JP3832402B2 - カーボンナノチューブを有する電子源とそれを用いた電子顕微鏡および電子線描画装置 - Google Patents
カーボンナノチューブを有する電子源とそれを用いた電子顕微鏡および電子線描画装置 Download PDFInfo
- Publication number
- JP3832402B2 JP3832402B2 JP2002234297A JP2002234297A JP3832402B2 JP 3832402 B2 JP3832402 B2 JP 3832402B2 JP 2002234297 A JP2002234297 A JP 2002234297A JP 2002234297 A JP2002234297 A JP 2002234297A JP 3832402 B2 JP3832402 B2 JP 3832402B2
- Authority
- JP
- Japan
- Prior art keywords
- electron source
- electron
- conductive
- bonding material
- carbon nanotube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/30—Cold cathodes, e.g. field-emissive cathode
- H01J1/304—Field-emissive cathodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/05—Preparation or purification of carbon not covered by groups C01B32/15, C01B32/20, C01B32/25, C01B32/30
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2201/00—Electrodes common to discharge tubes
- H01J2201/30—Cold cathodes
- H01J2201/304—Field emission cathodes
- H01J2201/30446—Field emission cathodes characterised by the emitter material
- H01J2201/30453—Carbon types
- H01J2201/30469—Carbon nanotubes (CNTs)
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/063—Electron sources
- H01J2237/06325—Cold-cathode sources
- H01J2237/06341—Field emission
- H01J2237/0635—Multiple source, e.g. comb or array
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
- Y10S977/86—Scanning probe structure
- Y10S977/875—Scanning probe structure with tip detail
- Y10S977/876—Nanotube tip
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/902—Specified use of nanostructure
- Y10S977/932—Specified use of nanostructure for electronic or optoelectronic application
- Y10S977/939—Electron emitter, e.g. spindt emitter tip coated with nanoparticles
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Cold Cathode And The Manufacture (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002234297A JP3832402B2 (ja) | 2002-08-12 | 2002-08-12 | カーボンナノチューブを有する電子源とそれを用いた電子顕微鏡および電子線描画装置 |
| TW092119556A TWI275565B (en) | 2002-08-12 | 2003-07-17 | Emission source having carbon nanotube, electron microscope using this emission source, and electron beam drawing device |
| US10/636,701 US6930313B2 (en) | 2002-08-12 | 2003-08-08 | Emission source having carbon nanotube, electron microscope using this emission source, and electron beam drawing device |
| KR1020030055263A KR100686294B1 (ko) | 2002-08-12 | 2003-08-11 | 카본 나노튜브를 갖는 전자원과 그것을 이용한 전자현미경 및 전자선 묘화 장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002234297A JP3832402B2 (ja) | 2002-08-12 | 2002-08-12 | カーボンナノチューブを有する電子源とそれを用いた電子顕微鏡および電子線描画装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006155551A Division JP3982558B2 (ja) | 2006-06-05 | 2006-06-05 | カーボンナノチューブを有する電子源とそれを用いた電子顕微鏡および電子線描画装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004079223A JP2004079223A (ja) | 2004-03-11 |
| JP2004079223A5 JP2004079223A5 (enExample) | 2005-02-17 |
| JP3832402B2 true JP3832402B2 (ja) | 2006-10-11 |
Family
ID=31492446
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002234297A Expired - Fee Related JP3832402B2 (ja) | 2002-08-12 | 2002-08-12 | カーボンナノチューブを有する電子源とそれを用いた電子顕微鏡および電子線描画装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6930313B2 (enExample) |
| JP (1) | JP3832402B2 (enExample) |
| KR (1) | KR100686294B1 (enExample) |
| TW (1) | TWI275565B (enExample) |
Families Citing this family (49)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6528785B1 (en) * | 1998-12-03 | 2003-03-04 | Daiken Chemical Co., Ltd. | Fusion-welded nanotube surface signal probe and method of attaching nanotube to probe holder |
| US7879308B1 (en) * | 2000-03-17 | 2011-02-01 | University Of Central Florida Research Foundation, Inc. | Multiwall carbon nanotube field emitter fabricated by focused ion beam technique |
| ATE514049T1 (de) * | 2002-01-15 | 2011-07-15 | Ibm | Mikrostrukturen |
| JP3797299B2 (ja) * | 2002-08-30 | 2006-07-12 | 石川島播磨重工業株式会社 | 高電圧用カソード及びその接合方法 |
| JP2005032500A (ja) * | 2003-07-10 | 2005-02-03 | Hitachi High-Technologies Corp | 冷陰極とそれを用いた電子源及び電子線装置 |
| JP4317779B2 (ja) | 2004-03-26 | 2009-08-19 | 株式会社日立ハイテクノロジーズ | 電界放出型電子銃およびそれを用いた電子ビーム応用装置 |
| JP2006049293A (ja) * | 2004-06-30 | 2006-02-16 | Hitachi High-Technologies Corp | 電界放出型電子銃およびそれを用いた電子ビーム応用装置 |
| EP1641012A3 (en) * | 2004-09-24 | 2008-12-03 | FEI Company | Electron source with low energy spread |
| JP2006092927A (ja) * | 2004-09-24 | 2006-04-06 | Sony Corp | 微小電子源装置及びその製造方法、平面型表示装置 |
| JP2006093141A (ja) * | 2004-09-24 | 2006-04-06 | Fei Co | 電子源及びその電子源を有する荷電粒子装置 |
| JP2006125846A (ja) * | 2004-10-26 | 2006-05-18 | Olympus Corp | カンチレバー |
| KR100660189B1 (ko) | 2004-11-12 | 2006-12-21 | 한국과학기술원 | 전해에칭을 이용한 나노팁의 접착장치 및 접착방법 |
| CN100530518C (zh) * | 2004-12-25 | 2009-08-19 | 鸿富锦精密工业(深圳)有限公司 | 场发射照明光源 |
| US9287356B2 (en) * | 2005-05-09 | 2016-03-15 | Nantero Inc. | Nonvolatile nanotube diodes and nonvolatile nanotube blocks and systems using same and methods of making same |
| KR20070014741A (ko) * | 2005-07-29 | 2007-02-01 | 삼성에스디아이 주식회사 | 전자방출원, 그 제조방법 및 이를 채용한 전자 방출 소자 |
| US7735147B2 (en) * | 2005-10-13 | 2010-06-08 | The Regents Of The University Of California | Probe system comprising an electric-field-aligned probe tip and method for fabricating the same |
| KR100792385B1 (ko) | 2005-12-14 | 2008-01-09 | 주식회사 하이닉스반도체 | 나노팁전자방출원, 그의 제조 방법 및 그를 구비한 나노팁리소그래피 장치 |
| US7544523B2 (en) * | 2005-12-23 | 2009-06-09 | Fei Company | Method of fabricating nanodevices |
| US20100258724A1 (en) * | 2005-12-28 | 2010-10-14 | Hitachi High-Technologies Corporation | Tip-sharpened carbon nanotubes and electron source using thereof |
| CN101042977B (zh) * | 2006-03-22 | 2011-12-21 | 清华大学 | 碳纳米管场发射电子源及其制造方法以及一场发射阵列 |
| CN100573783C (zh) * | 2006-04-05 | 2009-12-23 | 清华大学 | 碳纳米管场发射电子源的制造方法 |
| GB2453302B (en) * | 2006-06-30 | 2012-04-18 | Shimadzu Corp | Electron beam generating apparatus and methods of forming an emitter |
| JP2008041289A (ja) * | 2006-08-02 | 2008-02-21 | Hitachi High-Technologies Corp | 電界放出型電子銃およびそれを用いた電子線応用装置 |
| JP2008047309A (ja) * | 2006-08-11 | 2008-02-28 | Hitachi High-Technologies Corp | 電界放出型電子銃、およびその運転方法 |
| US9385065B2 (en) * | 2006-10-02 | 2016-07-05 | The Regents Of The University Of California | Solid state thermal rectifier |
| DE102007010463B4 (de) * | 2007-03-01 | 2010-08-26 | Sellmair, Josef, Dr. | Vorrichtung zur Feldemission von Teilchen |
| US7847273B2 (en) * | 2007-03-30 | 2010-12-07 | Eloret Corporation | Carbon nanotube electron gun |
| KR101118698B1 (ko) * | 2007-05-29 | 2012-03-12 | 전자빔기술센터 주식회사 | 시엔티 팁을 이용한 전자 칼럼 및 시엔티 팁을 정렬하는방법 |
| WO2009044564A1 (ja) * | 2007-10-05 | 2009-04-09 | Denki Kagaku Kogyo Kabushiki Kaisha | 電子源及び電子ビーム装置 |
| JP4589440B2 (ja) * | 2008-02-01 | 2010-12-01 | ツィンファ ユニバーシティ | 線状カーボンナノチューブ構造体 |
| CN101960286A (zh) * | 2008-02-27 | 2011-01-26 | 独立行政法人科学技术振兴机构 | 碳纳米管支持体及其制造方法 |
| JP4644723B2 (ja) * | 2008-03-31 | 2011-03-02 | 株式会社日立ハイテクノロジーズ | ナノチューブ探針を有する測定装置 |
| CN101609771B (zh) * | 2008-06-20 | 2010-12-08 | 清华大学 | 透射电镜微栅的制备方法 |
| JP2010210449A (ja) * | 2009-03-11 | 2010-09-24 | Hitachi High-Technologies Corp | 導電性ナノチューブ探針、それを用いた電気特性評価装置及び走査型プローブ顕微鏡 |
| US8729470B2 (en) * | 2009-06-14 | 2014-05-20 | DLA Instruments | Electron microscope with an emitter operating in medium vacuum |
| WO2011084146A1 (en) * | 2009-12-21 | 2011-07-14 | Dla Instruments, Inc. | Electron microscope with an emitter operating in medium vacuum |
| JP5063715B2 (ja) * | 2010-02-04 | 2012-10-31 | 株式会社日立ハイテクノロジーズ | 電子源,電子銃、それを用いた電子顕微鏡装置及び電子線描画装置 |
| US8766522B1 (en) * | 2010-06-02 | 2014-07-01 | The United States Of America As Represented By The Secretary Of The Air Force | Carbon nanotube fiber cathode |
| FR2965102B1 (fr) * | 2010-09-17 | 2016-12-16 | Centre Nat De La Rech Scient (Cnrs) | Canon a electrons emettant sous haute tension, destine notamment a la microscopie electronique |
| CN103531423A (zh) * | 2013-10-21 | 2014-01-22 | 严建新 | 针状带电粒子束发射体及制作方法 |
| JP6369987B2 (ja) * | 2014-12-03 | 2018-08-08 | 国立研究開発法人物質・材料研究機構 | 電子源 |
| JP6704229B2 (ja) * | 2015-09-14 | 2020-06-03 | リンテック オブ アメリカ インコーポレーテッドLintec of America, Inc. | 柔軟性シート、熱伝導部材、導電性部材、帯電防止部材、発熱体、電磁波遮蔽体、及び柔軟性シートの製造方法 |
| CN105712281B (zh) * | 2016-02-18 | 2017-08-04 | 国家纳米科学中心 | 一种锥形纳米碳材料功能化针尖及其制备方法 |
| US10566170B2 (en) | 2017-09-08 | 2020-02-18 | Electronics And Telecommunications Research Institute | X-ray imaging device and driving method thereof |
| JP2019220559A (ja) * | 2018-06-19 | 2019-12-26 | 株式会社ニューフレアテクノロジー | マルチ荷電粒子ビーム描画装置及びそのビーム評価方法 |
| CN109490580A (zh) * | 2018-11-09 | 2019-03-19 | 昆明理工大学 | 一种扫描隧道显微镜针尖的热处理装置 |
| WO2020158297A1 (ja) * | 2019-01-30 | 2020-08-06 | 国立研究開発法人物質・材料研究機構 | エミッタ、それを用いた電子銃および電子機器 |
| GB2619965A (en) * | 2022-06-24 | 2023-12-27 | Aquasium Tech Limited | Electron beam emitting assembly |
| JP7554332B1 (ja) * | 2023-09-27 | 2024-09-19 | 浜松ホトニクス株式会社 | 電子源、これを用いた電子銃及びデバイス |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08250054A (ja) * | 1995-03-14 | 1996-09-27 | Hitachi Ltd | 拡散補給型電子線源およびそれを用いた電子線装置 |
| US6528785B1 (en) * | 1998-12-03 | 2003-03-04 | Daiken Chemical Co., Ltd. | Fusion-welded nanotube surface signal probe and method of attaching nanotube to probe holder |
| JP3811004B2 (ja) * | 2000-11-26 | 2006-08-16 | 喜萬 中山 | 導電性走査型顕微鏡用プローブ |
| JP2002162335A (ja) * | 2000-11-26 | 2002-06-07 | Yoshikazu Nakayama | 垂直式走査型顕微鏡用カンチレバー及びこれを使用した垂直式走査型顕微鏡用プローブ |
| US6700127B2 (en) * | 2002-01-09 | 2004-03-02 | Biomed Solutions Llc | Point source for producing electrons beams |
-
2002
- 2002-08-12 JP JP2002234297A patent/JP3832402B2/ja not_active Expired - Fee Related
-
2003
- 2003-07-17 TW TW092119556A patent/TWI275565B/zh not_active IP Right Cessation
- 2003-08-08 US US10/636,701 patent/US6930313B2/en not_active Expired - Fee Related
- 2003-08-11 KR KR1020030055263A patent/KR100686294B1/ko not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| KR100686294B1 (ko) | 2007-02-23 |
| US20040026629A1 (en) | 2004-02-12 |
| JP2004079223A (ja) | 2004-03-11 |
| KR20040014912A (ko) | 2004-02-18 |
| US6930313B2 (en) | 2005-08-16 |
| TW200413250A (en) | 2004-08-01 |
| TWI275565B (en) | 2007-03-11 |
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