JP4569849B2 - ウレタン化反応触媒、及びウレタン化物の製造方法 - Google Patents
ウレタン化反応触媒、及びウレタン化物の製造方法 Download PDFInfo
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- JP4569849B2 JP4569849B2 JP2010504317A JP2010504317A JP4569849B2 JP 4569849 B2 JP4569849 B2 JP 4569849B2 JP 2010504317 A JP2010504317 A JP 2010504317A JP 2010504317 A JP2010504317 A JP 2010504317A JP 4569849 B2 JP4569849 B2 JP 4569849B2
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- catalyst
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- metal oxide
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- acid
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- RBQRWNWVPQDTJJ-UHFFFAOYSA-N methacryloyloxyethyl isocyanate Chemical compound CC(=C)C(=O)OCCN=C=O RBQRWNWVPQDTJJ-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910052680 mordenite Inorganic materials 0.000 description 1
- KHARCSTZAGNHOT-UHFFFAOYSA-N naphthalene-2,3-dicarboxylic acid Chemical compound C1=CC=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 KHARCSTZAGNHOT-UHFFFAOYSA-N 0.000 description 1
- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 description 1
- WPUMVKJOWWJPRK-UHFFFAOYSA-N naphthalene-2,7-dicarboxylic acid Chemical compound C1=CC(C(O)=O)=CC2=CC(C(=O)O)=CC=C21 WPUMVKJOWWJPRK-UHFFFAOYSA-N 0.000 description 1
- UFWIBTONFRDIAS-UHFFFAOYSA-N naphthalene-acid Natural products C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 1
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- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 150000002926 oxygen Chemical class 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
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- 150000004714 phosphonium salts Chemical class 0.000 description 1
- DHRLEVQXOMLTIM-UHFFFAOYSA-N phosphoric acid;trioxomolybdenum Chemical compound O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.OP(O)(O)=O DHRLEVQXOMLTIM-UHFFFAOYSA-N 0.000 description 1
- IYDGMDWEHDFVQI-UHFFFAOYSA-N phosphoric acid;trioxotungsten Chemical compound O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.OP(O)(O)=O IYDGMDWEHDFVQI-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
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- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
