JP4317125B2 - フッ素化ホスホン酸 - Google Patents

フッ素化ホスホン酸 Download PDF

Info

Publication number
JP4317125B2
JP4317125B2 JP2004509694A JP2004509694A JP4317125B2 JP 4317125 B2 JP4317125 B2 JP 4317125B2 JP 2004509694 A JP2004509694 A JP 2004509694A JP 2004509694 A JP2004509694 A JP 2004509694A JP 4317125 B2 JP4317125 B2 JP 4317125B2
Authority
JP
Japan
Prior art keywords
carbon atoms
mixture
alkylene group
nonafluorobutyl
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004509694A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005528446A5 (enExample
JP2005528446A (ja
Inventor
ディー. ボードマン,ラリー
ジェイ. ペルライト,マーク
ジン,ネイヨン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of JP2005528446A publication Critical patent/JP2005528446A/ja
Publication of JP2005528446A5 publication Critical patent/JP2005528446A5/ja
Application granted granted Critical
Publication of JP4317125B2 publication Critical patent/JP4317125B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/38Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/38Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
    • C07F9/3804Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)] not used, see subgroups
    • C07F9/3808Acyclic saturated acids which can have further substituents on alkyl
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/38Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
    • C07F9/40Esters thereof
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M105/00Lubricating compositions characterised by the base-material being a non-macromolecular organic compound
    • C10M105/74Lubricating compositions characterised by the base-material being a non-macromolecular organic compound containing phosphorus
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2223/00Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions
    • C10M2223/06Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions having phosphorus-to-carbon bonds
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2223/00Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions
    • C10M2223/06Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions having phosphorus-to-carbon bonds
    • C10M2223/061Metal salts
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2030/00Specified physical or chemical properties which is improved by the additive characterising the lubricating composition, e.g. multifunctional additives
    • C10N2030/06Oiliness; Film-strength; Anti-wear; Resistance to extreme pressure
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2050/00Form in which the lubricant is applied to the material being lubricated
    • C10N2050/015Dispersions of solid lubricants
    • C10N2050/02Dispersions of solid lubricants dissolved or suspended in a carrier which subsequently evaporates to leave a lubricant coating
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2060/00Chemical after-treatment of the constituents of the lubricating composition
    • C10N2060/08Halogenation
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/3154Of fluorinated addition polymer from unsaturated monomers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31678Of metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Composite Materials (AREA)
  • Materials Engineering (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2004509694A 2002-05-31 2003-05-20 フッ素化ホスホン酸 Expired - Fee Related JP4317125B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/161,258 US6824882B2 (en) 2002-05-31 2002-05-31 Fluorinated phosphonic acids
PCT/US2003/015686 WO2003102003A1 (en) 2002-05-31 2003-05-20 Fluorinated phosphonic acids

Publications (3)

Publication Number Publication Date
JP2005528446A JP2005528446A (ja) 2005-09-22
JP2005528446A5 JP2005528446A5 (enExample) 2006-07-06
JP4317125B2 true JP4317125B2 (ja) 2009-08-19

Family

ID=29709753

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004509694A Expired - Fee Related JP4317125B2 (ja) 2002-05-31 2003-05-20 フッ素化ホスホン酸

Country Status (10)

Country Link
US (1) US6824882B2 (enExample)
EP (1) EP1509536B1 (enExample)
JP (1) JP4317125B2 (enExample)
KR (1) KR100966660B1 (enExample)
CN (1) CN100369923C (enExample)
AT (1) ATE404572T1 (enExample)
AU (1) AU2003248533A1 (enExample)
CA (1) CA2486165A1 (enExample)
DE (1) DE60322889D1 (enExample)
WO (1) WO2003102003A1 (enExample)

