JP4068883B2 - 導電膜配線の形成方法、膜構造体の製造方法、電気光学装置の製造方法、及び電子機器の製造方法 - Google Patents

導電膜配線の形成方法、膜構造体の製造方法、電気光学装置の製造方法、及び電子機器の製造方法 Download PDF

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Publication number
JP4068883B2
JP4068883B2 JP2002119448A JP2002119448A JP4068883B2 JP 4068883 B2 JP4068883 B2 JP 4068883B2 JP 2002119448 A JP2002119448 A JP 2002119448A JP 2002119448 A JP2002119448 A JP 2002119448A JP 4068883 B2 JP4068883 B2 JP 4068883B2
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JP
Japan
Prior art keywords
substrate
conductive film
liquid material
film wiring
liquid
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Expired - Lifetime
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JP2002119448A
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English (en)
Japanese (ja)
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JP2003315813A (ja
JP2003315813A5 (enExample
Inventor
昌宏 古沢
利充 平井
正明 小田
央 岩重
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Ulvac Inc
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Seiko Epson Corp
Ulvac Inc
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Publication date
Application filed by Seiko Epson Corp, Ulvac Inc filed Critical Seiko Epson Corp
Priority to JP2002119448A priority Critical patent/JP4068883B2/ja
Priority to KR10-2003-0023891A priority patent/KR100484323B1/ko
Priority to US10/417,805 priority patent/US20030232128A1/en
Priority to TW092108953A priority patent/TW583903B/zh
Priority to EP03252478.7A priority patent/EP1357772B1/en
Priority to CNB031225268A priority patent/CN1284997C/zh
Publication of JP2003315813A publication Critical patent/JP2003315813A/ja
Publication of JP2003315813A5 publication Critical patent/JP2003315813A5/ja
Application granted granted Critical
Publication of JP4068883B2 publication Critical patent/JP4068883B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1241Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
    • H05K3/125Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing by ink-jet printing
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136286Wiring, e.g. gate line, drain line
    • G02F1/136295Materials; Compositions; Manufacture processes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2217/00Gas-filled discharge tubes
    • H01J2217/38Cold-cathode tubes
    • H01J2217/49Display panels, e.g. not making use of alternating current
    • H01J2217/492Details
    • H01J2217/49207Electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Liquid Crystal (AREA)
  • Electroluminescent Light Sources (AREA)
JP2002119448A 2002-04-22 2002-04-22 導電膜配線の形成方法、膜構造体の製造方法、電気光学装置の製造方法、及び電子機器の製造方法 Expired - Lifetime JP4068883B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2002119448A JP4068883B2 (ja) 2002-04-22 2002-04-22 導電膜配線の形成方法、膜構造体の製造方法、電気光学装置の製造方法、及び電子機器の製造方法
KR10-2003-0023891A KR100484323B1 (ko) 2002-04-22 2003-04-16 도전막 배선의 형성 방법, 막구조체, 전기 광학 장치, 및전자 기기
TW092108953A TW583903B (en) 2002-04-22 2003-04-17 Manufacturing method for conductive layer wiring, layered structure member, electro-optic device, and electronic apparatus
EP03252478.7A EP1357772B1 (en) 2002-04-22 2003-04-17 Manufacturing method for conductive layer wiring, electro-optic device, and electronic apparatus
US10/417,805 US20030232128A1 (en) 2002-04-22 2003-04-17 Manufacturing method for conductive layer wiring, layered structure member, electro-optic device, and electronic apparat
CNB031225268A CN1284997C (zh) 2002-04-22 2003-04-18 导电膜配线的形成方法、膜结构体、电光学装置以及电子仪器

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002119448A JP4068883B2 (ja) 2002-04-22 2002-04-22 導電膜配線の形成方法、膜構造体の製造方法、電気光学装置の製造方法、及び電子機器の製造方法

Publications (3)

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JP2003315813A JP2003315813A (ja) 2003-11-06
JP2003315813A5 JP2003315813A5 (enExample) 2005-09-29
JP4068883B2 true JP4068883B2 (ja) 2008-03-26

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JP2002119448A Expired - Lifetime JP4068883B2 (ja) 2002-04-22 2002-04-22 導電膜配線の形成方法、膜構造体の製造方法、電気光学装置の製造方法、及び電子機器の製造方法

Country Status (6)