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- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910001388 sodium aluminate Inorganic materials 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000011949 solid catalyst Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 239000012798 spherical particle Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000012974 tin catalyst Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- KSBAEPSJVUENNK-UHFFFAOYSA-L tin(ii) 2-ethylhexanoate Chemical compound [Sn+2].CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O KSBAEPSJVUENNK-UHFFFAOYSA-L 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 150000003623 transition metal compounds Chemical class 0.000 description 1
- PIILXFBHQILWPS-UHFFFAOYSA-N tributyltin Chemical compound CCCC[Sn](CCCC)CCCC PIILXFBHQILWPS-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- WRECIMRULFAWHA-UHFFFAOYSA-N trimethyl borate Chemical compound COB(OC)OC WRECIMRULFAWHA-UHFFFAOYSA-N 0.000 description 1
- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 description 1
- 238000009849 vacuum degassing Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
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- C08G18/4238—Polycondensates having carboxylic or carbonic ester groups in the main chain containing only aliphatic groups derived from dicarboxylic acids and dialcohols
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Description
(A)金属酸化物担体(A−1)表面に、金属酸化物(A−2)又は非金属化合物(A−3)を担持してなる複合金属酸化物、(B)ゼオライト、及び(C)ヘテロポリ酸から成る群から選ばれる少なくとも1つの固体酸触媒であるウレタン化反応触媒を提供する。
本発明のウレタン化反応触媒は、(A)金属酸化物担体(A−1)表面に、金属酸化物(A−2)又は非金属化合物(A−3)を担持してなる複合金属酸化物、(B)ゼオライト、(C)ヘテロポリ酸から成る群から選ばれる少なくとも1つの固体酸触媒であることが特徴である。
例えば、ジルコニア系担体酸化物に酸根を担持させた酸化物の調製は、担体のジルコニア系酸化物に無機酸またはその塩を含有させ、673〜1073Kで焼成することによって得ることができる。無機酸又はその塩としては、硫酸、塩酸、リン酸、炭酸、硝酸、ホウ酸及びそれらの塩、例えばアンモニウム塩、ナトリウム塩、カリウム塩等が挙げられる。本発明では、特に硫酸、硫酸アンモニウム、硫酸ナトリウム等が好ましく用いられる。これらの酸根を担持させた酸化物は、公知慣用の方法で調整することができる。
なお、ヘテロポリ酸の酸性塩における水素原子の置換数は特に限定されない。その使用法についても特に制限は無く、シリカ、アルミナ、シリカアルミナ、シリカジルコニア、珪藻土、ゼオライト、チタニア、ジルコニア、炭化ケイ素、活性炭などの担体に担持して用いても良い。
本発明で使用する水酸基含有化合物とイソシアナート化合物は、通常のウレタンの製造に用いられる化合物であれば特に限定されない。
ポリウレタンの製造原料である水酸基含有化合物は、通常のポリウレタンの製造に用いられる化合物であれば特に制限されないが、たとえば多価アルコール、ポリエーテルポリオール、ポリエステルポリオール、ポリマーポリオールなどが挙げられる。
ウレタン化反応を利用して、ウレタン結合を有する反応性化合物を製造する場合には、水酸基含有化合物又はイソシアナート化合物のいずれか一方に、反応性基を有することが好ましい。反応性基としては、ラジカル重合性基が、活性エネルギー線硬化や熱硬化に利用することができ、好ましい。
(1)常圧下にポリオールと多価カルボン酸とを縮重合させる方法、
(2)真空下で両者を縮合重合せしめる方法、
(3)トルエンの如き不活性溶剤の存在下で縮重合を行う方法
などがある。
縮重合反応は、窒素等の不活性ガスの雰囲気下で行うことが、得られるポリエステル、ポリエステルポリオール、不飽和ポリエステルの着色を防止する点で好ましい。
前記固体酸触媒を除去する場合は、得られたウレタン化物の粘度が低い場合には、濾過等の方法により容易に除去可能である。得られたウレタン化物の粘度が高く、濾過が困難である場合には、適宜溶剤により希釈する、或いは加熱するなど粘度を低下させて濾過することにより容易に除去可能となる。また、粒径の大きな触媒を用い、固定床流通式反応器を利用することで濾過をせずに触媒を分離することも可能である。
本発明のウレタン化反応触媒を、2液型ウレタン化組成物用として使用してもよい。この場合は、ウレタン化反応触媒として(A)金属酸化物担体(A−1)表面に担持金属酸化物(A−2)を担持してなる複合金属酸化物を選択すると、金属種を適宜選択できるので、毒性の低い金属を選択することが可能であり、触媒の分離が必要でない2液型ウレタン化組成物用の触媒としても好適に使用できる。
