FI20095947A0 - Monikerrospinnoite, menetelmä monikerrospinnoitteen valmistamiseksi, ja sen käyttötapoja - Google Patents

Monikerrospinnoite, menetelmä monikerrospinnoitteen valmistamiseksi, ja sen käyttötapoja

Info

Publication number
FI20095947A0
FI20095947A0 FI20095947A FI20095947A FI20095947A0 FI 20095947 A0 FI20095947 A0 FI 20095947A0 FI 20095947 A FI20095947 A FI 20095947A FI 20095947 A FI20095947 A FI 20095947A FI 20095947 A0 FI20095947 A0 FI 20095947A0
Authority
FI
Finland
Prior art keywords
multilayer coating
manufacturing
same
multilayer
coating
Prior art date
Application number
FI20095947A
Other languages
English (en)
Swedish (sv)
Inventor
Sami Sneck
Nora Isomaeki
Jarmo Maula
Olli Jylhae
Matti Putkonen
Original Assignee
Beneq Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beneq Oy filed Critical Beneq Oy
Priority to FI20095947A priority Critical patent/FI20095947A0/fi
Publication of FI20095947A0 publication Critical patent/FI20095947A0/fi
Priority to CN201080040851.9A priority patent/CN102575345B/zh
Priority to EA201290148A priority patent/EA022723B1/ru
Priority to JP2012528401A priority patent/JP2013504866A/ja
Priority to EP10815048.3A priority patent/EP2478127A4/en
Priority to PCT/FI2010/050700 priority patent/WO2011030004A1/en
Priority to KR1020127009458A priority patent/KR20120085259A/ko
Priority to TW099130793A priority patent/TWI507559B/zh
Priority to US13/395,942 priority patent/US20120177903A1/en
Priority to JP2015101530A priority patent/JP2015212419A/ja

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
    • C23C16/45529—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations specially adapted for making a layer stack of alternating different compositions or gradient compositions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/403—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
    • C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y10T428/2495—Thickness [relative or absolute]
    • Y10T428/24967—Absolute thicknesses specified
    • Y10T428/24975—No layer or component greater than 5 mils thick

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Formation Of Insulating Films (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
FI20095947A 2009-09-14 2009-09-14 Monikerrospinnoite, menetelmä monikerrospinnoitteen valmistamiseksi, ja sen käyttötapoja FI20095947A0 (fi)

Priority Applications (10)

Application Number Priority Date Filing Date Title
FI20095947A FI20095947A0 (fi) 2009-09-14 2009-09-14 Monikerrospinnoite, menetelmä monikerrospinnoitteen valmistamiseksi, ja sen käyttötapoja
CN201080040851.9A CN102575345B (zh) 2009-09-14 2010-09-13 多层涂层、制作多层涂层的方法及其应用
EA201290148A EA022723B1 (ru) 2009-09-14 2010-09-13 Многослойное покрытие, способ изготовления многослойного покрытия
JP2012528401A JP2013504866A (ja) 2009-09-14 2010-09-13 多層コーティング、多層コーティングの製造方法及び多層コーティングの使用
EP10815048.3A EP2478127A4 (en) 2009-09-14 2010-09-13 Multilayer coating, method for fabricating a multilayer coating, and uses for the same
PCT/FI2010/050700 WO2011030004A1 (en) 2009-09-14 2010-09-13 Multilayer coating, method for fabricating a multilayer coating, and uses for the same
KR1020127009458A KR20120085259A (ko) 2009-09-14 2010-09-13 다층 코팅, 다층 코팅 제조 방법 및 이의 용도
TW099130793A TWI507559B (zh) 2009-09-14 2010-09-13 多層被覆層、其製法及用途
US13/395,942 US20120177903A1 (en) 2009-09-14 2010-09-13 Multilayer coating, method for fabricating a multilayer coating, and uses for the same
JP2015101530A JP2015212419A (ja) 2009-09-14 2015-05-19 多層コーティング、多層コーティングの製造方法及び多層コーティングの使用

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FI20095947A FI20095947A0 (fi) 2009-09-14 2009-09-14 Monikerrospinnoite, menetelmä monikerrospinnoitteen valmistamiseksi, ja sen käyttötapoja

Publications (1)

Publication Number Publication Date
FI20095947A0 true FI20095947A0 (fi) 2009-09-14

Family

ID=41136409

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20095947A FI20095947A0 (fi) 2009-09-14 2009-09-14 Monikerrospinnoite, menetelmä monikerrospinnoitteen valmistamiseksi, ja sen käyttötapoja

Country Status (9)

