JP2019514042A5 - - Google Patents
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- JP2019514042A5 JP2019514042A5 JP2018547903A JP2018547903A JP2019514042A5 JP 2019514042 A5 JP2019514042 A5 JP 2019514042A5 JP 2018547903 A JP2018547903 A JP 2018547903A JP 2018547903 A JP2018547903 A JP 2018547903A JP 2019514042 A5 JP2019514042 A5 JP 2019514042A5
- Authority
- JP
- Japan
- Prior art keywords
- buffer
- further embodiments
- hardmask
- nitride
- silicon nitride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662306979P | 2016-03-11 | 2016-03-11 | |
| US62/306,979 | 2016-03-11 | ||
| PCT/US2017/021769 WO2017156388A1 (en) | 2016-03-11 | 2017-03-10 | Pre-patterned lithography templates, processes based on radiation patterning using the templates and processes to form the templates |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019514042A JP2019514042A (ja) | 2019-05-30 |
| JP2019514042A5 true JP2019514042A5 (https=) | 2021-08-12 |
| JP6993982B2 JP6993982B2 (ja) | 2022-02-04 |
Family
ID=59786564
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018547903A Active JP6993982B2 (ja) | 2016-03-11 | 2017-03-10 | 予めパターン形成されたリソグラフィ・テンプレート、該テンプレートを使用した放射線パターニングに基づくプロセス、及び該テンプレートを形成するためのプロセス |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US10649328B2 (https=) |
| JP (1) | JP6993982B2 (https=) |
| KR (1) | KR102394042B1 (https=) |
| CN (1) | CN108780739B (https=) |
| TW (1) | TWI721125B (https=) |
| WO (1) | WO2017156388A1 (https=) |
Families Citing this family (55)
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| GB201517273D0 (en) | 2015-09-30 | 2015-11-11 | Univ Manchester | Resist composition |
| CN108780739B (zh) | 2016-03-11 | 2023-09-15 | 因普里亚公司 | 预图案化光刻模板、基于使用该模板的辐射图案化的工艺及形成该模板的工艺 |
| CN109844642B (zh) * | 2016-09-13 | 2022-11-22 | 谷歌有限责任公司 | 防止光致抗蚀剂显影剂蚀刻的缓冲层 |
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| CN108780739B (zh) | 2016-03-11 | 2023-09-15 | 因普里亚公司 | 预图案化光刻模板、基于使用该模板的辐射图案化的工艺及形成该模板的工艺 |
| KR102791311B1 (ko) | 2016-08-12 | 2025-04-04 | 인프리아 코포레이션 | 금속 함유 레지스트로부터의 에지 비드 영역의 금속 잔류물 저감방법 |
| KR102918243B1 (ko) | 2017-11-20 | 2026-01-26 | 인프리아 코포레이션 | 유기주석 클러스터, 유기주석 클러스터의 용액, 및 고해상도 패턴화에 대한 적용 |
| TWI814552B (zh) | 2018-04-05 | 2023-09-01 | 美商英培雅股份有限公司 | 錫十二聚物及具有強ｅｕｖ吸收的輻射可圖案化塗層 |
| US12416861B2 (en) | 2019-04-12 | 2025-09-16 | Inpria Corporation | Organometallic photoresist developer compositions and processing methods |
-
2017
- 2017-03-10 CN CN201780016440.8A patent/CN108780739B/zh active Active
- 2017-03-10 WO PCT/US2017/021769 patent/WO2017156388A1/en not_active Ceased
- 2017-03-10 JP JP2018547903A patent/JP6993982B2/ja active Active
- 2017-03-10 TW TW106108071A patent/TWI721125B/zh active
- 2017-03-10 KR KR1020187029161A patent/KR102394042B1/ko active Active
- 2017-03-10 US US15/455,784 patent/US10649328B2/en active Active
-
2020
- 2020-04-01 US US16/837,666 patent/US11347145B2/en active Active
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