なお、実施例及び比較例の転化率(%)は下記の式により算出し、評価した。
転化率(%)=100(%)−NCO保持率(%)
[数2]
NCO保持率(%)=(反応後のNCO含有率(%)÷仕込み時のNCO含有率(%))
×100(%)
100℃で一晩乾燥させた水酸化ジルコニウム(Zr(OH)4、日本軽金属工業製)50gを、純水にモリブデン酸アンモニウム[(NH4)6Mo7O24・4H2O(キシダ化学製)]を必要量溶かした水溶液(0.04mol・dm−3)を用い、水酸化ジルコニウムの細孔容積分の前記モリブデン酸アンモニウム水溶液を少しずつ加えてジルコニウム担体表面が均一に濡れた状態にして焼成前の前駆体を得た(インシピエント・ウェットネス法)。三酸化モリブデン(MoO3)の担持量が、質量比でMo/Zr=0.1となるように溶液濃度で調節した。反応前処理として酸素雰囲気下焼成温度1073Kで3時間焼成を行った。自然放置冷却し、常温にして、固体酸触媒(AA−1)を得た。
焼成温度を673Kに変えた以外は上記実施例1と同様に調製し、固体酸触媒(AA−2)を得た。
100℃で一晩乾燥させた水酸化ジルコニウム(Zr(OH)4、日本軽金属工業製)50gを、純水にパラタングステン酸アンモニウム[(NH4)10W12O41・5H2O(キシダ化学製)]を必要量溶かした水溶液(0.016mol・dm−3)を用い、水酸化ジルコニウムの細孔容積分の前記パラタングステン酸アンモニウム水溶液を少しずつ加えてジルコニウム担体表面が均一に濡れた状態にして焼成前の前駆体を得た(インシピエント・ウェットネス法)。三酸化タングステン(WO3)の担持量が、質量比でW/Zr=0.2となるように溶液濃度で調節した。反応前処理として酸素雰囲気下焼成温度1073Kで、3時間焼成を行った。放置冷却し、常温にして、固体酸触媒(AA−3)を得た。
測定方法:
試料(固体酸触媒AA−1又は固体酸触媒AA−2)約0.1gを日本ベル製TPD−AT−1型昇温脱離装置の石英セル(内径10mm)にセットし、ヘリウムガス(30cm3min−1,1atm)流通下で423K(150℃)まで5Kmin−1で昇温し、423Kで3時間保った。その後、ヘリウムガスを流通させたまま373K(100℃)まで7.5Kmin−1で降温した後に真空脱気し、100Torr(1Torr=1/760atm=133Pa)のNH3を導入して30分間吸着させ、その後12分間脱気した後に水蒸気処理を行った。水蒸気処理としては、373Kで約25Torr(約3kPa)の蒸気圧の水蒸気を導入、そのまま30分間保ち、30分間脱気、再び30分間水蒸気導入、再び30分間脱気の順に繰り返した。その後、ヘリウムガス0.041mmols−1(298K,25℃,1atmで60cm3min−1に相当する)を、減圧を保ちながら(100Torr)流通させ、373Kで30分間保った後に試料床を10Kmin−1で983K(710℃)まで昇温し、出口気体を質量分析計(ANELVAM−QA100F)で分析した。
実測に基づく1点法では、ピーク面積から酸量、ピーク位置などから平均酸強度を決定できる。この方法によると質量当たりの固体酸触媒AA−1の酸量は約0.03molkg−1、固体酸触媒AA−2の酸量は約0.2molkg−1と差があるように思われるが、表面密度(酸量/表面積)は固体酸触媒A,Bとも0.4〜0.7nm−2程度であった。平均酸強度は固体酸触媒AA−1がΔH=133kJmol−1、H0に換算して−7.4に対して、固体酸触媒AA−2がΔH=116kJmol−1、H0に換算して−4.4とやや弱かった。
100mLの丸底フラスコに4.00gのヘキサメチレンジイソシアナートと5.69gのアクリル酸2−ヒドロキシエチル、及び溶媒として10.0gの酢酸エチルを仕込み、触媒として上記触媒調製例1の固体酸触媒(AA−1)を0.30g添加した。
100mLの丸底フラスコに4.00gのヘキサメチレンジイソシアナートと5.69gのアクリル酸2−ヒドロキシエチル、及び溶媒として10.0gの酢酸エチルを仕込み、触媒として上記触媒調製例1の固体酸触媒(AA−1)を0.30g添加した。
100mLの丸底フラスコに10.00gのヘキサメチレンジイソシアナートと14.22gのアクリル酸2−ヒドロキシエチルを仕込み、触媒として上記触媒調製例1の固体酸触媒(AA−1)を0.75g添加した。
100mLの丸底フラスコに4.00gのヘキサメチレンジイソシアナートと5.69gのアクリル酸2−ヒドロキシエチル、及び溶媒として10.0gの酢酸エチルを仕込み、触媒として上記触媒調製例2の固体酸触媒(AA−2)を0.30g添加した。
水酸基価56.0(分子量2000)のポリプロピレングリコール300.0gを500mLビーカー中で80℃に温調し、60℃に温調したジフェニルメタンジイソシアナート38.0gを加え、さらに上記触媒調製例1で調製した固体酸触媒(AA−1)を6.8g添加し、さらに80℃で温調した状態を保ちながら撹拌し、反応の進行に伴う増粘挙動を追跡すると、樹脂粘度が20Pa・s到達に要した時間は14分であった。
冷却管、凝集管、窒素導入管付きの500mLの四ッ口フラスコに1、4ブタンジオール131gとアジピン酸169g、固体酸触媒(AA−1)6gを仕込み、10mL/minで窒素ブローしながら115℃まで昇温、91mmHgの減圧下で24時間反応を行い、OHV102.4、酸価0.68のポリエステルポリオール(分子量約1100)を得た。
100mLの丸底フラスコに4.00gのヘキサメチレンジイソシアナートと5.69gのアクリル酸2−ヒドロキシエチル、及び溶媒として10.0gの酢酸エチルを仕込み、触媒として上記触媒調製例3の固体酸触媒(AA−3)を0.30g添加した。
