JP2020160466A - ペリクル - Google Patents

ペリクル Download PDF

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Publication number
JP2020160466A
JP2020160466A JP2020102605A JP2020102605A JP2020160466A JP 2020160466 A JP2020160466 A JP 2020160466A JP 2020102605 A JP2020102605 A JP 2020102605A JP 2020102605 A JP2020102605 A JP 2020102605A JP 2020160466 A JP2020160466 A JP 2020160466A
Authority
JP
Japan
Prior art keywords
pellicle
pressure
sensitive adhesive
adhesive layer
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2020102605A
Other languages
English (en)
Japanese (ja)
Other versions
JP2020160466A5 (enrdf_load_stackoverflow
Inventor
浩平 矢野
Kohei Yano
浩平 矢野
泰輝 山下
Yasuteru Yamashita
泰輝 山下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Original Assignee
Asahi Kasei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Corp filed Critical Asahi Kasei Corp
Priority to JP2020102605A priority Critical patent/JP2020160466A/ja
Publication of JP2020160466A publication Critical patent/JP2020160466A/ja
Publication of JP2020160466A5 publication Critical patent/JP2020160466A5/ja
Priority to JP2022035429A priority patent/JP7274636B2/ja
Pending legal-status Critical Current

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  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Adhesives Or Adhesive Processes (AREA)
JP2020102605A 2020-06-12 2020-06-12 ペリクル Pending JP2020160466A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2020102605A JP2020160466A (ja) 2020-06-12 2020-06-12 ペリクル
JP2022035429A JP7274636B2 (ja) 2020-06-12 2022-03-08 ペリクル

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020102605A JP2020160466A (ja) 2020-06-12 2020-06-12 ペリクル

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2015221593A Division JP2017090719A (ja) 2015-11-11 2015-11-11 ペリクル

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2022035429A Division JP7274636B2 (ja) 2020-06-12 2022-03-08 ペリクル

Publications (2)

Publication Number Publication Date
JP2020160466A true JP2020160466A (ja) 2020-10-01
JP2020160466A5 JP2020160466A5 (enrdf_load_stackoverflow) 2021-04-22

Family

ID=72643293

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020102605A Pending JP2020160466A (ja) 2020-06-12 2020-06-12 ペリクル

Country Status (1)

Country Link
JP (1) JP2020160466A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2023149343A1 (enrdf_load_stackoverflow) * 2022-02-04 2023-08-10
KR20240089744A (ko) 2022-01-26 2024-06-20 미쯔이가가꾸가부시끼가이샤 펠리클

Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008065258A (ja) * 2006-09-11 2008-03-21 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
US20080248231A1 (en) * 2007-04-09 2008-10-09 Nitto Denko Corporation Double-sided pressure-sensitive adhesive tape or sheet for use in wiring circuit board and wiring circuit board having the double-sided pressure-sensitive adhesive tape
JP2008256925A (ja) * 2007-04-04 2008-10-23 Shin Etsu Chem Co Ltd ペリクル
JP2009025560A (ja) * 2007-07-19 2009-02-05 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
WO2010026938A1 (ja) * 2008-09-08 2010-03-11 電気化学工業株式会社 半導体製品の製造方法
JP2010189605A (ja) * 2009-02-20 2010-09-02 Sekisui Chem Co Ltd 粘着剤組成物及び表面保護用粘着シート
JP2012093518A (ja) * 2010-10-26 2012-05-17 Asahi Kasei E-Materials Corp ペリクル
JP2012108277A (ja) * 2010-11-17 2012-06-07 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
JP2012230227A (ja) * 2011-04-26 2012-11-22 Shin Etsu Chem Co Ltd リソグラフィ用ペリクル
JP2014211591A (ja) * 2013-04-22 2014-11-13 信越化学工業株式会社 ペリクルおよびこのペリクルを装着するフォトマスク
JP2015001683A (ja) * 2013-06-18 2015-01-05 信越化学工業株式会社 高平坦リソグラフィ用ペリクル
JP2015114502A (ja) * 2013-12-12 2015-06-22 旭化成イーマテリアルズ株式会社 ペリクル、ペリクル付フォトマスク及び半導体素子の製造方法
JP6048203B2 (ja) * 2013-02-19 2016-12-21 大日本印刷株式会社 粘着剤組成物

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008065258A (ja) * 2006-09-11 2008-03-21 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
JP2008256925A (ja) * 2007-04-04 2008-10-23 Shin Etsu Chem Co Ltd ペリクル
US20080248231A1 (en) * 2007-04-09 2008-10-09 Nitto Denko Corporation Double-sided pressure-sensitive adhesive tape or sheet for use in wiring circuit board and wiring circuit board having the double-sided pressure-sensitive adhesive tape
JP2009025560A (ja) * 2007-07-19 2009-02-05 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
WO2010026938A1 (ja) * 2008-09-08 2010-03-11 電気化学工業株式会社 半導体製品の製造方法
JP2010189605A (ja) * 2009-02-20 2010-09-02 Sekisui Chem Co Ltd 粘着剤組成物及び表面保護用粘着シート
JP2012093518A (ja) * 2010-10-26 2012-05-17 Asahi Kasei E-Materials Corp ペリクル
JP2012108277A (ja) * 2010-11-17 2012-06-07 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
JP2012230227A (ja) * 2011-04-26 2012-11-22 Shin Etsu Chem Co Ltd リソグラフィ用ペリクル
JP6048203B2 (ja) * 2013-02-19 2016-12-21 大日本印刷株式会社 粘着剤組成物
JP2014211591A (ja) * 2013-04-22 2014-11-13 信越化学工業株式会社 ペリクルおよびこのペリクルを装着するフォトマスク
JP2015001683A (ja) * 2013-06-18 2015-01-05 信越化学工業株式会社 高平坦リソグラフィ用ペリクル
JP2015114502A (ja) * 2013-12-12 2015-06-22 旭化成イーマテリアルズ株式会社 ペリクル、ペリクル付フォトマスク及び半導体素子の製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240089744A (ko) 2022-01-26 2024-06-20 미쯔이가가꾸가부시끼가이샤 펠리클
JPWO2023149343A1 (enrdf_load_stackoverflow) * 2022-02-04 2023-08-10
WO2023149343A1 (ja) * 2022-02-04 2023-08-10 三井化学株式会社 ペリクル、露光原版、及び露光装置、並びにペリクルの作製方法、及びマスク用粘着剤層の試験方法
TWI870772B (zh) * 2022-02-04 2025-01-21 日商三井化學股份有限公司 護膜、曝光原版、曝光裝置、及護膜之製作方法
JP7673258B2 (ja) 2022-02-04 2025-05-08 三井化学株式会社 ペリクル、露光原版、及び露光装置、並びにペリクルの作製方法、及びマスク用粘着剤層の試験方法

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