JP4551758B2 - 液浸露光方法および半導体装置の製造方法 - Google Patents

液浸露光方法および半導体装置の製造方法 Download PDF

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Publication number
JP4551758B2
JP4551758B2 JP2004378299A JP2004378299A JP4551758B2 JP 4551758 B2 JP4551758 B2 JP 4551758B2 JP 2004378299 A JP2004378299 A JP 2004378299A JP 2004378299 A JP2004378299 A JP 2004378299A JP 4551758 B2 JP4551758 B2 JP 4551758B2
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Japan
Prior art keywords
wafer
substrate
liquid
film
immersion
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Expired - Fee Related
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JP2004378299A
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English (en)
Japanese (ja)
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JP2006186112A (ja
JP2006186112A5 (https=
Inventor
健太郎 松永
信一 伊藤
拓也 河野
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Toshiba Corp
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Toshiba Corp
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Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP2004378299A priority Critical patent/JP4551758B2/ja
Priority to TW094143393A priority patent/TWI290339B/zh
Priority to US11/315,000 priority patent/US7423728B2/en
Priority to KR1020050129525A priority patent/KR100753270B1/ko
Publication of JP2006186112A publication Critical patent/JP2006186112A/ja
Publication of JP2006186112A5 publication Critical patent/JP2006186112A5/ja
Application granted granted Critical
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2004378299A 2004-12-27 2004-12-27 液浸露光方法および半導体装置の製造方法 Expired - Fee Related JP4551758B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2004378299A JP4551758B2 (ja) 2004-12-27 2004-12-27 液浸露光方法および半導体装置の製造方法
TW094143393A TWI290339B (en) 2004-12-27 2005-12-08 Liquid immersion exposure method, liquid immersion type exposure device, and manufacturing method of semiconductor
US11/315,000 US7423728B2 (en) 2004-12-27 2005-12-23 Immersion exposure method and apparatus, and manufacturing method of a semiconductor device
KR1020050129525A KR100753270B1 (ko) 2004-12-27 2005-12-26 액침 노광 방법, 액침형 노광 장치, 및 반도체 장치의 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004378299A JP4551758B2 (ja) 2004-12-27 2004-12-27 液浸露光方法および半導体装置の製造方法

Publications (3)

Publication Number Publication Date
JP2006186112A JP2006186112A (ja) 2006-07-13
JP2006186112A5 JP2006186112A5 (https=) 2010-02-25
JP4551758B2 true JP4551758B2 (ja) 2010-09-29

Family

ID=36739007

Family Applications (1)

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JP2004378299A Expired - Fee Related JP4551758B2 (ja) 2004-12-27 2004-12-27 液浸露光方法および半導体装置の製造方法

Country Status (4)

Country Link
US (1) US7423728B2 (https=)
JP (1) JP4551758B2 (https=)
KR (1) KR100753270B1 (https=)
TW (1) TWI290339B (https=)

