JP4176779B2 - 基板処理方法,記録媒体及び基板処理装置 - Google Patents
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
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- Manufacturing & Machinery (AREA)
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- Cleaning Or Drying Semiconductors (AREA)
- Drying Of Solid Materials (AREA)
Description
W ウェハ
1 基板処理装置
2 チャンバー
16 湿度調節機構
17 制御コンピュータ
17c 記録媒体
41 薬液(DHF液)供給源
42 薬液(SC−1液)供給源
43 薬液(SC−2液)供給源
47 リンス液供給源
91 ガス供給チャンバー
101 主供給路
102 FFU
103 クリーンエア供給路
104 CDA供給源
105 CDA供給路
107 切換ダンパ
112 開閉弁
Claims (15)
- 薬液を用いて基板を処理する薬液処理工程を行った後,基板を乾燥させる乾燥処理工程を行う方法であって,
前記薬液処理工程時に使用される薬液の種類に応じて,少なくとも前記乾燥処理工程において,前記基板の周囲の湿度を低減させ,水より揮発性が高い流体を基板に供給する状態と,前記基板の周囲の湿度を低減させず,水より揮発性が高い流体を基板に供給しない状態とに切り替えることを特徴とする,基板処理方法。 - 前記薬液処理工程の後に,水より揮発性が高い流体を供給して基板に液膜を形成させる液膜形成工程を行い,
前記液膜形成工程において,前記基板の周囲の湿度を低減させることを特徴とする,請求項1に記載の基板処理方法。 - 前記水より揮発性が高い流体は,IPAを含む流体であることを特徴とする,請求項1または2に記載の基板処理方法。
- 前記薬液処理工程と,リンス液を用いて基板を処理するリンス処理工程と,基板の上面にIPAを含む流体を供給して液膜を形成する液膜形成工程と,前記乾燥処理工程とを行い,
前記液膜形成工程において,前記基板の周囲の湿度を低減させる状態に切り替えることを特徴とする,請求項1に記載の基板処理方法。 - 前記基板の周囲の湿度を低減する場合,露点温度を−40℃以下にすることを特徴とする,請求項1〜4のいずれかに記載の基板処理方法。
- 前記基板の周囲の湿度の調節は,前記基板の周囲にFFUから供給されるクリーンエアを供給する状態と,前記クリーンエアよりも湿度が低い低露点ガスを供給する状態とを切り換えることにより行うことを特徴とする,請求項1〜5のいずれかに記載の基板処理方法。
- 前記低露点ガスは,CDA又は窒素ガスであることを特徴とする,請求項6に記載の基板処理方法。
- 基板の薬液処理及び乾燥処理を行う基板処理装置の制御コンピュータによって実行することが可能なソフトウェアが記録された記録媒体であって,
前記ソフトウェアは,前記制御コンピュータによって実行されることにより,前記基板処理装置に,請求項1〜7のいずれかに記載の基板処理方法を行わせるものであることを特徴とする,記録媒体。 - 薬液を用いて基板を薬液処理した後,基板を乾燥する装置であって,
互いに異なる種類の薬液を供給する複数の薬液供給源と,水より揮発性が高い流体を供給する流体供給源と,基板の周囲の湿度を調節する湿度調節機構と,前記流体供給源および前記湿度調節機構を制御する制御部とを備え,
前記制御部は,薬液処理の際に用いた薬液の種類に応じて,少なくとも基板を乾燥させる乾燥処理工程を行う乾燥処理工程において,前記基板の周囲の湿度を低減させ,水より揮発性が高い流体を基板に供給する状態と,前記基板の周囲の湿度を低減させず,水より揮発性が高い流体を基板に供給する状態とに,前記流体供給源および前記湿度調節機構を制御することを特徴とする,基板処理装置。 - 前記水より揮発性が高い流体は,IPAを含む流体であることを特徴とする,請求項9に記載の基板処理装置。
- 前記基板の周囲の湿度を低減させる場合,露点温度を−40℃以下にすることを特徴とする,請求項9または10に記載の基板処理装置。
- クリーンエアを供給するFFUと,前記クリーンエアよりも湿度が低い低露点ガスを供給する低露点ガス供給源とを備え,
前記基板の周囲に前記クリーンエアを供給する状態と前記低露点ガスを供給する状態とを切り換えることが可能な構成としたことを特徴とする,請求項9〜11のいずれかに記載の基板処理装置。 - 前記FFUから供給される前記クリーンエアを取り込む取り込み用カップと,前記取り込み用カップ内のクリーンエアを前記基板の周囲に導入するクリーンエア供給路と,前記取り込み用カップ内のクリーンエアを前記取り込み用カップの外部に排出させるクリーンエア排出口とを備えることを特徴とする,請求項12に記載の基板処理装置。
- 前記クリーンエア又は前記低露点ガスを前記基板の周囲に導入する主供給路と,前記FFUから供給される前記クリーンエアを前記主供給路に導入するクリーンエア供給路と,前記低露点ガス供給源から供給される前記低露点ガスを前記主供給路に導入する低露点ガス供給路とを備え,
前記クリーンエア供給路と前記主供給路を連通させる状態と遮断する状態とを切り換える切換部を設け,
前記切換部において,前記クリーンエア供給路の下流端部は,前記主供給路の上流端部に向かって前記クリーンエアを吐出する方向に指向し,
前記クリーンエア供給路と前記主供給路は,互いに同一の直線上に備えられ,
前記低露点ガス供給路は,前記切換部を介して前記主供給路に接続され,
