JP4498170B2 - 半導体装置及びその製造方法 - Google Patents
半導体装置及びその製造方法 Download PDFInfo
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- JP4498170B2 JP4498170B2 JP2005057185A JP2005057185A JP4498170B2 JP 4498170 B2 JP4498170 B2 JP 4498170B2 JP 2005057185 A JP2005057185 A JP 2005057185A JP 2005057185 A JP2005057185 A JP 2005057185A JP 4498170 B2 JP4498170 B2 JP 4498170B2
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- 239000004065 semiconductor Substances 0.000 title claims description 39
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 15
- 239000002184 metal Substances 0.000 claims description 15
- 230000036413 temperature sense Effects 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 3
- 238000012544 monitoring process Methods 0.000 claims description 2
- 238000000605 extraction Methods 0.000 description 16
- 229910052782 aluminium Inorganic materials 0.000 description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 9
- 230000008901 benefit Effects 0.000 description 8
- 229910000679 solder Inorganic materials 0.000 description 8
- 238000005476 soldering Methods 0.000 description 5
- 239000000047 product Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000012467 final product Substances 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical group [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
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- 230000004048 modification Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
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Description
本実施の形態の特徴点は、引き出し配線(後述する電極配線部に相当)の分割に対応して、電力半導体素子の表面電極(第1主電極)上の接続電極をも分割し、分割された引き出し配線とそれに対応する分割された接続電極同士を相対させて電気的に接続した点にある。以下、インバータ回路のIGBTとダイオードとの1ペアーに関して、上記特徴点を図面に基づき具体的に記載する。
本実施の形態では、第1主電極上に形成された接続電極10,11は相対する様に分割されており、且つ、引き出し電極4の電極配線部5も相対する様に分割されており、加えて、第1接続電極10A,11Aと対応する第1電極配線部5Aとの位置は相対関係にあると共に、第2接続電極10B,11Bと対応する第2電極配線部5Bとの位置も相対関係にあるので、IGBT1とダイオード2とに引き出し配線5を半田付けする際の位置決めが簡単になると言う製造上のメリットがある。
又、本実施の形態では接続電極10,11を相対する様に第2方向D2に関して分割しているので、各接続電極10A,10B,11A,11Bへの半田摘出量を調整することで、半田8,9の厚みを均一にし易いと言う製造上のメリットがある。つまり、接続電極の面積が大面積になればなる程、面と面との間に均一に半田の厚さをコントロールすることが難しくなるからである。換言すれば、チップが大きいと、チップの中で半田溜りが形成され易くなる。
又、図1の構造では、IGBT1とダイオード2とを裏面金属板3上に第2方向D2に沿って並んで配置し、且つ、両者1,2をそれらの上部に位置する引き出し電極4の延在方向D2に沿って並んで配置すると共に、引き出し電極4の側面の内でIGBT1の上部に該当する部分及びダイオード2の上部に該当する部分のそれぞれから、同様に、電極配線部5(5A,5B)を内側に向けて折り曲げて形成している。しかも、引き出し電極4と電極配線部5(5A,5B)とは一体化されている。この様な引き出し電極4を利用することで、引き出し電極4と電極配線部5とから成る上面側リードフレームを、IGBT1及びダイオード2の分割された接続電極10,11に、1工程(相対位置関係にある電極配線部5と対応する接続電極10,11との半田付け工程)で電気的に接合させることが可能となる。この点で、IGBT及びダイオードの接続端子を別々に形成する場合と比較すると、上面側リードフレームの形成が簡単になる。
既述した通り、IGBT1の上部に位置する引き出し電極4に平行に延在した分割領域DR1内には温度センス12が形成されている。従って、IGBTチップの端以外の場所の温度をモニターすることが可能である。特に、温度センス12は、IGBT1の表面中央に、即ち、分割領域DR1の中央部内に配設されているので、温度が最も高くなるIGBTチップ中央の温度をモニターすることが出来る。
本実施の形態は、図1に例示した半導体装置の製造方法に関しており、図7乃至図9は、図1の半導体装置を製造する工程の各段階に於ける同装置の縦断面図である。
本発明で言う「電力半導体素子」の概念には、実施の形態1で例示したIGBTの他に、パワーMOSFET等のスイッチング素子や、ダイオードが、含まれる。
Claims (6)
- 表面及び裏面上にそれぞれ形成された第1及び第2主電極を備える電力半導体素子と、
前記電力半導体素子の前記第2主電極と電気的に接続された金属板と、
前記第1主電極上に互いに相対する様に分離形成された第1及び第2接続電極と、
その一方の側面部から下方に向けて形成された第1電極配線部と、前記一方の側面部に対向する他方の側面部から下方に向けて前記第1電極配線部と相対する様に前記第1電極配線部とは分離して形成された第2電極配線部とを備える引き出し電極とを備え、
前記第1電極配線部は前記第1接続電極とのみ電気的に接続されている一方、
前記第2電極配線部は前記第2接続電極とのみ電気的に接続されていることを特徴とする、
半導体装置。 - 請求項1記載の半導体装置であって、
前記第1及び第2接続電極は共に第1方向に沿って形成されており、
前記引き出し電極は前記第1方向と直交する第2方向に延在しており、
前記第1及び第2接続電極は前記第2方向に関して分割されていることを特徴とする、
半導体装置。 - 請求項2記載の半導体装置であって、
前記第1及び第2電極配線部は共に内側に折り曲げられて互いに相対していることを特徴とする、
半導体装置。 - 請求項2記載の半導体装置であって、
前記第1主電極は、前記第1接続電極と前記第2接続電極との間の領域に於いて2分割されて、前記第1主電極が存在しない分割領域が前記第1接続電極と前記第2接続電極との間の前記電力半導体素子の表面に形成されており、
前記電力半導体素子の温度をモニターする温度センスが前記分割領域上に形成されていることを特徴とする、
半導体装置。 - 請求項4記載の半導体装置であって、
前記温度センスが前記電力半導体素子の前記表面の中央に配設されていることを特徴とする、
半導体装置。 - その上に互いに相対する様に分離形成された第1及び第2接続電極が形成された第1主電極及び前記第1主電極に対向する第2主電極を備える電力半導体素子の前記第2主電極を金属板の表面と電気的に接続する工程と、
その一方の側面部から下方に向けて形成された第1電極配線部と、前記一方の側面部に対向する他方の側面部から下方に向けて前記第1電極配線部と相対する様に前記第1電極配線部とは分離して形成された第2電極配線部とを備える引き出し電極の内で、前記第1電極配線部を前記第1接続電極にのみ電気的に接続すると共に、前記第2電極配線部を前記第2接続電極にのみ電気的に接続する工程とを備えることを特徴とする、
半導体装置の製造方法。
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