100mLの丸底フラスコに4.00gのヘキサメチレンジイソシアナートと6.38gのアクリル酸2−ヒドロキシプロピル、及び溶媒として10.0gの酢酸エチルを仕込み、触媒として上記触媒調製例1の固体酸触媒(AA−1)を0.30g添加した。
100mLの丸底フラスコに4.00gのヘキサメチレンジイソシアナートと6.38gのアクリル酸2−ヒドロキシプロピル、及び溶媒として10.0gの酢酸エチルを仕込み、触媒として上記触媒調製例3の固体酸触媒(AA−3)を0.30g添加した。
100mLの丸底フラスコに4.00gのヘキサメチレンジイソシアナートと5.69gのアクリル酸2−ヒドロキシエチル、及び溶媒として10.0gの酢酸エチルを仕込み、触媒として公知慣用の方法によって調整したリン酸根ジルコニアを0.30g添加した。反応温度60℃で撹拌しながら反応を行い、反応開始から5時間後に反応混合物を少量採取し、NCO含有率(%)を測定した。測定結果に基づいて得たNCO転化率は60%であった。反応液を0.2ミクロンのメンブレンフィルターで濾過し、触媒を取り除き、目的とするウレタンアクリレートの酢酸エチル溶液を得た。酢酸エチル溶液中の触媒の残存率は検出限界(5ppm)以下であった。
100mLの丸底フラスコに4.00gのヘキサメチレンジイソシアナートと5.69gのアクリル酸2−ヒドロキシエチル、及び溶媒として10.0gの酢酸エチルを仕込み、触媒としてジブチルチンジラウレートを0.002g添加した。
100mLの丸底フラスコに4.00gのヘキサメチレンジイソシアナートと5.69gのアクリル酸2−ヒドロキシエチル、及び溶媒として10.0gの酢酸エチルを仕込んだ。
100mLの丸底フラスコに4.00gのヘキサメチレンジイソシアナートと5.69gのアクリル酸2−ヒドロキシエチル、及び溶媒として10.0gの酢酸エチルを仕込み、触媒としてジブチルチンジラウレートを0.002g添加した。
100mLの丸底フラスコに4.00gのヘキサメチレンジイソシアナートと5.69gのアクリル酸2−ヒドロキシエチル、及び溶媒として10.0gの酢酸エチルを仕込んだ。
100mLの丸底フラスコに10.00gのヘキサメチレンジイソシアナートと14.22gのアクリル酸2−ヒドロキシエチルを仕込み、触媒としてジブチルチンジラウレートを0.006g添加した。
100mLの丸底フラスコに10.00gのヘキサメチレンジイソシアナートと14.22gのアクリル酸2−ヒドロキシエチルを仕込んだ。
水酸基価56.0(分子量2000)のポリプロピレングリコール300.0gを500mLビーカー中で80℃に温調し、60℃に温調したジフェニルメタンジイソシアナート38.0gを加え、80℃で温調した状態を保ちながら撹拌し、反応の進行に伴う増粘挙動を追跡し、樹脂粘度が20Pa・s到達に要した時間は100分と非常に遅かった。
100mLの丸底フラスコに4.00gのヘキサメチレンジイソシアナートと6.38gのアクリル酸2−ヒドロキシプロピル、及び溶媒として10.0gの酢酸エチルを仕込んだ。反応温度80℃で撹拌しながら反応を行い、反応開始から12時間後に反応混合物を少量採取し、NCO含有率(%)を測定した。測定結果に基づいて得たNCO転化率は0%であった。即ち、残存金属の影響を避けるために触媒を使用せずに反応させた場合、反応しないことが判る。
B:固体酸触媒AA−2
Claims (8)
- 水酸基含有化合物とイソシアナート化合物を反応させてウレタン化物を製造するための触媒であって、該触媒が、
(A)金属酸化物担体(A−1)表面に、金属酸化物(A−2)又は非金属化合物(A−3)を担持してなる複合金属酸化物の固体酸触媒であることを特徴とするウレタン化反応触媒。 - 前記金属酸化物担体(A−1)が、ジルコニア、シリカ、アルミナ若しくはチタニアのいずれか、又はこれらを任意の組み合わせで併用したものである請求項1に記載のウレタン化反応触媒。
- 前記担持する金属酸化物(A−2)が、モリブデン酸化物、タングステン酸化物若しくはタンタル酸化物のいずれか、又はこれらを任意の組み合わせで併用したものである請求項1又は2に記載のウレタン化反応触媒。
- 前記担持する非金属化合物(A−3)が硫酸根含有化合物、又はリン酸根含有化合物であることを特徴とする請求項1又は2に記載のウレタン化反応触媒。
- 水酸基含有化合物とイソシアナート化合物とを、請求項1に記載のウレタン化反応触媒のうち、(A)金属酸化物担体(A−1)表面に、金属酸化物(A−2)又は非金属化合物(A−3)を担持してなる複合金属酸化物の存在下に反応させることを特徴とするウレタン化物の製造方法。
- 水酸基含有化合物がポリオールであり、前記イソシアナート化合物が2つ以上のイソシアナート基を有する化合物である、請求項5に記載のウレタン化物の製造方法。
- 前記水酸基含有化合物がポリオールであり、前記イソシアナート化合物が1つのイソシアナート基とラジカル重合性基とを有する化合物であるか、又は
前記水酸基含有化合物が1つのヒドロキシ基とラジカル重合性基とを有する化合物であり、前記イソシアナート化合物が2つ以上のイソシアナート基を有する化合物である、請求項5に記載のウレタン化物の製造方法。 - 請求項3に記載のウレタン化反応触媒が、請求項2に記載の金属酸化物担体(A−1)としてジルコニアを、請求項3に記載の金属酸化物(A−2)としてモリブデン酸化物を用い、且つハメットの酸度関数(H0)が−3〜−9である複合金属酸化物(AA)であって、該複合金属酸化物(AA)の存在下に、
1)ポリオールと多価カルボン酸とを反応させポリエステルポリオールを製造する工程
2)該ポリエステルポリオールと前記イソシアネートとのウレタン化反応を行う工程
を、順次行うことを特徴とするウレタン化物の製造方法。
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