BR112017020245A2 - ?processo para produção de um laminado, laminado, película de barreira, uso da película de barreira, e, dispositivo eletrônico?. - Google Patents

?processo para produção de um laminado, laminado, película de barreira, uso da película de barreira, e, dispositivo eletrônico?.

Info

Publication number
BR112017020245A2
BR112017020245A2 BR112017020245-0A BR112017020245A BR112017020245A2 BR 112017020245 A2 BR112017020245 A2 BR 112017020245A2 BR 112017020245 A BR112017020245 A BR 112017020245A BR 112017020245 A2 BR112017020245 A2 BR 112017020245A2
Authority
BR
Brazil
Prior art keywords
laminate
barrier film
producing
electronic device
cycles
Prior art date
Application number
BR112017020245-0A
Other languages
English (en)
Inventor
Ahlf Maraike
Frank Juergen
ADERMANN Torben
KLOTZ Stephan
Original Assignee
Basf Coatings Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Coatings Gmbh filed Critical Basf Coatings Gmbh
Publication of BR112017020245A2 publication Critical patent/BR112017020245A2/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
    • C23C16/45529—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations specially adapted for making a layer stack of alternating different compositions or gradient compositions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/30—Organic light-emitting transistors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laminated Bodies (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
  • Chemical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
  • Thin Film Transistor (AREA)

Abstract

a presente invenção está no campo dos processos para a produção de laminados orgânicos-inorgânicos flexíveis. em particular, a presente invenção se refere a um processo para produção de um laminado compreendendo pelo menos duas vezes uma sequência compreendendo (a) deposição de uma camada inorgânica realizando-se de 3 a 150 ciclos de um processo de deposição por camada atômica, e (b) deposição de uma camada orgânica compreendendo nitrogênio realizando-se de 1 a 3 ciclos de um processo de deposição por camada molecular.
BR112017020245-0A 2015-03-25 2016-03-15 ?processo para produção de um laminado, laminado, película de barreira, uso da película de barreira, e, dispositivo eletrônico?. BR112017020245A2 (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP15160789.2 2015-03-25
EP15160789 2015-03-25
PCT/EP2016/055534 WO2016150759A1 (en) 2015-03-25 2016-03-15 Process for producing flexible organic-inorganic laminates

Publications (1)

Publication Number Publication Date
BR112017020245A2 true BR112017020245A2 (pt) 2018-06-05

Family

ID=52779530

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112017020245-0A BR112017020245A2 (pt) 2015-03-25 2016-03-15 ?processo para produção de um laminado, laminado, película de barreira, uso da película de barreira, e, dispositivo eletrônico?.

Country Status (12)

Country Link
US (1) US11286561B2 (pt)
EP (1) EP3274487A1 (pt)
JP (1) JP6986447B2 (pt)
KR (1) KR102596710B1 (pt)
CN (1) CN107429390A (pt)
BR (1) BR112017020245A2 (pt)
CA (1) CA2978031A1 (pt)
MX (1) MX2017012134A (pt)
RU (1) RU2721247C2 (pt)
SG (1) SG11201707265QA (pt)
TW (1) TWI782892B (pt)
WO (1) WO2016150759A1 (pt)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MX2017009473A (es) 2015-01-20 2017-11-02 Basf Coatings Gmbh Proceso para la produccion de laminados flexibles organicos-inorganicos.
EP3818192B1 (en) * 2018-07-05 2024-05-15 BASF Coatings GmbH Transparent conductive film
WO2023018308A1 (ko) * 2021-08-12 2023-02-16 한양대학교 산학협력단 분자선 구조를 갖는 다층 분자막 포토레지스트 및 이의 제조방법

