GB201509646D0 - Novel process - Google Patents

Novel process

Info

Publication number
GB201509646D0
GB201509646D0 GBGB1509646.4A GB201509646A GB201509646D0 GB 201509646 D0 GB201509646 D0 GB 201509646D0 GB 201509646 A GB201509646 A GB 201509646A GB 201509646 D0 GB201509646 D0 GB 201509646D0
Authority
GB
United Kingdom
Prior art keywords
novel process
novel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GBGB1509646.4A
Other versions
GB2539016A (en
GB2539016B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CAFFIO MARCO AND HAUPT REMUS A B AND MARQUORDT CLAUS AND ARVIDSEN JOHN H
Original Assignee
CAFFIO MARCO AND HAUPT REMUS A B AND MARQUORDT CLAUS AND ARVIDSEN JOHN H
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CAFFIO MARCO AND HAUPT REMUS A B AND MARQUORDT CLAUS AND ARVIDSEN JOHN H filed Critical CAFFIO MARCO AND HAUPT REMUS A B AND MARQUORDT CLAUS AND ARVIDSEN JOHN H
Priority to GB1509646.4A priority Critical patent/GB2539016B/en
Publication of GB201509646D0 publication Critical patent/GB201509646D0/en
Publication of GB2539016A publication Critical patent/GB2539016A/en
Application granted granted Critical
Publication of GB2539016B publication Critical patent/GB2539016B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/182—Graphene
    • C01B32/184—Preparation
    • C01B32/186—Preparation by chemical vapour deposition [CVD]
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
GB1509646.4A 2015-06-03 2015-06-03 Manufacture of graphene by plasma-enhanced CVD Active GB2539016B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB1509646.4A GB2539016B (en) 2015-06-03 2015-06-03 Manufacture of graphene by plasma-enhanced CVD

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1509646.4A GB2539016B (en) 2015-06-03 2015-06-03 Manufacture of graphene by plasma-enhanced CVD

Publications (3)

Publication Number Publication Date
GB201509646D0 true GB201509646D0 (en) 2015-07-15
GB2539016A GB2539016A (en) 2016-12-07
GB2539016B GB2539016B (en) 2017-12-06

Family

ID=53677727

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1509646.4A Active GB2539016B (en) 2015-06-03 2015-06-03 Manufacture of graphene by plasma-enhanced CVD

Country Status (1)

Country Link
GB (1) GB2539016B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115285982A (en) * 2022-07-29 2022-11-04 西北有色金属研究院 Method for preparing graphene film layer on surface of single crystal silicon by plasma-assisted CVD (chemical vapor deposition)
CN115285982B (en) * 2022-07-29 2024-04-26 西北有色金属研究院 Method for preparing graphene film layer by plasma-assisted CVD (chemical vapor deposition) on surface of monocrystalline silicon

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10181521B2 (en) * 2017-02-21 2019-01-15 Texas Instruments Incorporated Graphene heterolayers for electronic applications
CN109824038B (en) * 2019-02-20 2022-03-25 南京大学 Method for efficiently eliminating graphene wrinkles by chemical vapor deposition
CN110203912A (en) * 2019-07-17 2019-09-06 西北有色金属研究院 A kind of method that low molten carbon material surface ties up preparation two-dimensional graphene film layer surely
GB202107982D0 (en) * 2021-06-03 2021-07-21 He Carbon Supercap Ltd Method for producing nanoparticles
WO2023079018A1 (en) * 2021-11-04 2023-05-11 Universite Picardie Jules Verne Process for direct deposition of graphene or graphene oxide onto a substrate of interest

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2943660B1 (en) * 2009-03-25 2011-04-29 Commissariat Energie Atomique GRAPHENE PRODUCTION PROCESS
KR101206136B1 (en) * 2010-10-29 2012-11-28 한국과학기술원 Method for improving graphene property, method for manufacturing graphene using the same, graphene manufactured by the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115285982A (en) * 2022-07-29 2022-11-04 西北有色金属研究院 Method for preparing graphene film layer on surface of single crystal silicon by plasma-assisted CVD (chemical vapor deposition)
CN115285982B (en) * 2022-07-29 2024-04-26 西北有色金属研究院 Method for preparing graphene film layer by plasma-assisted CVD (chemical vapor deposition) on surface of monocrystalline silicon

Also Published As

Publication number Publication date
GB2539016A (en) 2016-12-07
GB2539016B (en) 2017-12-06

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732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)

Free format text: REGISTERED BETWEEN 20210415 AND 20210421