JP2018503027A5 - - Google Patents

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Publication number
JP2018503027A5
JP2018503027A5 JP2017553464A JP2017553464A JP2018503027A5 JP 2018503027 A5 JP2018503027 A5 JP 2018503027A5 JP 2017553464 A JP2017553464 A JP 2017553464A JP 2017553464 A JP2017553464 A JP 2017553464A JP 2018503027 A5 JP2018503027 A5 JP 2018503027A5
Authority
JP
Japan
Prior art keywords
pumping line
vacuum pump
common pumping
vacuum
inlet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2017553464A
Other languages
English (en)
Japanese (ja)
Other versions
JP2018503027A (ja
Filing date
Publication date
Priority claimed from GB1500133.2A external-priority patent/GB2533933A/en
Application filed filed Critical
Publication of JP2018503027A publication Critical patent/JP2018503027A/ja
Publication of JP2018503027A5 publication Critical patent/JP2018503027A5/ja
Pending legal-status Critical Current

Links

JP2017553464A 2015-01-06 2016-01-06 真空ポンプ装置における又はそれに関連する改善 Pending JP2018503027A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
GB1500133.2A GB2533933A (en) 2015-01-06 2015-01-06 Improvements in or relating to vacuum pumping arrangements
GB1500133.2 2015-01-06
PCT/GB2016/050018 WO2016110694A1 (en) 2015-01-06 2016-01-06 Improvements in or relating to vacuum pumping arrangements
GB1600201.6 2016-01-06
GB1600201.6A GB2536336B (en) 2015-01-06 2016-01-06 Improvements in or relating to vacuum pumping arrangements

Publications (2)

Publication Number Publication Date
JP2018503027A JP2018503027A (ja) 2018-02-01
JP2018503027A5 true JP2018503027A5 (enExample) 2019-01-10

Family

ID=55129989

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2017553464A Pending JP2018503027A (ja) 2015-01-06 2016-01-06 真空ポンプ装置における又はそれに関連する改善
JP2017553465A Active JP6924147B2 (ja) 2015-01-06 2016-01-06 真空排気システム及びこの真空排気システムに使用されるチャネル切換弁

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2017553465A Active JP6924147B2 (ja) 2015-01-06 2016-01-06 真空排気システム及びこの真空排気システムに使用されるチャネル切換弁

Country Status (8)

Country Link
US (2) US10309401B2 (enExample)
EP (2) EP3243005B1 (enExample)
JP (2) JP2018503027A (enExample)
KR (2) KR102504078B1 (enExample)
CN (2) CN107110161B (enExample)
GB (2) GB2533933A (enExample)
SG (1) SG11201705287WA (enExample)
WO (2) WO2016110694A1 (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5808454B1 (ja) * 2014-04-25 2015-11-10 株式会社日立国際電気 基板処理装置、半導体装置の製造方法、プログラムおよび記録媒体
WO2015182699A1 (ja) * 2014-05-30 2015-12-03 株式会社 荏原製作所 真空排気システム
GB201620225D0 (en) * 2016-11-29 2017-01-11 Edwards Ltd Vacuum pumping arrangement
GB2561899B (en) 2017-04-28 2020-11-04 Edwards Ltd Vacuum pumping system
GB2564399A (en) * 2017-07-06 2019-01-16 Edwards Ltd Improvements in or relating to pumping line arrangements
DE102017214687A1 (de) * 2017-08-22 2019-02-28 centrotherm international AG Behandlungsvorrichtung für Substrate und Verfahren zum Betrieb einer solchen Behandlungsvorrichtung
CN107799445A (zh) * 2017-11-01 2018-03-13 德淮半导体有限公司 用于半导体工艺腔的泵系统
GB201718752D0 (en) 2017-11-13 2017-12-27 Edwards Ltd Vacuum and abatement systems
CN108486543A (zh) * 2018-03-02 2018-09-04 惠科股份有限公司 基板成膜机台及使用方法
JP7472114B2 (ja) 2018-09-28 2024-04-22 ラム リサーチ コーポレーション 堆積副生成物の蓄積からの真空ポンプの保護
CN109185705B (zh) * 2018-10-15 2024-04-16 苏州精濑光电有限公司 设备的吸真空气路系统
GB2579360A (en) * 2018-11-28 2020-06-24 Edwards Ltd Multiple chamber vacuum exhaust system
GB2581503A (en) * 2019-02-20 2020-08-26 Edwards Ltd Vacuum pumping
GB2584881B (en) * 2019-06-19 2022-01-05 Edwards Vacuum Llc Multiple vacuum chamber exhaust system and method of evacuating multiple chambers
CN110435190A (zh) * 2019-06-26 2019-11-12 中复连众风电科技有限公司 具有抽真空单元的模具真空加热设备
KR102329548B1 (ko) * 2019-10-17 2021-11-24 무진전자 주식회사 챔버 배기량 자동 조절 시스템
GB2592346B (en) * 2020-01-09 2022-11-02 Edwards Ltd Vacuum pump and vacuum pump set for evacuating a semiconductor processing chamber
GB2592043A (en) * 2020-02-13 2021-08-18 Edwards Ltd Axial flow vacuum pump
FR3112177B1 (fr) * 2020-07-09 2022-07-08 Pfeiffer Vacuum Ligne de vide et procédé de contrôle d’une ligne de vide
FR3112086B1 (fr) * 2020-07-09 2022-07-08 Pfeiffer Vacuum Dispositif de traitement des gaz et ligne de vide
GB2603892A (en) * 2021-02-03 2022-08-24 Edwards Ltd Pump apparatus and system
GB2606193B (en) 2021-04-29 2023-09-06 Edwards Ltd A valve module for a vacuum pumping system
JP7374158B2 (ja) * 2021-10-15 2023-11-06 株式会社荏原製作所 生成物除去装置、処理システム及び生成物除去方法
US12391011B2 (en) * 2022-11-10 2025-08-19 The Boeing Company Double vacuum debulk processing

