KR100285408B1 - 기판처리장치,기판반송기 및 기판반송장치 - Google Patents
기판처리장치,기판반송기 및 기판반송장치 Download PDFInfo
- Publication number
- KR100285408B1 KR100285408B1 KR1019970049258A KR19970049258A KR100285408B1 KR 100285408 B1 KR100285408 B1 KR 100285408B1 KR 1019970049258 A KR1019970049258 A KR 1019970049258A KR 19970049258 A KR19970049258 A KR 19970049258A KR 100285408 B1 KR100285408 B1 KR 100285408B1
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- wafer
- storage means
- chamber
- substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
- H10P72/7602—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a robot blade or gripped by a gripper for conveyance
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
- H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
- H10P72/3304—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber characterised by movements or sequence of movements of transfer devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/141—Associated with semiconductor wafer handling includes means for gripping wafer
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP96-275581 | 1996-09-26 | ||
| JP27558196A JP3947761B2 (ja) | 1996-09-26 | 1996-09-26 | 基板処理装置、基板搬送機および基板処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR19980025056A KR19980025056A (ko) | 1998-07-06 |
| KR100285408B1 true KR100285408B1 (ko) | 2001-04-02 |
Family
ID=17557457
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019970049258A Expired - Fee Related KR100285408B1 (ko) | 1996-09-26 | 1997-09-26 | 기판처리장치,기판반송기 및 기판반송장치 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6053980A (enExample) |
| EP (1) | EP0833374A3 (enExample) |
| JP (1) | JP3947761B2 (enExample) |
| KR (1) | KR100285408B1 (enExample) |
Families Citing this family (71)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6296735B1 (en) * | 1993-05-03 | 2001-10-02 | Unaxis Balzers Aktiengesellschaft | Plasma treatment apparatus and method for operation same |
| KR100269097B1 (ko) * | 1996-08-05 | 2000-12-01 | 엔도 마코토 | 기판처리장치 |
| AT411304B (de) * | 1997-06-18 | 2003-11-25 | Sez Ag | Träger für scheibenförmige gegenstände, insbesondere silizium-wafer |
| US6228773B1 (en) * | 1998-04-14 | 2001-05-08 | Matrix Integrated Systems, Inc. | Synchronous multiplexed near zero overhead architecture for vacuum processes |
| KR100265287B1 (ko) * | 1998-04-21 | 2000-10-02 | 윤종용 | 반도체소자 제조용 식각설비의 멀티챔버 시스템 |
| JP2000306978A (ja) | 1999-02-15 | 2000-11-02 | Kokusai Electric Co Ltd | 基板処理装置、基板搬送装置、および基板処理方法 |
| US6612797B1 (en) * | 1999-05-18 | 2003-09-02 | Asyst Technologies, Inc. | Cassette buffering within a minienvironment |
| KR100319494B1 (ko) * | 1999-07-15 | 2002-01-09 | 김용일 | 원자층 에피택시 공정을 위한 반도체 박막 증착장치 |
| JP2001284276A (ja) * | 2000-03-30 | 2001-10-12 | Hitachi Kokusai Electric Inc | 基板処理装置 |
| US6326755B1 (en) * | 2000-04-12 | 2001-12-04 | Asyst Technologies, Inc. | System for parallel processing of workpieces |
| US6420864B1 (en) * | 2000-04-13 | 2002-07-16 | Nanophotonics Ag | Modular substrate measurement system |
| US20020170673A1 (en) * | 2000-04-29 | 2002-11-21 | Tanguay Michael J. | System and method of processing composite substrates within a high throughput reactor |
