JP3947761B2 - 基板処理装置、基板搬送機および基板処理方法 - Google Patents

基板処理装置、基板搬送機および基板処理方法 Download PDF

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Publication number
JP3947761B2
JP3947761B2 JP27558196A JP27558196A JP3947761B2 JP 3947761 B2 JP3947761 B2 JP 3947761B2 JP 27558196 A JP27558196 A JP 27558196A JP 27558196 A JP27558196 A JP 27558196A JP 3947761 B2 JP3947761 B2 JP 3947761B2
Authority
JP
Japan
Prior art keywords
substrate
wafer
substrates
holding means
mounting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP27558196A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10107121A5 (enExample
JPH10107121A (ja
Inventor
敦彦 須田
一行 豊田
一誠 巻口
誠 小沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Denki Electric Inc
Original Assignee
Hitachi Kokusai Electric Inc
Kokusai Denki Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Kokusai Electric Inc, Kokusai Denki Electric Inc filed Critical Hitachi Kokusai Electric Inc
Priority to JP27558196A priority Critical patent/JP3947761B2/ja
Priority to EP97115096A priority patent/EP0833374A3/en
Priority to US08/923,110 priority patent/US6053980A/en
Priority to KR1019970049258A priority patent/KR100285408B1/ko
Publication of JPH10107121A publication Critical patent/JPH10107121A/ja
Publication of JPH10107121A5 publication Critical patent/JPH10107121A5/ja
Application granted granted Critical
Publication of JP3947761B2 publication Critical patent/JP3947761B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7602—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a robot blade or gripped by a gripper for conveyance
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
    • H10P72/3304—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber characterised by movements or sequence of movements of transfer devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/141—Associated with semiconductor wafer handling includes means for gripping wafer

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP27558196A 1996-09-26 1996-09-26 基板処理装置、基板搬送機および基板処理方法 Expired - Fee Related JP3947761B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP27558196A JP3947761B2 (ja) 1996-09-26 1996-09-26 基板処理装置、基板搬送機および基板処理方法
EP97115096A EP0833374A3 (en) 1996-09-26 1997-09-01 Substrate processing apparatus
US08/923,110 US6053980A (en) 1996-09-26 1997-09-04 Substrate processing apparatus
KR1019970049258A KR100285408B1 (ko) 1996-09-26 1997-09-26 기판처리장치,기판반송기 및 기판반송장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27558196A JP3947761B2 (ja) 1996-09-26 1996-09-26 基板処理装置、基板搬送機および基板処理方法

Publications (3)

Publication Number Publication Date
JPH10107121A JPH10107121A (ja) 1998-04-24
JPH10107121A5 JPH10107121A5 (enExample) 2004-09-24
JP3947761B2 true JP3947761B2 (ja) 2007-07-25

Family

ID=17557457

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27558196A Expired - Fee Related JP3947761B2 (ja) 1996-09-26 1996-09-26 基板処理装置、基板搬送機および基板処理方法

Country Status (4)

Country Link
US (1) US6053980A (enExample)
EP (1) EP0833374A3 (enExample)
JP (1) JP3947761B2 (enExample)
KR (1) KR100285408B1 (enExample)

