JP4689058B2 - リニアモータ、ステージ装置および露光装置ならびにデバイス製造方法 - Google Patents

リニアモータ、ステージ装置および露光装置ならびにデバイス製造方法 Download PDF

Info

Publication number
JP4689058B2
JP4689058B2 JP2001040170A JP2001040170A JP4689058B2 JP 4689058 B2 JP4689058 B2 JP 4689058B2 JP 2001040170 A JP2001040170 A JP 2001040170A JP 2001040170 A JP2001040170 A JP 2001040170A JP 4689058 B2 JP4689058 B2 JP 4689058B2
Authority
JP
Japan
Prior art keywords
linear motor
metal film
jacket
mover
coil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001040170A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002247830A5 (enExample
JP2002247830A (ja
Inventor
圭司 江本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2001040170A priority Critical patent/JP4689058B2/ja
Priority to US10/068,841 priority patent/US6972499B2/en
Priority to EP02251037A priority patent/EP1233501B1/en
Priority to DE60234398T priority patent/DE60234398D1/de
Priority to KR10-2002-0008143A priority patent/KR100485881B1/ko
Publication of JP2002247830A publication Critical patent/JP2002247830A/ja
Priority to US11/133,292 priority patent/US7218020B2/en
Publication of JP2002247830A5 publication Critical patent/JP2002247830A5/ja
Application granted granted Critical
Publication of JP4689058B2 publication Critical patent/JP4689058B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
    • H02K41/031—Synchronous motors; Motors moving step by step; Reluctance motors of the permanent magnet type
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K9/00—Arrangements for cooling or ventilating
    • H02K9/22—Arrangements for cooling or ventilating by solid heat conducting material embedded in, or arranged in contact with, the stator or rotor, e.g. heat bridges
    • H02K9/227—Heat sinks

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electromagnetism (AREA)
  • Linear Motors (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Motor Or Generator Cooling System (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2001040170A 2001-02-16 2001-02-16 リニアモータ、ステージ装置および露光装置ならびにデバイス製造方法 Expired - Fee Related JP4689058B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2001040170A JP4689058B2 (ja) 2001-02-16 2001-02-16 リニアモータ、ステージ装置および露光装置ならびにデバイス製造方法
US10/068,841 US6972499B2 (en) 2001-02-16 2002-02-11 Linear motor, stage apparatus, exposure apparatus, and device manufacturing method
DE60234398T DE60234398D1 (de) 2001-02-16 2002-02-15 Linearmotor, Trägersystem und Belichtungssystem mit einem solchen Linearmotor, und Herstellungsmethode
KR10-2002-0008143A KR100485881B1 (ko) 2001-02-16 2002-02-15 리니어모터, 스테이지장치, 노광장치 및 디바이스제조방법
EP02251037A EP1233501B1 (en) 2001-02-16 2002-02-15 Linear motor, stage apparatus, exposure apparatus and device manufacturing method
US11/133,292 US7218020B2 (en) 2001-02-16 2005-05-20 Linear motor, stage apparatus, exposure apparatus, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001040170A JP4689058B2 (ja) 2001-02-16 2001-02-16 リニアモータ、ステージ装置および露光装置ならびにデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2002247830A JP2002247830A (ja) 2002-08-30
JP2002247830A5 JP2002247830A5 (enExample) 2008-03-27
JP4689058B2 true JP4689058B2 (ja) 2011-05-25

Family

ID=18902826

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001040170A Expired - Fee Related JP4689058B2 (ja) 2001-02-16 2001-02-16 リニアモータ、ステージ装置および露光装置ならびにデバイス製造方法

Country Status (5)

