JP4473139B2 - フッ化スルホニル末端基を有する過フッ化ビニルエーテルの製造 - Google Patents
フッ化スルホニル末端基を有する過フッ化ビニルエーテルの製造 Download PDFInfo
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- JP4473139B2 JP4473139B2 JP2004564850A JP2004564850A JP4473139B2 JP 4473139 B2 JP4473139 B2 JP 4473139B2 JP 2004564850 A JP2004564850 A JP 2004564850A JP 2004564850 A JP2004564850 A JP 2004564850A JP 4473139 B2 JP4473139 B2 JP 4473139B2
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- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 title claims description 13
- OBTWBSRJZRCYQV-UHFFFAOYSA-N sulfuryl difluoride Chemical group FS(F)(=O)=O OBTWBSRJZRCYQV-UHFFFAOYSA-N 0.000 title claims description 10
- 238000004519 manufacturing process Methods 0.000 title description 23
- PGFXOWRDDHCDTE-UHFFFAOYSA-N hexafluoropropylene oxide Chemical compound FC(F)(F)C1(F)OC1(F)F PGFXOWRDDHCDTE-UHFFFAOYSA-N 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 14
- 150000003839 salts Chemical class 0.000 claims description 14
- 239000003054 catalyst Substances 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- 150000001768 cations Chemical class 0.000 claims description 9
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 7
- 239000002798 polar solvent Substances 0.000 claims description 4
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 claims description 3
- RRZIJNVZMJUGTK-UHFFFAOYSA-N 1,1,2-trifluoro-2-(1,2,2-trifluoroethenoxy)ethene Chemical class FC(F)=C(F)OC(F)=C(F)F RRZIJNVZMJUGTK-UHFFFAOYSA-N 0.000 description 15
- 238000003682 fluorination reaction Methods 0.000 description 8
- 239000011734 sodium Substances 0.000 description 7
- 239000011698 potassium fluoride Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- -1 carbonyl fluoride compound Chemical class 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- OIUVUINPJBFCCD-UHFFFAOYSA-N 2,2,3,3,4,4-hexafluoro-4-fluorosulfonylbutanoyl fluoride Chemical compound FC(=O)C(F)(F)C(F)(F)C(F)(F)S(F)(=O)=O OIUVUINPJBFCCD-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 3
- 239000003456 ion exchange resin Substances 0.000 description 3
- 229920003303 ion-exchange polymer Polymers 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- VLIZXYVPNGFOFC-UHFFFAOYSA-N 2,2,3,3-tetrafluoro-3-(1,1,2,2,3,3,4,4-octafluoro-4-fluorosulfonylbutoxy)propanoyl fluoride Chemical compound FC(=O)C(F)(F)C(F)(F)OC(F)(F)C(F)(F)C(F)(F)C(F)(F)S(F)(=O)=O VLIZXYVPNGFOFC-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 2
- JAAGVIUFBAHDMA-UHFFFAOYSA-M rubidium bromide Chemical compound [Br-].[Rb+] JAAGVIUFBAHDMA-UHFFFAOYSA-M 0.000 description 2
- WFUBYPSJBBQSOU-UHFFFAOYSA-M rubidium iodide Chemical compound [Rb+].[I-] WFUBYPSJBBQSOU-UHFFFAOYSA-M 0.000 description 2
- SYNPRNNJJLRHTI-UHFFFAOYSA-N 2-(hydroxymethyl)butane-1,4-diol Chemical compound OCCC(CO)CO SYNPRNNJJLRHTI-UHFFFAOYSA-N 0.000 description 1
- QGHDLJAZIIFENW-UHFFFAOYSA-N 4-[1,1,1,3,3,3-hexafluoro-2-(4-hydroxy-3-prop-2-enylphenyl)propan-2-yl]-2-prop-2-enylphenol Chemical group C1=C(CC=C)C(O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(O)C(CC=C)=C1 QGHDLJAZIIFENW-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- GSJWYIDMIRQHMV-UHFFFAOYSA-N butanoyl fluoride Chemical compound CCCC(F)=O GSJWYIDMIRQHMV-UHFFFAOYSA-N 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- LYQFWZFBNBDLEO-UHFFFAOYSA-M caesium bromide Chemical compound [Br-].[Cs+] LYQFWZFBNBDLEO-UHFFFAOYSA-M 0.000 description 1