Families Citing this family (58)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7396594B2 (en) * 2002-06-24 2008-07-08 The Trustees Of Princeton University Carrier applied coating layers
US7569285B2 (en) * 1996-10-17 2009-08-04 The Trustees Of Princeton University Enhanced bonding layers on titanium materials
US7815963B2 (en) 1996-10-17 2010-10-19 The Trustees Of Princeton University Enhanced bonding layers on titanium materials
US20060194008A1 (en) 1999-09-22 2006-08-31 Princeton University Devices with multiple surface functionality
US20040090516A1 (en) * 2002-09-09 2004-05-13 Heidelberger Druckmaschinen Ag Print substrate contacting element having an ink-repellent coating and method for coating a print substrate-contacting element
CN100558735C (zh) * 2003-08-21 2009-11-11 3M创新有限公司 全氟聚醚酰胺连接的膦酸酯、磷酸酯和其衍生物
US7189479B2 (en) * 2003-08-21 2007-03-13 3M Innovative Properties Company Phototool coating
DE60336322D1 (de) * 2003-11-21 2011-04-21 Obducat Ab Nanoimprint Lithographie in Mehrschichtsystemem
EP1718722A4 (en) 2004-01-30 2012-08-08 Du Pont PRODUCTION PROCESSES AND SYSTEMS, COMPOSITIONS, TENSIDES, MONOMER UNITS, METAL COMPLEXES, PHOSPHATESTER, GLYCOLS, AQUEOUS FILM-FORMING FOAMS AND FOAM STABILIZERS
US7148360B2 (en) 2004-01-30 2006-12-12 3M Innovative Properties Company Perfluoropolyether benzotriazole compounds
KR101257881B1 (ko) * 2004-05-28 2013-04-24 오브듀캇 아베 임프린트 공정용 금속 몰드
EP1600811A1 (en) 2004-05-28 2005-11-30 Obducat AB Modified metal molds for use in imprinting processes
EP1616713B1 (de) * 2004-07-16 2007-11-14 Heidelberger Druckmaschinen Aktiengesellschaft Wiederverwendbare Druckform
JP4604743B2 (ja) * 2005-02-01 2011-01-05 セイコーエプソン株式会社 機能性基板の製造方法、機能性基板、微細パターンの形成方法、導電膜配線、電子光学装置および電子機器
JP4584754B2 (ja) * 2005-04-06 2010-11-24 株式会社日立産機システム ナノプリント金型、その製造方法及びこの金型を用いたナノプリント装置並びにナノプリント方法
WO2007112312A2 (en) * 2006-03-24 2007-10-04 3M Innovative Properties Company Medicinal formulation container with a treated metal surface
US7824755B2 (en) * 2006-06-29 2010-11-02 3M Innovative Properties Company Fluorinated leveling agents
US8067103B2 (en) * 2006-08-24 2011-11-29 Aculon, Inc. Optical articles with thin hydrophobic layers
US8889230B2 (en) 2006-08-31 2014-11-18 3M Innovative Properties Company Side chain fluorochemicals with crystallizable spacer groups
WO2008060583A2 (en) * 2006-11-15 2008-05-22 Aculon, Inc. Organometallic films, methods for applying organometallic films to substrates and substrates coated with such films
DE602007006557D1 (de) * 2006-12-29 2010-06-24 3M Innovative Properties Co Langkettige polymethylenhalidtelomere
EP2444428B1 (en) * 2007-06-06 2013-07-24 3M Innovative Properties Company Fluorinated compositions and surface treatments made therefrom
US20080315459A1 (en) * 2007-06-21 2008-12-25 3M Innovative Properties Company Articles and methods for replication of microstructures and nanofeatures
US20090114618A1 (en) * 2007-06-21 2009-05-07 3M Innovative Properties Company Method of making hierarchical articles
US20090041986A1 (en) * 2007-06-21 2009-02-12 3M Innovative Properties Company Method of making hierarchical articles
US8318656B2 (en) 2007-07-03 2012-11-27 E. I. Du Pont De Nemours And Company Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foam stabilizers