Country Link
US (2) US6972499B2 (enExample)
EP (1) EP1233501B1 (enExample)
JP (1) JP4689058B2 (enExample)
KR (1) KR100485881B1 (enExample)
DE (1) DE60234398D1 (enExample)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4689058B2 (ja) * 2001-02-16 2011-05-25 キヤノン株式会社 リニアモータ、ステージ装置および露光装置ならびにデバイス製造方法
KR20030067168A (ko) * 2002-02-07 2003-08-14 이승구 솔더 레지스트 잉크 조성물
US7336006B2 (en) * 2002-09-19 2008-02-26 Fuji Xerox Co., Ltd. Magnetic actuator with reduced magnetic flux leakage and haptic sense presenting device
JPWO2004068673A1 (ja) * 2003-01-28 2006-05-25 本田技研工業株式会社 永久磁石式モータ用ロータ
EP1475668A1 (en) 2003-05-09 2004-11-10 ASML Netherlands B.V. Method of preparing components for a lithographic apparatus
JP4241295B2 (ja) * 2003-09-26 2009-03-18 キヤノン株式会社 ステージ装置
JP2005209670A (ja) * 2004-01-20 2005-08-04 Canon Inc 磁気浮上装置
JP4418710B2 (ja) * 2004-05-17 2010-02-24 キヤノン株式会社 ステージ装置
WO2005112233A1 (ja) * 2004-05-18 2005-11-24 Kabushiki Kaisha Yaskawa Denki キャンド・リニアモータ電機子およびキャンド・リニアモータ
JP4386807B2 (ja) * 2004-07-29 2009-12-16 富士通コンポーネント株式会社 触覚パネル
JP4725910B2 (ja) * 2004-09-07 2011-07-13 日本パルスモーター株式会社 リニアアクチュエータ
JP4765937B2 (ja) * 2004-10-01 2011-09-07 株式会社ニコン リニアモータ、ステージ装置、及び露光装置
JP2006174583A (ja) * 2004-12-15 2006-06-29 Fanuc Ltd リニアモータ
JP4612847B2 (ja) * 2005-02-10 2011-01-12 キヤノン株式会社 容器、及びそれを用いた露光装置
DE102005054531A1 (de) * 2005-11-14 2007-05-24 Trithor Gmbh Primärteil eines Linearmotors und Linearmotor hiermit
FR2900287B1 (fr) * 2006-04-20 2008-11-07 Sidel Participations Support pour un moteur electrique lineaire comportant des moyens de compensation thermique
DE102006022191A1 (de) * 2006-05-12 2007-11-15 Rovema - Verpackungsmaschinen Gmbh Beutelmaschine für Verpackungszwecke
JP2008048565A (ja) * 2006-08-21 2008-02-28 Murata Mach Ltd リニアモータおよびそれを搭載した工作機械
JP2008167574A (ja) * 2006-12-28 2008-07-17 Meidensha Corp 永久磁石形回転電機
US8185434B2 (en) 2007-07-11 2012-05-22 Bous Joseph System and method for conducting sales
JP5357485B2 (ja) * 2008-09-30 2013-12-04 サバンジ大学 磁石可動型リニアモータ
DE102010004642B4 (de) * 2010-01-13 2012-09-27 Integrated Dynamics Engineering Gmbh Magnetaktor sowie Verfahren zu dessen Montage
US8829740B2 (en) * 2010-05-27 2014-09-09 Rockwell Automation Technologies, Inc. Sealed linear motor system
KR101732636B1 (ko) 2010-08-23 2017-05-24 주식회사 코베리 선형 전동기
DE102010041468A1 (de) * 2010-09-27 2012-03-29 Carl Zeiss Smt Gmbh Baugruppe einer Projektionsbelichtungsanlage für die EUV-Lithographie
US8885148B2 (en) * 2011-01-04 2014-11-11 Asml Holding N.V. System and method for design of linear motor for vacuum environment
US9968002B2 (en) * 2016-09-23 2018-05-08 Hiwin Mikrosystems Corp. Heat-transfer mechanism of motor primary
JP7060995B2 (ja) * 2018-03-30 2022-04-27 キヤノン株式会社 ステージ装置、リソグラフィ装置、および物品の製造方法
NL2022467B1 (en) * 2019-01-28 2020-08-18 Prodrive Tech Bv Position sensor for long stroke linear permanent magnet motor
WO2020223030A1 (en) * 2019-04-29 2020-11-05 Kulicke And Soffa Industries, Inc. Linear motors and wire bonding machines including the same
JP7266015B2 (ja) * 2020-09-18 2023-04-27 株式会社Ｓｃｒｅｅｎホールディングス 真空処理装置
JP7337766B2 (ja) * 2020-09-18 2023-09-04 株式会社Ｓｃｒｅｅｎホールディングス 真空処理装置
JP7720550B2 (ja) * 2021-09-29 2025-08-08 パナソニックＩｐマネジメント株式会社 直動装置および電子部品実装装置

