PL412520A1 - Sposób wytwarzania folii grafenowej o zadanej liczbie warstw grafenu - Google Patents

Sposób wytwarzania folii grafenowej o zadanej liczbie warstw grafenu

Info

Publication number
PL412520A1
PL412520A1 PL412520A PL41252015A PL412520A1 PL 412520 A1 PL412520 A1 PL 412520A1 PL 412520 A PL412520 A PL 412520A PL 41252015 A PL41252015 A PL 41252015A PL 412520 A1 PL412520 A1 PL 412520A1
Authority
PL
Poland
Prior art keywords
graphene
producing
polymer
set number
layers
Prior art date
Application number
PL412520A
Other languages
English (en)
Inventor
Aleksandra Krajewska
Iwona Pasternak
Aleksandra Przewłoka
Włodzimierz Strupiński
Original Assignee
Instytut Technologii Materiałów Elektronicznych
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Instytut Technologii Materiałów Elektronicznych filed Critical Instytut Technologii Materiałów Elektronicznych
Priority to PL412520A priority Critical patent/PL412520A1/pl
Priority to ES16168937T priority patent/ES2913838T3/es
Priority to EP16168937.7A priority patent/EP3098198B1/en
Priority to PL16168937.7T priority patent/PL3098198T3/pl
Publication of PL412520A1 publication Critical patent/PL412520A1/pl

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/15Nano-sized carbon materials
    • C01B32/182Graphene
    • C01B32/194After-treatment
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P90/00Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement
    • H10P90/21Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement by transferring two-dimensional materials
    • H10P90/212Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement by transferring two-dimensional materials by transferring of graphene
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/80Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
    • C01P2002/82Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by IR- or Raman-data

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • Inorganic Chemistry (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Laminated Bodies (AREA)

Abstract

Przedmiotem zgłoszenia jest sposób wytwarzania folii grafenowej o zadanej liczbie warstw grafenu obejmujący etapy: wytwarzanie grafenu na podłożu metalowym; naniesienie na powierzchnię grafenu warstwy polimeru; oddzielenie stosu polimer/grafen od podłoża metalicznego charakteryzujący się tym, że następnie obejmuje etapy: przeniesienie utworzonego stosu polimer/grafen bezpośrednio na podłoże metalowe z osadzoną na nim co najmniej jedną warstwą grafenu; oddzielenie stosu polimer/grafen/grafen od podłoża metalicznego.
PL412520A 2015-05-29 2015-05-29 Sposób wytwarzania folii grafenowej o zadanej liczbie warstw grafenu PL412520A1 (pl)

Priority Applications (4)

Application Number Priority Date Filing Date Title
PL412520A PL412520A1 (pl) 2015-05-29 2015-05-29 Sposób wytwarzania folii grafenowej o zadanej liczbie warstw grafenu
ES16168937T ES2913838T3 (es) 2015-05-29 2016-05-10 Método de producción de lámina de grafeno con número predefinido de capas de grafeno
EP16168937.7A EP3098198B1 (en) 2015-05-29 2016-05-10 Production method of graphene foil with a pre-defined number of graphene layers
PL16168937.7T PL3098198T3 (pl) 2015-05-29 2016-05-10 Sposób wytwarzania folii grafenowej ze wstępnie określoną liczbą warstw grafenowych

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PL412520A PL412520A1 (pl) 2015-05-29 2015-05-29 Sposób wytwarzania folii grafenowej o zadanej liczbie warstw grafenu

Publications (1)

Publication Number Publication Date
PL412520A1 true PL412520A1 (pl) 2016-12-05

Family

ID=56194215

Family Applications (2)

Application Number Title Priority Date Filing Date
PL412520A PL412520A1 (pl) 2015-05-29 2015-05-29 Sposób wytwarzania folii grafenowej o zadanej liczbie warstw grafenu
PL16168937.7T PL3098198T3 (pl) 2015-05-29 2016-05-10 Sposób wytwarzania folii grafenowej ze wstępnie określoną liczbą warstw grafenowych

Family Applications After (1)

Application Number Title Priority Date Filing Date
PL16168937.7T PL3098198T3 (pl) 2015-05-29 2016-05-10 Sposób wytwarzania folii grafenowej ze wstępnie określoną liczbą warstw grafenowych

Country Status (3)