Country Link
US (1) US20030232128A1 (enExample)
EP (1) EP1357772B1 (enExample)
JP (1) JP4068883B2 (enExample)
KR (1) KR100484323B1 (enExample)
CN (1) CN1284997C (enExample)
TW (1) TW583903B (enExample)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004146796A (ja) * 2002-09-30 2004-05-20 Seiko Epson Corp 膜パターンの形成方法、薄膜製造装置、導電膜配線、電気光学装置、電子機器、並びに非接触型カード媒体
JP4244382B2 (ja) * 2003-02-26 2009-03-25 セイコーエプソン株式会社 機能性材料定着方法及びデバイス製造方法
JP4572868B2 (ja) * 2003-05-12 2010-11-04 セイコーエプソン株式会社 配線パターン形成方法、非接触型カード媒体の製造方法、電気光学装置の製造方法及びアクティブマトリクス基板の製造方法
JP3823981B2 (ja) * 2003-05-12 2006-09-20 セイコーエプソン株式会社 パターンと配線パターン形成方法、デバイスとその製造方法、電気光学装置、電子機器及びアクティブマトリクス基板の製造方法
WO2005047968A1 (en) 2003-11-14 2005-05-26 Semiconductor Energy Laboratory Co., Ltd. Display device and method for manufacturing the same
US7439086B2 (en) 2003-11-14 2008-10-21 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing liquid crystal display device
WO2005048222A1 (en) 2003-11-14 2005-05-26 Semiconductor Energy Laboratory Co., Ltd. Light emitting display device, method for manufacturing the same, and tv set
JP4624078B2 (ja) * 2003-11-14 2011-02-02 株式会社半導体エネルギー研究所 液晶表示装置の作製方法
JP2005262598A (ja) * 2004-03-18 2005-09-29 Asahi Kasei Corp 積層体およびその製造方法
EP1741550B1 (en) * 2004-03-31 2019-04-24 Toray Industries, Inc. Laminated film
JP2005351975A (ja) * 2004-06-08 2005-12-22 Seiko Epson Corp 配向膜形成装置、配向膜形成方法、描画装置および描画方法
JP4275644B2 (ja) * 2004-06-23 2009-06-10 シャープ株式会社 アクティブマトリクス基板およびその製造方法、並びに電子装置
JP4168984B2 (ja) * 2004-06-28 2008-10-22 セイコーエプソン株式会社 配線基板の形成方法
JP2006035184A (ja) * 2004-07-30 2006-02-09 Seiko Epson Corp 液滴塗布方法と液滴塗布装置及び電気光学装置並びに電子機器
JP4051631B2 (ja) 2004-08-20 2008-02-27 セイコーエプソン株式会社 エッチング方法、微細構造体の製造方法、導電線の形成方法、薄膜トランジスタの製造方法及び電子機器の製造方法
JP4583848B2 (ja) * 2004-09-07 2010-11-17 富士フイルム株式会社 マトリクスアレイ基板の製造方法、マトリクスアレイ基板、液晶表示装置、pdp用データー電極の製造方法、pdp用データー電極、及びpdp
JP4100385B2 (ja) * 2004-09-22 2008-06-11 セイコーエプソン株式会社 多層構造形成方法、配線基板の製造方法、および電子機器の製造方法
JP4158755B2 (ja) * 2004-09-30 2008-10-01 セイコーエプソン株式会社 機能膜の製造方法、薄膜トランジスタの製造方法
US20060073337A1 (en) * 2004-10-01 2006-04-06 Krzysztof Nauka Conductive path made of metallic nanoparticles and conductive organic material
JP4389747B2 (ja) 2004-10-12 2009-12-24 セイコーエプソン株式会社 パターン形成方法および配線形成方法
JP2006128228A (ja) * 2004-10-26 2006-05-18 Seiko Epson Corp 導電膜の形成方法、配線基板、電子デバイスおよび電子機器
JP4151652B2 (ja) * 2005-01-11 2008-09-17 セイコーエプソン株式会社 識別コード描画方法
TWI472037B (zh) 2005-01-28 2015-02-01 半導體能源研究所股份有限公司 半導體裝置,電子裝置,和半導體裝置的製造方法
TWI569441B (zh) 2005-01-28 2017-02-01 半導體能源研究所股份有限公司 半導體裝置,電子裝置,和半導體裝置的製造方法
JP4293181B2 (ja) * 2005-03-18 2009-07-08 セイコーエプソン株式会社 金属粒子分散液、金属粒子分散液の製造方法、導電膜形成基板の製造方法、電子デバイスおよび電子機器
KR100683766B1 (ko) 2005-03-30 2007-02-15 삼성에스디아이 주식회사 평판표시장치 및 그의 제조방법
JP2006318835A (ja) 2005-05-16 2006-11-24 Seiko Epson Corp 多層化膜の形成方法および多層化膜、並びに電気光学装置、電子機器
US7867561B2 (en) * 2005-06-22 2011-01-11 Canon Kabushiki Kaisha Circuit pattern forming method and circuit pattern forming device
JP2008010353A (ja) 2006-06-30 2008-01-17 Seiko Epson Corp マスクの製造方法、配線パターンの製造方法、及びプラズマディスプレイの製造方法
