semiconductor device
JP5695745B2 (ja) * 2011-11-09 2015-04-08 ユニサンティス エレクトロニクス シンガポール プライベート リミテッドUnisantis Electronics Singapore Pte Ltd. 半導体装置の製造方法及び半導体装置
JP5749818B2 (ja) * 2012-06-08 2015-07-15 ユニサンティス エレクトロニクス シンガポール プライベート リミテッドUnisantis Electronics Singapore Pte Ltd. 半導体装置の製造方法、及び、半導体装置
US8836051B2 (en) 2012-06-08 2014-09-16 Unisantis Electronics Singapore Pte. Ltd. Method for producing semiconductor device and semiconductor device
US9000513B2 (en) 2012-11-12 2015-04-07 Unisantis Electronics Singapore Pte. Ltd. Method for manufacturing a semiconductor device and semiconductor device with surrounding gate transistor
WO2014171014A1 (ja) * 2013-04-19 2014-10-23 ユニサンティス エレクトロニクス シンガポール プライベート リミテッド 半導体装置の製造方法、及び、半導体装置
WO2015037086A1 (ja) * 2013-09-11 2015-03-19 ユニサンティス エレクトロニクス シンガポール プライベート リミテッド 半導体装置
WO2015071966A1 (ja) * 2013-11-12 2015-05-21 ユニサンティス エレクトロニクス シンガポール プライベート リミテッド 半導体装置
WO2015071965A1 (ja) * 2013-11-12 2015-05-21 ユニサンティス エレクトロニクス シンガポール プライベート リミテッド 半導体装置
WO2015087413A1 (ja) * 2013-12-11 2015-06-18 ユニサンティス エレクトロニクス シンガポール プライベート リミテッド 半導体装置
WO2015097800A1 (ja) * 2013-12-26 2015-07-02 ユニサンティス エレクトロニクス シンガポール プライベート リミテッド 半導体装置
JP5936653B2 (ja) * 2014-08-06 2016-06-22 ユニサンティス エレクトロニクス シンガポール プライベート リミテッドUnisantis Electronics Singapore Pte Ltd. 半導体装置
JP5869079B2 (ja) * 2014-09-02 2016-02-24 ユニサンティス エレクトロニクス シンガポール プライベート リミテッドUnisantis Electronics Singapore Pte Ltd. 半導体装置の製造方法、及び、半導体装置
JP6156883B2 (ja) * 2015-02-06 2017-07-05 ユニサンティス エレクトロニクス シンガポール プライベート リミテッドUnisantis Electronics Singapore Pte Ltd. 半導体装置の製造方法及び半導体装置
JP6427068B2 (ja) * 2015-05-27 2018-11-21 ユニサンティス エレクトロニクス シンガポール プライベート リミテッドUnisantis Electronics Singapore Pte Ltd. 半導体装置
WO2017077578A1 (ja) * 2015-11-02 2017-05-11 ユニサンティス エレクトロニクス シンガポール プライベート リミテッド 半導体装置
JP6329301B2 (ja) * 2017-05-01 2018-05-23 ユニサンティス エレクトロニクス シンガポール プライベート リミテッドUnisantis Electronics Singapore Pte Ltd. 半導体装置の製造方法及び半導体装置
JP6503421B2 (ja) * 2017-09-06 2019-04-17 ユニサンティス エレクトロニクス シンガポール プライベート リミテッドUnisantis Electronics Singapore Pte Ltd. 半導体装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03225873A (ja) * 1990-01-30 1991-10-04 Mitsubishi Electric Corp 半導体装置
JP3403231B2 (ja) * 1993-05-12 2003-05-06 三菱電機株式会社 半導体装置およびその製造方法
JPH1079482A (ja) * 1996-08-09 1998-03-24 Rai Hai 超高密度集積回路
US6304483B1 (en) * 1998-02-24 2001-10-16 Micron Technology, Inc. Circuits and methods for a static random access memory using vertical transistors
JP4674386B2 (ja) * 1999-02-17 2011-04-20 ソニー株式会社 半導体記憶装置
JP2005078741A (ja) * 2003-09-02 2005-03-24 Renesas Technology Corp 半導体記憶装置
JP5114968B2 (ja) * 2007-02-20 2013-01-09 富士通セミコンダクター株式会社 半導体装置及びその製造方法
JP5503971B2 (ja) * 2007-11-07 2014-05-28 ルネサスエレクトロニクス株式会社 半導体装置

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9484424B2 (en) 2013-07-30 2016-11-01 Unisantis Electronics Singapore Pte. Ltd. Semiconductor device with a NAND circuit having four transistors
US9627496B2 (en) 2013-07-30 2017-04-18 Unisantis Electronics Singapore Pte. Ltd. Semiconductor with a two-input NOR circuit
US9449988B2 (en) 2013-08-08 2016-09-20 Unisantis Electronics Singapore Pte. Ltd. Semiconductor device with six transistors forming a nor circuit
US9601510B2 (en) 2013-08-08 2017-03-21 Unisantis Electronics Singapore Pte. Ltd. Semiconductor device with six transistors forming a NAND circuit
US9646991B2 (en) 2013-09-03 2017-05-09 Unisantis Electronics Singapore Pte. Ltd. Semiconductor device with surrounding gate transistors in a NOR circuit
US9716092B2 (en) 2013-09-03 2017-07-25 Unisantis Electronics Singapore Pte. Ltd. Semiconductor device with surrounding gate transistors in a NAND circuit
US9117528B2 (en) 2014-01-20 2015-08-25 Unisantis Electronics Singapore Pte. Ltd. Semiconductor device
US9641179B2 (en) 2014-04-10 2017-05-02 Unisantis Electronics Singapore Pte. Ltd. Semiconductor device
US9876504B2 (en) 2014-04-10 2018-01-23 Unisantis Electronics Singapore Pte. Ltd. Semiconductor device
US9590631B2 (en) 2014-04-22 2017-03-07 Unisantis Electronics Singapore Pte. Ltd. Semiconductor device
US9627407B2 (en) 2014-04-22 2017-04-18 Unisantis Electronics Singapore Pte. Ltd. Semiconductor device comprising a NOR decoder with an inverter

Also Published As

Publication number Publication date
JP2010272874A (ja) 2010-12-02

Similar Documents

Publication Publication Date Title
JP4756221B2 (ja) 半導体記憶装置
TWI402973B (zh) 半導體記憶裝置及其製造方法
WO2009096465A1 (ja) 半導体記憶装置
JP5524547B2 (ja) 半導体記憶装置
KR101182025B1 (ko) 반도체 기억장치
EP2299485A1 (en) SRAM cell comprising four NMOS SGTs and two load resistors
JP5715209B2 (ja) 半導体記憶装置
JP5382939B2 (ja) 半導体記憶装置
TW201336052A (zh) 半導體記憶裝置
JP5489272B2 (ja) 半導体記憶装置
WO2013121537A1 (ja) 半導体記憶装置
JPWO2013121537A1 (ja) 半導体記憶装置
JPWO2013121536A1 (ja) 半導体記憶装置

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20100909

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20100909

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100909

A975 Report on accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A971005

Effective date: 20101021

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101111

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20101206

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110204

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20110509

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20110512

R150 Certificate of patent or registration of utility model

Ref document number: 4756221

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140610

Year of fee payment: 3

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313113

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140610

Year of fee payment: 3

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250