JP4279465B2 - 透明な金属酸化物のコロイド及びセラマーを製造するためのナノサイズ金属酸化物の粒子 - Google Patents

透明な金属酸化物のコロイド及びセラマーを製造するためのナノサイズ金属酸化物の粒子 Download PDF

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Publication number
JP4279465B2
JP4279465B2 JP2000562307A JP2000562307A JP4279465B2 JP 4279465 B2 JP4279465 B2 JP 4279465B2 JP 2000562307 A JP2000562307 A JP 2000562307A JP 2000562307 A JP2000562307 A JP 2000562307A JP 4279465 B2 JP4279465 B2 JP 4279465B2
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metal oxide
ceramer
particles
oxide particles
grams
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JP2002521305A5 (enExample
JP2002521305A (ja
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エス． アーニー，デビット
イー． ウッド，トーマス
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3M Co
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3M Co
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F120/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F120/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F120/10—Esters
    • C08F120/22—Esters containing halogen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/36—Compounds of titanium
    • C09C1/3692—Combinations of treatments provided for in groups C09C1/3615 - C09C1/3684
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • B32B27/308—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising acrylic (co)polymers
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/003—Titanates
    • C01G23/006—Alkaline earth titanates
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/04—Oxides; Hydroxides
    • C01G23/047—Titanium dioxide
    • C01G23/053—Producing by wet processes, e.g. hydrolysing titanium salts
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/0427—Coating with only one layer of a composition containing a polymer binder
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00—Use of ingredients characterised by shape
    • C08K7/16—Solid spheres
    • C08K7/18—Solid spheres inorganic
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/36—Compounds of titanium
    • C09C1/3607—Titanium dioxide
    • C09C1/3684—Treatment with organo-silicon compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • C09D133/16—Homopolymers or copolymers of esters containing halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/61—Additives non-macromolecular inorganic
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/60—Compounds characterised by their crystallite size
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C01P2004/03—Particle morphology depicted by an image obtained by SEM

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Geology (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Polymerisation Methods In General (AREA)
  • Colloid Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP2000562307A 1998-07-30 1998-07-30 透明な金属酸化物のコロイド及びセラマーを製造するためのナノサイズ金属酸化物の粒子 Expired - Lifetime JP4279465B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US1998/015843 WO2000006495A1 (en) 1998-07-30 1998-07-30 Nanosize metal oxide particles for producing transparent metal oxide colloids and ceramers

Publications (3)

Publication Number Publication Date
JP2002521305A JP2002521305A (ja) 2002-07-16
JP2002521305A5 JP2002521305A5 (enExample) 2006-01-05
JP4279465B2 true JP4279465B2 (ja) 2009-06-17

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JP2000562307A Expired - Lifetime JP4279465B2 (ja) 1998-07-30 1998-07-30 透明な金属酸化物のコロイド及びセラマーを製造するためのナノサイズ金属酸化物の粒子
JP2000562418A Expired - Fee Related JP4223686B2 (ja) 1998-07-30 1998-12-30 臭素化ポリマーおよび無機酸化物粒子含有セラマー

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JP2000562418A Expired - Fee Related JP4223686B2 (ja) 1998-07-30 1998-12-30 臭素化ポリマーおよび無機酸化物粒子含有セラマー

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Country Link
EP (2) EP1112228B1 (enExample)
JP (2) JP4279465B2 (enExample)
KR (2) KR100547959B1 (enExample)
CN (1) CN1202015C (enExample)
AU (2) AU8761498A (enExample)
CA (2) CA2338917A1 (enExample)
DE (1) DE69827166T2 (enExample)
WO (2) WO2000006495A1 (enExample)