Family Cites Families (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4184089A (en) * 1976-02-18 1980-01-15 Westinghouse Electric Corp. Multiple plane spoke structure for a superconducting dynamoelectric machine
JPS5953784B2 (ja) * 1980-04-15 1984-12-26 ブラザー工業株式会社 リニアステツプモ−タ
US4492356A (en) * 1982-02-26 1985-01-08 Hitachi, Ltd. Precision parallel translation system
JPH0487551A (ja) * 1990-07-26 1992-03-19 Nippon Seiko Kk リニアモータ装置
US5153472A (en) * 1991-07-19 1992-10-06 International Business Machines Corporation Probe positioning actuator
US5714272A (en) * 1991-12-12 1998-02-03 Zaidan Houjin Shinku Kagaku Kenkyujo Heat insulating film
JPH06275873A (ja) * 1993-03-18 1994-09-30 Toshiba Corp 超電導磁石装置
JP3121718B2 (ja) * 1993-11-15 2001-01-09 東海旅客鉄道株式会社 地上コイル装置及びその製造方法
JP3209636B2 (ja) * 1994-03-30 2001-09-17 日本トムソン株式会社 リニア直流モータ及びこれを具備した駆動ユニット
JP3148512B2 (ja) * 1994-05-02 2001-03-19 キヤノン株式会社 駆動装置
IL109845A (en) * 1994-06-01 1998-08-16 Tadiran Ltd Rechargeable electrochemical cell
US5554460A (en) * 1994-07-05 1996-09-10 Motorola, Inc. Multi-layered coated membrane electrodes for electrochemical cells and cells using same
JP3475973B2 (ja) * 1994-12-14 2003-12-10 株式会社ニコン リニアモータ、ステージ装置、及び露光装置
JPH08214514A (ja) * 1995-02-01 1996-08-20 Mitsubishi Electric Corp かご形誘導電動機、そのステータ鋳造金型およびステータ鋳造方法
JPH08339952A (ja) * 1995-06-12 1996-12-24 Mitsubishi Electric Corp マーク位置識別装置およびマーク位置識別方法
US5925956A (en) * 1995-06-30 1999-07-20 Nikon Corporation Stage construction incorporating magnetically levitated movable stage
JP2971799B2 (ja) * 1996-02-14 1999-11-08 日本酸素株式会社 合成樹脂製断熱二重壁容器の製造方法及び合成樹脂製断熱二重壁蓋の製造方法
KR100302929B1 (ko) * 1995-12-25 2001-11-02 오카모토 유지 초고 진공용 영구자석
JPH09182408A (ja) * 1995-12-27 1997-07-11 Hitachi Metals Ltd リニアモータ
US6012697A (en) * 1996-04-12 2000-01-11 Nikon Corporation Stage and supporting mechanism for supporting movable mirror on stage
US5995328A (en) * 1996-10-03 1999-11-30 Quantum Corporation Multi-layered integrated conductor trace array interconnect structure having optimized electrical parameters
US6084319A (en) * 1996-10-16 2000-07-04 Canon Kabushiki Kaisha Linear motor, and stage device and exposure apparatus provided with the same
US5998889A (en) * 1996-12-10 1999-12-07 Nikon Corporation Electro-magnetic motor cooling system
JPH10209033A (ja) * 1997-01-21 1998-08-07 Canon Inc 位置決めステージ装置およびこれを用いた露光装置
JPH10270535A (ja) * 1997-03-25 1998-10-09 Nikon Corp 移動ステージ装置、及び該ステージ装置を用いた回路デバイス製造方法
JPH1198811A (ja) * 1997-09-24 1999-04-09 Canon Inc リニアモータ、これを用いたステージ装置や露光装置、ならびにデバイス製造方法
JPH11275849A (ja) * 1998-03-18 1999-10-08 Yaskawa Electric Corp キャンド・リニアモータの固定子
CN1251381C (zh) * 1998-04-23 2006-04-12 西铁城时计株式会社 小型电动机的转子
US6114781A (en) * 1999-02-26 2000-09-05 Nikon Corporation Cooling system for a linear or planar motor
US6130490A (en) * 1999-04-06 2000-10-10 Nikon Corporation X-Y stage with movable magnet plate
JP2001025227A (ja) * 1999-07-08 2001-01-26 Canon Inc リニアモータ並びにこれを有するステージ装置および露光装置
JP2001025277A (ja) 1999-07-09 2001-01-26 Kobe Steel Ltd 同期電動機のセンサレス制御装置
JP2001118773A (ja) * 1999-10-18 2001-04-27 Nikon Corp ステージ装置及び露光装置
KR100345320B1 (ko) * 1999-12-23 2002-07-24 학교법인 포항공과대학교 스테인레스 스틸 표면상에 크롬산화막을 형성하는 방법
US6307619B1 (en) * 2000-03-23 2001-10-23 Silicon Valley Group, Inc. Scanning framing blade apparatus
US6798092B1 (en) * 2000-10-12 2004-09-28 Christopher W. Gabrys Low outgas flywheel motor/generator
JP2002176761A (ja) 2000-12-08 2002-06-21 Canon Inc リニアモータ及び該リニアモータを用いた露光装置
JP4689058B2 (ja) * 2001-02-16 2011-05-25 キヤノン株式会社 リニアモータ、ステージ装置および露光装置ならびにデバイス製造方法
DE10109031A1 (de) * 2001-02-24 2002-09-05 Zeiss Carl Optisches Strahlführungssystem und Verfahren zur Kontaminationsverhinderung optischer Komponenten hiervon
JP4110504B2 (ja) * 2001-03-13 2008-07-02 株式会社安川電機 真空用モータ
US6646233B2 (en) * 2002-03-05 2003-11-11 Hitachi High-Technologies Corporation Wafer stage for wafer processing apparatus and wafer processing method

