JP2021507545A - メモリセル、メモリアレイ、及びメモリアレイを形成する方法 - Google Patents
メモリセル、メモリアレイ、及びメモリアレイを形成する方法 Download PDFInfo
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- 239000000463 material Substances 0.000 claims abstract description 214
- 238000003860 storage Methods 0.000 claims abstract description 85
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 77
- 230000005641 tunneling Effects 0.000 claims abstract description 75
- 230000000903 blocking effect Effects 0.000 claims abstract description 60
- 238000000034 method Methods 0.000 claims abstract description 46
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 44
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims abstract description 44
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 37
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 37
- 230000004888 barrier function Effects 0.000 claims description 19
- 239000004020 conductor Substances 0.000 claims description 13
- 238000009413 insulation Methods 0.000 claims description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- 230000003647 oxidation Effects 0.000 claims description 6
- 238000007254 oxidation reaction Methods 0.000 claims description 6
- 239000011232 storage material Substances 0.000 claims description 6
- 238000011065 in-situ storage Methods 0.000 claims description 2
- 230000001590 oxidative effect Effects 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 description 14
- 239000000203 mixture Substances 0.000 description 9
- 239000011810 insulating material Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 238000005530 etching Methods 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 4
- 229910052721 tungsten Inorganic materials 0.000 description 4
- 239000010937 tungsten Substances 0.000 description 4
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 3
- 238000000429 assembly Methods 0.000 description 3
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- 239000003989 dielectric material Substances 0.000 description 3
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- 230000007246 mechanism Effects 0.000 description 3
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 239000002800 charge carrier Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910005540 GaP Inorganic materials 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
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- 238000010292 electrical insulation Methods 0.000 description 1
- -1 etc.) Substances 0.000 description 1
- 229910001938 gadolinium oxide Inorganic materials 0.000 description 1
- 229940075613 gadolinium oxide Drugs 0.000 description 1
- CMIHHWBVHJVIGI-UHFFFAOYSA-N gadolinium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[Gd+3].[Gd+3] CMIHHWBVHJVIGI-UHFFFAOYSA-N 0.000 description 1
- HZXMRANICFIONG-UHFFFAOYSA-N gallium phosphide Chemical compound [Ga]#P HZXMRANICFIONG-UHFFFAOYSA-N 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 229910000449 hafnium oxide Inorganic materials 0.000 description 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
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- H10B—ELECTRONIC MEMORY DEVICES
- H10B41/00—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
- H10B41/20—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by three-dimensional arrangements, e.g. with cells on different height levels
- H10B41/23—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels
- H10B41/27—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
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- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/401—Multistep manufacturing processes
- H01L29/4011—Multistep manufacturing processes for data storage electrodes
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- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
- H01L29/51—Insulating materials associated therewith
- H01L29/511—Insulating materials associated therewith with a compositional variation, e.g. multilayer structures
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
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- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66833—Unipolar field-effect transistors with an insulated gate, i.e. MISFET with a charge trapping gate insulator, e.g. MNOS transistors
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/792—Field effect transistors with field effect produced by an insulated gate with charge trapping gate insulator, e.g. MNOS-memory transistors
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- H10B41/30—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the memory core region
- H10B41/35—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the memory core region with a cell select transistor, e.g. NAND
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- H10B43/10—EEPROM devices comprising charge-trapping gate insulators characterised by the top-view layout
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- H10B43/20—EEPROM devices comprising charge-trapping gate insulators characterised by three-dimensional arrangements, e.g. with cells on different height levels
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- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B43/00—EEPROM devices comprising charge-trapping gate insulators
- H10B43/20—EEPROM devices comprising charge-trapping gate insulators characterised by three-dimensional arrangements, e.g. with cells on different height levels
- H10B43/23—EEPROM devices comprising charge-trapping gate insulators characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels
- H10B43/27—EEPROM devices comprising charge-trapping gate insulators characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
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- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B43/00—EEPROM devices comprising charge-trapping gate insulators
- H10B43/30—EEPROM devices comprising charge-trapping gate insulators characterised by the memory core region
- H10B43/35—EEPROM devices comprising charge-trapping gate insulators characterised by the memory core region with cell select transistors, e.g. NAND
Abstract
Description
Claims (33)
- 導電ゲートと、
前記導電ゲートに隣接する電荷阻止領域であって、酸窒化ケイ素と二酸化ケイ素とを含む前記電荷阻止領域と、
前記電荷阻止領域に隣接する電荷蓄積領域と、
前記電荷蓄積領域に隣接するトンネリング材料と、
前記トンネリング材料に隣接するチャネル材料であって、前記トンネリング材料は、前記チャネル材料と前記電荷蓄積領域との間にある、前記チャネル材料と
を含む、メモリセル。 - 前記電荷阻止領域は、前記導電ゲートに近接して前記酸窒化ケイ素を含み、前記酸窒化ケイ素によって前記導電ゲートから離隔された前記二酸化ケイ素を含む、請求項1に記載のメモリセル。
- 前記電荷阻止領域の前記酸窒化ケイ素は、誘電障壁領域に直接接し、前記誘電障壁領域は、前記導電ゲートの導電材料に直接接する、請求項2に記載のメモリセル。
- 前記電荷阻止領域の前記二酸化ケイ素は、前記電荷蓄積領域に直接接する、請求項1に記載のメモリセル。
- 前記電荷蓄積領域は窒化ケイ素を含み、前記窒化ケイ素は、前記電荷阻止領域の前記二酸化ケイ素に直接接する、請求項1に記載のメモリセル。