- XQPRBTXUXXVTKB-UHFFFAOYSA-M caesium iodide Chemical compound [I-].[Cs+] XQPRBTXUXXVTKB-UHFFFAOYSA-M 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- MHYFEEDKONKGEB-UHFFFAOYSA-N oxathiane 2,2-dioxide Chemical compound O=S1(=O)CCCCO1 MHYFEEDKONKGEB-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 150000008053 sultones Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C303/00—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides
- C07C303/02—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of sulfonic acids or halides thereof
- C07C303/22—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of sulfonic acids or halides thereof from sulfonic acids, by reactions not involving the formation of sulfo or halosulfonyl groups; from sulfonic halides by reactions not involving the formation of halosulfonyl groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/78—Halides of sulfonic acids
- C07C309/79—Halides of sulfonic acids having halosulfonyl groups bound to acyclic carbon atoms
- C07C309/82—Halides of sulfonic acids having halosulfonyl groups bound to acyclic carbon atoms of a carbon skeleton substituted by singly-bound oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C315/00—Preparation of sulfones; Preparation of sulfoxides
- C07C315/04—Preparation of sulfones; Preparation of sulfoxides by reactions not involving the formation of sulfone or sulfoxide groups
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B3/00—Electrolytic production of organic compounds
- C25B3/20—Processes
- C25B3/27—Halogenation
- C25B3/28—Fluorination
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Description
a)
による、4〜7員環であるスルトンをフッ素化して、FSO2−(CF2)(n-1)−COFを生成することを含む。フッ素化はいずれかの適切な手段によって達成されるが、最も一般的には、米国特許第2,732,398号明細書に記載のように電気化学的フッ素化によって達成される。
フッ化カリウム114gを有するジグライム2L中で、4−(フルオロスルホニル)ヘキサフルオロブチリルフルオリド、FSO2(CF2)3COF2162g(7.7モル)を当モル量のヘキサフルオロプロピレンオキシド(HFPO)(1281g,7.7モル)と反応させて、パーフルオロ−4−(フルオロスルホニル)ブトキシプロピオニルフルオリド(収率65%で2250g,5.1モル)と、更なるヘキサフルオロプロピレンオキシド単位を有する、より高い沸点の副生成物675gとを得た。
次いで、パーフルオロ−4−(フルオロスルホニル)ブトキシプロピオニルフルオリド1108g(2.5モル)をグリム中で70℃にて炭酸ナトリウム(603g,5.7モル)と反応させて、酸のナトリウム塩を生成した。次いで、溶媒を真空下で除去し、乾燥した塩を165℃に加熱して、二酸化炭素副生成物で真空を破壊し、182℃まで加熱し続けて、パーフルオロ−4−(フルオロスルホニル)ブトキシビニルエーテル(収率74%で703g,1.9モル)を単離した。
本発明の態様及び本発明に関連する態様としては、以下のものがある。
本発明は、その第一の態様として、式FSO 2 −(CF 2 ) n −O−CF=CF 2 (式中、nは2〜5である)のフッ化スルホニル末端基を有する過フッ化ビニルエーテルを製造する方法であって、
a)
b)FSO 2 −(CF 2 ) (n-1) −COFをヘキサフルオロプロピレンオキシド(HFPO)と反応させて、FSO 2 −(CF 2 ) (n) −O−CF(CF 3 )−COFを生成するステップ;
c)FSO 2 −(CF 2 ) (n) −O−CF(CF 3 )−COFを金属カチオンM +p (pはMの原子価である)の塩と反応させて、(FSO 2 −(CF 2 ) (n) −O−CF(CF 3 )−COO - ) p M +p を生成するステップ;および
d)FSO 2 −(CF 2 ) (n) −O−CF(CF 3 )−COO - ) p M +p を熱分解して、FSO 2 −(CF 2 ) (n) −O−CF=CF 2 を生成するステップ
を含む方法に関する。
本発明は、その第二の態様として、前記第一の態様において、n=4である、過フッ化ビニルエーテルを製造する方法に関する。
本発明は、その第三の態様として、前記第一の態様において、ステップc)が極性溶媒中で行われる、過フッ化ビニルエーテルを製造する方法に関する。
本発明は、その第四の態様として、前記第一の態様において、金属カチオンの前記塩がNa 2 CO 3 である、過フッ化ビニルエーテルを製造する方法に関する。
本発明は、その第五の態様として、前記第三の態様において、金属カチオンの前記塩がNa 2 CO 3 である、過フッ化ビニルエーテルを製造する方法に関する。
本発明は、その第六の態様として、前記第一の態様において、前記ステップb)がフッ化物触媒の存在下で行われる、過フッ化ビニルエーテルを製造する方法に関する。
本発明は、その第七の態様として、前記第六の態様において、前記ステップb)が、フッ化物触媒以外のいずれかの触媒の非存在下で行われる、過フッ化ビニルエーテルを製造する方法に関する。
本発明は、その第八の態様として、前記第六の態様において、前記フッ化物触媒がKFである、過フッ化ビニルエーテルを製造する方法に関する。
本発明は、その第九の態様として、前記第七の態様において、前記フッ化物触媒がKFである、過フッ化ビニルエーテルを製造する方法に関する。
本発明は、その第十の態様として、前記第一の態様において、前記ステップb)全体を通して、存在するFSO 2 −(CF 2 ) (n-1) −COFのモル量が、存在するHFPOのモル量を少なくとも10%超える量で残る、過フッ化ビニルエーテルを製造する方法に関する。
本発明は、その第十一の態様として、前記第六の態様において、前記ステップb)全体を通して、存在するFSO 2 −(CF 2 ) (n-1) −COFのモル量が、存在するHFPOのモル量を少なくとも10%超える量で残る、過フッ化ビニルエーテルを製造する方法に関する。
本発明は、その第十二の態様として、前記第一の態様において、前記ステップa)が電気化学的フッ素化を含む、過フッ化ビニルエーテルを製造する方法に関する。
本発明は、その第十三の態様として、前記第二の態様において、前記ステップa)が電気化学的フッ素化を含む、過フッ化ビニルエーテルを製造する方法に関する。
本発明は、その第十四の態様として、前記第五の態様において、前記ステップa)が電気化学的フッ素化を含む、過フッ化ビニルエーテルを製造する方法に関する。
本発明は、その第十五の態様として、前記第六の態様において、前記ステップa)が電気化学的フッ素化を含む、過フッ化ビニルエーテルを製造する方法に関する。
本発明は、その第十六の態様として、前記第十の態様において、前記ステップa)が電気化学的フッ素化を含む、過フッ化ビニルエーテルを製造する方法に関する。
本発明は、その第十七の態様として、前記第十一の態様において、前記ステップa)が電気化学的フッ素化を含む、過フッ化ビニルエーテルを製造する方法に関する。
Claims (4)
- テトラフルオロエチレンを使用ないで、式FSO2−(CF2)n−O−CF=CF2(式中、nは2〜5である)のフッ化スルホニル末端基を有する過フッ化ビニルエーテルを製造する方法であって、
a)
b)FSO2−(CF2)(n-1)−COFをヘキサフルオロプロピレンオキシド(HFPO)と反応させて、FSO2−(CF2)(n)−O−CF(CF3)−COFを生成するステップ;
c)FSO2−(CF2)(n)−O−CF(CF3)−COFを金属カチオンM+p(pはMの原子価である)の塩と反応させて、(FSO2−(CF2)(n)−O−CF(CF3)−COO-)pM+pを生成するステップ;および
d)FSO2−(CF2)(n)−O−CF(CF3)−COO-)pM+pを熱分解して、FSO2−(CF2)(n)−O−CF=CF2を生成するステップ
を含む方法。 - n=4である、請求項1に記載の方法。
- ステップc)が極性溶媒中で行われ、又金属カチオンの前記塩がNa2CO3である、請求項1又は2に記載の方法。
- 前記ステップb)が、フッ化物触媒の存在下であって、他の触媒を用いないで行われる、請求項1〜3のいずれか一項に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/322,226 US6624328B1 (en) | 2002-12-17 | 2002-12-17 | Preparation of perfluorinated vinyl ethers having a sulfonyl fluoride end-group |
PCT/US2003/034920 WO2004060857A1 (en) | 2002-12-17 | 2003-11-04 | Preparation of perfluorinated vinyl ethers having a sulfonyl fluoride end-group |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2006510720A JP2006510720A (ja) | 2006-03-30 |
JP2006510720A5 JP2006510720A5 (ja) | 2006-11-16 |
JP4473139B2 true JP4473139B2 (ja) | 2010-06-02 |
Family
ID=28041600
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004564850A Expired - Fee Related JP4473139B2 (ja) | 2002-12-17 | 2003-11-04 | フッ化スルホニル末端基を有する過フッ化ビニルエーテルの製造 |
Country Status (8)
Country | Link |
---|---|
US (1) | US6624328B1 (ja) |
EP (1) | EP1572633A1 (ja) |
JP (1) | JP4473139B2 (ja) |
KR (1) | KR20050085696A (ja) |
CN (1) | CN1326835C (ja) |
AU (1) | AU2003290576A1 (ja) |
CA (1) | CA2506456A1 (ja) |
WO (1) | WO2004060857A1 (ja) |
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- 2003-11-04 JP JP2004564850A patent/JP4473139B2/ja not_active Expired - Fee Related
- 2003-11-04 CN CNB2003801059303A patent/CN1326835C/zh not_active Expired - Fee Related
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- 2003-11-04 WO PCT/US2003/034920 patent/WO2004060857A1/en active Application Filing
- 2003-11-04 CA CA002506456A patent/CA2506456A1/en not_active Abandoned
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AU2003290576A1 (en) | 2004-07-29 |
EP1572633A1 (en) | 2005-09-14 |
KR20050085696A (ko) | 2005-08-29 |
CA2506456A1 (en) | 2004-07-22 |
CN1326835C (zh) | 2007-07-18 |
WO2004060857A1 (en) | 2004-07-22 |
US6624328B1 (en) | 2003-09-23 |
CN1726186A (zh) | 2006-01-25 |
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