Families Citing this family (67)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6416838B1 (en) 1999-10-28 2002-07-09 3M Innovative Properties Company Compositions and articles made therefrom
JP3517698B2 (ja) * 2000-03-03 2004-04-12 独立行政法人産業技術総合研究所 ナノ粒子分散構造体及びその積層体
JP4627355B2 (ja) * 2000-06-23 2011-02-09 大日本印刷株式会社 高屈折率コーティング組成物、高屈折率塗膜、画像表示装置、及び、反射防止フィルム
US8129443B2 (en) * 2000-08-11 2012-03-06 Sun Medical Co., Ltd. Polymerizable composition, cured object obtained therefrom, and composite material
US6497957B1 (en) 2000-10-04 2002-12-24 Eastman Kodak Company Antireflection article of manufacture
TW554176B (en) * 2000-10-04 2003-09-21 Eastman Kodak Co Method of optically modifying a polymeric material
TW528878B (en) * 2000-10-04 2003-04-21 Eastman Kodak Co Method of making an antireflection polymeric material
EP1195623A1 (en) * 2000-10-04 2002-04-10 Eastman Kodak Company Method of making an antireflection article of manufacture
US6896958B1 (en) * 2000-11-29 2005-05-24 Nanophase Technologies Corporation Substantially transparent, abrasion-resistant films containing surface-treated nanocrystalline particles
WO2002070234A1 (de) * 2001-03-01 2002-09-12 Siemens Aktiengesellschaft Verfahren zum versehen eines festkörpers mit einer oberflächenschicht und einer klebefolie sowie festkörper nach diesem verfahren
KR100435314B1 (ko) * 2001-04-13 2004-06-10 (주)나노닉스 무기 나노 입자의 제조방법
US6962946B2 (en) 2001-11-21 2005-11-08 3M Innovative Properties Company Nanoparticles having a rutile-like crystalline phase and method of preparing same
DE10205920A1 (de) 2002-02-12 2003-08-21 Itn Nanovation Gmbh Nanoskaliger Rutil, sowie Verfahren zu dessen Herstellung
KR100476557B1 (ko) * 2002-04-24 2005-03-17 삼성전기주식회사 나노크기의 금속입자 형성방법 및 이를 이용한 전도층형성방법
ATE421564T1 (de) 2002-05-24 2009-02-15 3M Innovative Properties Co Verwendung von oberflächenmodifizierten nanopartikeln zur ölgewinnung
US7001580B2 (en) 2002-12-31 2006-02-21 3M Innovative Properties Company Emulsions including surface-modified organic molecules
US7141612B2 (en) 2002-12-31 2006-11-28 3M Innovative Properties Company Stabilized foams including surface-modified organic molecules
US7129277B2 (en) 2002-12-31 2006-10-31 3M Innovative Properties Company Emulsions including surface-modified inorganic nanoparticles
US8993221B2 (en) 2012-02-10 2015-03-31 Pixelligent Technologies, Llc Block co-polymer photoresist
US7524616B2 (en) * 2003-03-04 2009-04-28 Pixelligent Technologies Llc Applications of semiconductor nano-sized particles for photolithography
US7459146B2 (en) 2003-05-30 2008-12-02 3M Innovative Properties Company Stabilized aerosol dispersions
US7109247B2 (en) 2003-05-30 2006-09-19 3M Innovative Properties Company Stabilized particle dispersions containing nanoparticles
US7169375B2 (en) 2003-08-29 2007-01-30 General Electric Company Metal oxide nanoparticles, methods of making, and methods of use
US7282272B2 (en) 2003-09-12 2007-10-16 3M Innovative Properties Company Polymerizable compositions comprising nanoparticles
US7289202B2 (en) 2004-09-10 2007-10-30 3M Innovative Properties Company Methods for testing durable optical elements
US7074463B2 (en) 2003-09-12 2006-07-11 3M Innovative Properties Company Durable optical element
US6842288B1 (en) 2003-10-30 2005-01-11 3M Innovative Properties Company Multilayer optical adhesives and articles
JP2007525824A (ja) * 2003-11-05 2007-09-06 ディーエスエム アイピー アセッツ ビー．ブイ． マイクロチップを製造するための方法および装置
EP1530086A1 (en) * 2003-11-05 2005-05-11 DSM IP Assets B.V. A method and an apparatus for producing micro-chips
US7189768B2 (en) 2003-11-25 2007-03-13 3M Innovative Properties Company Solution containing surface-modified nanoparticles
JP2007535590A (ja) * 2004-04-22 2007-12-06 Ｊｓｒ株式会社 低屈折率コーティング組成物
JP5173119B2 (ja) * 2004-04-30 2013-03-27 学校法人日本大学 硬質膜、及び硬質膜製造方法
