JP2016537510A5 - - Google Patents
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- JP2016537510A5 JP2016537510A5 JP2016538483A JP2016538483A JP2016537510A5 JP 2016537510 A5 JP2016537510 A5 JP 2016537510A5 JP 2016538483 A JP2016538483 A JP 2016538483A JP 2016538483 A JP2016538483 A JP 2016538483A JP 2016537510 A5 JP2016537510 A5 JP 2016537510A5
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- JP
- Japan
- Prior art keywords
- group
- substrate structure
- substrate
- formula
- organic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 33
- 239000010410 layer Substances 0.000 claims 7
- 239000010409 thin film Substances 0.000 claims 6
- 150000001875 compounds Chemical class 0.000 claims 5
- 238000004519 manufacturing process Methods 0.000 claims 5
- 238000000034 method Methods 0.000 claims 5
- 239000002243 precursor Substances 0.000 claims 5
- 229910052782 aluminium Inorganic materials 0.000 claims 4
- 229910052793 cadmium Inorganic materials 0.000 claims 4
- 229910052802 copper Inorganic materials 0.000 claims 4
- 229910052733 gallium Inorganic materials 0.000 claims 4
- 229910052738 indium Inorganic materials 0.000 claims 4
- 229910052742 iron Inorganic materials 0.000 claims 4
- 229910052748 manganese Inorganic materials 0.000 claims 4
- 239000002052 molecular layer Substances 0.000 claims 4
- 229910052758 niobium Inorganic materials 0.000 claims 4
- 229910052710 silicon Inorganic materials 0.000 claims 4
- 229910052718 tin Inorganic materials 0.000 claims 4
- 229910052719 titanium Inorganic materials 0.000 claims 4
- 229910052721 tungsten Inorganic materials 0.000 claims 4
- 229910052720 vanadium Inorganic materials 0.000 claims 4
- 229910052725 zinc Inorganic materials 0.000 claims 4
- 229910052726 zirconium Inorganic materials 0.000 claims 4
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims 3
- 125000003118 aryl group Chemical group 0.000 claims 3
- 125000000753 cycloalkyl group Chemical group 0.000 claims 3
- 125000001072 heteroaryl group Chemical group 0.000 claims 3
- 239000002184 metal Substances 0.000 claims 3
- 229910052751 metal Inorganic materials 0.000 claims 3
- 125000003396 thiol group Chemical group [H]S* 0.000 claims 3
- 101100134925 Gallus gallus COR6 gene Chemical group 0.000 claims 2
- 239000002033 PVDF binder Substances 0.000 claims 2
- 125000003545 alkoxy group Chemical group 0.000 claims 2
- 125000003277 amino group Chemical group 0.000 claims 2
- 125000004429 atom Chemical group 0.000 claims 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 2
- 125000001033 ether group Chemical group 0.000 claims 2
- 239000010408 film Substances 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims 2
- 229920000139 polyethylene terephthalate Polymers 0.000 claims 2
- 239000005020 polyethylene terephthalate Substances 0.000 claims 2
- 229920000307 polymer substrate Polymers 0.000 claims 2
- 239000004926 polymethyl methacrylate Substances 0.000 claims 2
- 229920002981 polyvinylidene fluoride Polymers 0.000 claims 2
- 239000000126 substance Substances 0.000 claims 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical group CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical group Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims 1
- 239000004952 Polyamide Substances 0.000 claims 1
- 239000004642 Polyimide Substances 0.000 claims 1
- 229910010413 TiO 2 Inorganic materials 0.000 claims 1
- 150000004703 alkoxides Chemical class 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 229910002091 carbon monoxide Inorganic materials 0.000 claims 1