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69129055T2 (de) * 1990-10-03 1998-08-06 Dow Chemical Co Hydroxy-funktionalisierte Polyetheramine zur Verwendung als Sperrschicht bei sauerstoffempfindlichen Materialien
US6690044B1 (en) * 1993-03-19 2004-02-10 Micron Technology, Inc. Approach to avoid buckling BPSG by using an intermediate barrier layer
DE4438359C2 (de) * 1994-10-27 2001-10-04 Schott Glas Behälter aus Kunststoff mit einer Sperrbeschichtung
US6926572B2 (en) * 2002-01-25 2005-08-09 Electronics And Telecommunications Research Institute Flat panel display device and method of forming passivation film in the flat panel display device
JP2007090803A (ja) * 2005-09-30 2007-04-12 Fujifilm Corp ガスバリアフィルム、並びに、これを用いた画像表示素子および有機エレクトロルミネッセンス素子
EP2097179B1 (en) 2006-11-13 2020-01-29 The Regents of the University of Colorado, a body corporate Molecular layer deposition process for making organic or organic-inorganic polymers
EP2171534B1 (en) * 2007-06-22 2015-12-02 The Regents of the University of Colorado Protective coatings for organic electronic devices made using atomic layer deposition and molecular layer deposition techniques
US20090169904A1 (en) * 2007-12-27 2009-07-02 Makoto Yamada Barrier laminate, gas-barrier film, device and optical component
JP2009224190A (ja) * 2008-03-17 2009-10-01 Fujifilm Corp バリア性積層体とその製造方法、デバイスおよび光学部材
US20110171439A1 (en) * 2008-07-08 2011-07-14 Shahab Jahromi Laminate and composite layer comprising a substrate and a coating, and a process and apparatus for preparation thereof
EP2360293A1 (en) 2010-02-11 2011-08-24 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Method and apparatus for depositing atomic layers on a substrate
JP5772966B2 (ja) * 2011-09-26 2015-09-02 日本軽金属株式会社 アルミ樹脂接合体及びその製造方法
MX2014004592A (es) * 2011-10-24 2014-11-26 Tera Barrier Films Pte Ltd Barrera de encapsulacion apilada.
KR20140045716A (ko) 2012-10-09 2014-04-17 건국대학교 산학협력단 유무기 합금 필름의 제조방법 및 그로부터 제조된 유무기 합금 필름
JP6286557B2 (ja) * 2013-08-30 2018-02-28 ビーエーエスエフ コーティングス ゲゼルシャフト ミット ベシュレンクテル ハフツングＢＡＳＦ Ｃｏａｔｉｎｇｓ ＧｍｂＨ 有機−無機ハイブリッド薄膜およびその調製方法
JP6604974B2 (ja) 2014-06-12 2019-11-13 ビーエーエスエフ コーティングス ゲゼルシャフト ミット ベシュレンクテル ハフツング 可撓性有機−無機積層体を製造する方法
CA2949398C (en) 2014-06-13 2022-07-19 Basf Coatings Gmbh Process for producing organic-inorganic laminates
MX2017009473A (es) 2015-01-20 2017-11-02 Basf Coatings Gmbh Proceso para la produccion de laminados flexibles organicos-inorganicos.

Also Published As

Publication number Publication date
CA2978031A1 (en) 2016-09-29
MX2017012134A (es) 2018-02-09
RU2017135503A3 (pt) 2019-09-05
TWI782892B (zh) 2022-11-11
KR102596710B1 (ko) 2023-11-01
TW201700789A (zh) 2017-01-01
US20180119279A1 (en) 2018-05-03
RU2721247C2 (ru) 2020-05-18
JP6986447B2 (ja) 2021-12-22
SG11201707265QA (en) 2017-10-30
CN107429390A (zh) 2017-12-01
WO2016150759A1 (en) 2016-09-29
RU2017135503A (ru) 2019-04-26
KR20170130415A (ko) 2017-11-28
US11286561B2 (en) 2022-03-29
JP2018513271A (ja) 2018-05-24
EP3274487A1 (en) 2018-01-31

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Legal Events

Date Code Title Description
B06U Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette]
B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B09B Patent application refused [chapter 9.2 patent gazette]