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4021898A (en) * 1976-05-20 1977-05-10 Timex Corporation Method of adjusting the frequency of vibration of piezoelectric resonators
JPS564069A (en) 1979-06-22 1981-01-16 Mitsubishi Electric Corp Test of semiconductor device
US5010035A (en) * 1985-05-23 1991-04-23 The Regents Of The University Of California Wafer base for silicon carbide semiconductor device
JPH07107388B2 (ja) 1987-12-16 1995-11-15 株式会社日立製作所 複数真空容器の排気方法
JPH02185681A (ja) * 1989-01-11 1990-07-20 Mitsubishi Electric Corp 真空排気装置
JPH03258976A (ja) * 1990-03-08 1991-11-19 Mitsubishi Electric Corp 真空装置における真空の再生方法
US5733104A (en) * 1992-12-24 1998-03-31 Balzers-Pfeiffer Gmbh Vacuum pump system
GB9614849D0 (en) * 1996-07-15 1996-09-04 Boc Group Plc Processes for the scubbing of noxious substances
US6277347B1 (en) * 1997-02-24 2001-08-21 Applied Materials, Inc. Use of ozone in process effluent abatement
JP4112659B2 (ja) * 1997-12-01 2008-07-02 大陽日酸株式会社 希ガスの回収方法及び装置
US6383300B1 (en) * 1998-11-27 2002-05-07 Tokyo Electron Ltd. Heat treatment apparatus and cleaning method of the same
JP3564069B2 (ja) 1999-03-05 2004-09-08 忠弘 大見 真空装置
JP2004218648A (ja) * 1999-03-05 2004-08-05 Tadahiro Omi 真空装置
JP2003083248A (ja) * 2001-09-06 2003-03-19 Ebara Corp 真空排気システム
JP4180265B2 (ja) * 2001-10-31 2008-11-12 株式会社アルバック 真空排気装置の運転方法
DE10159835B4 (de) * 2001-12-06 2012-02-23 Pfeiffer Vacuum Gmbh Vakuumpumpsystem
WO2004036047A1 (en) * 2002-10-14 2004-04-29 The Boc Group Plc Rotary piston vacuum pump with washing installation
US6761135B1 (en) * 2003-08-27 2004-07-13 Bryon Edward Becktold Multipurpose assembly
US7278831B2 (en) * 2003-12-31 2007-10-09 The Boc Group, Inc. Apparatus and method for control, pumping and abatement for vacuum process chambers
GB0505500D0 (en) * 2005-03-17 2005-04-27 Boc Group Plc Vacuum pumping arrangement
US20070189356A1 (en) * 2006-02-13 2007-08-16 Jonathan Pettit Exhaust buildup monitoring in semiconductor processing
GB2437968A (en) * 2006-05-12 2007-11-14 Boc Group Plc Vacuum pumping arrangement for evacuating a plurality of process chambers
GB0615722D0 (en) * 2006-08-08 2006-09-20 Boc Group Plc Apparatus for conveying a waste stream
US20090242046A1 (en) * 2008-03-31 2009-10-01 Benjamin Riordon Valve module
JP2010161150A (ja) * 2009-01-07 2010-07-22 Shimadzu Corp ガス排気ライン切り換え機構およびガス排気ライン切り換え方法
JP2010167338A (ja) * 2009-01-20 2010-08-05 Renesas Electronics Corp 真空処理装置及び真空処理方法
CN102713287B (zh) * 2009-12-28 2015-04-15 株式会社爱发科 真空排气装置、真空排气方法及基板处理装置
CN101922437B (zh) * 2010-08-05 2012-05-23 友达光电股份有限公司 真空设备
KR101427726B1 (ko) * 2011-12-27 2014-08-07 가부시키가이샤 히다치 고쿠사이 덴키 기판 처리 장치 및 반도체 장치의 제조 방법
KR101427719B1 (ko) * 2012-07-16 2014-09-30 (주)트리플코어스코리아 반도체 공정 펌프 및 배기라인의 부산물 제어 방법
JP5808454B1 (ja) * 2014-04-25 2015-11-10 株式会社日立国際電気 基板処理装置、半導体装置の製造方法、プログラムおよび記録媒体
WO2015182699A1 (ja) * 2014-05-30 2015-12-03 株式会社 荏原製作所 真空排気システム
JP6522892B2 (ja) * 2014-05-30 2019-05-29 株式会社荏原製作所 真空排気システム

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