| US6508883B1 (en) * | 2000-04-29 | 2003-01-21 | Advanced Technology Materials, Inc. | Throughput enhancement for single wafer reactor |
| US6709522B1 (en) * | 2000-07-11 | 2004-03-23 | Nordson Corporation | Material handling system and methods for a multichamber plasma treatment system |
| US6609869B2 (en) * | 2001-01-04 | 2003-08-26 | Asm America | Transfer chamber with integral loadlock and staging station |
| JP4884594B2 (ja) * | 2001-03-22 | 2012-02-29 | 東京エレクトロン株式会社 | 半導体製造装置及び制御方法 |
| US20030031538A1 (en) * | 2001-06-30 | 2003-02-13 | Applied Materials, Inc. | Datum plate for use in installations of substrate handling systems |
| US6918731B2 (en) * | 2001-07-02 | 2005-07-19 | Brooks Automation, Incorporated | Fast swap dual substrate transport for load lock |
| JP2003051527A (ja) * | 2001-08-02 | 2003-02-21 | Takehide Hayashi | 半導体自動搬送対応efem(密閉容器からウエハーを出し入れし、製造装置に供給、回収する装置)用foup(密閉容器)移載ロボット |
| KR100822872B1 (ko) * | 2001-08-14 | 2008-04-17 | 삼성코닝정밀유리 주식회사 | 유리기판의 박막 코팅 방법 |
| US6899507B2 (en) * | 2002-02-08 | 2005-05-31 | Asm Japan K.K. | Semiconductor processing apparatus comprising chamber partitioned into reaction and transfer sections |
| JP2003243481A (ja) * | 2002-02-21 | 2003-08-29 | Asm Japan Kk | 半導体製造装置及びメンテナンス方法 |
| US6589850B1 (en) * | 2002-06-04 | 2003-07-08 | Newport Fab, Llc | Method and system for fabricating a bipolar transistor and related structure |
| US20040089227A1 (en) * | 2002-07-19 | 2004-05-13 | Albert Wang | Dual chamber vacuum processing system |
| US20070183871A1 (en) * | 2002-07-22 | 2007-08-09 | Christopher Hofmeister | Substrate processing apparatus |
| US7959395B2 (en) * | 2002-07-22 | 2011-06-14 | Brooks Automation, Inc. | Substrate processing apparatus |
| US7988398B2 (en) | 2002-07-22 | 2011-08-02 | Brooks Automation, Inc. | Linear substrate transport apparatus |
| US8960099B2 (en) * | 2002-07-22 | 2015-02-24 | Brooks Automation, Inc | Substrate processing apparatus |
| JP4270434B2 (ja) * | 2002-11-29 | 2009-06-03 | シャープ株式会社 | 基板移載装置並びに基板の取り出し方法および基板の収納方法 |
| WO2005022602A2 (en) * | 2003-08-29 | 2005-03-10 | Crossing Automation, Inc. | A method and apparatus for semiconductor processing |
| US7458763B2 (en) | 2003-11-10 | 2008-12-02 | Blueshift Technologies, Inc. | Mid-entry load lock for semiconductor handling system |
| US20050113976A1 (en) | 2003-11-10 | 2005-05-26 | Blueshift Technologies, Inc. | Software controller for handling system |
| US8313277B2 (en) | 2003-11-10 | 2012-11-20 | Brooks Automation, Inc. | Semiconductor manufacturing process modules |
| US8696298B2 (en) * | 2003-11-10 | 2014-04-15 | Brooks Automation, Inc. | Semiconductor manufacturing process modules |
| US20070286710A1 (en) * | 2003-11-10 | 2007-12-13 | Van Der Meulen Peter | Semiconductor manufacturing process modules |
| US10086511B2 (en) | 2003-11-10 | 2018-10-02 | Brooks Automation, Inc. | Semiconductor manufacturing systems |
| US20070269297A1 (en) | 2003-11-10 | 2007-11-22 | Meulen Peter V D | Semiconductor wafer handling and transport |
| US8267632B2 (en) | 2003-11-10 | 2012-09-18 | Brooks Automation, Inc. | Semiconductor manufacturing process modules |
| KR100558558B1 (ko) * | 2004-01-26 | 2006-03-10 | 삼성전자주식회사 | 멀티챔버 프로세스장치 |