US8115920B2 (en) * 2007-11-14 2012-02-14 3M Innovative Properties Company Method of making microarrays
US8071277B2 (en) * 2007-12-21 2011-12-06 3M Innovative Properties Company Method and system for fabricating three-dimensional structures with sub-micron and micron features
US20100285227A1 (en) * 2007-12-31 2010-11-11 Yapel Robert A Method for applying a coatable material
JP5350733B2 (ja) * 2008-09-30 2013-11-27 株式会社クレハ ホスホン酸、ホスホン酸銅化合物、樹脂組成物及び積層体
US8658258B2 (en) * 2008-10-21 2014-02-25 Aculon, Inc. Plasma treatment of substrates prior to the formation a self-assembled monolayer
US8846160B2 (en) 2008-12-05 2014-09-30 3M Innovative Properties Company Three-dimensional articles using nonlinear thermal polymerization
WO2010080353A2 (en) 2008-12-18 2010-07-15 3M Innovative Properties Company Method of contacting hydrocarbon-bearing formations with fluorinated phosphate and phosphonate compositions
JP5436882B2 (ja) * 2009-02-17 2014-03-05 大東化成工業株式会社 撥水撥油性顔料およびそれを含有する化粧料
JP4666093B2 (ja) 2009-03-13 2011-04-06 ユニマテック株式会社 ポリフルオロアルキルホスホン酸エステルの製造法
JP4506893B1 (ja) * 2009-03-13 2010-07-21 ユニマテック株式会社 ポリフルオロアルキルホスホン酸およびその製造法
CN102348711B (zh) * 2009-03-13 2014-04-16 优迈特株式会社 多氟烷基膦酸、其制备方法及以其为有效成分的脱模剂
JP4506894B1 (ja) * 2009-03-13 2010-07-21 ユニマテック株式会社 離型剤
JP4614007B2 (ja) * 2009-06-05 2011-01-19 ユニマテック株式会社 離型剤
KR101387359B1 (ko) * 2009-07-10 2014-04-21 유니마테크 가부시키가이샤 폴리플루오로알킬포스폰산에스테르 및 그 제조법
JP4626715B1 (ja) * 2009-09-11 2011-02-09 ユニマテック株式会社 離型剤
JP4715958B2 (ja) * 2009-11-04 2011-07-06 ユニマテック株式会社 ポリフルオロアルキルホスホン酸塩乳化剤
US8361215B2 (en) 2009-11-04 2013-01-29 Unimatec Co., Ltd. Polyfluoroalkylphosphonic acid salt emulsifier and mold-releasing agent comprising the same as active ingredient
EP2499190B1 (en) 2009-11-10 2013-11-06 3M Innovative Properties Company Method for making polylactide films
JP2011173959A (ja) * 2010-02-23 2011-09-08 Unimatec Co Ltd 含フッ素ポリマーラテックスの製造法
US9714469B2 (en) * 2010-12-23 2017-07-25 Rolex Sa Composition for increasing the lipophobicity of a watch-making component
JP6426470B2 (ja) 2011-05-25 2018-11-21 スリーエム イノベイティブ プロパティズ カンパニー 光制御フィルム
FR2990433A1 (fr) * 2012-05-10 2013-11-15 Surfactis Technologies Compositions catanioniques de recouvrement de surface par des molecules phosphoniques et amines
ES2617070T3 (es) * 2012-10-16 2017-06-15 Rohm And Haas Company Composición de fosfonato de fluoroalquilo
US20170363783A1 (en) * 2014-12-05 2017-12-21 3M Innovative Properties Company Retroreflective elements with a monolayer-forming compound
US10167356B2 (en) 2014-12-18 2019-01-01 3M Innovative Properties Company Fluorinated polymers comprising phosphonic moieties
EP3192853B1 (fr) 2016-01-15 2023-04-26 Sikemia Procede de traitement d'une surface pour l'obtention d'un revêtement oleophobe et/ou hydrophobe
CN109415326A (zh) 2016-06-29 2019-03-01 3M创新有限公司 可聚合的离子液体组合物
CN111936311A (zh) 2018-04-17 2020-11-13 3M创新有限公司 导电膜
WO2020072036A1 (en) 2018-10-02 2020-04-09 3M Innovative Properties Company Flexible release articles and methods for making same
JP2022513950A (ja) * 2018-12-18 2022-02-09 スリーエム イノベイティブ プロパティズ カンパニー 落書きに対して耐性のある金属、金属酸化物、及び酸化ケイ素表面を作製するための不透過性コーティング
EP3744175B1 (en) * 2019-05-31 2024-05-29 Rolex S.A. Composition for impregnating a substrate, in particular a watchstrap
JP7454430B2 (ja) * 2020-04-02 2024-03-22 東ソー・ファインケム株式会社 含フッ素ホスホン酸の製造方法

