MX390409B - Proceso para producir laminados orgánicos-inorgánicos flexibles. - Google Patents

Proceso para producir laminados orgánicos-inorgánicos flexibles.

Info

Publication number
MX390409B
MX390409B MX2016016346A MX2016016346A MX390409B MX 390409 B MX390409 B MX 390409B MX 2016016346 A MX2016016346 A MX 2016016346A MX 2016016346 A MX2016016346 A MX 2016016346A MX 390409 B MX390409 B MX 390409B
Authority
MX
Mexico
Prior art keywords
flexible organic
inorganic
producing flexible
laminates
inorganic laminates
Prior art date
Application number
MX2016016346A
Other languages
English (en)
Other versions
MX2016016346A (es
Inventor
Daniel Löffler
Felix Eickemeyer
Jürgen FRANK
Kwan Hyuck Yoon
Maraike Ahlf
Myung Mo Sung
Stephan Klotz
Original Assignee
Basf Coatings Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Coatings Gmbh filed Critical Basf Coatings Gmbh
Publication of MX2016016346A publication Critical patent/MX2016016346A/es
Publication of MX390409B publication Critical patent/MX390409B/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
    • C23C16/45529—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations specially adapted for making a layer stack of alternating different compositions or gradient compositions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/403—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
  • Wrappers (AREA)

Abstract

La presente invención es en el campo de procesos para producir laminados orgánicos-inorgánicos flexibles así como también películas de barrera que comprenden laminados orgánicos-inorgánicos flexibles mediante deposición de capas atómicas. En particular, la presente invención se refiere a un proceso para producir un laminado que comprende más de una vez la secuencia que comprende a) depositar una capa inorgánica realizando de 4 a 150 ciclos de proceso de deposición de capas atómicas, y b) depositar una capa orgánica que comprende azufre mediante un proceso de deposición de capas moleculares.
MX2016016346A 2014-06-12 2015-05-07 Proceso para producir laminados orgánicos-inorgánicos flexibles. MX390409B (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP14172146 2014-06-12
EP15150318 2015-01-07
PCT/EP2015/060105 WO2015188992A1 (en) 2014-06-12 2015-05-07 Process for producing flexible organic-inorganic laminates

Publications (2)

Publication Number Publication Date
MX2016016346A MX2016016346A (es) 2017-04-27
MX390409B true MX390409B (es) 2025-03-20

Family

ID=53055053

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2016016346A MX390409B (es) 2014-06-12 2015-05-07 Proceso para producir laminados orgánicos-inorgánicos flexibles.

Country Status (12)

Country Link
US (1) US11685995B2 (es)
EP (1) EP3155141B1 (es)
JP (1) JP6604974B2 (es)
KR (1) KR102439664B1 (es)
CN (1) CN106414799A (es)
BR (1) BR112016028225B1 (es)
CA (1) CA2950012C (es)
MX (1) MX390409B (es)
RU (1) RU2695997C2 (es)
SG (1) SG11201609703QA (es)
TW (1) TWI722987B (es)
WO (1) WO2015188992A1 (es)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BR112016028242B1 (pt) * 2014-06-13 2022-08-16 Basf Coatings Gmbh Processo para produzir um laminado
SG11201705023SA (en) 2015-01-20 2017-07-28 Basf Coatings Gmbh Process for producing flexible organic-inorganic laminates
RU2721247C2 (ru) 2015-03-25 2020-05-18 БАСФ Коатингс ГмбХ Способ изготовления гибких органических-неорганических слоистых материалов
US10787738B2 (en) 2016-01-27 2020-09-29 Basf Se Process for the generation of thin inorganic films
CN107201504B (zh) * 2017-05-19 2019-04-05 京东方科技集团股份有限公司 真空干燥膜层的方法和显示器件
WO2019013939A1 (en) * 2017-07-10 2019-01-17 Ares Materials Inc. PHOTOMODELED PLANARIZING LAYERS FOR FLEXIBLE ELECTRONICS
CN111356785A (zh) * 2017-11-19 2020-06-30 应用材料公司 用于金属氧化物在金属表面上的ald的方法
KR102794666B1 (ko) * 2018-07-05 2025-04-15 바스프 코팅스 게엠베하 투명 전도성 필름
KR102250011B1 (ko) * 2018-10-18 2021-05-10 한양대학교 산학협력단 막 구조체, 소자 및 멀티레벨 소자
KR102224346B1 (ko) * 2019-07-11 2021-03-05 한양대학교 산학협력단 유무기 하이브리드층, 이 층을 구비하는 유무기 적층체, 및 이 적층체를 가스 배리어로 구비하는 유기전자소자
EP4334380A1 (en) 2021-05-06 2024-03-13 BASF Coatings GmbH Multilayer barrier film, its manufacture and use in photovoltaic applications
KR102796366B1 (ko) * 2022-01-13 2025-04-18 한양대학교 산학협력단 분자선 구조를 갖는 다층 분자막 포토레지스트의 제조방법
CN114695896B (zh) * 2022-03-14 2023-07-18 电子科技大学 一种电子器件的自组装高阻隔薄膜封装方法
CN120615105A (zh) 2022-12-14 2025-09-09 巴斯夫涂料有限公司 多层阻挡膜涂覆的聚合物基底、其制造和在电子装置中的用途
WO2024167360A1 (ko) * 2023-02-10 2024-08-15 한양대학교 산학협력단 배위결합에 의해 가교가능한 분자선 구조를 갖는 다층 분자막 포토레지스트
WO2024167351A1 (ko) * 2023-02-10 2024-08-15 한양대학교 산학협력단 분자선 구조를 갖는 포지티브형의 다층 분자막 포토레지스트

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Also Published As

Publication number Publication date
MX2016016346A (es) 2017-04-27
RU2695997C2 (ru) 2019-07-30
EP3155141A1 (en) 2017-04-19
JP6604974B2 (ja) 2019-11-13
KR20170020765A (ko) 2017-02-24
CN106414799A (zh) 2017-02-15
KR102439664B1 (ko) 2022-09-02
CA2950012C (en) 2022-07-26
BR112016028225A2 (pt) 2017-08-22
TWI722987B (zh) 2021-04-01
CA2950012A1 (en) 2015-12-17
US20180187306A1 (en) 2018-07-05
RU2017100539A3 (es) 2018-11-28
BR112016028225B1 (pt) 2022-08-16
RU2017100539A (ru) 2018-07-16
TW201610232A (zh) 2016-03-16
WO2015188992A1 (en) 2015-12-17
BR112016028225A8 (pt) 2021-05-25
JP2017524811A (ja) 2017-08-31
US11685995B2 (en) 2023-06-27
SG11201609703QA (en) 2016-12-29
EP3155141B1 (en) 2021-04-21

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