Also Published As

Publication number Publication date
EP1233501A2 (en) 2002-08-21
US20020113498A1 (en) 2002-08-22
DE60234398D1 (de) 2009-12-31
KR20020067672A (ko) 2002-08-23
JP2002247830A (ja) 2002-08-30
EP1233501B1 (en) 2009-11-18
US7218020B2 (en) 2007-05-15
KR100485881B1 (ko) 2005-04-29
US6972499B2 (en) 2005-12-06
US20050212362A1 (en) 2005-09-29
EP1233501A3 (en) 2004-05-12

Similar Documents

Publication Publication Date Title
JP4689058B2 (ja) リニアモータ、ステージ装置および露光装置ならびにデバイス製造方法
JP4745556B2 (ja) 位置決め装置、露光装置、及びデバイス製造方法
US7994484B2 (en) Stage apparatus and exposure apparatus
JP3814598B2 (ja) 温度調整装置、露光装置及びデバイス製造方法
US7280185B2 (en) Stage system including fine-motion cable unit, exposure apparatus, and method of manufacturing device
EP1457834A2 (en) Positioning apparatus, exposure apparatus and method for producing device
JP2006287014A (ja) 位置決め装置およびリニアモータ
US20040080727A1 (en) EUV exposure apparatus with cooling device to prevent overheat of electromagnetic motor in vacuum
JP2001025227A (ja) リニアモータ並びにこれを有するステージ装置および露光装置
KR101151575B1 (ko) 리니어 모터, 스테이지 장치 및 노광 장치
US5574556A (en) Stage mechanism in exposure apparatus
JP2001037200A (ja) リニアモータ、ステージ装置、露光装置およびデバイス製造方法
JPH10309071A (ja) リニアモータ及びこれを有するステージ装置や露光装置
JP2004304117A (ja) 鉄心
JP4474151B2 (ja) モータおよびそれを用いた露光装置ならびにデバイス製造方法
JP2005295762A (ja) ステージ装置および露光装置
JP2005243809A (ja) 露光装置、および該露光装置に好適に用いられる駆動手段
JP3592292B2 (ja) リニアモータを有するステージ装置、露光装置
JP2004281654A (ja) 駆動機構及びそれを用いた露光装置、デバイスの製造方法
JPH07130647A (ja) マスク支持装置およびこれを用いた露光装置
JP2005260183A (ja) 移動装置及び露光装置
JP2005117866A (ja) リニアモータ、ステージ装置、露光装置、並びにデバイス製造方法
JP2018072662A (ja) 光学装置、それを備えた露光装置、および物品の製造方法
JP2004349576A (ja) ステージ装置、静圧軸受装置、位置決め方法、露光装置及びデバイス製造方法
JP2005110466A (ja) リニアモータ、ステージ装置および露光装置ならびにデバイス製造方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080213

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20080213

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20100201

RD01 Notification of change of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7421

Effective date: 20100630

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100819

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100824

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101022

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20110215

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20110216

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

Ref document number: 4689058

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140225

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees