JP4434315B2 - 多層配線基板の製造方法 - Google Patents
多層配線基板の製造方法 Download PDFInfo
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- JP4434315B2 JP4434315B2 JP2009544335A JP2009544335A JP4434315B2 JP 4434315 B2 JP4434315 B2 JP 4434315B2 JP 2009544335 A JP2009544335 A JP 2009544335A JP 2009544335 A JP2009544335 A JP 2009544335A JP 4434315 B2 JP4434315 B2 JP 4434315B2
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/4038—Through-connections; Vertical interconnect access [VIA] connections
- H05K3/4053—Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques
- H05K3/4069—Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques for via connections in organic insulating substrates
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/18—Printed circuits structurally associated with non-printed electric components
- H05K1/182—Printed circuits structurally associated with non-printed electric components associated with components mounted in the printed circuit board, e.g. insert mounted components [IMC]
- H05K1/185—Components encapsulated in the insulating substrate of the printed circuit or incorporated in internal layers of a multilayer circuit
- H05K1/186—Components encapsulated in the insulating substrate of the printed circuit or incorporated in internal layers of a multilayer circuit manufactured by mounting on or connecting to patterned circuits before or during embedding
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/18—Printed circuits structurally associated with non-printed electric components
- H05K1/182—Printed circuits structurally associated with non-printed electric components associated with components mounted in the printed circuit board, e.g. insert mounted components [IMC]
- H05K1/185—Components encapsulated in the insulating substrate of the printed circuit or incorporated in internal layers of a multilayer circuit
- H05K1/186—Components encapsulated in the insulating substrate of the printed circuit or incorporated in internal layers of a multilayer circuit manufactured by mounting on or connecting to patterned circuits before or during embedding
- H05K1/187—Components encapsulated in the insulating substrate of the printed circuit or incorporated in internal layers of a multilayer circuit manufactured by mounting on or connecting to patterned circuits before or during embedding the patterned circuits being prefabricated circuits, which are not yet attached to a permanent insulating substrate, e.g. on a temporary carrier
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4614—Manufacturing multilayer circuits by laminating two or more circuit boards the electrical connections between the circuit boards being made during lamination
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4652—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/82—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by forming build-up interconnects at chip-level, e.g. for high density interconnects [HDI]
- H01L2224/82009—Pre-treatment of the connector or the bonding area
- H01L2224/8203—Reshaping, e.g. forming vias
- H01L2224/82035—Reshaping, e.g. forming vias by heating means
- H01L2224/82039—Reshaping, e.g. forming vias by heating means using a laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/82—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by forming build-up interconnects at chip-level, e.g. for high density interconnects [HDI]
- H01L2224/82009—Pre-treatment of the connector or the bonding area
- H01L2224/8203—Reshaping, e.g. forming vias
- H01L2224/82047—Reshaping, e.g. forming vias by mechanical means, e.g. severing, pressing, stamping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01004—Beryllium [Be]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
- H01L2924/097—Glass-ceramics, e.g. devitrified glass
- H01L2924/09701—Low temperature co-fired ceramic [LTCC]
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0183—Dielectric layers
- H05K2201/0195—Dielectric or adhesive layers comprising a plurality of layers, e.g. in a multilayer structure
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/06—Lamination
- H05K2203/063—Lamination of preperforated insulating layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/06—Lamination
- H05K2203/066—Transfer laminating of insulating material, e.g. resist as a whole layer, not as a pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/14—Related to the order of processing steps
- H05K2203/1461—Applying or finishing the circuit pattern after another process, e.g. after filling of vias with conductive paste, after making printed resistors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/20—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4652—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
- H05K3/4658—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern characterized by laminating a prefabricated metal foil pattern, e.g. by transfer
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
- Y10T156/1002—Methods of surface bonding and/or assembly therefor with permanent bending or reshaping or surface deformation of self sustaining lamina
- Y10T156/1043—Subsequent to assembly
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
Description
1 コア基板
2 実装用ランド
3,4 ビア用ランド
5 ビアホール
6 導電ペースト
7 回路部品
10 樹脂層(第1の樹脂層)
11 ビアホール
12 導電ペースト
20 接着層(第2の樹脂層)
21 ビアホール
22 保護フィルム
23 貫通穴
40 キャリア
41 ビア用ランド
42 実装用ランド
43 凸部
50 コア基板
52a 実装用ランド
52b ビア用ランド
57 回路部品
60 樹脂層(第1の樹脂層)
61 ビアホール
62 導電ペースト
70 接着層(第2の樹脂層)
71 ビアホール
72 保護フィルム
73 貫通穴
80 金属箔
81 配線パターン
Claims (9)
- 導体パターンを有し、この導体パターンを底面とする有底の第1のビアホールが形成された硬化状態の第1の樹脂層を準備する第1の工程と、
前記第1のビアホールと対応する位置に貫通した第2のビアホールが形成された未硬化状態の第2の樹脂層を準備する第2の工程と、
前記第1のビアホールと第2のビアホールとが連続するように前記第1の樹脂層と第2の樹脂層とを積層する第3の工程と、
前記第1のビアホールと第2のビアホールとに導電ペーストを同時に充填する第4の工程と、
前記第2のビアホールに導電ペーストが充填された前記第2の樹脂層に対して、前記導電ペーストと接触するように金属箔を圧着する第5の工程と、
第5の工程の後、前記第2の樹脂層と前記導電ペーストとを硬化させる第6の工程と、
前記金属箔をパターン化して、前記第2のビアホール内で硬化された導電ペーストと電気的に導通した配線パターンを形成する第7の工程と、を備える多層配線基板の製造方法。 - 導体パターンを有し、この導体パターンを底面とする有底の第1のビアホールが形成された硬化状態の第1の樹脂層を準備する第1の工程と、
前記第1の樹脂層の上面に未硬化状態の第2の樹脂層を積層する第2の工程と、
第2の工程の後、前記第2の樹脂層に前記第1のビアホールと対応する第2のビアホールを形成する第3の工程と、
前記第1のビアホールと第2のビアホールとに導電ペーストを同時に充填する第4の工程と、
前記第2のビアホールに導電ペーストが充填された前記第2の樹脂層に対して、前記導電ペーストと接触するように金属箔を圧着する第5の工程と、
第5の工程の後、前記第2の樹脂層と前記導電ペーストとを硬化させる第6の工程と、
前記金属箔をパターン化して、前記第2のビアホール内で硬化された導電ペーストと電気的に導通した配線パターンを形成する第7の工程と、を備える多層配線基板の製造方法。 - 導体パターンを有し、この導体パターンを底面とする有底の第1のビアホールが形成された硬化状態の第1の樹脂層を準備する第1の工程と、
前記第1のビアホールと対応する位置に貫通した第2のビアホールが形成された未硬化状態の第2の樹脂層を準備する第2の工程と、
前記第1のビアホールと第2のビアホールとが連続するように前記第1の樹脂層と第2の樹脂層とを積層する第3の工程と、
前記第1のビアホールと第2のビアホールとに導電ペーストを同時に充填する第4の工程と、
表面に配線パターンを有する基板を、前記第2のビアホールに充填された導電ペーストと前記配線パターンとが接触するように、前記第2の樹脂層に対して圧着する第5の工程と、
第5の工程の後、前記第2の樹脂層と前記導電ペーストとを硬化させる第6の工程と、を備える多層配線基板の製造方法。 - 導体パターンを有し、この導体パターンを底面とする有底の第1のビアホールが形成された硬化状態の第1の樹脂層を準備する第1の工程と、
前記第1の樹脂層の上面に未硬化状態の第2の樹脂層を積層する第2の工程と、
第2の工程の後、前記第2の樹脂層に前記第1のビアホールと対応する第2のビアホールを形成する第3の工程と、
前記第1のビアホールと第2のビアホールとに導電ペーストを同時に充填する第4の工程と、
表面に配線パターンを有する基板を、前記第2のビアホールに充填された導電ペーストと前記配線パターンとが接触するように、前記第2の樹脂層に対して圧着する第5の工程と、
第5の工程の後、前記第2の樹脂層と前記導電ペーストとを硬化させる第6の工程と、を備える多層配線基板の製造方法。 - 前記第5の工程において、前記基板はキャリアであり、前記第2の樹脂層に前記キャリアを圧着し、前記第2の樹脂層と前記導電ペーストとを硬化させる第6の工程の終了後に、前記キャリアを剥離することを特徴とする請求項3又は4に記載の多層配線基板の製造方法。
- 前記第5の工程において、前記配線パターンの露出面には凸部が形成されており、前記基板を前記第2の樹脂層に圧着する時、前記凸部を前記第2のビアホールに挿入することを特徴とする請求項3乃至5のいずれか1項に記載の多層配線基板の製造方法。
- 前記第1の工程において、表面に導体パターンが形成された基材の表面に未硬化樹脂層を圧着した後、当該未硬化樹脂層を硬化させることにより第1の樹脂層を形成し、前記第1の樹脂層をレーザー加工することにより、前記導体パターンを底面とする第1のビアホールを形成することを特徴とする請求項1乃至6のいずれか1項に記載の多層配線基板の製造方法。
- 前記第1の工程において、前記導体パターンに回路部品を実装し、前記回路部品を未硬化状態の樹脂層の中に埋設した後、当該樹脂層を硬化させることにより、前記回路部品を内蔵した前記第1の樹脂層を得ることを特徴とする請求項7に記載の多層配線基板の製造方法。
- 前記第2のビアホールの口径は、前記第1のビアホールの開口径より小さいことを特徴とする請求項1乃至8のいずれか1項に記載の多層配線基板の製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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JP2007331339 | 2007-12-25 | ||
JP2007331339 | 2007-12-25 | ||
PCT/JP2008/073173 WO2009081853A1 (ja) | 2007-12-25 | 2008-12-19 | 多層配線基板の製造方法 |
Publications (2)
Publication Number | Publication Date |
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JP4434315B2 true JP4434315B2 (ja) | 2010-03-17 |
JPWO2009081853A1 JPWO2009081853A1 (ja) | 2011-05-06 |
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JP2009544335A Expired - Fee Related JP4434315B2 (ja) | 2007-12-25 | 2008-12-19 | 多層配線基板の製造方法 |
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Country | Link |
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US (1) | US8419884B2 (ja) |
JP (1) | JP4434315B2 (ja) |
CN (1) | CN101911847B (ja) |
DE (1) | DE112008003532T5 (ja) |
WO (1) | WO2009081853A1 (ja) |
Cited By (1)
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WO2016189951A1 (ja) * | 2015-05-26 | 2016-12-01 | 株式会社村田製作所 | フィルタ装置 |
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JP5262188B2 (ja) * | 2008-02-29 | 2013-08-14 | 富士通株式会社 | 基板 |
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JP2011044523A (ja) * | 2009-08-20 | 2011-03-03 | Murata Mfg Co Ltd | 樹脂多層基板及び該樹脂多層基板の製造方法 |
JP5672675B2 (ja) * | 2009-08-20 | 2015-02-18 | 株式会社村田製作所 | 樹脂多層基板 |
KR101319902B1 (ko) | 2009-08-24 | 2013-10-18 | 가부시키가이샤 무라타 세이사쿠쇼 | 수지 다층 기판 및 그 수지 다층 기판의 제조방법 |
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US8716867B2 (en) * | 2010-05-12 | 2014-05-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Forming interconnect structures using pre-ink-printed sheets |
US8697541B1 (en) * | 2010-12-24 | 2014-04-15 | Ananda H. Kumar | Methods and structures for preparing single crystal silicon wafers for use as substrates for epitaxial growth of crack-free gallium nitride films and devices |
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JP5516536B2 (ja) * | 2011-09-14 | 2014-06-11 | 株式会社村田製作所 | 電子部品モジュールの製造方法 |
US9265147B2 (en) | 2012-11-14 | 2016-02-16 | Fujikura Ltd. | Multi-layer wiring board |
JP5789872B2 (ja) * | 2012-11-14 | 2015-10-07 | 株式会社フジクラ | 多層配線基板 |
TWI565378B (zh) * | 2012-12-31 | 2017-01-01 | 三星電機股份有限公司 | 電路板及其製造方法 |
KR102240704B1 (ko) * | 2014-07-15 | 2021-04-15 | 삼성전기주식회사 | 패키지 기판, 패키지 기판의 제조 방법 및 이를 이용한 적층형 패키지 |
KR102268388B1 (ko) * | 2014-08-11 | 2021-06-23 | 삼성전기주식회사 | 인쇄회로기판 및 그 제조방법 |
JP6423313B2 (ja) | 2015-05-26 | 2018-11-14 | 新光電気工業株式会社 | 電子部品内蔵基板及びその製造方法と電子装置 |
JP7182856B2 (ja) * | 2017-05-11 | 2022-12-05 | 大日本印刷株式会社 | 配線基板及びその製造方法 |
JP6863244B2 (ja) * | 2017-11-20 | 2021-04-21 | 株式会社村田製作所 | 電子部品および電子部品の製造方法 |
WO2020121813A1 (ja) * | 2018-12-13 | 2020-06-18 | 株式会社村田製作所 | 樹脂基板、電子機器、および樹脂基板の製造方法 |
CN110190002B (zh) * | 2019-07-04 | 2021-01-12 | 环维电子(上海)有限公司 | 一种半导体组件及其制造方法 |
JP7364383B2 (ja) * | 2019-07-19 | 2023-10-18 | 株式会社 大昌電子 | プリント配線板の製造方法 |
WO2021146894A1 (zh) * | 2020-01-21 | 2021-07-29 | 鹏鼎控股(深圳)股份有限公司 | 内埋电子元件的电路板及制作方法 |
CN115023056A (zh) * | 2022-05-30 | 2022-09-06 | 青岛歌尔微电子研究院有限公司 | 封装产品的选择性封装方法 |
US20240049397A1 (en) * | 2022-08-08 | 2024-02-08 | Reophotonics, Ltd. | Methods to fill through-holes of a substrate with metal paste |
WO2024070529A1 (ja) * | 2022-09-26 | 2024-04-04 | 株式会社村田製作所 | コンデンサ素子 |
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JP2003124380A (ja) * | 2001-10-15 | 2003-04-25 | Matsushita Electric Ind Co Ltd | 電子部品内蔵モジュールおよびその製造方法 |
JP2005039227A (ja) * | 2003-07-03 | 2005-02-10 | Matsushita Electric Ind Co Ltd | 半導体内蔵モジュールとその製造方法 |
JP2005064446A (ja) * | 2003-07-25 | 2005-03-10 | Dainippon Printing Co Ltd | 積層用モジュールの製造方法 |
JP2005064447A (ja) * | 2003-07-30 | 2005-03-10 | Dainippon Printing Co Ltd | 多層配線基板およびその製造方法 |
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CN101911847A (zh) | 2010-12-08 |
CN101911847B (zh) | 2012-07-18 |
US20100236698A1 (en) | 2010-09-23 |
DE112008003532T5 (de) | 2010-11-25 |
US8419884B2 (en) | 2013-04-16 |
WO2009081853A1 (ja) | 2009-07-02 |
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