- 125000005587 carbonate group Chemical group 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- 229920002313 fluoropolymer Polymers 0.000 claims 1
- 239000004811 fluoropolymer Substances 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 229910044991 metal oxide Inorganic materials 0.000 claims 1
- 150000004706 metal oxides Chemical class 0.000 claims 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N nitrate group Chemical group [N+](=O)([O-])[O-] NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 229920000058 polyacrylate Polymers 0.000 claims 1
- 229920002647 polyamide Polymers 0.000 claims 1
- 229920000515 polycarbonate Polymers 0.000 claims 1
- 239000004417 polycarbonate Substances 0.000 claims 1
- 229920000728 polyester Polymers 0.000 claims 1
- 239000011112 polyethylene naphthalate Substances 0.000 claims 1
- -1 polyethylene terephthalate Polymers 0.000 claims 1
- 229920001721 polyimide Polymers 0.000 claims 1
- 239000011241 protective layer Substances 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 229910052716 thallium Inorganic materials 0.000 claims 1
- 150000003573 thiols Chemical class 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical group O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2013-0104463 | 2013-08-30 | ||
| KR1020130104463 | 2013-08-30 | ||
| PCT/KR2013/009910 WO2015030298A1 (ko) | 2013-08-30 | 2013-11-04 | 기판 구조물 및 이의 제조 방법 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016537510A JP2016537510A (ja) | 2016-12-01 |
| JP2016537510A5 true JP2016537510A5 (enExample) | 2017-01-12 |
| JP6654753B2 JP6654753B2 (ja) | 2020-02-26 |
Family
ID=52586830
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016538482A Active JP6286557B2 (ja) | 2013-08-30 | 2013-11-04 | 有機−無機ハイブリッド薄膜およびその調製方法 |
| JP2016538483A Active JP6654753B2 (ja) | 2013-08-30 | 2013-11-04 | 基板構造およびその調製方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016538482A Active JP6286557B2 (ja) | 2013-08-30 | 2013-11-04 | 有機−無機ハイブリッド薄膜およびその調製方法 |
Country Status (12)
| Country | Link |
|---|---|
| US (2) | US9576876B2 (enExample) |
| EP (2) | EP3040443B1 (enExample) |
| JP (2) | JP6286557B2 (enExample) |
| KR (2) | KR20150026746A (enExample) |
| CN (2) | CN105745353B (enExample) |
| BR (2) | BR112016004389B1 (enExample) |
| CA (2) | CA2922612A1 (enExample) |
| MX (2) | MX390737B (enExample) |
| RU (2) | RU2670303C2 (enExample) |
| SG (2) | SG11201600923YA (enExample) |
| TW (2) | TWI606111B (enExample) |
| WO (2) | WO2015030297A1 (enExample) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2670303C2 (ru) * | 2013-08-30 | 2018-10-22 | Июкф-Хю (Индастри-Юниверсити-Кооперейшн Фаундейшн Ханян Юниверсити) | Функциональная тонкая пленка и способ ее изготовления |
| JP6253070B2 (ja) * | 2013-09-30 | 2017-12-27 | エルジー・ケム・リミテッド | 有機電子素子用基板およびこの製造方法 |
| MX390409B (es) | 2014-06-12 | 2025-03-20 | Basf Coatings Gmbh | Proceso para producir laminados orgánicos-inorgánicos flexibles. |
| SG11201707265QA (en) * | 2015-03-25 | 2017-10-30 | Basf Coatings Gmbh | Process for producing flexible organic-inorganic laminates |
| US20190036077A1 (en) * | 2016-02-18 | 2019-01-31 | Sharp Kabushiki Kaisha | Method for producing organic el display device, and organic el display device |
| KR102586045B1 (ko) * | 2016-07-12 | 2023-10-10 | 삼성디스플레이 주식회사 | 디스플레이 장치 및 이의 제조 방법 |
| US20190040503A1 (en) * | 2017-08-03 | 2019-02-07 | Hrl Laboratories, Llc | Feedstocks for additive manufacturing, and methods of using the same |
| WO2019010696A1 (en) * | 2017-07-14 | 2019-01-17 | General Electric Company | METHOD FOR DEPOSITION LAYERED BY GAS PHASE MOLECULAR LAYER ON A MICROPOROUS SUPPORT |