Families Citing this family (71)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6296735B1 (en) * 1993-05-03 2001-10-02 Unaxis Balzers Aktiengesellschaft Plasma treatment apparatus and method for operation same
KR100269097B1 (ko) * 1996-08-05 2000-12-01 엔도 마코토 기판처리장치
AT411304B (de) * 1997-06-18 2003-11-25 Sez Ag Träger für scheibenförmige gegenstände, insbesondere silizium-wafer
US6228773B1 (en) * 1998-04-14 2001-05-08 Matrix Integrated Systems, Inc. Synchronous multiplexed near zero overhead architecture for vacuum processes
KR100265287B1 (ko) * 1998-04-21 2000-10-02 윤종용 반도체소자 제조용 식각설비의 멀티챔버 시스템
JP2000306978A (ja) 1999-02-15 2000-11-02 Kokusai Electric Co Ltd 基板処理装置、基板搬送装置、および基板処理方法
US6612797B1 (en) * 1999-05-18 2003-09-02 Asyst Technologies, Inc. Cassette buffering within a minienvironment
KR100319494B1 (ko) * 1999-07-15 2002-01-09 김용일 원자층 에피택시 공정을 위한 반도체 박막 증착장치
JP2001284276A (ja) * 2000-03-30 2001-10-12 Hitachi Kokusai Electric Inc 基板処理装置
US6326755B1 (en) * 2000-04-12 2001-12-04 Asyst Technologies, Inc. System for parallel processing of workpieces
US6420864B1 (en) * 2000-04-13 2002-07-16 Nanophotonics Ag Modular substrate measurement system
US20020170673A1 (en) * 2000-04-29 2002-11-21 Tanguay Michael J. System and method of processing composite substrates within a high throughput reactor
US6508883B1 (en) * 2000-04-29 2003-01-21 Advanced Technology Materials, Inc. Throughput enhancement for single wafer reactor
US6709522B1 (en) * 2000-07-11 2004-03-23 Nordson Corporation Material handling system and methods for a multichamber plasma treatment system
US6609869B2 (en) * 2001-01-04 2003-08-26 Asm America Transfer chamber with integral loadlock and staging station
JP4884594B2 (ja) * 2001-03-22 2012-02-29 東京エレクトロン株式会社 半導体製造装置及び制御方法
US20030031538A1 (en) * 2001-06-30 2003-02-13 Applied Materials, Inc. Datum plate for use in installations of substrate handling systems
US6918731B2 (en) * 2001-07-02 2005-07-19 Brooks Automation, Incorporated Fast swap dual substrate transport for load lock
JP2003051527A (ja) * 2001-08-02 2003-02-21 Takehide Hayashi 半導体自動搬送対応ｅｆｅｍ（密閉容器からウエハーを出し入れし、製造装置に供給、回収する装置）用ｆｏｕｐ（密閉容器）移載ロボット
KR100822872B1 (ko) * 2001-08-14 2008-04-17 삼성코닝정밀유리 주식회사 유리기판의 박막 코팅 방법
US6899507B2 (en) * 2002-02-08 2005-05-31 Asm Japan K.K. Semiconductor processing apparatus comprising chamber partitioned into reaction and transfer sections
JP2003243481A (ja) * 2002-02-21 2003-08-29 Asm Japan Kk 半導体製造装置及びメンテナンス方法
US6589850B1 (en) * 2002-06-04 2003-07-08 Newport Fab, Llc Method and system for fabricating a bipolar transistor and related structure
US20040089227A1 (en) * 2002-07-19 2004-05-13 Albert Wang Dual chamber vacuum processing system
US20070183871A1 (en) * 2002-07-22 2007-08-09 Christopher Hofmeister Substrate processing apparatus
US7959395B2 (en) * 2002-07-22 2011-06-14 Brooks Automation, Inc. Substrate processing apparatus
US7988398B2 (en) 2002-07-22 2011-08-02 Brooks Automation, Inc. Linear substrate transport apparatus
US8960099B2 (en) * 2002-07-22 2015-02-24 Brooks Automation, Inc Substrate processing apparatus
JP4270434B2 (ja) * 2002-11-29 2009-06-03 シャープ株式会社 基板移載装置並びに基板の取り出し方法および基板の収納方法
WO2005022602A2 (en) * 2003-08-29 2005-03-10 Crossing Automation, Inc. A method and apparatus for semiconductor processing
US7458763B2 (en) 2003-11-10 2008-12-02 Blueshift Technologies, Inc. Mid-entry load lock for semiconductor handling system
US20050113976A1 (en) 2003-11-10 2005-05-26 Blueshift Technologies, Inc. Software controller for handling system
US8313277B2 (en) 2003-11-10 2012-11-20 Brooks Automation, Inc. Semiconductor manufacturing process modules
US8696298B2 (en) * 2003-11-10 2014-04-15 Brooks Automation, Inc. Semiconductor manufacturing process modules
US20070286710A1 (en) * 2003-11-10 2007-12-13 Van Der Meulen Peter Semiconductor manufacturing process modules
US10086511B2 (en) 2003-11-10 2018-10-02 Brooks Automation, Inc. Semiconductor manufacturing systems
US20070269297A1 (en) 2003-11-10 2007-11-22 Meulen Peter V D Semiconductor wafer handling and transport
US8267632B2 (en) 2003-11-10 2012-09-18 Brooks Automation, Inc. Semiconductor manufacturing process modules
KR100558558B1 (ko) * 2004-01-26 2006-03-10 삼성전자주식회사 멀티챔버 프로세스장치
US7282097B2 (en) * 2004-06-14 2007-10-16 Applied Materials, Inc. Slit valve door seal
GB2415291B (en) * 2004-06-15 2008-08-13 Nanobeam Ltd Charged particle beam system
TWI278416B (en) * 2004-12-09 2007-04-11 Au Optronics Corp Cassette stocker
US7798764B2 (en) 2005-12-22 2010-09-21 Applied Materials, Inc. Substrate processing sequence in a cartesian robot cluster tool
US7371022B2 (en) 2004-12-22 2008-05-13 Sokudo Co., Ltd. Developer endpoint detection in a track lithography system
US7351656B2 (en) * 2005-01-21 2008-04-01 Kabushiki Kaihsa Toshiba Semiconductor device having oxidized metal film and manufacture method of the same
US7467916B2 (en) * 2005-03-08 2008-12-23 Asm Japan K.K. Semiconductor-manufacturing apparatus equipped with cooling stage and semiconductor-manufacturing method using same
US7374391B2 (en) 2005-12-22 2008-05-20 Applied Materials, Inc. Substrate gripper for a substrate handling robot
JP4642619B2 (ja) * 2005-09-22 2011-03-02 東京エレクトロン株式会社 基板処理システム及び方法
KR100699539B1 (ko) * 2006-03-31 2007-03-23 세메스 주식회사 기판 처리 시스템 및 이를 이용한 기판 처리 방법
US8398355B2 (en) * 2006-05-26 2013-03-19 Brooks Automation, Inc. Linearly distributed semiconductor workpiece processing tool
US20080166210A1 (en) * 2007-01-05 2008-07-10 Applied Materials, Inc. Supinating cartesian robot blade
US10541157B2 (en) 2007-05-18 2020-01-21 Brooks Automation, Inc. Load lock fast pump vent
WO2008144670A1 (en) 2007-05-18 2008-11-27 Brooks Automation, Inc. Load lock fast pump vent
WO2009055507A1 (en) * 2007-10-26 2009-04-30 Applied Materials, Inc. Methods and apparatus for sealing a slit valve door
JP5511273B2 (ja) * 2008-09-12 2014-06-04 株式会社日立国際電気 基板処理装置及び基板処理方法
KR20100073670A (ko) * 2008-12-23 2010-07-01 황무성 웨이퍼 이송 시스템과 이를 포함하는 반도체 팹 구조물 및 웨이퍼 이송 방법
JP4973675B2 (ja) * 2009-02-26 2012-07-11 東京エレクトロン株式会社 基板処理装置及び基板処理方法
US8602706B2 (en) * 2009-08-17 2013-12-10 Brooks Automation, Inc. Substrate processing apparatus
GB2476476B (en) * 2009-12-23 2013-05-22 Nanobeam Ltd Charged particle beam system
WO2012017653A1 (ja) * 2010-08-06 2012-02-09 東京エレクトロン株式会社 基板処理システム、搬送モジュール、基板処理方法及び半導体素子の製造方法
JP5689294B2 (ja) * 2010-11-25 2015-03-25 東京エレクトロン株式会社 処理装置
JP2013171872A (ja) * 2012-02-17 2013-09-02 Tokyo Electron Ltd 基板処理装置及び基板処理方法
JP2013171871A (ja) * 2012-02-17 2013-09-02 Tokyo Electron Ltd 基板処理装置及び基板処理方法
KR101530024B1 (ko) * 2013-12-20 2015-06-22 주식회사 유진테크 기판 처리 모듈, 이를 포함하는 기판 처리 장치 및 기판 전달 방법
KR101613544B1 (ko) * 2014-02-13 2016-04-19 주식회사 유진테크 기판 처리 장치
KR101659560B1 (ko) * 2014-08-26 2016-09-23 주식회사 테라세미콘 기판처리 장치의 반응기
JP6795675B2 (ja) 2017-02-17 2020-12-02 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置、半導体装置の製造方法およびプログラム
US11133207B2 (en) * 2018-08-30 2021-09-28 Taiwan Semiconductor Manufacturing Co., Ltd. Method for forming films on wafers separated by different distances
JP6896682B2 (ja) 2018-09-04 2021-06-30 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置および半導体装置の製造方法
DE102019123556A1 (de) * 2019-09-03 2021-03-04 Aixtron Se Lademodul für ein CVD-Reaktorsystem
EP4022239A1 (en) * 2019-10-03 2022-07-06 LPE S.p.A. Treating arrangement with loading/unloading group and epitaxial reactor

