BR112016028225A2 - processo para produção de laminados flexíveis orgânico-inorgânicos - Google Patents

processo para produção de laminados flexíveis orgânico-inorgânicos

Info

Publication number
BR112016028225A2
BR112016028225A2 BR112016028225A BR112016028225A BR112016028225A2 BR 112016028225 A2 BR112016028225 A2 BR 112016028225A2 BR 112016028225 A BR112016028225 A BR 112016028225A BR 112016028225 A BR112016028225 A BR 112016028225A BR 112016028225 A2 BR112016028225 A2 BR 112016028225A2
Authority
BR
Brazil
Prior art keywords
flexible laminates
inorganic flexible
inorganic
producing organic
organic
Prior art date
Application number
BR112016028225A
Other languages
English (en)
Other versions
BR112016028225B1 (pt
BR112016028225A8 (pt
Inventor
LÖFFLER Daniel
Eickemeyer Felix
Frank Jürgen
Hyuck YOON Kwan
Ahlf Maraike
Mo SUNG Myung
KLOTZ Stephan
Original Assignee
Basf Coatings Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Coatings Gmbh filed Critical Basf Coatings Gmbh
Publication of BR112016028225A2 publication Critical patent/BR112016028225A2/pt
Publication of BR112016028225A8 publication Critical patent/BR112016028225A8/pt
Publication of BR112016028225B1 publication Critical patent/BR112016028225B1/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
    • C23C16/45529—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations specially adapted for making a layer stack of alternating different compositions or gradient compositions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/403—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
  • Wrappers (AREA)

Abstract

a presente invenção está no campo de processos para produção de laminados flexíveis orgânico-inorgânico, bem como de películas protetoras compreendendo laminados flexíveis orgânico-inorgânicos por deposição de camada atômica. em particular, a presente invenção diz respeito a um processo para produção de um laminado, o processo compreendendo mais do que uma vez a sequência compreendendo (a) deposição de uma camada inorgânica ao se executar 4 a 150 ciclos de um processo de deposição de camada atômica e, (b) deposição de uma camada orgânica compreendendo enxofre por meio de um processo de deposição de camada molecular.
BR112016028225-6A 2014-06-12 2015-05-07 Processo para produção de um laminado, laminado, película protetora, uso de uma película protetora e dispositivo eletrônico BR112016028225B1 (pt)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
EP14172146.4 2014-06-12
EP14172146 2014-06-12
EP15150318 2015-01-07
EP15150318.2 2015-01-07
PCT/EP2015/060105 WO2015188992A1 (en) 2014-06-12 2015-05-07 Process for producing flexible organic-inorganic laminates

Publications (3)

Publication Number Publication Date
BR112016028225A2 true BR112016028225A2 (pt) 2017-08-22
BR112016028225A8 BR112016028225A8 (pt) 2021-05-25
BR112016028225B1 BR112016028225B1 (pt) 2022-08-16

Family

ID=53055053

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112016028225-6A BR112016028225B1 (pt) 2014-06-12 2015-05-07 Processo para produção de um laminado, laminado, película protetora, uso de uma película protetora e dispositivo eletrônico

Country Status (12)

Country Link
US (1) US11685995B2 (pt)
EP (1) EP3155141B1 (pt)
JP (1) JP6604974B2 (pt)
KR (1) KR102439664B1 (pt)
CN (1) CN106414799A (pt)
BR (1) BR112016028225B1 (pt)
CA (1) CA2950012C (pt)
MX (1) MX2016016346A (pt)
RU (1) RU2695997C2 (pt)
SG (1) SG11201609703QA (pt)
TW (1) TWI722987B (pt)
WO (1) WO2015188992A1 (pt)

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* Cited by examiner, † Cited by third party
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WO2015188990A2 (en) * 2014-06-13 2015-12-17 Basf Coatings Gmbh Process for producing organic-inorganic laminates
SG11201705023SA (en) 2015-01-20 2017-07-28 Basf Coatings Gmbh Process for producing flexible organic-inorganic laminates
CN107429390A (zh) 2015-03-25 2017-12-01 巴斯夫涂料有限公司 制备挠性有机‑无机层压材料的方法
WO2017129440A1 (en) 2016-01-27 2017-08-03 Basf Se Process for the generation of thin inorganic films
CN107201504B (zh) * 2017-05-19 2019-04-05 京东方科技集团股份有限公司 真空干燥膜层的方法和显示器件
US11427684B2 (en) 2017-07-10 2022-08-30 ARES Materials, Inc. Photopatterned planarization layers for flexible electronics
KR20200074263A (ko) * 2017-11-19 2020-06-24 어플라이드 머티어리얼스, 인코포레이티드 금속 표면들 상의 금속 산화물들의 ald를 위한 방법들
CN112334602B (zh) * 2018-07-05 2023-06-30 巴斯夫涂料有限公司 透明导电膜
KR102250011B1 (ko) * 2018-10-18 2021-05-10 한양대학교 산학협력단 막 구조체, 소자 및 멀티레벨 소자
TW202311054A (zh) 2021-05-06 2023-03-16 德商巴斯夫塗料有限責任公司 多層障壁膜、其製造及其於光伏打應用之用途
CN114695896B (zh) * 2022-03-14 2023-07-18 电子科技大学 一种电子器件的自组装高阻隔薄膜封装方法
WO2024126566A1 (en) 2022-12-14 2024-06-20 Basf Coatings Gmbh Multilayer barrier film coated polymeric substrate, its manufacture and use in electronic devices
WO2024167360A1 (ko) * 2023-02-10 2024-08-15 한양대학교 산학협력단 배위결합에 의해 가교가능한 분자선 구조를 갖는 다층 분자막 포토레지스트
WO2024167351A1 (ko) * 2023-02-10 2024-08-15 한양대학교 산학협력단 분자선 구조를 갖는 포지티브형의 다층 분자막 포토레지스트

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SG11201705023SA (en) * 2015-01-20 2017-07-28 Basf Coatings Gmbh Process for producing flexible organic-inorganic laminates

Also Published As

Publication number Publication date
US11685995B2 (en) 2023-06-27
JP6604974B2 (ja) 2019-11-13
US20180187306A1 (en) 2018-07-05
TWI722987B (zh) 2021-04-01
KR20170020765A (ko) 2017-02-24
MX2016016346A (es) 2017-04-27
CA2950012C (en) 2022-07-26
RU2017100539A (ru) 2018-07-16
RU2695997C2 (ru) 2019-07-30
WO2015188992A1 (en) 2015-12-17
BR112016028225B1 (pt) 2022-08-16
RU2017100539A3 (pt) 2018-11-28
TW201610232A (zh) 2016-03-16
JP2017524811A (ja) 2017-08-31
EP3155141A1 (en) 2017-04-19
SG11201609703QA (en) 2016-12-29
BR112016028225A8 (pt) 2021-05-25
CA2950012A1 (en) 2015-12-17
EP3155141B1 (en) 2021-04-21
KR102439664B1 (ko) 2022-09-02
CN106414799A (zh) 2017-02-15

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B06U Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette]
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 07/05/2015, OBSERVADAS AS CONDICOES LEGAIS