- 前記電荷阻止領域は、前記導電ゲートと前記電荷蓄積領域との間に約50Åから約150Åまでの範囲内の厚さを有し、前記電荷阻止領域の前記二酸化ケイ素は、前記導電ゲートと前記電荷蓄積領域との間に約10Åから約30Åまでの範囲内の厚さを有する、請求項1に記載のメモリセル。
- 交互の絶縁レベル及びワード線レベルの垂直方向のスタックであって、前記ワード線レベルは導電領域を含む、前記スタックと、
前記導電領域に隣接する電荷蓄積領域と、
前記電荷蓄積領域と前記導電領域との間の電荷阻止領域であって、前記電荷阻止領域は、酸窒化ケイ素に沿って垂直方向に拡張する二酸化ケイ素を含み、前記二酸化ケイ素は、前記酸窒化ケイ素と前記電荷蓄積領域との間にある、前記電荷阻止領域と
を含む、アセンブリ。 - 前記スタックに沿って垂直方向に拡張するチャネル材料を含み、前記電荷蓄積領域は、前記導電領域と前記チャネル材料との間にある、請求項7に記載のアセンブリ。
- 前記チャネル材料は、前記垂直方向に沿って蛇行し、前記絶縁レベルに沿った前記チャネル材料の区域は内側へ突出し、前記導電レベルに沿った前記チャネル材料の区域は外側へ突出する、請求項8に記載のアセンブリ。
- 前記導電領域は、垂直方向の凹面を有する、請求項9に記載のアセンブリ。
- 前記電荷蓄積領域は、前記導電領域に沿った構造体として構成され、前記構造体は、前記絶縁レベルの介在領域によって相互から垂直方向に離隔される、請求項7に記載のアセンブリ。
- 前記導電領域と前記電荷阻止領域の前記酸窒化ケイ素との間に誘電障壁領域を含む、請求項7に記載のアセンブリ。
- 前記電荷阻止領域の前記酸窒化ケイ素は、前記電荷阻止領域の前記二酸化ケイ素と前記電荷蓄積領域との間に厚さを有し、前記厚さは、約20Åから約140Åまでの範囲内である、請求項7に記載のアセンブリ。
- 交互の絶縁レベル及びワード線レベルの垂直方向のスタックと、
前記スタックに沿って垂直方向に拡張するチャネル材料と、
導電領域を含む前記ワード線レベルであって、前記導電領域は間隙によって前記チャネル材料から離隔される、前記ワード線レベルと、
前記間隙の少なくとも一部の上方及び下方にレッジを含む前記絶縁レベルと、
前記間隙内の電荷蓄積領域であって、前記レッジの介在領域によって相互から垂直方向に離隔される前記電荷蓄積領域と、
前記間隙内の、前記電荷蓄積領域と前記導電領域との間の電荷阻止領域であって、前記電荷阻止領域は、酸窒化ケイ素に沿って垂直方向に拡張する二酸化ケイ素を含み、前記二酸化ケイ素は、前記酸窒化ケイ素と前記電荷蓄積領域との間にある、前記電荷阻止領域と
を含む、メモリアレイ。 - 前記チャネル材料は、前記垂直方向に沿って蛇行し、前記絶縁レベルに沿った前記チャネル材料の区域は内側に突出し、前記導電レベルに沿った前記チャネル材料の区域は外側に突出する、請求項14に記載のメモリアレイ。
- 前記導電領域は、垂直方向の凹面を有する、請求項15に記載のメモリアレイ。
- 前記電荷蓄積領域は窒化ケイ素を含む、請求項14に記載のメモリアレイ。
- 前記電荷阻止領域の前記酸窒化ケイ素は第1の水平方向の厚さを有し、前記電荷阻止領域の前記二酸化ケイ素は第2の水平方向の厚さを有し、前記第1の水平方向の厚さは、前記第1の水平方向の厚さの少なくとも約2倍である、請求項14に記載のメモリアレイ。
- 前記チャネル材料に沿ってトンネリング材料が拡張し、絶縁性の前記レッジは、前記トンネリング材料に直接接する、請求項14に記載のメモリアレイ。
- 前記トンネリング材料は第1のトンネリング材料であり、前記第1のトンネリング材料は、前記電荷蓄積材料に隣接し、前記レッジの最上面及び底面に直接接する、請求項14に記載のメモリアレイ。
- 前記レッジの各々は、前記レッジの前記最上面と前記底面との間に拡張する側壁面を有し、前記第1のトンネリング材料と前記チャネル材料との間に第2のトンネリング材料を含み、前記第2のトンネリング材料は、前記チャネル材料に沿って垂直方向に拡張し、前記レッジの側壁面に直接接する、請求項20に記載のメモリアレイ。
- 前記第2のトンネリング材料と前記チャネル材料との間に第3のトンネリング材料を含む、請求項21に記載のメモリアレイ。
- 交互の第1及び第2のレベルのスタックを通じて第1の開口部を形成することであって、前記第1のレベルは第1の材料を含み、前記第2のレベルは第2の材料を含むことと、
間隙を形成するために前記第1の開口部に沿って前記第1のレベルの前記第1の材料を凹部加工することであって、前記間隙は、前記第2のレベルの前記第2の材料の区域の間に垂直方向にあり、前記第2のレベルの前記第2の材料の前記区域は、前記間隙の上方及び下方のレッジであることと、
前記第1の材料の残存部分に沿って電荷阻止領域を形成するために、前記間隙に沿って前記第1のレベルの前記第1の材料の縁を酸化することと、
前記間隙内に、及び前記電荷阻止領域に沿って電荷捕獲領域を形成することと、
前記第1の開口部内に、垂直方向に拡張するトンネリング材料を形成することであって、前記トンネリング材料は、前記第2のレベルの前記第2の材料の縁に沿って、及び前記電荷捕獲領域に沿って拡張することと、
前記第1の開口部内に、及び前記トンネリング材料に隣接してチャネル材料を形成することと、
前記スタックを通じて第2の開口部を形成することであって、前記第2の開口部は、前記第1の材料の前記残存部分を通じて拡張することと、
前記第2の開口部に沿って空洞を形成するために、前記第1の材料の前記残存部分を除去することと、
前記空洞内に導電領域を形成することと
を含む、アセンブリを形成する方法。 - 前記酸化することは、in situ steam generationを利用する、請求項23に記載の方法。
- 前記酸化することは、プラズマを利用する、請求項23に記載の方法。
- 前記第1の材料は窒化ケイ素を含み、前記第2の材料は二酸化ケイ素を含む、請求項23に記載の方法。
- 前記第1の材料は窒化ケイ素を含み、前記電荷阻止領域は酸窒化ケイ素を含む、請求項23に記載の方法。
- 前記電荷阻止領域は二酸化ケイ素をも含む、請求項27に記載の方法。
- 前記電荷阻止領域の前記酸窒化ケイ素は第1の水平方向の厚さを有し、前記電荷阻止領域の前記二酸化ケイ素は第2の水平方向の厚さを有し、前記第1の水平方向の厚さは、前記第1の水平方向の厚さの少なくとも約2倍である、請求項28に記載の方法。
- 前記電荷阻止領域の前記酸窒化ケイ素は、約20Åから約140Åまでの範囲内の水平方向の厚さを有し、前記電荷阻止領域の前記二酸化ケイ素は、約10Åから約30Åまでの範囲内の水平方向の厚さを有する、請求項28に記載の方法。
- 前記チャネル材料は、垂直方向に沿って蛇行し、前記第2のレベルに沿った前記チャネル材料の区域は、前記第1の開口部に対して内側へ側面において突出し、前記第1のレベルに沿った前記チャネル材料の区域は、前記第1の開口部に対して外側へ側面において突出する、請求項23に記載の方法。
- 前記トンネリング材料は第2のトンネリング材料であり、前記電荷捕獲領域の縁に沿って第1のトンネリング材料を形成することを更に含み、前記第1のトンネリング材料は、前記間隙内にのみあり、前記第2のトンネリング材料は、前記第1のトンネリング材料と前記チャネル材料との間にあり、前記第2のトンネリング材料は、前記第1のトンネリング材料とは組成的に異なる、請求項23に記載の方法。
- 前記第2のトンネリング材料に沿って第3のトンネリング材料を形成することを更に含み、前記第3のトンネリング材料は、前記第2のトンネリング材料と前記チャネル材料との間にあり、前記第3のトンネリング材料は前記第2のトンネリング材料とは組成的に異なる、請求項32に記載の方法。
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