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KR101101737B1 (ko) * 2002-12-10 2012-01-05 가부시키가이샤 니콘 노광장치 및 노광방법, 디바이스 제조방법
JP4696558B2 (ja) * 2005-01-07 2011-06-08 Ｊｓｒ株式会社 フォトレジストパターン形成方法、及びフォトレジストパターン形成用基板
JPWO2006080250A1 (ja) * 2005-01-25 2008-08-07 Jsr株式会社 液浸型露光システム、液浸型露光用液体のリサイクル方法及び供給方法
JP5045437B2 (ja) * 2005-06-21 2012-10-10 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
US20070085989A1 (en) * 2005-06-21 2007-04-19 Nikon Corporation Exposure apparatus and exposure method, maintenance method, and device manufacturing method
JP2007142181A (ja) * 2005-11-18 2007-06-07 Toshiba Corp 基板処理方法及びリンス装置
JP2007194503A (ja) * 2006-01-20 2007-08-02 Toshiba Corp 基板処理方法および基板処理装置
JP4830523B2 (ja) * 2006-02-08 2011-12-07 東京エレクトロン株式会社 塗布、現像装置、塗布、現像方法及びその方法を実施するためのコンピュータプログラム。
US20070269724A1 (en) * 2006-05-17 2007-11-22 Micronic Laser Systems Ab Method and process for immersion exposure of a substrate
JP4368365B2 (ja) 2006-08-02 2009-11-18 Ｔｄｋ株式会社 液浸露光用基板およびその製造方法、ならびに液浸露光方法
JP4772620B2 (ja) * 2006-08-11 2011-09-14 東京エレクトロン株式会社 液浸露光用塗布膜の処理条件決定方法および処理条件決定装置
JP2008060302A (ja) * 2006-08-31 2008-03-13 Sokudo:Kk 基板処理装置
JP5029611B2 (ja) * 2006-09-08 2012-09-19 株式会社ニコン クリーニング用部材、クリーニング方法、露光装置、並びにデバイス製造方法
JP4813333B2 (ja) 2006-11-21 2011-11-09 東京エレクトロン株式会社 膜形成方法、膜形成装置、パターン形成方法およびコンピュータ読取可能な記憶媒体
US20080198346A1 (en) * 2007-02-16 2008-08-21 Canon Kabushiki Kaisha Exposure apparatus and method for manufacturing device
US20080241489A1 (en) * 2007-03-30 2008-10-02 Renesas Technology Corp. Method of forming resist pattern and semiconductor device manufactured with the same
US8435593B2 (en) * 2007-05-22 2013-05-07 Asml Netherlands B.V. Method of inspecting a substrate and method of preparing a substrate for lithography
US20090009733A1 (en) * 2007-07-06 2009-01-08 Canon Kabushiki Kaisha Exposure apparatus
KR100871749B1 (ko) * 2007-07-20 2008-12-05 주식회사 동부하이텍 이머전 리소그라피 장치 및 이를 이용한 패턴 형성 방법
JP2009117832A (ja) 2007-11-06 2009-05-28 Asml Netherlands Bv リソグラフィの基板を準備する方法、基板、デバイス製造方法、密封コーティングアプリケータ及び密封コーティング測定装置
NL1036186A1 (nl) * 2007-12-03 2009-06-04 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP2009260264A (ja) * 2008-03-24 2009-11-05 Canon Inc 露光装置およびデバイス製造方法
NL2003362A (en) * 2008-10-16 2010-04-19 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP2010135428A (ja) * 2008-12-02 2010-06-17 Toshiba Corp 基板保持部材及び半導体装置の製造方法
JP2010140958A (ja) * 2008-12-09 2010-06-24 Canon Inc 露光装置及びデバイス製造方法
US8760630B2 (en) 2011-01-01 2014-06-24 Canon Kabushiki Kaisha Exposure apparatus and method of manufacturing device
CA3085086C (en) 2011-12-06 2023-08-08 Delta Faucet Company Ozone distribution in a faucet
US9377679B2 (en) 2012-07-31 2016-06-28 Hoya Corporation Reflective mask blank and method for manufacturing same, method for manufacturing reflective mask, and method for manufacturing semiconductor device
CN108463437B (zh) 2015-12-21 2022-07-08 德尔塔阀门公司 包括消毒装置的流体输送系统

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JP3747566B2 (ja) 1997-04-23 2006-02-22 株式会社ニコン 液浸型露光装置
DE10332112A1 (de) 2003-07-09 2005-01-27 Carl Zeiss Smt Ag Projektionsbelichtungsverfahren und Projektionsbelichtungssystem
SG135052A1 (en) * 2002-11-12 2007-09-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP4595320B2 (ja) * 2002-12-10 2010-12-08 株式会社ニコン 露光装置、及びデバイス製造方法
KR101101737B1 (ko) * 2002-12-10 2012-01-05 가부시키가이샤 니콘 노광장치 및 노광방법, 디바이스 제조방법
JP4604452B2 (ja) * 2003-02-26 2011-01-05 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
EP3104396B1 (en) * 2003-06-13 2018-03-21 Nikon Corporation Exposure method, substrate stage, exposure apparatus, and device manufacturing method
JP3993549B2 (ja) 2003-09-30 2007-10-17 株式会社東芝 レジストパターン形成方法
US7528929B2 (en) * 2003-11-14 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4513590B2 (ja) * 2004-02-19 2010-07-28 株式会社ニコン 光学部品及び露光装置
JP4622340B2 (ja) * 2004-03-04 2011-02-02 株式会社ニコン 露光装置、デバイス製造方法
JP4220423B2 (ja) * 2004-03-24 2009-02-04 株式会社東芝 レジストパターン形成方法
JP2005302880A (ja) * 2004-04-08 2005-10-27 Canon Inc 液浸式露光装置
JP4677987B2 (ja) * 2004-07-21 2011-04-27 株式会社ニコン 露光方法及びデバイス製造方法

Also Published As

Publication number Publication date
US20060177776A1 (en) 2006-08-10
TW200633010A (en) 2006-09-16
US7423728B2 (en) 2008-09-09
KR20060074857A (ko) 2006-07-03
KR100753270B1 (ko) 2007-08-29
TWI290339B (en) 2007-11-21
JP2006186112A (ja) 2006-07-13

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