US20080044634A1 (en) * 2006-08-16 2008-02-21 Lexmark International, Inc. Fluid composition receiving layer for printed conductive layers and methods therefor
US7709307B2 (en) * 2006-08-24 2010-05-04 Kovio, Inc. Printed non-volatile memory
EP2168148B1 (en) 2007-07-18 2012-05-16 Ricoh Company, Ltd. Laminate structure, electronic device, and display device
CN101489346B (zh) * 2008-01-15 2011-11-16 欣兴电子股份有限公司 线路板的图案化结构
WO2014111942A1 (en) * 2013-01-21 2014-07-24 Camtek Ltd. Surface pretreatment and drop spreading control on multi component surfaces
JP6428636B2 (ja) * 2013-10-30 2018-11-28 株式会社ニコン 薄膜の製造方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB406933A (en) * 1933-08-31 1934-03-08 Shellmar Products Co Improvements in or relating to methods of printing
US4411980A (en) * 1981-09-21 1983-10-25 E. I. Du Pont De Nemours And Company Process for the preparation of flexible circuits
US4668533A (en) * 1985-05-10 1987-05-26 E. I. Du Pont De Nemours And Company Ink jet printing of printed circuit boards
JPH0797696B2 (ja) * 1986-07-05 1995-10-18 株式会社豊田自動織機製作所 ハイブリツドic基板と回路パタ−ン形成方法
US4808274A (en) * 1986-09-10 1989-02-28 Engelhard Corporation Metallized substrates and process for producing
US5132248A (en) * 1988-05-31 1992-07-21 The United States Of America As Represented By The United States Department Of Energy Direct write with microelectronic circuit fabrication
US5114744A (en) * 1989-08-21 1992-05-19 Hewlett-Packard Company Method for applying a conductive trace pattern to a substrate
EP0720202B1 (en) 1994-12-26 1999-06-09 Kabushiki Kaisha Toshiba Display screen and method of manufacturing the same
WO1997038810A1 (en) * 1996-04-17 1997-10-23 Philips Electronics N.V. Method of manufacturing a sintered structure on a substrate
US6461678B1 (en) * 1997-04-29 2002-10-08 Sandia Corporation Process for metallization of a substrate by curing a catalyst applied thereto
CA2306384A1 (en) * 1997-10-14 1999-04-22 Patterning Technologies Limited Method of forming an electronic device
JP4003273B2 (ja) 1998-01-19 2007-11-07 セイコーエプソン株式会社 パターン形成方法および基板製造装置
JP3606047B2 (ja) * 1998-05-14 2005-01-05 セイコーエプソン株式会社 基板の製造方法
EP0980097B1 (en) * 1998-08-10 2013-01-09 Ulvac, Inc. Dispersion containing Cu ultrafine particles individually dispersed therein
JP2000158639A (ja) * 1998-11-30 2000-06-13 Canon Inc 画像形成装置及び画像形成方法
US6630274B1 (en) * 1998-12-21 2003-10-07 Seiko Epson Corporation Color filter and manufacturing method therefor
JP3646784B2 (ja) * 2000-03-31 2005-05-11 セイコーエプソン株式会社 薄膜パタ−ンの製造方法および微細構造体
JP5008216B2 (ja) * 2000-10-13 2012-08-22 株式会社アルバック インクジェット用インクの製法

Also Published As

Publication number Publication date
EP1357772A2 (en) 2003-10-29
KR20030084608A (ko) 2003-11-01
JP2003315813A (ja) 2003-11-06
TW583903B (en) 2004-04-11
CN1453608A (zh) 2003-11-05
EP1357772A3 (en) 2005-01-19
CN1284997C (zh) 2006-11-15
KR100484323B1 (ko) 2005-04-20
EP1357772B1 (en) 2013-06-19
US20030232128A1 (en) 2003-12-18
TW200401594A (en) 2004-01-16

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