JPH10247679A5 - - Google Patents

Info

Publication number
JPH10247679A5
JPH10247679A5 JP1997063824A JP6382497A JPH10247679A5 JP H10247679 A5 JPH10247679 A5 JP H10247679A5 JP 1997063824 A JP1997063824 A JP 1997063824A JP 6382497 A JP6382497 A JP 6382497A JP H10247679 A5 JPH10247679 A5 JP H10247679A5
Authority
JP
Japan
Prior art keywords
substrates
process module
substrate
storage means
processed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997063824A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10247679A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP6382497A priority Critical patent/JPH10247679A/ja
Priority claimed from JP6382497A external-priority patent/JPH10247679A/ja
Publication of JPH10247679A publication Critical patent/JPH10247679A/ja
Publication of JPH10247679A5 publication Critical patent/JPH10247679A5/ja
Pending legal-status Critical Current

Links

JP6382497A 1997-03-03 1997-03-03 半導体処理装置 Pending JPH10247679A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6382497A JPH10247679A (ja) 1997-03-03 1997-03-03 半導体処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6382497A JPH10247679A (ja) 1997-03-03 1997-03-03 半導体処理装置

Publications (2)

Publication Number Publication Date
JPH10247679A JPH10247679A (ja) 1998-09-14
JPH10247679A5 true JPH10247679A5 (enExample) 2005-01-20

Family

ID=13240509

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6382497A Pending JPH10247679A (ja) 1997-03-03 1997-03-03 半導体処理装置

Country Status (1)

Country Link
JP (1) JPH10247679A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011009290A (ja) * 2009-06-23 2011-01-13 Shin Etsu Handotai Co Ltd ウェーハの処理方法、ウェーハの処理システム、エピタキシャルウェーハの製造方法およびエピタキシャルウェーハの製造システム
JP6751735B2 (ja) * 2018-07-25 2020-09-09 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
JP7185671B2 (ja) * 2020-09-23 2022-12-07 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法

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