| US10673046B2 (en) * | 2018-04-13 | 2020-06-02 | GM Global Technology Operations LLC | Separator for lithium metal based batteries |
| CN112334602B (zh) * | 2018-07-05 | 2023-06-30 | 巴斯夫涂料有限公司 | 透明导电膜 |
| KR102224346B1 (ko) * | 2019-07-11 | 2021-03-05 | 한양대학교 산학협력단 | 유무기 하이브리드층, 이 층을 구비하는 유무기 적층체, 및 이 적층체를 가스 배리어로 구비하는 유기전자소자 |
| CN110508155B (zh) * | 2019-08-21 | 2021-09-03 | 南京大学 | 一种锌基无机-有机杂化纳米多孔分离膜的制备方法 |
| CN110635044B (zh) * | 2019-11-04 | 2021-07-06 | 吉林大学 | 一种有机金属卤化物钙钛矿太阳能电池的复合封装薄膜及其制备方法 |
| CN112410763A (zh) * | 2020-10-28 | 2021-02-26 | 武汉华星光电半导体显示技术有限公司 | 一种薄膜封装层，其制备方法及可折叠显示装置 |
| TWI824213B (zh) * | 2020-12-19 | 2023-12-01 | 逢甲大學 | 可撓式透明導電複合膜及其製造方法 |
| KR102558965B1 (ko) * | 2021-03-18 | 2023-07-25 | 한국과학기술연구원 | 신축성 표시 장치 및 신축성 표시 장치 제조 방법 |
| US20240189861A1 (en) | 2021-05-06 | 2024-06-13 | Basf Coatings Gmbh | Multilayer barrier film, its manufacture and use in photovoltaic applications |
| WO2023018308A1 (ko) * | 2021-08-12 | 2023-02-16 | 한양대학교 산학협력단 | 분자선 구조를 갖는 다층 분자막 포토레지스트 및 이의 제조방법 |
| EP4386482A4 (en) * | 2021-08-12 | 2025-10-22 | Iucf Hyu | MULTILAYER MOLECULAR FILM PHOTOSENSITIVE RESIN HAVING MOLECULAR LINE STRUCTURE AND METHOD FOR PRODUCING SAME |
| KR102796366B1 (ko) * | 2022-01-13 | 2025-04-18 | 한양대학교 산학협력단 | 분자선 구조를 갖는 다층 분자막 포토레지스트의 제조방법 |
| CN115124727B (zh) * | 2022-07-08 | 2023-07-14 | 中国科学院山西煤炭化学研究所 | 一种mof薄膜的制备方法 |
| CN117845191A (zh) * | 2022-09-30 | 2024-04-09 | 华为技术有限公司 | 复合薄膜及其制备方法和应用 |
| WO2024126566A1 (en) | 2022-12-14 | 2024-06-20 | Basf Coatings Gmbh | Multilayer barrier film coated polymeric substrate, its manufacture and use in electronic devices |
| WO2024167351A1 (ko) * | 2023-02-10 | 2024-08-15 | 한양대학교 산학협력단 | 분자선 구조를 갖는 포지티브형의 다층 분자막 포토레지스트 |
| WO2024167360A1 (ko) * | 2023-02-10 | 2024-08-15 | 한양대학교 산학협력단 | 배위결합에 의해 가교가능한 분자선 구조를 갖는 다층 분자막 포토레지스트 |
| CN116794116A (zh) * | 2023-05-29 | 2023-09-22 | 南京大学 | 一种基于无机-有机杂化纳米多孔膜/半导体金属氧化物的薄膜氢气传感器及其制备方法 |
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| JP4654911B2 (ja) | 2003-05-16 | 2011-03-23 | 凸版印刷株式会社 | 透明ガスバリア積層フィルム、これを用いたエレクトロルミネッセンス発光素子、エレクトロルミネッセンス表示装置、及び電気泳動式表示パネル |
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| JP2005297498A (ja) | 2004-04-16 | 2005-10-27 | Dainippon Printing Co Ltd | 可撓性基板およびそれを用いた有機デバイス |
| US7378157B2 (en) | 2004-06-28 | 2008-05-27 | Dai Nippon Printing Co., Ltd. | Gas barrier film, and display substrate and display using the same |
| KR101001441B1 (ko) * | 2004-08-17 | 2010-12-14 | 삼성전자주식회사 | 유무기 금속 하이브리드 물질 및 이를 포함하는 유기절연체 조성물 |
| NO20045674D0 (no) | 2004-12-28 | 2004-12-28 | Uni I Oslo | Thin films prepared with gas phase deposition technique |
| JP2007185937A (ja) | 2005-12-12 | 2007-07-26 | Fujifilm Corp | 有機−無機ハイブリッド材料、ガスバリヤーフィルム及びその製造方法 |
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| DE102006016280A1 (de) * | 2006-04-01 | 2007-10-04 | Pvflex Solar Gmbh | Glasloser Solarstrom-Modul mit flexiblen Dünnschicht-Zellen und Verfahren zu seiner Herstellung |
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| US10092927B2 (en) | 2006-11-13 | 2018-10-09 | The Regents Of The University Of Colorado, A Body Corporate | Molecular layer deposition process for making organic or organic-inorganic polymers |
| JP2008218632A (ja) * | 2007-03-02 | 2008-09-18 | Fujifilm Corp | 電子デバイス |
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| JP5127277B2 (ja) | 2007-04-05 | 2013-01-23 | 新日鉄住金マテリアルズ株式会社 | 表面平坦性絶縁膜形成用塗布溶液、表面平坦性絶縁膜被覆基材、及び表面平坦性絶縁膜被覆基材の製造方法 |
| JP5198131B2 (ja) | 2007-05-14 | 2013-05-15 | 富士フイルム株式会社 | バリアフィルムおよび素子 |
| JP5510766B2 (ja) | 2007-06-20 | 2014-06-04 | 大日本印刷株式会社 | イオンプレーティング用蒸発源材料の原料粉末、イオンプレーティング用蒸発源材料及びその製造方法、ガスバリア性シート及びその製造方法 |
