BR112016028225A8 - processo para produção de um laminado, laminado, película protetora, uso da película protetora e dispositivo eletrônico - Google Patents
processo para produção de um laminado, laminado, película protetora, uso da película protetora e dispositivo eletrônicoInfo
- Publication number
- BR112016028225A8 BR112016028225A8 BR112016028225A BR112016028225A BR112016028225A8 BR 112016028225 A8 BR112016028225 A8 BR 112016028225A8 BR 112016028225 A BR112016028225 A BR 112016028225A BR 112016028225 A BR112016028225 A BR 112016028225A BR 112016028225 A8 BR112016028225 A8 BR 112016028225A8
- Authority
- BR
- Brazil
- Prior art keywords
- laminate
- protective film
- producing
- organic
- electronic device
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
- C23C16/45529—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations specially adapted for making a layer stack of alternating different compositions or gradient compositions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/60—Deposition of organic layers from vapour phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
- Wrappers (AREA)
Abstract
processo para produção de laminados flexíveis orgânico-inorgânicos. a presente invenção está no campo de processos para produção de laminados flexíveis orgânico-inorgânico, bem como de películas protetoras compreendendo laminados flexíveis orgânico-inorgânicos por deposição de camada atômica. em particular, a presente invenção diz respeito a um processo para produção de um laminado, o processo compreendendo mais do que uma vez a sequência compreendendo (a) deposição de uma camada inorgânica ao se executar 4 a 150 ciclos de um processo de deposição de camada atômica e, (b) deposição de uma camada orgânica compreendendo enxofre por meio de um processo de deposição de camada molecular.
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP14172146.4 | 2014-06-12 | ||
EP14172146 | 2014-06-12 | ||
EP15150318 | 2015-01-07 | ||
EP15150318.2 | 2015-01-07 | ||
PCT/EP2015/060105 WO2015188992A1 (en) | 2014-06-12 | 2015-05-07 | Process for producing flexible organic-inorganic laminates |
Publications (3)
Publication Number | Publication Date |
---|---|
BR112016028225A2 BR112016028225A2 (pt) | 2017-08-22 |
BR112016028225A8 true BR112016028225A8 (pt) | 2021-05-25 |
BR112016028225B1 BR112016028225B1 (pt) | 2022-08-16 |
Family
ID=53055053
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR112016028225-6A BR112016028225B1 (pt) | 2014-06-12 | 2015-05-07 | Processo para produção de um laminado, laminado, película protetora, uso de uma película protetora e dispositivo eletrônico |
Country Status (12)
Country | Link |
---|---|
US (1) | US11685995B2 (pt) |
EP (1) | EP3155141B1 (pt) |
JP (1) | JP6604974B2 (pt) |
KR (1) | KR102439664B1 (pt) |
CN (1) | CN106414799A (pt) |
BR (1) | BR112016028225B1 (pt) |
CA (1) | CA2950012C (pt) |
MX (1) | MX2016016346A (pt) |
RU (1) | RU2695997C2 (pt) |
SG (1) | SG11201609703QA (pt) |
TW (1) | TWI722987B (pt) |
WO (1) | WO2015188992A1 (pt) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11639549B2 (en) * | 2014-06-13 | 2023-05-02 | Basf Coatings Gmbh | Process for producing organic-inorganic laminates |
BR112017015636A2 (pt) | 2015-01-20 | 2018-03-13 | Basf Coatings Gmbh | processo para produção de laminados orgânico-inorgânicos flexíveis. |
MX2017012134A (es) | 2015-03-25 | 2018-02-09 | Basf Coatings Gmbh | Procedimiento para la produccion de laminados organicos e inorganicos flexibles. |
US10787738B2 (en) | 2016-01-27 | 2020-09-29 | Basf Se | Process for the generation of thin inorganic films |
CN107201504B (zh) * | 2017-05-19 | 2019-04-05 | 京东方科技集团股份有限公司 | 真空干燥膜层的方法和显示器件 |
WO2019013939A1 (en) * | 2017-07-10 | 2019-01-17 | Ares Materials Inc. | PHOTOMODELED PLANARIZING LAYERS FOR FLEXIBLE ELECTRONICS |
JP7413258B2 (ja) * | 2017-11-19 | 2024-01-15 | アプライド マテリアルズ インコーポレイテッド | 金属表面上の金属酸化物のaldのための方法 |
CN112334602B (zh) * | 2018-07-05 | 2023-06-30 | 巴斯夫涂料有限公司 | 透明导电膜 |
KR102250011B1 (ko) * | 2018-10-18 | 2021-05-10 | 한양대학교 산학협력단 | 막 구조체, 소자 및 멀티레벨 소자 |
EP4334380A1 (en) | 2021-05-06 | 2024-03-13 | BASF Coatings GmbH | Multilayer barrier film, its manufacture and use in photovoltaic applications |