US7491661B2 (en) * 2004-12-28 2009-02-17 Asml Netherlands B.V. Device manufacturing method, top coat material and substrate
JP5231022B2 (ja) 2004-12-30 2013-07-10 スリーエム イノベイティブ プロパティズ カンパニー 表面改質ナノ粒子を含むポリマーブレンドおよびその製造方法
US7326448B2 (en) 2005-02-17 2008-02-05 3M Innovative Properties Company Polymerizable oligomeric urethane compositions comprising nanoparticles
JP2006273709A (ja) * 2005-03-03 2006-10-12 Mitsubishi Chemicals Corp 高屈折率を有するナノ粒子
US7274458B2 (en) 2005-03-07 2007-09-25 3M Innovative Properties Company Thermoplastic film having metallic nanoparticle coating
US20060204676A1 (en) * 2005-03-11 2006-09-14 Jones Clinton L Polymerizable composition comprising low molecular weight organic component
US7666494B2 (en) 2005-05-04 2010-02-23 3M Innovative Properties Company Microporous article having metallic nanoparticle coating
US20080003373A1 (en) 2005-05-11 2008-01-03 Yazaki Corporation Antireflective coating compositions and methods for depositing such coatings
US7400445B2 (en) 2005-05-31 2008-07-15 3M Innovative Properties Company Optical filters for accelerated weathering devices
JP4142734B2 (ja) 2005-09-16 2008-09-03 松下電器産業株式会社 回折光学素子
TWI417324B (zh) 2005-11-15 2013-12-01 3M Innovative Properties Co 增亮膜及無機奈米粒子之表面處理方法
GB0602678D0 (en) * 2006-02-09 2006-03-22 Dupont Teijin Films Us Ltd Polyester film and manufacturing process
JP2007292883A (ja) * 2006-04-21 2007-11-08 Dainippon Printing Co Ltd 光学積層体
US7491287B2 (en) 2006-06-09 2009-02-17 3M Innovative Properties Company Bonding method with flowable adhesive composition
JP5186144B2 (ja) * 2006-07-18 2013-04-17 昭和電工株式会社 透明反射防止板
US20090312457A1 (en) * 2006-12-20 2009-12-17 Hoya Corporation Metal oxide nanoparticle, process for producing the same, nanoparticle dispersed resin and method for producing the same
EP1939689A1 (en) * 2006-12-28 2008-07-02 DSM IP Assets B.V. Immersion fluid and method for producing microchips
JP5309447B2 (ja) * 2007-01-25 2013-10-09 住友大阪セメント株式会社 表面被覆ナノ粒子及びその製造方法並びに表面被覆ナノ粒子分散液
JP2009091448A (ja) * 2007-10-09 2009-04-30 Momentive Performance Materials Japan Kk ハードコート用樹脂組成物
US7981986B2 (en) 2008-04-29 2011-07-19 3M Innovative Properties Company Optical films comprising fluorenol (meth)acrylate monomer
US8592511B2 (en) 2010-04-23 2013-11-26 Pixelligent Technologies, Llc Synthesis, capping and dispersion of nanocrystals
KR20130088037A (ko) * 2010-06-23 2013-08-07 니폰 가세이 가부시키가이샤 무기 유기 하이브리드 재료 및 그것을 사용한 광학 재료 그리고 무기 유기 복합재 조성물
JP6038785B2 (ja) 2010-06-30 2016-12-07 スリーエム イノベイティブ プロパティズ カンパニー 微生物を迅速に検出するための装置
US8920675B2 (en) 2010-10-27 2014-12-30 Pixelligent Technologies, Llc Synthesis, capping and dispersion of nanocrystals
EP2718766A1 (en) 2011-06-08 2014-04-16 3M Innovative Properties Company Photoresists containing polymer-tethered nanoparticles
US9359689B2 (en) 2011-10-26 2016-06-07 Pixelligent Technologies, Llc Synthesis, capping and dispersion of nanocrystals
CN103958200B (zh) * 2011-11-21 2015-12-23 3M创新有限公司 包括纳米颗粒的漆面保护膜
JP5895583B2 (ja) * 2012-02-21 2016-03-30 コニカミノルタ株式会社 有機エレクトロルミネッセンス素子、照明装置および表示装置ならびに有機エレクトロルミネッセンス素子の製造方法
JP6022866B2 (ja) * 2012-09-14 2016-11-09 旭化成株式会社 アルカリ土類金属原子チタン酸化物分散液の製造方法
JP6280922B2 (ja) 2013-09-30 2018-02-14 富士フイルム株式会社 六方晶フェライト粒子の製造方法および磁気記録媒体の製造方法
TWI609935B (zh) * 2013-09-30 2018-01-01 住友大阪水泥股份有限公司 無機粒子分散液、含無機粒子之組成物、塗膜、附塗膜之塑膠基材、顯示裝置
EP3191590B1 (en) * 2014-09-10 2024-02-21 Quantumdx Group Limited Sorbent material for separating bio-macromolecules
WO2018130504A1 (en) * 2017-01-11 2018-07-19 Basf Se Process for producing nanoparticles
JP6564551B1 (ja) * 2018-11-27 2019-08-21 株式会社アドマテックス 表面改質チタン酸バリウム粒子材料、チタン酸バリウム含有樹脂組成物、及びチタン酸バリウム分散液
WO2021260601A1 (en) * 2020-06-25 2021-12-30 3M Innovative Properties Company Curable high refractive index ink compositions and articles prepared from the ink compositions

