SG11201609703QA - Process for producing flexible organic-inorganic laminates - Google Patents
Process for producing flexible organic-inorganic laminatesInfo
- Publication number
- SG11201609703QA SG11201609703QA SG11201609703QA SG11201609703QA SG11201609703QA SG 11201609703Q A SG11201609703Q A SG 11201609703QA SG 11201609703Q A SG11201609703Q A SG 11201609703QA SG 11201609703Q A SG11201609703Q A SG 11201609703QA SG 11201609703Q A SG11201609703Q A SG 11201609703QA
- Authority
- SG
- Singapore
- Prior art keywords
- flexible organic
- producing flexible
- inorganic laminates
- laminates
- inorganic
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
- C23C16/45529—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations specially adapted for making a layer stack of alternating different compositions or gradient compositions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/60—Deposition of organic layers from vapour phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP14172146 | 2014-06-12 | ||
| EP15150318 | 2015-01-07 | ||
| PCT/EP2015/060105 WO2015188992A1 (en) | 2014-06-12 | 2015-05-07 | Process for producing flexible organic-inorganic laminates |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201609703QA true SG11201609703QA (en) | 2016-12-29 |
Family
ID=53055053
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201609703QA SG11201609703QA (en) | 2014-06-12 | 2015-05-07 | Process for producing flexible organic-inorganic laminates |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US11685995B2 (en) |
| EP (1) | EP3155141B1 (en) |
| JP (1) | JP6604974B2 (en) |
| KR (1) | KR102439664B1 (en) |
| CN (1) | CN106414799A (en) |
| BR (1) | BR112016028225B1 (en) |
| CA (1) | CA2950012C (en) |
| MX (1) | MX2016016346A (en) |
| RU (1) | RU2695997C2 (en) |
| SG (1) | SG11201609703QA (en) |
| TW (1) | TWI722987B (en) |
| WO (1) | WO2015188992A1 (en) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BR112016028242B1 (en) * | 2014-06-13 | 2022-08-16 | Basf Coatings Gmbh | PROCESS TO PRODUCE A LAMINATED |
| CN107208265B (en) | 2015-01-20 | 2021-03-23 | 巴斯夫涂料有限公司 | Method for producing flexible organic-inorganic laminates |
| CA2978031A1 (en) | 2015-03-25 | 2016-09-29 | Basf Coatings Gmbh | Process for producing flexible organic-inorganic laminates |
| CN108495856A (en) | 2016-01-27 | 2018-09-04 | 巴斯夫欧洲公司 | The method for generating inorganic thin film |
| CN107201504B (en) * | 2017-05-19 | 2019-04-05 | 京东方科技集团股份有限公司 | It is dried in vacuo the method and display device of film layer |
| US11427684B2 (en) | 2017-07-10 | 2022-08-30 | ARES Materials, Inc. | Photopatterned planarization layers for flexible electronics |
| WO2019099976A1 (en) * | 2017-11-19 | 2019-05-23 | Applied Materials, Inc. | Methods for ald of metal oxides on metal surfaces |
| CN112334602B (en) * | 2018-07-05 | 2023-06-30 | 巴斯夫涂料有限公司 | Transparent conductive film |
| KR102250011B1 (en) * | 2018-10-18 | 2021-05-10 | 한양대학교 산학협력단 | Layer Structure, Element and Multilevel Element |
| TW202311054A (en) | 2021-05-06 | 2023-03-16 | 德商巴斯夫塗料有限責任公司 | Multilayer barrier film, its manufacture and use in photovoltaic applications |
| CN114695896B (en) * | 2022-03-14 | 2023-07-18 | 电子科技大学 | Self-assembled high-barrier film packaging method of electronic device |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS524535B2 (en) | 1974-03-07 | 1977-02-04 | ||
| WO2003016589A1 (en) * | 2001-08-20 | 2003-02-27 | Nova-Plasma Inc. | Coatings with low permeation of gases and vapors |
| JP2006321127A (en) * | 2005-05-19 | 2006-11-30 | Konica Minolta Holdings Inc | Barrier film and organic electroluminescent device |
| JP2007090803A (en) * | 2005-09-30 | 2007-04-12 | Fujifilm Corp | Gas barrier film, and picture display element and organic electroluminescent element using the film |
| JP4866658B2 (en) | 2006-05-23 | 2012-02-01 | 東京エレクトロン株式会社 | Semiconductor manufacturing equipment |
| KR100856508B1 (en) * | 2007-06-15 | 2008-09-04 | 주식회사 잉크테크 | Transpatent conductive layer and preparation method thereof |
| JP5220106B2 (en) * | 2007-06-22 | 2013-06-26 | ザ・リージエンツ・オブ・ザ・ユニバーシティ・オブ・コロラド | Protective coatings for organic electronic devices manufactured using atomic layer deposition and molecular layer deposition methods |
| US7858144B2 (en) * | 2007-09-26 | 2010-12-28 | Eastman Kodak Company | Process for depositing organic materials |
| JP2009164049A (en) * | 2008-01-09 | 2009-07-23 | Fuji Electric Holdings Co Ltd | Organic el device |
| US20090324826A1 (en) | 2008-06-27 | 2009-12-31 | Hitoshi Kato | Film Deposition Apparatus, Film Deposition Method, and Computer Readable Storage Medium |
| JP2010228412A (en) * | 2009-03-30 | 2010-10-14 | Fujifilm Corp | Gas barrier film and method for manufacturing barrier laminate |
| JPWO2011027619A1 (en) * | 2009-09-02 | 2013-02-04 | コニカミノルタホールディングス株式会社 | Barrier film and manufacturing method thereof |
| FI20095947A0 (en) * | 2009-09-14 | 2009-09-14 | Beneq Oy | Multilayer Coating, Process for Manufacturing a Multilayer Coating, and Uses for the Same |
| US20120207944A1 (en) * | 2010-08-17 | 2012-08-16 | Dudley Sean Finch | Fabrication and selective patterning of thin films using ion beam-enhanced atomic and molecular layer deposition |
| US9163310B2 (en) | 2011-02-18 | 2015-10-20 | Veeco Ald Inc. | Enhanced deposition of layer on substrate using radicals |
| CN102593371A (en) * | 2012-03-16 | 2012-07-18 | 四川长虹电器股份有限公司 | Packaging structure for organic light-emitting device (OLED) |
| KR20140045716A (en) | 2012-10-09 | 2014-04-17 | 건국대학교 산학협력단 | Method for preparing organic-inorganic alloy films and the organic-inorganic films prepared therefrom |
| BR112016004476A2 (en) * | 2013-08-30 | 2017-09-12 | Basf Coatings Gmbh | substrate structure, light emitting device, display device, solar battery cell and method for preparing the substrate structure) |
| CN107208265B (en) * | 2015-01-20 | 2021-03-23 | 巴斯夫涂料有限公司 | Method for producing flexible organic-inorganic laminates |
-
2015
- 2015-05-07 RU RU2017100539A patent/RU2695997C2/en active
- 2015-05-07 CN CN201580031240.0A patent/CN106414799A/en active Pending
- 2015-05-07 MX MX2016016346A patent/MX2016016346A/en unknown
- 2015-05-07 BR BR112016028225-6A patent/BR112016028225B1/en active IP Right Grant
- 2015-05-07 JP JP2016572699A patent/JP6604974B2/en active Active
- 2015-05-07 SG SG11201609703QA patent/SG11201609703QA/en unknown
- 2015-05-07 WO PCT/EP2015/060105 patent/WO2015188992A1/en active Application Filing
- 2015-05-07 EP EP15721001.4A patent/EP3155141B1/en active Active
- 2015-05-07 KR KR1020167034256A patent/KR102439664B1/en active IP Right Grant
- 2015-05-07 CA CA2950012A patent/CA2950012C/en active Active
- 2015-05-07 US US15/316,661 patent/US11685995B2/en active Active
- 2015-05-27 TW TW104117043A patent/TWI722987B/en active
Also Published As
| Publication number | Publication date |
|---|---|
| CA2950012A1 (en) | 2015-12-17 |
| JP2017524811A (en) | 2017-08-31 |
| EP3155141B1 (en) | 2021-04-21 |
| BR112016028225A8 (en) | 2021-05-25 |
| CN106414799A (en) | 2017-02-15 |
| TWI722987B (en) | 2021-04-01 |
| KR102439664B1 (en) | 2022-09-02 |
| EP3155141A1 (en) | 2017-04-19 |
| US11685995B2 (en) | 2023-06-27 |
| JP6604974B2 (en) | 2019-11-13 |
| RU2695997C2 (en) | 2019-07-30 |
| WO2015188992A1 (en) | 2015-12-17 |
| MX2016016346A (en) | 2017-04-27 |
| KR20170020765A (en) | 2017-02-24 |
| BR112016028225A2 (en) | 2017-08-22 |
| CA2950012C (en) | 2022-07-26 |
| RU2017100539A3 (en) | 2018-11-28 |
| RU2017100539A (en) | 2018-07-16 |
| BR112016028225B1 (en) | 2022-08-16 |
| US20180187306A1 (en) | 2018-07-05 |
| TW201610232A (en) | 2016-03-16 |
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