CN114695896B (zh) * | 2022-03-14 | 2023-07-18 | 电子科技大学 | 一种电子器件的自组装高阻隔薄膜封装方法 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS524535B2 (pt) | 1974-03-07 | 1977-02-04 | ||
JP2004537448A (ja) * | 2001-08-20 | 2004-12-16 | ノバ−プラズマ インコーポレイテッド | 気体および蒸気に対する浸透度の低いコーティング |
JP2006321127A (ja) * | 2005-05-19 | 2006-11-30 | Konica Minolta Holdings Inc | バリアフィルム、及び有機エレクトロルミネッセンスデバイス |
JP2007090803A (ja) * | 2005-09-30 | 2007-04-12 | Fujifilm Corp | ガスバリアフィルム、並びに、これを用いた画像表示素子および有機エレクトロルミネッセンス素子 |
JP4866658B2 (ja) | 2006-05-23 | 2012-02-01 | 東京エレクトロン株式会社 | 半導体製造装置 |
KR100856508B1 (ko) * | 2007-06-15 | 2008-09-04 | 주식회사 잉크테크 | 투명도전막 및 이의 제조방법 |
JP5220106B2 (ja) * | 2007-06-22 | 2013-06-26 | ザ・リージエンツ・オブ・ザ・ユニバーシティ・オブ・コロラド | 原子層堆積法及び分子層堆積法を用いて製造された有機電子デバイス用の保護被膜 |
US7858144B2 (en) * | 2007-09-26 | 2010-12-28 | Eastman Kodak Company | Process for depositing organic materials |
JP2009164049A (ja) * | 2008-01-09 | 2009-07-23 | Fuji Electric Holdings Co Ltd | 有機elデバイス |
US20090324826A1 (en) | 2008-06-27 | 2009-12-31 | Hitoshi Kato | Film Deposition Apparatus, Film Deposition Method, and Computer Readable Storage Medium |
JP2010228412A (ja) * | 2009-03-30 | 2010-10-14 | Fujifilm Corp | ガスバリアフィルムおよびバリア性積層体の製造方法 |
WO2011027619A1 (ja) * | 2009-09-02 | 2011-03-10 | コニカミノルタホールディングス株式会社 | バリアフィルム及びその製造方法 |
FI20095947A0 (fi) * | 2009-09-14 | 2009-09-14 | Beneq Oy | Monikerrospinnoite, menetelmä monikerrospinnoitteen valmistamiseksi, ja sen käyttötapoja |
US20120207944A1 (en) | 2010-08-17 | 2012-08-16 | Dudley Sean Finch | Fabrication and selective patterning of thin films using ion beam-enhanced atomic and molecular layer deposition |
US9163310B2 (en) * | 2011-02-18 | 2015-10-20 | Veeco Ald Inc. | Enhanced deposition of layer on substrate using radicals |
CN102593371A (zh) | 2012-03-16 | 2012-07-18 | 四川长虹电器股份有限公司 | 有机电致发光器件的封装结构 |
KR20140045716A (ko) | 2012-10-09 | 2014-04-17 | 건국대학교 산학협력단 | 유무기 합금 필름의 제조방법 및 그로부터 제조된 유무기 합금 필름 |
EP3040442B1 (en) | 2013-08-30 | 2024-02-14 | IUCF-HYU (Industry-University Cooperation Foundation Hanyang University) | Functional thin films comprising an hybrid organic/inorganic thin films and method of manufacturing same |
BR112017015636A2 (pt) * | 2015-01-20 | 2018-03-13 | Basf Coatings Gmbh | processo para produção de laminados orgânico-inorgânicos flexíveis. |
-
2015
- 2015-05-07 CN CN201580031240.0A patent/CN106414799A/zh active Pending
- 2015-05-07 MX MX2016016346A patent/MX2016016346A/es unknown
- 2015-05-07 CA CA2950012A patent/CA2950012C/en active Active
- 2015-05-07 WO PCT/EP2015/060105 patent/WO2015188992A1/en active Application Filing
- 2015-05-07 EP EP15721001.4A patent/EP3155141B1/en active Active
- 2015-05-07 KR KR1020167034256A patent/KR102439664B1/ko active IP Right Grant
- 2015-05-07 US US15/316,661 patent/US11685995B2/en active Active
- 2015-05-07 SG SG11201609703QA patent/SG11201609703QA/en unknown
- 2015-05-07 BR BR112016028225-6A patent/BR112016028225B1/pt active IP Right Grant
- 2015-05-07 RU RU2017100539A patent/RU2695997C2/ru active
- 2015-05-07 JP JP2016572699A patent/JP6604974B2/ja active Active
- 2015-05-27 TW TW104117043A patent/TWI722987B/zh active
Also Published As
Publication number | Publication date |
---|---|
CN106414799A (zh) | 2017-02-15 |
WO2015188992A1 (en) | 2015-12-17 |
MX2016016346A (es) | 2017-04-27 |
RU2017100539A (ru) | 2018-07-16 |
RU2695997C2 (ru) | 2019-07-30 |
US11685995B2 (en) | 2023-06-27 |
SG11201609703QA (en) | 2016-12-29 |
RU2017100539A3 (pt) | 2018-11-28 |
BR112016028225A2 (pt) | 2017-08-22 |
EP3155141A1 (en) | 2017-04-19 |
TW201610232A (zh) | 2016-03-16 |
TWI722987B (zh) | 2021-04-01 |
CA2950012A1 (en) | 2015-12-17 |
CA2950012C (en) | 2022-07-26 |
BR112016028225B1 (pt) | 2022-08-16 |
EP3155141B1 (en) | 2021-04-21 |
KR20170020765A (ko) | 2017-02-24 |
JP6604974B2 (ja) | 2019-11-13 |
US20180187306A1 (en) | 2018-07-05 |
JP2017524811A (ja) | 2017-08-31 |
KR102439664B1 (ko) | 2022-09-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B06U | Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette] | ||
B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 07/05/2015, OBSERVADAS AS CONDICOES LEGAIS |