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3145222A (en) 1961-02-23 1964-08-18 Du Pont Addition of polyfluoroalkyl iodides to unsaturated compounds and products produced thereby
US4094911A (en) 1969-03-10 1978-06-13 Minnesota Mining And Manufacturing Company Poly(perfluoroalkylene oxide) derivatives
US3937724A (en) 1969-07-18 1976-02-10 The United States Of America As Represented By The Secretary Of Agriculture Organo-phosphorus compounds containing perfluoroalkyl radicals and their application to cellulosic textiles
JPS5377015A (en) 1976-12-16 1978-07-08 Asahi Glass Co Ltd Preparation of fluorine-containing phosphoric acid ester
JPS60144377A (ja) 1984-01-06 1985-07-30 Daicel Chem Ind Ltd 再剥離型粘着剤
US4736051A (en) 1985-03-20 1988-04-05 Kao Corporation Process for the preparation of an alkali metal salt of a diester phosphoric acid
FR2616150B1 (fr) 1987-06-05 1990-11-23 Atochem Composes fluoro-phosphoniques et leur procede de preparation
US5011963A (en) 1988-02-09 1991-04-30 Matsushita Electric Ind., Co., Ltd. Terminal perfluoroalkylsilane compounds
US4877815A (en) * 1989-02-17 1989-10-31 E. I. Du Pont De Nemours And Company Nucleating agents for thermoplastic resins
US5219654A (en) 1990-02-06 1993-06-15 Nanofilm Corporation Film forming composition and method for modifying surfaces with ultra thin films
US5277788A (en) 1990-10-01 1994-01-11 Aluminum Company Of America Twice-anodized aluminum article having an organo-phosphorus monolayer and process for making the article
US5266650A (en) 1990-10-11 1993-11-30 Minnesota Mining And Manufacturing Company Curing fluorocarbon elastomers
US5384374A (en) 1991-01-11 1995-01-24 Minnesota Mining And Manufacturing Company Curing fluorocarbon elastomers
US5162292A (en) * 1991-05-06 1992-11-10 Eastman Kodak Company Slipping layer containing a phosphonic acid derivative for dye-donor element used in thermal dye transfer
US5178916A (en) 1991-06-21 1993-01-12 At&T Bell Laboratories Process for making corrosion-resistant articles
DE4300857A1 (de) 1993-01-15 1994-07-21 Basf Magnetics Gmbh Magnetisches Aufzeichnungsmedium
JP2850944B2 (ja) 1995-01-26 1999-01-27 日本メクトロン株式会社 アクリル系エラストマ−加硫成形品
JP2872065B2 (ja) 1995-01-26 1999-03-17 日本メクトロン株式会社 アクリル系エラストマ−組成物およびその加硫成形品
JP3543460B2 (ja) 1995-12-08 2004-07-14 Nok株式会社 オイルフィルターガスケット成形用活性ハロゲン含有アクリルゴム組成物
US5766698A (en) 1996-11-25 1998-06-16 Nanofilm Corporation Method for modifying surfaces with ultra thin films
US5851674A (en) 1997-07-30 1998-12-22 Minnesota Mining And Manufacturing Company Antisoiling coatings for antireflective surfaces and methods of preparation
ATE213011T1 (de) * 1997-11-06 2002-02-15 Max Planck Gesellschaft Selbstorganisierende beschichtungen
US6210840B1 (en) 1997-12-02 2001-04-03 Denso Corporation Flame-retardant electrolytic solution and nonaqueous secondary battery containing the same
US6277485B1 (en) 1998-01-27 2001-08-21 3M Innovative Properties Company Antisoiling coatings for antireflective surfaces and methods of preparation
WO1999037626A1 (en) 1998-01-27 1999-07-29 Minnesota Mining And Manufacturing Company Fluorochemical benzotriazoles
US6063730A (en) * 1998-08-19 2000-05-16 Eastman Kodak Company Reusable donor layer containing dye wells for continuous tone thermal printing
JP2002530527A (ja) 1998-11-16 2002-09-17 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 誘導化金属表面、前記金属表面と官能化重合体の複合体およびそれらの製造方法
FR2792949B1 (fr) 1999-04-30 2001-06-29 Jacques Pierre Pouyfaucon Compose reactif non polluant pour le revetement de metaux, en vue de les proteger de la corrosion et de faciliter leur deformation mecanique
EP2082995B1 (en) 1999-10-27 2012-08-08 3M Innovative Properties Company Method of reducing the surface tension, of forming a stable foam and to increase the wetting of a coating
US6380101B1 (en) 2000-04-18 2002-04-30 International Business Machines Corporation Method of forming patterned indium zinc oxide and indium tin oxide films via microcontact printing and uses thereof
US6632872B1 (en) 2000-09-19 2003-10-14 3M Innovative Properties Company Adhesive compositions including self-assembling molecules, adhesives, articles, and methods