| US9660205B2 (en) * | 2007-06-22 | 2017-05-23 | Regents Of The University Of Colorado | Protective coatings for organic electronic devices made using atomic layer deposition and molecular layer deposition techniques |
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| US8067085B2 (en) | 2007-09-14 | 2011-11-29 | Fujifilm Corporation | Gas barrier film, and display device comprising the same |
| US7858144B2 (en) | 2007-09-26 | 2010-12-28 | Eastman Kodak Company | Process for depositing organic materials |
| RU2462793C2 (ru) * | 2007-12-28 | 2012-09-27 | Юниверсите Де Ля Медитерране Экс-Марсель Ii | Гибридные нанокомпозиционные материалы |
| US8776238B2 (en) * | 2008-07-16 | 2014-07-08 | International Business Machines Corporation | Verifying certificate use |
| US8241749B2 (en) | 2008-09-11 | 2012-08-14 | Fujifilm Corporation | Barrier laminate, gas barrier film, and device using the same |
| JP2011046060A (ja) | 2009-08-26 | 2011-03-10 | Fujifilm Corp | ガスバリアフィルムおよびガスバリアフィルムの製造方法 |
| JP4821925B2 (ja) | 2009-11-27 | 2011-11-24 | 大日本印刷株式会社 | ガスバリア性フィルム、装置、及びガスバリア性フィルムの製造方法 |
| EP2549560B1 (en) | 2010-03-17 | 2018-09-26 | Konica Minolta Holdings, Inc. | Organic electronic device and method of manufacturing the same |
| CN102821949B (zh) | 2010-03-25 | 2016-08-10 | 凸版印刷株式会社 | 阻气性层叠体及包装材料 |
| JP5598080B2 (ja) | 2010-05-17 | 2014-10-01 | 大日本印刷株式会社 | ガスバリア性シートの製造方法 |
| JP5913809B2 (ja) | 2011-01-05 | 2016-04-27 | リンテック株式会社 | 透明電極基板、その製造方法、該透明電極基板を有する電子デバイス及び太陽電池 |
| JP5752438B2 (ja) * | 2011-02-23 | 2015-07-22 | グンゼ株式会社 | ガスバリアフィルム |
| JP2014514981A (ja) * | 2011-05-16 | 2014-06-26 | エルジー・ケム・リミテッド | 多層プラスチック基板およびその製造方法 |
| KR101432737B1 (ko) | 2011-07-28 | 2014-08-22 | 한양대학교 산학협력단 | 유기-무기 혼성 박막 및 이의 제조 방법 |
| RU2670303C2 (ru) * | 2013-08-30 | 2018-10-22 | Июкф-Хю (Индастри-Юниверсити-Кооперейшн Фаундейшн Ханян Юниверсити) | Функциональная тонкая пленка и способ ее изготовления |
-
2013
- 2013-11-04 RU RU2016111693A patent/RU2670303C2/ru active
- 2013-11-04 JP JP2016538482A patent/JP6286557B2/ja active Active
- 2013-11-04 JP JP2016538483A patent/JP6654753B2/ja active Active
- 2013-11-04 SG SG11201600923YA patent/SG11201600923YA/en unknown
- 2013-11-04 CN CN201380079249.XA patent/CN105745353B/zh active Active
- 2013-11-04 WO PCT/KR2013/009909 patent/WO2015030297A1/ko not_active Ceased
- 2013-11-04 CA CA2922612A patent/CA2922612A1/en not_active Abandoned
- 2013-11-04 EP EP13892719.9A patent/EP3040443B1/en active Active
- 2013-11-04 MX MX2016002433A patent/MX390737B/es unknown
- 2013-11-04 BR BR112016004389-8A patent/BR112016004389B1/pt active IP Right Grant
- 2013-11-04 US US14/413,754 patent/US9576876B2/en active Active
- 2013-11-04 BR BR112016004476A patent/BR112016004476A2/pt not_active Application Discontinuation
- 2013-11-04 EP EP13892196.0A patent/EP3040442B1/en active Active
- 2013-11-04 CN CN201380079150.XA patent/CN105723011B/zh active Active
- 2013-11-04 MX MX2016002432A patent/MX389406B/es unknown
- 2013-11-04 CA CA2922615A patent/CA2922615A1/en not_active Abandoned
- 2013-11-04 RU RU2016111694A patent/RU2672962C2/ru active
- 2013-11-04 SG SG11201600921XA patent/SG11201600921XA/en unknown
- 2013-11-04 US US14/915,562 patent/US10418300B2/en active Active
- 2013-11-04 WO PCT/KR2013/009910 patent/WO2015030298A1/ko not_active Ceased
- 2013-12-02 TW TW102143967A patent/TWI606111B/zh active
- 2013-12-02 TW TW102144000A patent/TWI521083B/zh active
-
2014
- 2014-02-17 KR KR20140018154A patent/KR20150026746A/ko not_active Withdrawn
- 2014-02-18 KR KR1020140018212A patent/KR102289064B1/ko active Active
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