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5972739A (ja) * 1982-10-20 1984-04-24 Hitachi Ltd 真空処理装置
JPH0666295B2 (ja) * 1983-06-29 1994-08-24 東京応化工業株式会社 多段プラズマ処理装置
JPH0622216B2 (ja) * 1984-11-21 1994-03-23 株式会社日立製作所 プラズマ処理装置
KR950012969B1 (ko) * 1986-04-28 1995-10-24 배리언 어소시에이츠 인코포레이티드 모듀울 반도체 웨이퍼 운반 및 처리 시스템
JPS63204726A (ja) * 1987-02-20 1988-08-24 Anelva Corp 真空処理装置
JPH0825151B2 (ja) * 1988-09-16 1996-03-13 東京応化工業株式会社 ハンドリングユニット
FR2638386B1 (fr) * 1988-11-02 1995-08-11 Eurl Seirob Bras telemanipulateur bipolaire
JP2592511B2 (ja) * 1988-12-03 1997-03-19 株式会社フレンドテック研究所 縦型半導体製造システム
JPH0784241B2 (ja) * 1990-04-10 1995-09-13 国際電気株式会社 ウェーハ移載装置
JP2808826B2 (ja) * 1990-05-25 1998-10-08 松下電器産業株式会社 基板の移し換え装置
JPH04240721A (ja) * 1991-01-25 1992-08-28 Sony Corp マルチチャンバプロセス装置
JPH05152215A (ja) * 1991-11-29 1993-06-18 Hitachi Ltd 成膜装置
US5766360A (en) * 1992-03-27 1998-06-16 Kabushiki Kaisha Toshiba Substrate processing apparatus and substrate processing method
CH687986A5 (de) * 1993-05-03 1997-04-15 Balzers Hochvakuum Plasmabehandlungsanlage und Verfahren zu deren Betrieb.
JP3066691B2 (ja) * 1993-09-17 2000-07-17 東京エレクトロン株式会社 マルチチャンバー処理装置及びそのクリーニング方法
JPH07221163A (ja) * 1994-02-04 1995-08-18 Nissin Electric Co Ltd 基板搬送装置
KR0129582B1 (ko) * 1994-06-23 1998-04-06 김주용 다중 기판 전달 장치
US5826129A (en) * 1994-06-30 1998-10-20 Tokyo Electron Limited Substrate processing system
TW295677B (enExample) * 1994-08-19 1997-01-11 Tokyo Electron Co Ltd
WO1997010079A1 (en) * 1995-09-13 1997-03-20 Silicon Valley Group, Inc. Concentric dual elbow
US5647724A (en) * 1995-10-27 1997-07-15 Brooks Automation Inc. Substrate transport apparatus with dual substrate holders
US6299404B1 (en) * 1995-10-27 2001-10-09 Brooks Automation Inc. Substrate transport apparatus with double substrate holders

Also Published As

Publication number Publication date
US6053980A (en) 2000-04-25
KR100285408B1 (ko) 2001-04-02
EP0833374A3 (en) 1998-05-13
KR19980025056A (ko) 1998-07-06
JPH10107121A (ja) 1998-04-24
EP0833374A2 (en) 1998-04-01

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