| US7282097B2 (en) * | 2004-06-14 | 2007-10-16 | Applied Materials, Inc. | Slit valve door seal |
| GB2415291B (en) * | 2004-06-15 | 2008-08-13 | Nanobeam Ltd | Charged particle beam system |
| TWI278416B (en) * | 2004-12-09 | 2007-04-11 | Au Optronics Corp | Cassette stocker |
| US7798764B2 (en) | 2005-12-22 | 2010-09-21 | Applied Materials, Inc. | Substrate processing sequence in a cartesian robot cluster tool |
| US7371022B2 (en) | 2004-12-22 | 2008-05-13 | Sokudo Co., Ltd. | Developer endpoint detection in a track lithography system |
| US7351656B2 (en) * | 2005-01-21 | 2008-04-01 | Kabushiki Kaihsa Toshiba | Semiconductor device having oxidized metal film and manufacture method of the same |
| US7467916B2 (en) * | 2005-03-08 | 2008-12-23 | Asm Japan K.K. | Semiconductor-manufacturing apparatus equipped with cooling stage and semiconductor-manufacturing method using same |
| US7374391B2 (en) | 2005-12-22 | 2008-05-20 | Applied Materials, Inc. | Substrate gripper for a substrate handling robot |
| JP4642619B2 (ja) * | 2005-09-22 | 2011-03-02 | 東京エレクトロン株式会社 | 基板処理システム及び方法 |
| KR100699539B1 (ko) * | 2006-03-31 | 2007-03-23 | 세메스 주식회사 | 기판 처리 시스템 및 이를 이용한 기판 처리 방법 |
| US8398355B2 (en) * | 2006-05-26 | 2013-03-19 | Brooks Automation, Inc. | Linearly distributed semiconductor workpiece processing tool |
| US20080166210A1 (en) * | 2007-01-05 | 2008-07-10 | Applied Materials, Inc. | Supinating cartesian robot blade |
| US10541157B2 (en) | 2007-05-18 | 2020-01-21 | Brooks Automation, Inc. | Load lock fast pump vent |
| WO2008144670A1 (en) | 2007-05-18 | 2008-11-27 | Brooks Automation, Inc. | Load lock fast pump vent |
| WO2009055507A1 (en) * | 2007-10-26 | 2009-04-30 | Applied Materials, Inc. | Methods and apparatus for sealing a slit valve door |
| JP5511273B2 (ja) * | 2008-09-12 | 2014-06-04 | 株式会社日立国際電気 | 基板処理装置及び基板処理方法 |
| KR20100073670A (ko) * | 2008-12-23 | 2010-07-01 | 황무성 | 웨이퍼 이송 시스템과 이를 포함하는 반도체 팹 구조물 및 웨이퍼 이송 방법 |
| JP4973675B2 (ja) * | 2009-02-26 | 2012-07-11 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理方法 |
| US8602706B2 (en) * | 2009-08-17 | 2013-12-10 | Brooks Automation, Inc. | Substrate processing apparatus |
| GB2476476B (en) * | 2009-12-23 | 2013-05-22 | Nanobeam Ltd | Charged particle beam system |
| WO2012017653A1 (ja) * | 2010-08-06 | 2012-02-09 | 東京エレクトロン株式会社 | 基板処理システム、搬送モジュール、基板処理方法及び半導体素子の製造方法 |
| JP5689294B2 (ja) * | 2010-11-25 | 2015-03-25 | 東京エレクトロン株式会社 | 処理装置 |
| JP2013171872A (ja) * | 2012-02-17 | 2013-09-02 | Tokyo Electron Ltd | 基板処理装置及び基板処理方法 |
| JP2013171871A (ja) * | 2012-02-17 | 2013-09-02 | Tokyo Electron Ltd | 基板処理装置及び基板処理方法 |
| KR101530024B1 (ko) * | 2013-12-20 | 2015-06-22 | 주식회사 유진테크 | 기판 처리 모듈, 이를 포함하는 기판 처리 장치 및 기판 전달 방법 |
| KR101613544B1 (ko) * | 2014-02-13 | 2016-04-19 | 주식회사 유진테크 | 기판 처리 장치 |
| KR101659560B1 (ko) * | 2014-08-26 | 2016-09-23 | 주식회사 테라세미콘 | 기판처리 장치의 반응기 |
| JP6795675B2 (ja) | 2017-02-17 | 2020-12-02 | 株式会社Kokusai Electric | 基板処理装置、半導体装置の製造方法およびプログラム |
| US11133207B2 (en) * | 2018-08-30 | 2021-09-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for forming films on wafers separated by different distances |
| JP6896682B2 (ja) | 2018-09-04 | 2021-06-30 | 株式会社Kokusai Electric | 基板処理装置および半導体装置の製造方法 |