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3793293A (en) * 1971-08-04 1974-02-19 Nat Starch Chem Corp Electrophotographic coating compositions having bromine-containing polymer binders
US4478876A (en) * 1980-12-18 1984-10-23 General Electric Company Process of coating a substrate with an abrasion resistant ultraviolet curable composition
GB2089826B (en) * 1980-12-18 1985-01-03 Gen Electric Abrasion resistant ultraviolet light curable hard coating compositions
US4438190A (en) * 1981-03-04 1984-03-20 Hitachi Chemical Company, Ltd. Photosensitive resin composition containing unsaturated monomers and unsaturated phosphates
US4487904A (en) * 1983-09-21 1984-12-11 Toray Industries, Inc. Urethanized acrylic resin material for plastic lens and lens composed thereof
JPS63279201A (ja) * 1987-05-12 1988-11-16 Kureha Chem Ind Co Ltd 樹脂レンズ
DE3736686A1 (de) * 1987-10-29 1989-05-11 Fraunhofer Ges Forschung Verfahren zur herstellung von monodispersen keramischen pulvern
IL89696A0 (en) * 1988-04-11 1989-09-28 Minnesota Mining & Mfg Abrasion resistant coatings comprising silicon dioxide dispersions
US5002795A (en) * 1988-04-29 1991-03-26 Metallized Products, Inc. Method of making a fire retardant and antistatic film
JPH02278125A (ja) * 1989-04-19 1990-11-14 Mitsubishi Pencil Co Ltd 筆記具のインキ吸蔵体のインキ検知方法
JPH03153715A (ja) * 1989-11-10 1991-07-01 Kuraray Co Ltd 光学用メタクリル系樹脂
DE4233396A1 (de) * 1992-10-05 1994-04-07 Merck Patent Gmbh Oberflächenmodifizierte Oxidpartikel und ihre Anwendung als Füll- und Modifizierungsmittel in Polymermaterialien
US5372796A (en) * 1993-04-13 1994-12-13 Southwest Research Institute Metal oxide-polymer composites
US5391210A (en) * 1993-12-16 1995-02-21 Minnesota Mining And Manufacturing Company Abrasive article
JP3536067B2 (ja) * 1995-09-11 2004-06-07 日本エーアールシー株式会社 プライマー組成物
US5932626A (en) * 1997-05-09 1999-08-03 Minnesota Mining And Manufacturing Company Optical product prepared from high index of refraction brominated monomers
US6355754B1 (en) * 1997-05-09 2002-03-12 3M Innovative Properties Company High refractive index chemical composition and polymers and polymeric material derived therefrom
CA2340671A1 (en) * 1998-09-02 2000-03-16 Minnesota Mining And Manufacturing Company Brominated materials

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Publication number Publication date
AU2018699A (en) 2000-02-21
KR20010072131A (ko) 2001-07-31
DE69827166T2 (de) 2006-02-23
AU8761498A (en) 2000-02-21
WO2000006495A1 (en) 2000-02-10
KR100588324B1 (ko) 2006-06-12
CN1202015C (zh) 2005-05-18
EP1112228B1 (en) 2004-10-20
CN1303351A (zh) 2001-07-11
KR20010106425A (ko) 2001-11-29
WO2000006622A1 (en) 2000-02-10
JP4223686B2 (ja) 2009-02-12
DE69827166D1 (de) 2004-11-25
JP2003521556A (ja) 2003-07-15
EP1105430A1 (en) 2001-06-13
CA2338920A1 (en) 2000-02-10
AU744976B2 (en) 2002-03-07
EP1112228A1 (en) 2001-07-04
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JP2002521305A (ja) 2002-07-16

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