Country Link
EP (1) EP3098198B1 (pl)
ES (1) ES2913838T3 (pl)
PL (2) PL412520A1 (pl)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106744865B (zh) * 2016-12-01 2019-04-30 无锡第六元素电子薄膜科技有限公司 一种激光供体膜及其制备方法、利用激光供体膜转移石墨烯薄膜的方法
EP3367423B1 (en) * 2017-02-28 2020-04-29 Graphenea, S.A. Method for obtaining multilayer graphene
CN110831768A (zh) * 2017-07-10 2020-02-21 香港科技大学 石墨烯转移方法
CN110156001B (zh) * 2019-07-11 2023-01-03 电子科技大学 一种转移石墨烯薄膜的方法
CN110600166B (zh) * 2019-09-04 2021-04-06 东华大学 一种基底支撑的功能化导电聚合物膜及其制备方法
EP4260361A1 (en) * 2020-12-14 2023-10-18 Danmarks Tekniske Universitet Two-dimensional material and heterostructures on an intermediate polymer transfer layer and their fabrication
CN112919454B (zh) * 2021-01-29 2023-10-13 南京大学 一种控制双层石墨烯堆叠角度的方法
CN113772662A (zh) * 2021-09-16 2021-12-10 上海巴库斯超导新材料有限公司 一种具有均一层厚的单层平整石墨烯
CN116641038A (zh) * 2023-03-28 2023-08-25 北京大学 一种防止金属铜腐蚀的方法、金属铜防腐蚀结构
CN116419554B (zh) * 2023-03-29 2023-09-15 西安工业大学 石墨烯精准叠加结构及其制备方法和应用

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101680761B1 (ko) * 2010-09-17 2016-11-30 삼성전자주식회사 그래핀-폴리머 층상 복합체 및 그의 제조방법
US10040683B2 (en) * 2010-11-17 2018-08-07 Sungkyunkwan University Foundation For Corporate Collaboration Multi-layered graphene sheet and method of fabricating the same
CN104029431B (zh) * 2014-06-23 2018-06-19 南开大学 扭曲角度可控的多层石墨烯结构制备方法

Also Published As

Publication number Publication date
ES2913838T3 (es) 2022-06-06
EP3098198B1 (en) 2022-04-27
PL3098198T3 (pl) 2022-07-18
EP3098198A1 (en) 2016-11-30

Similar Documents

Publication Publication Date Title
PL412520A1 (pl) Sposób wytwarzania folii grafenowej o zadanej liczbie warstw grafenu
SG11201700091UA (en) Adhesion layer composition, method for forming film by nanoimprinting, methods for manufacturing optical component, circuit board and electronic apparatus
PH12018501092A1 (en) High conductivity graphane-metal composite and methods of manufacture
WO2015196066A3 (en) Method for the fabrication and transfer of graphene
MX375104B (es) Un procedimiento para la transferencia de microestructuras a un sustrato final.
PL3370973T3 (pl) Sposób nanoszenia warstwy przenoszonej folii na podłoże
MX2016002432A (es) Pelicula delgada hibrida organica-inorganica y metodo para su preparacion.
SG11201508319QA (en) Antifouling coating composition, antifouling coating film, antifouling substrate, and method for producing antifouling substrate
EP3124525A4 (en) Polymer substrate with hard coat layer and manufacturing method for such polymer substrate
EP2861780A4 (en) Coating of a railway by means of atomic layer deposition
MX2015012261A (es) Revestimientos que exhiben una apariencia de tri-capa, metodos de revestimiento y substratos relacionados.
SG10201911502WA (en) Conductive film coated substrate, multilayer reflective film coated substrate, reflective mask blank, reflective mask, and semiconductor device manufacturing method
FR2957280B1 (fr) Procede de fabrication d'un complexe metallique
WO2012012026A3 (en) Metal film deposition
HUE054582T2 (hu) Funkcionális réteghalmazzal bevont, fejlett mechanikai tulajdonságokkal rendelkezõ szubsztrátum
EP3239100A4 (en) Composite substrate, method for forming nanocarbon film, and nanocarbon film
EP3385072A4 (en) AGENT PREVENTED COATING, AGENT PREVENTING THE SUBSTRATE AND METHOD FOR PRODUCING THE NOISE PREVENTIVE SUBSTRATE
SG11201509576QA (en) Antifouling coating composition, antifouling coating film, substrate with antifouling coating film, and production process for the substrate
EA201692363A1 (ru) Подложка, снабженная многослойной системой с дискретными металлическими слоями, стеклопакет, применение и способ
JP2016095504A5 (pl)
EP3067438A4 (en) Method for forming intermediate layer formed between substrate and dlc film, method for forming dlc film, and intermediate layer formed between substrate and dlc film
IL282127A (en) Method for manufacturing a conductive composite comprising at least one surface layer comprising few-layer graphene
EP3418424A4 (en) COMPOSITE SUBSTRATE, PELLETIC LAYER AND METHOD FOR PRODUCING A COMPOSITE SUBSTRATE SUBSTRATE
MX364944B (es) Elemento de conexión eléctrica, proceso para fabricar un elemento de conexión eléctrica y uso de un elemento de conexión eléctrica.
TW201612956A (en) Method of depositing a layer, method of manufacturing a transistor, layer stack for an electronic device, and an electronic device