FI20095382A0 - Heijastava kalvorakenne, menetelmä heijastavan kalvorakenteen valmistamiseksi, ja käytöt kalvorakenteelle ja menetelmälle - Google Patents

Heijastava kalvorakenne, menetelmä heijastavan kalvorakenteen valmistamiseksi, ja käytöt kalvorakenteelle ja menetelmälle

Info

Publication number
FI20095382A0
FI20095382A0 FI20095382A FI20095382A FI20095382A0 FI 20095382 A0 FI20095382 A0 FI 20095382A0 FI 20095382 A FI20095382 A FI 20095382A FI 20095382 A FI20095382 A FI 20095382A FI 20095382 A0 FI20095382 A0 FI 20095382A0
Authority
FI
Finland
Prior art keywords
film construction
reflective film
making
construction
reflective
Prior art date
Application number
FI20095382A
Other languages
English (en)
Swedish (sv)
Original Assignee
Beneq Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beneq Oy filed Critical Beneq Oy
Priority to FI20095382A priority Critical patent/FI20095382A0/fi
Publication of FI20095382A0 publication Critical patent/FI20095382A0/fi
Priority to TW099110263A priority patent/TW201044026A/zh
Priority to EP10761231A priority patent/EP2417480A4/en
Priority to CN2010800147735A priority patent/CN102369464A/zh
Priority to US13/258,181 priority patent/US20120120514A1/en
Priority to EA201190202A priority patent/EA201190202A1/ru
Priority to PCT/FI2010/050269 priority patent/WO2010116034A1/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
    • G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/403—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
    • C23C16/45529—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations specially adapted for making a layer stack of alternating different compositions or gradient compositions
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0808—Mirrors having a single reflecting layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Laminated Bodies (AREA)
FI20095382A 2009-04-08 2009-04-08 Heijastava kalvorakenne, menetelmä heijastavan kalvorakenteen valmistamiseksi, ja käytöt kalvorakenteelle ja menetelmälle FI20095382A0 (fi)

Priority Applications (7)

Application Number Priority Date Filing Date Title
FI20095382A FI20095382A0 (fi) 2009-04-08 2009-04-08 Heijastava kalvorakenne, menetelmä heijastavan kalvorakenteen valmistamiseksi, ja käytöt kalvorakenteelle ja menetelmälle
TW099110263A TW201044026A (en) 2009-04-08 2010-04-02 Structure comprising at least one reflecting thin-film on a surface of a macroscopic object, method for fabricating a structure, and uses for the same
EP10761231A EP2417480A4 (en) 2009-04-08 2010-04-07 STRUCTURE COMPRISING AT LEAST ONE REFLECTIVE THIN FILM ON A MACROSCOPIC OBJECT SURFACE, METHOD OF MANUFACTURING A STRUCTURE, AND USES THEREOF
CN2010800147735A CN102369464A (zh) 2009-04-08 2010-04-07 宏观物体表面包含至少一层反射薄膜的结构,制造结构的方法,及其用途
US13/258,181 US20120120514A1 (en) 2009-04-08 2010-04-07 Structure comprising at least one reflecting thin-film on a surface of a macroscopic object, method for fabricating a structure, and uses for the same
EA201190202A EA201190202A1 (ru) 2009-04-08 2010-04-07 Структура, включающая по меньшей мере одну отражающую тонкую пленку на поверхности макроскопического объекта, способ изготовления структуры и применения этой структуры
PCT/FI2010/050269 WO2010116034A1 (en) 2009-04-08 2010-04-07 Structure comprising at least one reflecting thin film on a surface of a macroscopic object, method for fabricating a structure, and uses for the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FI20095382A FI20095382A0 (fi) 2009-04-08 2009-04-08 Heijastava kalvorakenne, menetelmä heijastavan kalvorakenteen valmistamiseksi, ja käytöt kalvorakenteelle ja menetelmälle

Publications (1)

Publication Number Publication Date
FI20095382A0 true FI20095382A0 (fi) 2009-04-08

Family

ID=40590264

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20095382A FI20095382A0 (fi) 2009-04-08 2009-04-08 Heijastava kalvorakenne, menetelmä heijastavan kalvorakenteen valmistamiseksi, ja käytöt kalvorakenteelle ja menetelmälle

Country Status (7)

Country Link
US (1) US20120120514A1 (fi)
EP (1) EP2417480A4 (fi)
CN (1) CN102369464A (fi)
EA (1) EA201190202A1 (fi)
FI (1) FI20095382A0 (fi)
TW (1) TW201044026A (fi)
WO (1) WO2010116034A1 (fi)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103773083B (zh) * 2012-10-18 2015-04-22 上海纳米技术及应用国家工程研究中心有限公司 一种光学干涉变色颜料及其制备方法和应用
KR20160047538A (ko) * 2013-10-16 2016-05-02 미쯔이 죠센 가부시키가이샤 성막 장치 및 성막 방법
CN110422345B (zh) * 2019-07-26 2022-07-19 中国电子科技集团公司第三十三研究所 一种基于光子晶体的osr热控涂层
CN112526663A (zh) * 2020-11-04 2021-03-19 浙江大学 一种基于原子层沉积的吸收膜及其制作方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6374005A (ja) * 1986-09-18 1988-04-04 Hoya Corp 多層膜裏面反射鏡
JP2509922B2 (ja) * 1986-12-27 1996-06-26 ホーヤ 株式会社 多層膜表面反射鏡
JP2003318094A (ja) * 2002-04-24 2003-11-07 Shin Etsu Handotai Co Ltd 露光装置用反射鏡および露光装置ならびに、それらを用いて製造される半導体デバイス
JP2003328094A (ja) * 2002-05-17 2003-11-19 Sky Alum Co Ltd 平版印刷版支持体用アルミニウム合金圧延板の製造方法
US7294360B2 (en) * 2003-03-31 2007-11-13 Planar Systems, Inc. Conformal coatings for micro-optical elements, and method for making the same
US20090225427A1 (en) * 2008-03-10 2009-09-10 Masco Corporation Optically modified three-dimensional object

Also Published As

Publication number Publication date
EP2417480A1 (en) 2012-02-15
TW201044026A (en) 2010-12-16
EP2417480A4 (en) 2012-12-12
US20120120514A1 (en) 2012-05-17
CN102369464A (zh) 2012-03-07
EA201190202A1 (ru) 2012-04-30
WO2010116034A1 (en) 2010-10-14

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