Also Published As

Publication number Publication date
KR100966660B1 (ko) 2010-06-30
US6824882B2 (en) 2004-11-30
WO2003102003A1 (en) 2003-12-11
US20030228469A1 (en) 2003-12-11
EP1509536A1 (en) 2005-03-02
KR20050004254A (ko) 2005-01-12
EP1509536B1 (en) 2008-08-13
CN100369923C (zh) 2008-02-20
CN1656108A (zh) 2005-08-17
CA2486165A1 (en) 2003-12-11
DE60322889D1 (de) 2008-09-25
JP2005528446A (ja) 2005-09-22
AU2003248533A1 (en) 2003-12-19
ATE404572T1 (de) 2008-08-15

Similar Documents

Publication Publication Date Title
JP4317125B2 (ja) フッ素化ホスホン酸
US7449266B2 (en) Perfluoropolyether benzotriazole compounds
US20050048288A1 (en) Perfluoropolyether amide-linked phosphonates, phosphates, and derivatives thereof
CN103476908B (zh) 用于增加钟表制造元件的疏油性的组合物
JP6073353B2 (ja) 潤滑性添加剤を含むフッ素化コーティング
JPWO2019039226A1 (ja) 含フッ素エーテル化合物、含フッ素エーテル組成物、コーティング液、物品およびその製造方法
JP7001097B2 (ja) 含フッ素エーテル化合物、含フッ素エーテル組成物、コーティング液、物品およびその製造方法
CN106232610A (zh) 用于金属表面的膦酸酯官能抗菌涂层
JP2010530478A (ja) 青銅の腐食保護
CN111051383A (zh) 含氟醚化合物、组合物及物品
WO2018080639A1 (en) Protective coating composition with mixed functionalities
JP6887297B2 (ja) 噴霧塗布用組成物
US7495118B2 (en) Compositions containing C4-swallow tail silanes
JP7102519B2 (ja) 多孔性誘電体のキャッピングに使用する芳香族アミノシロキサン官能化材料
RU2579066C1 (ru) Состав для получения гидрофобного покрытия
WO2009135686A2 (en) Self-assembled monolayers and method of production
JP2009542861A (ja) シラン類含有組成物
CN113549211A (zh) 含全氟聚醚的磷酸化合物、表面处理剂及物品
JP5843785B2 (ja) フッ素化アリーレン含有化合物、方法、及びそれから調製されるポリマー
JP6917024B2 (ja) 含フッ素ジオール/トリアジン誘導体コンポジット
JP2774765B2 (ja) 溶剤の組成物
KR101500327B1 (ko) 콘 구조의 형태를 갖는 폴리실록산, 초소수성 표면을 갖는 적층체 및 상기 적층체의 제조방법
KR20250161531A (ko) 기재 표면의 선택적 개질 방법, 표면처리된 기재의 제조 방법 및 조성물
JPH06108095A (ja) 溶 剤

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060519

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060519

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090421

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090521

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120529

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees