SG11201705023SA - Process for producing flexible organic-inorganic laminates - Google Patents

Process for producing flexible organic-inorganic laminates

Info

Publication number
SG11201705023SA
SG11201705023SA SG11201705023SA SG11201705023SA SG11201705023SA SG 11201705023S A SG11201705023S A SG 11201705023SA SG 11201705023S A SG11201705023S A SG 11201705023SA SG 11201705023S A SG11201705023S A SG 11201705023SA SG 11201705023S A SG11201705023S A SG 11201705023SA
Authority
SG
Singapore
Prior art keywords
flexible organic
producing flexible
inorganic laminates
laminates
inorganic
Prior art date
Application number
SG11201705023SA
Inventor
Maraike Ahlf
Juergen Frank
Torben Adermann
Stephan Klotz
Original Assignee
Basf Coatings Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP15151839.6A external-priority patent/EP3048185A1/en
Application filed by Basf Coatings Gmbh filed Critical Basf Coatings Gmbh
Publication of SG11201705023SA publication Critical patent/SG11201705023SA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
    • C23C16/45529—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations specially adapted for making a layer stack of alternating different compositions or gradient compositions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
    • C23C16/45534—Use of auxiliary reactants other than used for contributing to the composition of the main film, e.g. catalysts, activators or scavengers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45553—Atomic layer deposition [ALD] characterized by the use of precursors specially adapted for ALD
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/30—Organic light-emitting transistors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/844—Encapsulations
    • H10K50/8445—Encapsulations multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers
SG11201705023SA 2015-01-20 2015-12-22 Process for producing flexible organic-inorganic laminates SG11201705023SA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP15151839.6A EP3048185A1 (en) 2015-01-20 2015-01-20 Process for producing flexible organic-inorganic laminates
EP15161121 2015-03-26
PCT/EP2015/080988 WO2016116245A1 (en) 2015-01-20 2015-12-22 Process for producing flexible organic-inorganic laminates

Publications (1)

Publication Number Publication Date
SG11201705023SA true SG11201705023SA (en) 2017-07-28

Family

ID=55027749

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201705023SA SG11201705023SA (en) 2015-01-20 2015-12-22 Process for producing flexible organic-inorganic laminates

Country Status (12)

Country Link
US (1) US10988844B2 (en)
EP (1) EP3247819A1 (en)
JP (2) JP2018505968A (en)
KR (1) KR20170103827A (en)
CN (1) CN107208265B (en)
BR (1) BR112017015636A2 (en)
CA (1) CA2971016A1 (en)
MX (1) MX2017009473A (en)
RU (1) RU2736197C2 (en)
SG (1) SG11201705023SA (en)
TW (1) TW201708610A (en)
WO (1) WO2016116245A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3155141B1 (en) * 2014-06-12 2021-04-21 BASF Coatings GmbH Process for producing flexible organic-inorganic laminates
KR20170103827A (en) 2015-01-20 2017-09-13 바스프 코팅스 게엠베하 Process for producing flexible organic-inorganic laminates
EP3274487A1 (en) 2015-03-25 2018-01-31 BASF Coatings GmbH Process for producing flexible organic-inorganic laminates
EP3531462A1 (en) * 2018-02-23 2019-08-28 BASF Coatings GmbH Transparent conductive film
CN108666421A (en) * 2018-05-23 2018-10-16 京东方科技集团股份有限公司 Flexible substrates, organic electroluminescent LED display base plate and display device

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5289926A (en) 1976-01-22 1977-07-28 Olympus Optical Co Ltd Electrophotographic light sensitive plate
SE462454B (en) * 1988-11-10 1990-06-25 Pharmacia Ab METHOD FOR USE IN BIOSENSORS
US6690044B1 (en) 1993-03-19 2004-02-10 Micron Technology, Inc. Approach to avoid buckling BPSG by using an intermediate barrier layer
US6674121B2 (en) 2001-12-14 2004-01-06 The Regents Of The University Of California Method and system for molecular charge storage field effect transistor
US7132678B2 (en) 2003-03-21 2006-11-07 International Business Machines Corporation Electronic device including a self-assembled monolayer, and a method of fabricating the same
US7673970B2 (en) * 2004-06-30 2010-03-09 Lexmark International, Inc. Flexible circuit corrosion protection
ATE433349T1 (en) 2005-04-13 2009-06-15 Univ Heidelberg ORGANIC THIN FILM INSULATOR
JP2007253589A (en) 2006-03-27 2007-10-04 Fujifilm Corp Barrier film substrate and organic electroluminescence element
US7531293B2 (en) * 2006-06-02 2009-05-12 International Business Machines Corporation Radiation sensitive self-assembled monolayers and uses thereof
DE102006048216A1 (en) 2006-10-11 2008-04-17 Wacker Chemie Ag Laminates with thermoplastic polysiloxane-urea copolymers
US9660205B2 (en) 2007-06-22 2017-05-23 Regents Of The University Of Colorado Protective coatings for organic electronic devices made using atomic layer deposition and molecular layer deposition techniques
US20090056991A1 (en) 2007-08-31 2009-03-05 Kuhr Werner G Methods of Treating a Surface to Promote Binding of Molecule(s) of Interest, Coatings and Devices Formed Therefrom
WO2009034446A2 (en) * 2007-09-12 2009-03-19 Australia Diamonds Limited A method of assembly of two components
JP5253932B2 (en) * 2008-09-04 2013-07-31 東京エレクトロン株式会社 Film forming apparatus, substrate processing apparatus, film forming method, and storage medium
US8686404B2 (en) * 2008-12-08 2014-04-01 The Trustees Of The University Of Pennsylvania Organic semiconductors capable of ambipolar transport
JP2010142881A (en) * 2008-12-16 2010-07-01 Fujifilm Corp Structure having organic-inorganic composite layer and method of manufacturing the same
EP2360293A1 (en) 2010-02-11 2011-08-24 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Method and apparatus for depositing atomic layers on a substrate
BR112013019014A2 (en) 2011-01-27 2016-10-04 Vitriflex Inc stack of inorganic multilayers and methods and compositions related to this
WO2013047365A1 (en) 2011-09-26 2013-04-04 日本軽金属株式会社 Aluminum resin bonded body and method for producing same
KR102140719B1 (en) 2012-03-09 2020-08-03 에어 프로덕츠 앤드 케미칼스, 인코오포레이티드 Barrier materials for display devices
WO2013161809A1 (en) 2012-04-26 2013-10-31 コニカミノルタ株式会社 Gas barrier film, and electronic device employing same
JP6118102B2 (en) * 2012-12-21 2017-04-19 東京エレクトロン株式会社 SUBSTRATE POSITION DETECTING DEVICE, SUBSTRATE PROCESSING DEVICE USING THE SAME, AND FILM-FORMING DEVICE
WO2014135390A1 (en) 2013-03-06 2014-09-12 Basf Se Ink composition for producing semiconducting thin films
WO2014165426A1 (en) 2013-04-01 2014-10-09 Basf Corporation Flame retardant systems
EP3099837A1 (en) 2014-01-27 2016-12-07 Basf Se Process for the generation of thin inorganic films
EP3155141B1 (en) 2014-06-12 2021-04-21 BASF Coatings GmbH Process for producing flexible organic-inorganic laminates
MX2016016452A (en) 2014-06-13 2017-05-08 Basf Coatings Gmbh Process for producing organic-inorganic laminates.
WO2016012274A1 (en) 2014-07-21 2016-01-28 Basf Se Organic-inorganic tandem solar cell
KR20170103827A (en) 2015-01-20 2017-09-13 바스프 코팅스 게엠베하 Process for producing flexible organic-inorganic laminates
CN107406981A (en) 2015-03-12 2017-11-28 巴斯夫欧洲公司 The method for producing thin inoranic membrane
EP3274487A1 (en) 2015-03-25 2018-01-31 BASF Coatings GmbH Process for producing flexible organic-inorganic laminates

Also Published As

Publication number Publication date
US20180010249A1 (en) 2018-01-11
EP3247819A1 (en) 2017-11-29
JP2018505968A (en) 2018-03-01
CA2971016A1 (en) 2016-07-28
CN107208265A (en) 2017-09-26
CN107208265B (en) 2021-03-23
JP2021091969A (en) 2021-06-17
US10988844B2 (en) 2021-04-27
KR20170103827A (en) 2017-09-13
RU2736197C2 (en) 2020-11-12
TW201708610A (en) 2017-03-01
MX2017009473A (en) 2017-11-02
BR112017015636A2 (en) 2018-03-13
RU2017129456A3 (en) 2019-07-17
WO2016116245A1 (en) 2016-07-28
RU2017129456A (en) 2019-02-22

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