前記切換部において,前記低露点ガス供給路の下流端部は,前記主供給路の上流端部とは異なる位置に向かって前記低露点ガスを吐出する方向に指向していることを特徴とする,請求項12又は13に記載の基板処理装置。 - 前記低露点ガスは,CDA又は窒素ガスであることを特徴とする,請求項12〜14のいずれかに記載の基板処理装置。
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JP2006090297A JP4176779B2 (ja) | 2006-03-29 | 2006-03-29 | 基板処理方法,記録媒体及び基板処理装置 |
DE112007000442T DE112007000442B4 (de) | 2006-03-29 | 2007-03-29 | Substratbearbeitungsverfahren, Speichermedium und Substratbearbeitungseinrichtung |
US11/886,662 US8133327B2 (en) | 2006-03-29 | 2007-03-29 | Substrate processing method, storage medium and substrate processing apparatus |
PCT/JP2007/056820 WO2007111369A1 (ja) | 2006-03-29 | 2007-03-29 | 基板処理方法、記録媒体及び基板処理装置 |
KR1020077020305A KR100886860B1 (ko) | 2006-03-29 | 2007-03-29 | 기판 처리 방법, 기록 매체 및 기판 처리 장치 |
TW096111103A TW200807521A (en) | 2006-03-29 | 2007-03-29 | Substrate treatment method, recording medium and substrate treatment device |
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JP2008144595A Division JP4516141B2 (ja) | 2008-06-02 | 2008-06-02 | 基板処理方法,記録媒体及び基板処理装置 |
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DE (1) | DE112007000442B4 (ja) |
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JP5143498B2 (ja) * | 2006-10-06 | 2013-02-13 | 東京エレクトロン株式会社 | 基板処理方法、基板処理装置、プログラムならびに記録媒体 |
JP5117365B2 (ja) | 2008-02-15 | 2013-01-16 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法および記憶媒体 |
JP5297056B2 (ja) * | 2008-03-11 | 2013-09-25 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理方法 |
JP5173502B2 (ja) * | 2008-03-14 | 2013-04-03 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理方法 |
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JP5390873B2 (ja) * | 2009-01-28 | 2014-01-15 | 大日本スクリーン製造株式会社 | 基板処理方法および基板処理装置 |
US20120103371A1 (en) * | 2010-10-28 | 2012-05-03 | Lam Research Ag | Method and apparatus for drying a semiconductor wafer |
JP5642574B2 (ja) * | 2011-01-25 | 2014-12-17 | 東京エレクトロン株式会社 | 液処理装置および液処理方法 |
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JP5666414B2 (ja) * | 2011-10-27 | 2015-02-12 | 東京エレクトロン株式会社 | 液処理装置、液処理方法および記憶媒体 |
US9748120B2 (en) | 2013-07-01 | 2017-08-29 | Lam Research Ag | Apparatus for liquid treatment of disc-shaped articles and heating system for use in such apparatus |
JP5486708B2 (ja) * | 2013-02-28 | 2014-05-07 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理方法 |
JP6005588B2 (ja) * | 2013-05-31 | 2016-10-12 | 東京エレクトロン株式会社 | 液処理装置 |
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US8133327B2 (en) | 2012-03-13 |
TW200807521A (en) | 2008-02-01 |
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