| DE102019123556A1 (de) * | 2019-09-03 | 2021-03-04 | Aixtron Se | Lademodul für ein CVD-Reaktorsystem |
| EP4022239A1 (en) * | 2019-10-03 | 2022-07-06 | LPE S.p.A. | Treating arrangement with loading/unloading group and epitaxial reactor |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR880701205A (ko) * | 1986-04-28 | 1988-07-26 | 스탠리 지.코울 | 모듀울 반도체 웨이퍼 운반 및 처리 시스템 |
| KR960002497A (ko) * | 1994-06-03 | 1996-01-26 | 이노우에 아키라 | 기판처리 시스템 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5972739A (ja) * | 1982-10-20 | 1984-04-24 | Hitachi Ltd | 真空処理装置 |
| JPH0666295B2 (ja) * | 1983-06-29 | 1994-08-24 | 東京応化工業株式会社 | 多段プラズマ処理装置 |
| JPH0622216B2 (ja) * | 1984-11-21 | 1994-03-23 | 株式会社日立製作所 | プラズマ処理装置 |
| JPS63204726A (ja) * | 1987-02-20 | 1988-08-24 | Anelva Corp | 真空処理装置 |
| JPH0825151B2 (ja) * | 1988-09-16 | 1996-03-13 | 東京応化工業株式会社 | ハンドリングユニット |
| FR2638386B1 (fr) * | 1988-11-02 | 1995-08-11 | Eurl Seirob | Bras telemanipulateur bipolaire |
| JP2592511B2 (ja) * | 1988-12-03 | 1997-03-19 | 株式会社フレンドテック研究所 | 縦型半導体製造システム |
| JPH0784241B2 (ja) * | 1990-04-10 | 1995-09-13 | 国際電気株式会社 | ウェーハ移載装置 |
| JP2808826B2 (ja) * | 1990-05-25 | 1998-10-08 | 松下電器産業株式会社 | 基板の移し換え装置 |
| JPH04240721A (ja) * | 1991-01-25 | 1992-08-28 | Sony Corp | マルチチャンバプロセス装置 |
| JPH05152215A (ja) * | 1991-11-29 | 1993-06-18 | Hitachi Ltd | 成膜装置 |
| US5766360A (en) * | 1992-03-27 | 1998-06-16 | Kabushiki Kaisha Toshiba | Substrate processing apparatus and substrate processing method |
| CH687986A5 (de) * | 1993-05-03 | 1997-04-15 | Balzers Hochvakuum | Plasmabehandlungsanlage und Verfahren zu deren Betrieb. |
| JP3066691B2 (ja) * | 1993-09-17 | 2000-07-17 | 東京エレクトロン株式会社 | マルチチャンバー処理装置及びそのクリーニング方法 |
| JPH07221163A (ja) * | 1994-02-04 | 1995-08-18 | Nissin Electric Co Ltd | 基板搬送装置 |
| KR0129582B1 (ko) * | 1994-06-23 | 1998-04-06 | 김주용 | 다중 기판 전달 장치 |
| TW295677B (enExample) * | 1994-08-19 | 1997-01-11 | Tokyo Electron Co Ltd | |
| WO1997010079A1 (en) * | 1995-09-13 | 1997-03-20 | Silicon Valley Group, Inc. | Concentric dual elbow |
| US5647724A (en) * | 1995-10-27 | 1997-07-15 | Brooks Automation Inc. | Substrate transport apparatus with dual substrate holders |
| US6299404B1 (en) * | 1995-10-27 | 2001-10-09 | Brooks Automation Inc. | Substrate transport apparatus with double substrate holders |
-
1996
- 1996-09-26 JP JP27558196A patent/JP3947761B2/ja not_active Expired - Fee Related
-
1997
- 1997-09-01 EP EP97115096A patent/EP0833374A3/en not_active Withdrawn
- 1997-09-04 US US08/923,110 patent/US6053980A/en not_active Expired - Lifetime
- 1997-09-26 KR KR1019970049258A patent/KR100285408B1/ko not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR880701205A (ko) * | 1986-04-28 | 1988-07-26 | 스탠리 지.코울 | 모듀울 반도체 웨이퍼 운반 및 처리 시스템 |
| KR960002497A (ko) * | 1994-06-03 | 1996-01-26 | 이노우에 아키라 | 기판처리 시스템 |
Also Published As
| Publication number | Publication date |
|---|---|
| US6053980A (en) | 2000-04-25 |
| EP0833374A3 (en) | 1998-05-13 |
| KR19980025056A (ko) | 1998-07-06 |
| JPH10107121A (ja) | 1998-04-24 |
| EP0833374A2 (en) | 1998-04-01 |
| JP3947761B2 (ja) | 2007-07-25 |
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