Country Link
US (1) US20120177903A1 (fi)
EP (1) EP2478127A4 (fi)
JP (2) JP2013504866A (fi)
KR (1) KR20120085259A (fi)
CN (1) CN102575345B (fi)
EA (1) EA022723B1 (fi)
FI (1) FI20095947A0 (fi)
TW (1) TWI507559B (fi)
WO (1) WO2011030004A1 (fi)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6204911B2 (ja) * 2011-07-11 2017-09-27 ロータス アプライド テクノロジー エルエルシーＬｏｔｕｓ Ａｐｐｌｉｅｄ Ｔｅｃｈｎｏｌｏｇｙ， Ｌｌｃ 混合金属酸化物バリアフィルム及び混合金属酸化物バリアフィルムを形成する原子層成膜方法
CN103732392B (zh) * 2011-07-28 2015-11-25 凸版印刷株式会社 层叠体、阻气膜以及它们的制造方法
TWI473316B (zh) * 2011-08-17 2015-02-11 Nat Applied Res Laboratories 具透明導電特性及水氣阻絕功能之奈米疊層膜及其製造方法
KR20130117510A (ko) * 2012-04-18 2013-10-28 가부시키가이샤 가네카 무기막을 이용한 수분 투과 방지막의 제조 방법, 무기막을 이용한 수분 투과 방지막 및 전기, 전자 봉지 소자
EP2927346A4 (en) * 2012-11-29 2016-07-20 Lg Chemical Ltd COATING METHOD FOR REDUCING DAMAGE TO A SHOCK LAYER
KR20150109984A (ko) * 2014-03-21 2015-10-02 삼성전자주식회사 기체 차단 필름, 이를 포함하는 냉장고 및 기체 차단 필름의 제조방법
RU2695997C2 (ru) * 2014-06-12 2019-07-30 БАСФ Коатингс ГмбХ Способ получения гибких органо-неорганических слоистых материалов
FI126894B (fi) * 2014-12-22 2017-07-31 Beneq Oy Suutinpää, laitteisto ja menetelmä substraatin pinnan pinnoittamiseksi
US9893239B2 (en) 2015-12-08 2018-02-13 Nichia Corporation Method of manufacturing light emitting device
US11326253B2 (en) 2016-04-27 2022-05-10 Applied Materials, Inc. Atomic layer deposition of protective coatings for semiconductor process chamber components
EP3382060A1 (en) * 2017-03-31 2018-10-03 Linde Aktiengesellschaft Method of coating a component and fluid handling component apparatus
TWI773465B (zh) 2017-12-18 2022-08-01 美商恩特葛瑞斯股份有限公司 藉由原子層沉積塗覆所得之耐化學性多層塗層
KR102172190B1 (ko) * 2017-12-21 2020-10-30 인천대학교 산학협력단 컬러 전자섬유 및 이의 제조방법
US11769692B2 (en) 2018-10-31 2023-09-26 Taiwan Semiconductor Manufacturing Co., Ltd. High breakdown voltage inter-metal dielectric layer
CN112481602B (zh) * 2019-09-11 2023-12-15 艾特材料有限公司 一种在陶瓷背板上沉积金属氧化物薄膜的方法及设备

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI64878C (fi) * 1982-05-10 1984-01-10 Lohja Ab Oy Kombinationsfilm foer isynnerhet tunnfilmelektroluminensstrukturer
KR100363084B1 (ko) * 1999-10-19 2002-11-30 삼성전자 주식회사 박막 구조를 위한 다중막을 포함하는 커패시터 및 그 제조 방법
JP4295614B2 (ja) * 2001-07-18 2009-07-15 ザ・リージエンツ・オブ・ザ・ユニバーシテイ・オブ・コロラド 有機ポリマー表面に無機薄膜を成膜する方法
US6806145B2 (en) * 2001-08-31 2004-10-19 Asm International, N.V. Low temperature method of forming a gate stack with a high k layer deposited over an interfacial oxide layer
KR101040446B1 (ko) * 2002-04-19 2011-06-09 맷슨 테크놀로지, 인크. 저증기압 가스 전구체를 이용하여 기판 상에 막을증착하기 위한 시스템
KR101423446B1 (ko) * 2003-05-16 2014-07-24 이 아이 듀폰 디 네모아 앤드 캄파니 원자층 증착에 의해 제작된 플라스틱 기판용 배리어 필름
JP4363365B2 (ja) * 2004-07-20 2009-11-11 株式会社デンソー カラー有機ｅｌディスプレイおよびその製造方法
JP5464775B2 (ja) * 2004-11-19 2014-04-09 エイエスエム インターナショナル エヌ．ヴェー． 低温での金属酸化物膜の製造方法
FI117728B (fi) * 2004-12-21 2007-01-31 Planar Systems Oy Monikerrosmateriaali ja menetelmä sen valmistamiseksi
US7316962B2 (en) * 2005-01-07 2008-01-08 Infineon Technologies Ag High dielectric constant materials
JP4696926B2 (ja) * 2006-01-23 2011-06-08 株式会社デンソー 有機ｅｌ素子およびその製造方法
EP2000008B1 (en) * 2006-03-26 2011-04-27 Lotus Applied Technology, Llc Atomic layer deposition system and method for coating flexible substrates
JP2008235760A (ja) * 2007-03-23 2008-10-02 Denso Corp 絶縁膜の製造方法
US7939932B2 (en) * 2007-06-20 2011-05-10 Analog Devices, Inc. Packaged chip devices with atomic layer deposition protective films
JP2009110710A (ja) * 2007-10-26 2009-05-21 Denso Corp 有機ｅｌディスプレイおよびその製造方法
JP2009283850A (ja) * 2008-05-26 2009-12-03 Elpida Memory Inc キャパシタ用絶縁膜及びその形成方法、並びにキャパシタ及び半導体装置
CN102696116A (zh) * 2009-08-05 2012-09-26 纳幕尔杜邦公司 涂覆阻挡层的薄膜光伏电池
JP5912228B2 (ja) * 2010-05-17 2016-04-27 凸版印刷株式会社 ガスバリア性積層体の製造方法

Also Published As

Publication number Publication date
TW201109460A (en) 2011-03-16
JP2015212419A (ja) 2015-11-26
CN102575345B (zh) 2014-11-05
KR20120085259A (ko) 2012-07-31
CN102575345A (zh) 2012-07-11
JP2013504866A (ja) 2013-02-07
TWI507559B (zh) 2015-11-11
EA022723B1 (ru) 2016-02-29
WO2011030004A1 (en) 2011-03-17
US20120177903A1 (en) 2012-07-12
EP2478127A4 (en) 2017-07-05
EA201290148A1 (ru) 2012-08-30
EP2478127A1 (en) 2012-07-25

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