JPH10107121A5 - - Google Patents

Info

Publication number
JPH10107121A5
JPH10107121A5 JP1996275581A JP27558196A JPH10107121A5 JP H10107121 A5 JPH10107121 A5 JP H10107121A5 JP 1996275581 A JP1996275581 A JP 1996275581A JP 27558196 A JP27558196 A JP 27558196A JP H10107121 A5 JPH10107121 A5 JP H10107121A5
Authority
JP
Japan
Prior art keywords
substrate
substrates
holding means
processing chamber
substrate holding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1996275581A
Other languages
English (en)
Japanese (ja)
Other versions
JP3947761B2 (ja
JPH10107121A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP27558196A priority Critical patent/JP3947761B2/ja
Priority claimed from JP27558196A external-priority patent/JP3947761B2/ja
Priority to EP97115096A priority patent/EP0833374A3/en
Priority to US08/923,110 priority patent/US6053980A/en
Priority to KR1019970049258A priority patent/KR100285408B1/ko
Publication of JPH10107121A publication Critical patent/JPH10107121A/ja
Publication of JPH10107121A5 publication Critical patent/JPH10107121A5/ja
Application granted granted Critical
Publication of JP3947761B2 publication Critical patent/JP3947761B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP27558196A 1996-09-26 1996-09-26 基板処理装置、基板搬送機および基板処理方法 Expired - Fee Related JP3947761B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP27558196A JP3947761B2 (ja) 1996-09-26 1996-09-26 基板処理装置、基板搬送機および基板処理方法
EP97115096A EP0833374A3 (en) 1996-09-26 1997-09-01 Substrate processing apparatus
US08/923,110 US6053980A (en) 1996-09-26 1997-09-04 Substrate processing apparatus
KR1019970049258A KR100285408B1 (ko) 1996-09-26 1997-09-26 기판처리장치,기판반송기 및 기판반송장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27558196A JP3947761B2 (ja) 1996-09-26 1996-09-26 基板処理装置、基板搬送機および基板処理方法

Publications (3)

Publication Number Publication Date
JPH10107121A JPH10107121A (ja) 1998-04-24
JPH10107121A5 true JPH10107121A5 (enExample) 2004-09-24
JP3947761B2 JP3947761B2 (ja) 2007-07-25

Family

ID=17557457

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27558196A Expired - Fee Related JP3947761B2 (ja) 1996-09-26 1996-09-26 基板処理装置、基板搬送機および基板処理方法

Country Status (4)

Country Link
US (1) US6053980A (enExample)
EP (1) EP0833374A3 (enExample)
JP (1) JP3947761B2 (enExample)
KR (1) KR100285408B1 (enExample)

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CN101894779B (zh) * 2003-08-29 2013-05-01 交叉自动控制公司 用于半导体处理的方法和装置
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US10086511B2 (en) 2003-11-10 2018-10-02 Brooks Automation, Inc. Semiconductor manufacturing systems
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KR101522324B1 (ko) 2007-05-18 2015-05-21 브룩스 오토메이션 인코퍼레이티드 로드 락 빠른 펌프 벤트
US10541157B2 (en) 2007-05-18 2020-01-21 Brooks Automation, Inc. Load lock fast pump vent
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JP5511273B2 (ja) * 2008-09-12 2014-06-04 株式会社日立国際電気 基板処理装置及び基板処理方法
KR20100073670A (ko) * 2008-12-23 2010-07-01 황무성 웨이퍼 이송 시스템과 이를 포함하는 반도체 팹 구조물 및 웨이퍼 이송 방법
JP4973675B2 (ja) * 2009-02-26 2012-07-11 東京エレクトロン株式会社 基板処理装置及び基板処理方法
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JP5689294B2 (ja) * 2010-11-25 2015-03-25 東京エレクトロン株式会社 処理装置
JP2013171872A (ja) * 2012-02-17 2013-09-02 Tokyo Electron Ltd 基板処理装置及び基板処理方法
JP2013171871A (ja) * 2012-02-17 2013-09-02 Tokyo Electron Ltd 基板処理装置及び基板処理方法
KR101530024B1 (ko) * 2013-12-20 2015-06-22 주식회사 유진테크 기판 처리 모듈, 이를 포함하는 기판 처리 장치 및 기판 전달 방법
KR101613544B1 (ko) * 2014-02-13 2016-04-19 주식회사 유진테크 기판 처리 장치
KR101659560B1 (ko) * 2014-08-26 2016-09-23 주식회사 테라세미콘 기판처리 장치의 반응기
WO2018150536A1 (ja) 2017-02-17 2018-08-23 株式会社Kokusai Electric 基板処理装置、半導体装置の製造方法およびプログラム
US11133207B2 (en) * 2018-08-30 2021-09-28 Taiwan Semiconductor Manufacturing Co., Ltd. Method for forming films on wafers separated by different distances
JP6896682B2 (ja) 2018-09-04 2021-06-30 株式会社Kokusai Electric 基板処理装置および半導体装置の製造方法
DE102019123556A1 (de) * 2019-09-03 2021-03-04 Aixtron Se Lademodul für ein CVD-Reaktorsystem
CN114450781A (zh) * 2019-10-03 2022-05-06 洛佩诗公司 具有装载/卸载组的处理装置和外延反应器

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